JP2004525238A - 磁気媒体用途向け潤滑剤付着用溶媒としての弗素化ケトン - Google Patents
磁気媒体用途向け潤滑剤付着用溶媒としての弗素化ケトン Download PDFInfo
- Publication number
- JP2004525238A JP2004525238A JP2002584305A JP2002584305A JP2004525238A JP 2004525238 A JP2004525238 A JP 2004525238A JP 2002584305 A JP2002584305 A JP 2002584305A JP 2002584305 A JP2002584305 A JP 2002584305A JP 2004525238 A JP2004525238 A JP 2004525238A
- Authority
- JP
- Japan
- Prior art keywords
- lubricant
- lubricant composition
- fluorinated
- solvent
- perfluoropolyether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000314 lubricant Substances 0.000 title claims abstract description 148
- 239000002904 solvent Substances 0.000 title claims abstract description 62
- 150000002576 ketones Chemical class 0.000 title claims abstract description 51
- 239000000203 mixture Substances 0.000 claims abstract description 73
- 239000010702 perfluoropolyether Substances 0.000 claims abstract description 42
- 150000001875 compounds Chemical class 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000000576 coating method Methods 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- 239000000460 chlorine Substances 0.000 claims description 13
- 239000000654 additive Substances 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 12
- -1 cyclic phosphazene compound Chemical class 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- 230000000996 additive effect Effects 0.000 claims description 6
- 125000005842 heteroatom Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 230000001050 lubricating effect Effects 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Chemical group 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Chemical group 0.000 claims description 4
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 claims description 3
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical class F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 3
- YUMDTEARLZOACP-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6-decafluorocyclohexan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C(F)(F)C1(F)F YUMDTEARLZOACP-UHFFFAOYSA-N 0.000 claims description 2
- WTPUKBUYGDXTOF-UHFFFAOYSA-N F[C](Cl)Br Chemical class F[C](Cl)Br WTPUKBUYGDXTOF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 239000006184 cosolvent Substances 0.000 claims 2
- GRVMOMUDALILLH-UHFFFAOYSA-N 1,1,1,2,4,5,5,5-octafluoro-2,4-bis(trifluoromethyl)pentan-3-one Chemical compound FC(F)(F)C(F)(C(F)(F)F)C(=O)C(F)(C(F)(F)F)C(F)(F)F GRVMOMUDALILLH-UHFFFAOYSA-N 0.000 claims 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 1
- ZJCFOZHHYJVNNP-UHFFFAOYSA-N F[C]Br Chemical class F[C]Br ZJCFOZHHYJVNNP-UHFFFAOYSA-N 0.000 claims 1
- 150000001491 aromatic compounds Chemical class 0.000 claims 1
- 239000011630 iodine Substances 0.000 claims 1
- 125000002346 iodo group Chemical group I* 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 238000010792 warming Methods 0.000 abstract description 9
- 229930195733 hydrocarbon Natural products 0.000 abstract description 8
- 239000005453 ketone based solvent Substances 0.000 abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 8
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 7
- 239000000356 contaminant Substances 0.000 abstract description 3
- 230000002411 adverse Effects 0.000 abstract description 2
- 230000003381 solubilizing effect Effects 0.000 abstract 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 18
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 239000012535 impurity Substances 0.000 description 12
- 229910052731 fluorine Inorganic materials 0.000 description 10
- 238000004817 gas chromatography Methods 0.000 description 10
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 9
- 239000011737 fluorine Substances 0.000 description 9
- 235000003270 potassium fluoride Nutrition 0.000 description 9
- 239000011698 potassium fluoride Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- PBVZTJDHQVIHFR-UHFFFAOYSA-N 1,1,2,3,3,3-hexafluoroprop-1-ene Chemical compound FC(F)=C(F)C(F)(F)F.FC(F)=C(F)C(F)(F)F PBVZTJDHQVIHFR-UHFFFAOYSA-N 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000013310 covalent-organic framework Substances 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 5
- 238000004949 mass spectrometry Methods 0.000 description 5
- 239000013638 trimer Substances 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229960004624 perflexane Drugs 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 238000005194 fractionation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 3
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 3
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 3
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- BRWSHOSLZPMKII-UHFFFAOYSA-N 2,3,3,3-tetrafluoro-2-(trifluoromethyl)propanoyl fluoride Chemical compound FC(=O)C(F)(C(F)(F)F)C(F)(F)F BRWSHOSLZPMKII-UHFFFAOYSA-N 0.000 description 2
- LKEYHSAKBVEOJQ-UHFFFAOYSA-N 6,6,6-trifluorohexan-3-one Chemical compound CCC(=O)CCC(F)(F)F LKEYHSAKBVEOJQ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 235000011089 carbon dioxide Nutrition 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 239000013058 crude material Substances 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- VBJIFLOSOQGDRZ-UHFFFAOYSA-N (2-chloro-2,2-difluoroacetyl) 2-chloro-2,2-difluoroacetate Chemical compound FC(F)(Cl)C(=O)OC(=O)C(F)(F)Cl VBJIFLOSOQGDRZ-UHFFFAOYSA-N 0.000 description 1
- XJSRKJAHJGCPGC-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane Chemical compound FC(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F XJSRKJAHJGCPGC-UHFFFAOYSA-N 0.000 description 1
- PGISRKZDCUNMRX-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-(trifluoromethoxy)butane Chemical compound FC(F)(F)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)F PGISRKZDCUNMRX-UHFFFAOYSA-N 0.000 description 1
- UDVYMKMTPUSSLP-UHFFFAOYSA-N 1,1,1,2,4,4,5,5-octafluoro-5-(trifluoromethoxy)-2-(trifluoromethyl)pentan-3-one Chemical compound FC(F)(F)OC(F)(F)C(F)(F)C(=O)C(F)(C(F)(F)F)C(F)(F)F UDVYMKMTPUSSLP-UHFFFAOYSA-N 0.000 description 1
- FLXHMXSWIMMEFD-UHFFFAOYSA-N 1,1,1,3,3,4,4,5,5,6,6,7,7,8,8,8-hexadecafluorooctan-2-one Chemical compound FC(F)(F)C(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F FLXHMXSWIMMEFD-UHFFFAOYSA-N 0.000 description 1
- ZSXRVTIIXWUZDE-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,7-pentadecafluoroheptyl 2,2,2-trifluoroacetate Chemical compound FC(F)(F)C(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZSXRVTIIXWUZDE-UHFFFAOYSA-N 0.000 description 1
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
- OYRMHTPYKXUKCS-UHFFFAOYSA-N 1-fluoropentan-3-one Chemical compound CCC(=O)CCF OYRMHTPYKXUKCS-UHFFFAOYSA-N 0.000 description 1
- RUFSXELMOQBMOF-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,5-nonafluoropentanoyl fluoride Chemical compound FC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RUFSXELMOQBMOF-UHFFFAOYSA-N 0.000 description 1
- WIHCZQVQWBCKOA-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluorocyclopentan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C1(F)F WIHCZQVQWBCKOA-UHFFFAOYSA-N 0.000 description 1
- PQMAKJUXOOVROI-UHFFFAOYSA-N 2,2,3,3,5,5,6,6-octafluoro-4-(trifluoromethyl)morpholine Chemical compound FC(F)(F)N1C(F)(F)C(F)(F)OC(F)(F)C1(F)F PQMAKJUXOOVROI-UHFFFAOYSA-N 0.000 description 1
- ASZZHBXPMOVHCU-UHFFFAOYSA-N 3,9-diazaspiro[5.5]undecane-2,4-dione Chemical compound C1C(=O)NC(=O)CC11CCNCC1 ASZZHBXPMOVHCU-UHFFFAOYSA-N 0.000 description 1
- WHQHUSWWAFAPSR-UHFFFAOYSA-N CC(C)CC(C)(C)C(OF)=O Chemical compound CC(C)CC(C)(C)C(OF)=O WHQHUSWWAFAPSR-UHFFFAOYSA-N 0.000 description 1
- JXWUCIQWUMMXON-UHFFFAOYSA-N ClC(C(F)(F)Cl)(F)Cl.Cl[C]F Chemical compound ClC(C(F)(F)Cl)(F)Cl.Cl[C]F JXWUCIQWUMMXON-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- HMHHSXJDJHNSEF-UHFFFAOYSA-N F[C]I Chemical compound F[C]I HMHHSXJDJHNSEF-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 241000700159 Rattus Species 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- ZCZSIDMEHXZRLG-UHFFFAOYSA-N acetic acid heptyl ester Natural products CCCCCCCOC(C)=O ZCZSIDMEHXZRLG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001266 acyl halides Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004177 carbon cycle Methods 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical class OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- JPXGPRBLTIYFQG-UHFFFAOYSA-N heptan-4-yl acetate Chemical compound CCCC(CCC)OC(C)=O JPXGPRBLTIYFQG-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 231100000037 inhalation toxicity test Toxicity 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- SJFUDWKNZGXSLV-UHFFFAOYSA-N octan-2-yl acetate Chemical compound CCCCCCC(C)OC(C)=O SJFUDWKNZGXSLV-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/68—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent
- G11B5/70—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent on a base layer
- G11B5/71—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent on a base layer characterised by the lubricant
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M147/00—Lubricating compositions characterised by the additive being a macromolecular compound containing halogen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M107/00—Lubricating compositions characterised by the base-material being a macromolecular compound
- C10M107/38—Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M169/00—Lubricating compositions characterised by containing as components a mixture of at least two types of ingredient selected from base-materials, thickeners or additives, covered by the preceding groups, each of these compounds being essential
- C10M169/04—Mixtures of base-materials and additives
- C10M169/041—Mixtures of base-materials and additives the additives being macromolecular compounds only
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
- G11B5/7253—Fluorocarbon lubricant
- G11B5/7257—Perfluoropolyether lubricant
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2211/00—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2211/04—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions containing carbon, hydrogen, halogen, and oxygen
- C10M2211/042—Alcohols; Ethers; Aldehydes; Ketones
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2211/00—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2211/04—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions containing carbon, hydrogen, halogen, and oxygen
- C10M2211/042—Alcohols; Ethers; Aldehydes; Ketones
- C10M2211/0425—Alcohols; Ethers; Aldehydes; Ketones used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2211/00—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2211/06—Perfluorinated compounds
- C10M2211/063—Perfluorinated compounds used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2213/04—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2213/06—Perfluoro polymers
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/08—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-nitrogen bonds
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/14—Electric or magnetic purposes
- C10N2040/18—Electric or magnetic purposes in connection with recordings on magnetic tape or disc
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/015—Dispersions of solid lubricants
- C10N2050/02—Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/841,383 US6403149B1 (en) | 2001-04-24 | 2001-04-24 | Fluorinated ketones as lubricant deposition solvents for magnetic media applications |
| PCT/US2002/002901 WO2002086872A1 (en) | 2001-04-24 | 2002-02-01 | Fluorinated ketones as lubricant deposition solvents for magnetic media applications |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004525238A true JP2004525238A (ja) | 2004-08-19 |
| JP2004525238A5 JP2004525238A5 (enExample) | 2005-12-22 |
Family
ID=25284731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002584305A Pending JP2004525238A (ja) | 2001-04-24 | 2002-02-01 | 磁気媒体用途向け潤滑剤付着用溶媒としての弗素化ケトン |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6403149B1 (enExample) |
| EP (1) | EP1395983A1 (enExample) |
| JP (1) | JP2004525238A (enExample) |
| KR (1) | KR20030090783A (enExample) |
| CN (1) | CN1263001C (enExample) |
| WO (1) | WO2002086872A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013163667A (ja) * | 2012-02-13 | 2013-08-22 | Moresco Corp | フルオロポリエーテル化合物、これを含有する潤滑剤ならびに磁気ディスク |
| WO2022196503A1 (ja) * | 2021-03-17 | 2022-09-22 | Ａｇｃ株式会社 | 表面処理剤および表面処理層を有する基材の製造方法 |
| WO2022196502A1 (ja) * | 2021-03-17 | 2022-09-22 | Ａｇｃ株式会社 | 表面処理剤および表面処理層を有する基材の製造方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4666855B2 (ja) * | 1999-07-20 | 2011-04-06 | スリーエム イノベイティブ プロパティズ カンパニー | 消火組成物中でのフッ素化ケトンの使用法 |
| US7294294B1 (en) | 2000-10-17 | 2007-11-13 | Seagate Technology Llc | Surface modified stamper for imprint lithography |
| JP2004319058A (ja) * | 2003-03-31 | 2004-11-11 | Hoya Corp | 磁気ディスクの製造方法及び磁気ディスク |
| JP4527511B2 (ja) * | 2004-05-26 | 2010-08-18 | 富士通株式会社 | ヘッドスライダおよび磁気記録装置 |
| US7252780B2 (en) * | 2004-05-26 | 2007-08-07 | E.I. Du Pont De Nemours And Company | 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone refrigerant and heat transfer compositions comprising a fluoroether |
| US7371474B1 (en) * | 2004-08-06 | 2008-05-13 | Seagate Technology, Llc | Advanced lubricant for thin film storage medium |
| US20080024919A1 (en) * | 2004-10-13 | 2008-01-31 | Seagate Technology Llc | Freezing point reduction in FDB by enhancing lubricants with additives |
| JPWO2006100980A1 (ja) * | 2005-03-18 | 2008-09-04 | パイオニア株式会社 | 音声信号処理装置及びそのためのコンピュータプログラム |
| KR20070120018A (ko) * | 2005-04-28 | 2007-12-21 | 소니 가부시끼 가이샤 | 윤활제 조성물 및 그것을 도포하여 이루어지는 물품, 광디스크용 기판의 성형 스탬퍼, 광 디스크용 기판의 성형금형 장치, 광 디스크용 기판의 성형 방법 및 윤활막의형성 방법 |
| US7385089B2 (en) * | 2005-12-23 | 2008-06-10 | 3M Innovative Properties Company | Fluorochemical ketone compounds and processes for their use |
| JP4884180B2 (ja) * | 2006-11-21 | 2012-02-29 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
| US20100104742A1 (en) * | 2008-10-24 | 2010-04-29 | Hitachi Global Storage Technologies Netherlands Bv | System, method and apparatus for a neat state lubricant blend having improved processibility without diminishing performance of magnetic recording media |
| WO2010046464A1 (en) * | 2008-10-24 | 2010-04-29 | Solvay Solexis S.P.A. | Method for forming a lubricating film |
| JP5631604B2 (ja) * | 2009-02-19 | 2014-11-26 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスクの製造方法 |
| EP2441075B2 (en) | 2009-06-12 | 2024-05-01 | ABB Schweiz AG | Dielectric insulation medium |
| DE202009009305U1 (de) | 2009-06-17 | 2009-11-05 | Ormazabal Gmbh | Schalteinrichtung für Mittel-, Hoch- oder Höchstspannung mit einem Füllmedium |
| KR20130128433A (ko) | 2010-12-14 | 2013-11-26 | 에이비비 리써치 리미티드 | 유전성 절연 매질 |
| JP6042344B2 (ja) | 2010-12-14 | 2016-12-14 | アーベーベー・テヒノロギー・アーゲー | 誘電性絶縁媒体 |
| RU2567754C2 (ru) | 2010-12-16 | 2015-11-10 | Абб Текнолоджи Аг | Диэлектрическая изолирующая среда |
| EP2688991A1 (en) * | 2011-03-03 | 2014-01-29 | 3M Innovative Properties Company | Lubricant compositions containing fluorooxiranes |
| WO2013087700A1 (en) | 2011-12-13 | 2013-06-20 | Abb Technology Ag | Sealed and gas insulated high voltage converter environment for offshore platforms |
| CN102618362A (zh) * | 2012-02-27 | 2012-08-01 | 深圳市优宝惠新材料科技有限公司 | 减磨润滑涂层组合物 |
| EP3830849A4 (en) * | 2018-08-31 | 2021-09-01 | Adaptive Surface Technologies, Inc. | LUBRICANT COMPOSITIONS FOR LUBRICATION OF A TEXTURED SURFACE AND METHOD OF USING THEREFORE |
| EP3689980A1 (en) * | 2019-01-31 | 2020-08-05 | 3M Innovative Properties Company | Fluoropolymer compositions |
| JP7720851B2 (ja) | 2020-01-29 | 2025-08-08 | スリーエム イノベイティブ プロパティズ カンパニー | 堆積組成物、並びにそれを製造及び使用する方法 |
| CN111909752B (zh) * | 2020-08-26 | 2021-09-28 | 武汉理工大学 | 一种氟素润滑添加剂及其制备方法、及润滑材料 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3185734A (en) | 1960-10-25 | 1965-05-25 | Du Pont | Novel polyfluoro-substituted ketones and their preparation from polyfluoro acid fluorides |
| US3665041A (en) | 1967-04-04 | 1972-05-23 | Montedison Spa | Perfluorinated polyethers and process for their preparation |
| US4094911A (en) | 1969-03-10 | 1978-06-13 | Minnesota Mining And Manufacturing Company | Poly(perfluoroalkylene oxide) derivatives |
| NL7711424A (nl) | 1976-10-23 | 1978-04-25 | Hoechst Ag | Werkwijze voor de bereiding van fluor bevattende ketonen. |
| US4268556A (en) | 1979-01-08 | 1981-05-19 | Minnesota Mining And Manufacturing Company | Rigid magnetic recording disks lubricated with fluorinated telechelic polyether |
| US4671999A (en) | 1983-09-19 | 1987-06-09 | Minnesota Mining And Manufacturing Company | Magnetic recording media having perfluoropolyether coating |
| IT1174205B (it) | 1984-06-19 | 1987-07-01 | Montedison Spa | Fluoroplieteri contenenti gruppi terminali dotati di proprieta' ancoranti |
| IT1174206B (it) | 1984-06-19 | 1987-07-01 | Montedison Spa | Fluouropolieteri contenenti gruppi terminali dotati di capacita' ancornanti |
| IT1187676B (it) | 1985-07-03 | 1987-12-23 | Montefluos Spa | Processo per la lubrificazione di organi accessori di cassette contenenti nastri magnetici |
| JPS62192028A (ja) | 1986-02-18 | 1987-08-22 | Hitachi Maxell Ltd | 磁気記録媒体 |
| DE3807395A1 (de) | 1988-03-07 | 1989-09-21 | Henkel Kgaa | Verwendung ausgewaehlter copolymertypen der acryl- und/oder methacrylsaeureester als fliessverbesserer in paraffinreichen erdoelen und erdoelfraktionen (ii) |
| EP0609200A1 (en) | 1988-12-02 | 1994-08-10 | Minnesota Mining And Manufacturing Company | Direct fluorination process for making perfluorinated organic substances |
| US5049410A (en) | 1989-11-01 | 1991-09-17 | International Business Machines Corporation | Lubricant film for a thin-film disk |
| US5466877A (en) | 1994-03-15 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones |
| AU2998295A (en) * | 1994-07-01 | 1996-01-25 | Hmt Technology Corporation | Lubricant composition and method |
| US5663127A (en) | 1994-07-29 | 1997-09-02 | Minnesota Mining And Manufacturing Company | Perfluoropolyether lubricating compositions |
| US5925611A (en) | 1995-01-20 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Cleaning process and composition |
| US5998671A (en) | 1998-05-15 | 1999-12-07 | Alliedsignal Inc. | Fluorinated ketones and method for making same |
| AU775815B2 (en) | 1999-03-26 | 2004-08-19 | Pennzoil - Quaker State Company | Lubricant for magnetic recording medium and use thereof |
| JP4666855B2 (ja) * | 1999-07-20 | 2011-04-06 | スリーエム イノベイティブ プロパティズ カンパニー | 消火組成物中でのフッ素化ケトンの使用法 |
-
2001
- 2001-04-24 US US09/841,383 patent/US6403149B1/en not_active Expired - Lifetime
-
2002
- 2002-02-01 JP JP2002584305A patent/JP2004525238A/ja active Pending
- 2002-02-01 CN CNB02808778XA patent/CN1263001C/zh not_active Expired - Fee Related
- 2002-02-01 EP EP02706103A patent/EP1395983A1/en not_active Withdrawn
- 2002-02-01 WO PCT/US2002/002901 patent/WO2002086872A1/en not_active Ceased
- 2002-02-01 KR KR10-2003-7013837A patent/KR20030090783A/ko not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013163667A (ja) * | 2012-02-13 | 2013-08-22 | Moresco Corp | フルオロポリエーテル化合物、これを含有する潤滑剤ならびに磁気ディスク |
| WO2022196503A1 (ja) * | 2021-03-17 | 2022-09-22 | Ａｇｃ株式会社 | 表面処理剤および表面処理層を有する基材の製造方法 |
| WO2022196502A1 (ja) * | 2021-03-17 | 2022-09-22 | Ａｇｃ株式会社 | 表面処理剤および表面処理層を有する基材の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1263001C (zh) | 2006-07-05 |
| US6403149B1 (en) | 2002-06-11 |
| WO2002086872A1 (en) | 2002-10-31 |
| KR20030090783A (ko) | 2003-11-28 |
| EP1395983A1 (en) | 2004-03-10 |
| CN1505812A (zh) | 2004-06-16 |
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