JP2004307329A - Insulating material for display tube - Google Patents
Insulating material for display tube Download PDFInfo
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- JP2004307329A JP2004307329A JP2004078859A JP2004078859A JP2004307329A JP 2004307329 A JP2004307329 A JP 2004307329A JP 2004078859 A JP2004078859 A JP 2004078859A JP 2004078859 A JP2004078859 A JP 2004078859A JP 2004307329 A JP2004307329 A JP 2004307329A
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- 239000011810 insulating material Substances 0.000 title claims abstract description 34
- 239000011521 glass Substances 0.000 claims abstract description 102
- 239000000843 powder Substances 0.000 claims abstract description 21
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 26
- 238000010304 firing Methods 0.000 claims description 16
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 10
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 238000009413 insulation Methods 0.000 abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 abstract description 8
- 239000000463 material Substances 0.000 description 16
- 230000007423 decrease Effects 0.000 description 13
- 230000000694 effects Effects 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000002844 melting Methods 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 238000005191 phase separation Methods 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 5
- 238000005187 foaming Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 238000004031 devitrification Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 2
- 238000004455 differential thermal analysis Methods 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 238000007496 glass forming Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229940116411 terpineol Drugs 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920001483 poly(ethyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
Abstract
Description
本発明は、プラズマディスプレイパネル(PDP)、蛍光表示管(VFD)、電界放射型ディスプレイ(FED)等の絶縁被覆に主として用いられる表示管用絶縁材料に関するものである。なおPDPにおける絶縁被覆は、背面板に形成されたアドレス電極の保護や前面板に形成された透明電極等の保護に相当し、これらはそれぞれアドレス電極保護用誘電体材料及び透明誘電体材料と一般には呼ばれている。本発明においては、便宜上、電極も含めて配線と呼び、また誘電体材料も絶縁材料と同義として扱うものとする。 The present invention relates to an insulating material for a display tube mainly used for an insulating coating of a plasma display panel (PDP), a fluorescent display tube (VFD), a field emission display (FED), and the like. The insulating coating in the PDP corresponds to protection of the address electrodes formed on the back plate and protection of the transparent electrodes formed on the front plate, which are generally referred to as a dielectric material for protecting the address electrodes and a transparent dielectric material, respectively. Is called. In the present invention, for the sake of convenience, a wiring including an electrode is also referred to as a wiring, and a dielectric material is treated as being synonymous with an insulating material.
PDP、VFD、FED等の配線の絶縁被覆には、焼成温度が500〜600℃、熱膨張係数が60〜100×10-7/℃程度の特性を有する絶縁材料が使用されている。 For insulation coating of wiring such as PDP, VFD, FED, etc., an insulating material having characteristics of a firing temperature of 500 to 600 ° C. and a coefficient of thermal expansion of about 60 to 100 × 10 −7 / ° C. is used.
従来、この種の絶縁材料には、低温度で焼成可能な鉛含有ガラス(PbO−B2O3系)を主たる構成材料とする粉末材料が広く用いられている。ところが最近では環境問題の観点から、鉛を含まない絶縁材料が求められており、アルカリ成分を含むSiO2−B2O3−ZnO系ガラスを用いた材料が提案されている。(例えば特許文献1〜3)
しかしながら、特許文献1で提案された材料は、ガラスの安定性が悪いために、焼成時に失透し易く、設計通りの特性を得ることが難しい。また特許文献2及び3の材料は、焼成時に、ガラスからの揮発による表示管の輝度低下や、発泡による絶縁膜の絶縁不良について十分に考慮されていない。 However, since the material proposed in Patent Document 1 has poor stability of glass, it tends to be devitrified at the time of firing, and it is difficult to obtain characteristics as designed. Further, the materials disclosed in Patent Documents 2 and 3 do not sufficiently consider the reduction in brightness of the display tube due to volatilization from glass and the poor insulation of the insulating film due to foaming during firing.
本発明の目的は、表示管の輝度低下や絶縁不良を引き起こさず、またガラスの安定性が高く、しかも鉛を含まない表示管用絶縁材料を提供することである。 An object of the present invention is to provide an insulating material for a display tube which does not cause a decrease in luminance or insulation failure of the display tube, has high glass stability, and does not contain lead.
本発明の表示管用絶縁材料は、ガラス粉末を含む表示管用絶縁材料であって、該ガラス粉末がモル%表示で、SiO2 5〜25%、B2O3 25〜55%、ZnO 20〜45%、TiO2 0.1〜7%、Al2O3 0〜10%、Li2O+Na2O+K2O 2〜20%、MgO+CaO+SrO+BaO 0〜20%含有し、モル比でB2O3/SiO2≦3.5であるガラスからなることを特徴とする。 The insulating material for a display tube of the present invention is an insulating material for a display tube containing glass powder, wherein the glass powder is represented by mol%, 5 to 25% of SiO 2, 25 to 55% of B 2 O 3, and 20 to 45 of ZnO. %, TiO 2 0.1 to 7%, Al 2 O 3 0 to 10%, Li 2 O + Na 2 O + K 2 O 2 to 20%, MgO + CaO + SrO + BaO 0 to 20%, and a molar ratio of B 2 O 3 / SiO 2 It is characterized by being made of glass satisfying ≦ 3.5.
本発明の絶縁材料を用いれば、表示管の輝度低下や絶縁不良を引き起こさずにアルミニウム配線の絶縁被覆を行うことができる。またガラスの安定性が高く、しかも鉛を含まないため表示管用絶縁材料として好適である。 By using the insulating material of the present invention, it is possible to perform the insulating coating of the aluminum wiring without lowering the brightness of the display tube or causing insulation failure. Further, since the glass has high stability and does not contain lead, it is suitable as an insulating material for a display tube.
SiO2−B2O3−ZnO系ガラス粉末を含む絶縁材料を用いた場合に生じる表示管の輝度低下や絶縁不良は、およそ次のような機構により引き起こされる。 The following mechanism causes a reduction in the brightness of the display tube and poor insulation that occur when an insulating material containing a SiO 2 —B 2 O 3 —ZnO-based glass powder is used.
ガラス中に含まれる水分が焼成時に揮発すると、これに伴ってB2O3その他の揮発しやすい成分の揮発が促される。揮発したB2O3等は表示管の電子放出部分に悪影響を及ぼし、これが輝度低下の原因になると考えられる。それゆえガラス中の水分量が少ないほど、またB2O3の含有量が少ないほど、表示管の輝度低下が起こりにくくなる。 When the moisture contained in the glass is volatilized during firing, the volatilization of B 2 O 3 and other easily volatilizable components is promoted. Volatilized B 2 O 3 and the like have an adverse effect on the electron-emitting portion of the display tube, and this is considered to cause a reduction in luminance. Therefore, the lower the water content in the glass and the lower the content of B 2 O 3 , the less the brightness of the display tube is reduced.
また水分は、絶縁不良を引き起こす泡の発生原因でもある。絶縁不良の原因となる泡はアルミニウム配線上に主として発生するが、その泡はガラス中の水分がアルミニウムにより還元されて生じたものである。アルミニウムは非常に還元能力の高い材料であり、ガラス中の水分を容易に還元する。従って配線上に被覆されたガラスに多量の水分が含まれている場合、
2H2O → 2H2 + O2
の反応が起こり、著しい発泡が生じる。それゆえ、ガラス中の水分量が少ないほど、絶縁不良が起こりにくくなる。なお上記の反応は、エリンガムダイアグラムによる酸化還元の優先順位理論(Chemistry of Glasses,A Paul著)により説明できる。エリンガムダイアグラムは、材料間の酸化還元の優先順位を示している。また材料間の酸化還元反応の起こり易さは、エリンガムダイアグラム上の各材料の反応線間の距離に比例し、その距離が大きくなるほど容易に反応が起こる。この理論から、配線材料であるアルミニウムは、エリンガムダイアグラム上で、H2Oよりかなり下位に位置し、上位にあるH2Oを容易に還元することが分かる。
Moisture is also a cause of generation of bubbles that cause insulation failure. Bubbles that cause insulation failure mainly occur on the aluminum wiring, and the bubbles are generated by reducing the moisture in the glass with aluminum. Aluminum is a material having a very high reducing ability, and easily reduces moisture in glass. Therefore, if the glass coated on the wiring contains a large amount of moisture,
2H 2 O → 2H 2 + O 2
Reaction occurs, resulting in significant foaming. Therefore, as the amount of water in the glass is smaller, insulation failure is less likely to occur. The above reaction can be explained by the theory of priority of oxidation-reduction by Ellingham diagram (Chemistry of Glasses, A Paul). The Ellingham diagram shows the redox priorities among the materials. The likelihood of a redox reaction between the materials is proportional to the distance between the reaction lines of each material on the Ellingham diagram, and the greater the distance, the easier the reaction occurs. From this theory, it can be seen that aluminum, which is a wiring material, is much lower than H 2 O on the Ellingham diagram, and easily reduces H 2 O, which is higher.
そこで本発明では、絶縁材料の主たる構成材料であるSiO2−B2O3−ZnO系ガラスにおいて、所定量のTiO2をガラス組成に導入するとともに、B2O3/SiO2の値を厳密に調整することを特徴としている。 Therefore, in the present invention, in a SiO 2 —B 2 O 3 —ZnO-based glass which is a main constituent material of an insulating material, a predetermined amount of TiO 2 is introduced into the glass composition, and the value of B 2 O 3 / SiO 2 is strictly adjusted. It is characterized by being adjusted to.
TiO2は、ガラス構造を緻密化し、水分を含みにくくする成分である。またSiO2も同様の効果を有しており、B2O3に対するSiO2量を相対的に高めることにより、ガラス構造をさらに緻密化する。またその結果、揮発が起こりにくいガラスとなる。しかもB2O3の含有量が相対的に低下するために、ガラス中のB2O3量が低下し、B2O3の揮発量が減少する。しかもB2O3原料は含水量が多いため、B2O3含有量の減少に伴ってガラスに持ち込まれる水分量が減少する。 TiO 2 is a component that densifies the glass structure and makes it difficult to contain moisture. SiO 2 also has the same effect, and the glass structure is further densified by increasing the amount of SiO 2 relative to B 2 O 3 . As a result, the glass is less likely to volatilize. Moreover, since the content of B 2 O 3 relatively decreases, the amount of B 2 O 3 in the glass decreases, and the volatilization amount of B 2 O 3 decreases. In addition, since the B 2 O 3 raw material has a high water content, the amount of water brought into the glass decreases with a decrease in the B 2 O 3 content.
これらの相乗効果により、輝度低下や絶縁不良を起こしにくい絶縁材料を得ることができる。 Due to these synergistic effects, it is possible to obtain an insulating material that does not easily cause a decrease in luminance or insulation failure.
なおB2O3に対するSiO2量を相対的に高めると、ガラスが硬くなり、500〜600℃の温度で焼成することが困難になる。そこで本発明では、さらにアルカリ成分を導入し、ガラスの粘性を低下させた構成となっている。 If the amount of SiO 2 relative to B 2 O 3 is relatively increased, the glass becomes harder, and it becomes difficult to fire at a temperature of 500 to 600 ° C. Therefore, in the present invention, an alkali component is further introduced to reduce the viscosity of the glass.
以下に、本発明の表示管用絶縁材料に含まれるガラス粉末組成を限定した理由について個別に詳述する。 Hereinafter, the reasons for limiting the glass powder composition contained in the insulating material for a display tube of the present invention will be individually described in detail.
SiO2はガラスの骨格を形成する成分であり、ガラス形成酸化物である。また、SiO2含有量が多くなるとガラス構造が緻密化し、ガラス中の水分量が減少する傾向がある。また熱膨脹が低下する。本発明の組成においてはSiO2の含有量が25モル%より多いとガラスの粘性が高くなって絶縁被覆工程における焼成温度が高くなりすぎる。また5モル%より少ないとガラスが不安定になり焼成時に失透しやすくなる。ガラスが失透すると設計通りの特性が得難くなる。特に所望の流動性や熱膨張係数が得られなくなる。なお、絶縁材料は、より低温で焼成することが好まれるので、SiO2は20モル%以下が好ましく、またガラスの安定性から10モル%以上が好ましい。 SiO 2 is a component that forms the skeleton of glass, and is a glass-forming oxide. Also, when the content of SiO 2 is increased, the glass structure becomes denser, and the amount of water in the glass tends to decrease. Also, the thermal expansion decreases. In the composition of the present invention, if the content of SiO 2 is more than 25 mol%, the viscosity of the glass becomes high and the firing temperature in the insulating coating step becomes too high. On the other hand, if the content is less than 5 mol%, the glass becomes unstable and easily devitrifies during firing. When the glass is devitrified, it becomes difficult to obtain the characteristics as designed. In particular, the desired fluidity and thermal expansion coefficient cannot be obtained. Since it is preferable that the insulating material be fired at a lower temperature, SiO 2 is preferably at most 20 mol%, and more preferably at least 10 mol% from the viewpoint of glass stability.
B2O3は、ガラスの骨格を形成する成分であり、ガラス形成酸化物である。また、ガラスの溶融温度及び軟化点を下げる成分である。その一方で、揮発による輝度低下の原因となり、またその原料はガラス中への主な水分供給源となっている。B2O3の含有量が25モル%より少ないと上記効果に乏しくなり、55モル%より多いとガラスが分相すると同時に軟化点が630℃以下にならない。このため600℃以下の温度で焼成すると、平滑な表面を有する焼成膜が得られず、絶縁性が悪化する。またガラスからのB2O3の揮発によって表示管の輝度低下を引き起こすおそれがある。さらにB2O3原料が多量の水分をガラス中に持ち込み、発泡の原因となる。B2O3の含有量は好ましくは35〜45モル%である。 B 2 O 3 is a component that forms the skeleton of glass, and is a glass-forming oxide. It is a component that lowers the melting temperature and softening point of glass. On the other hand, it causes a decrease in luminance due to volatilization, and the raw material is a main water supply source into glass. When the content of B 2 O 3 is less than 25 mol%, the above effect is poor. When the content is more than 55 mol%, the glass is separated and the softening point does not become 630 ° C. or lower. For this reason, when firing at a temperature of 600 ° C. or less, a fired film having a smooth surface cannot be obtained, and the insulating property deteriorates. Further, the brightness of the display tube may be reduced due to the volatilization of B 2 O 3 from the glass. Further, the B 2 O 3 raw material brings a large amount of water into the glass, causing foaming. The content of B 2 O 3 is preferably 35 to 45 mol%.
ZnOは中間酸化物であり、ガラスの溶融温度や軟化点を著しく上げることなく、熱膨張係数を下げる成分である。ZnOが20モル%より少ないとその効果が十分でなく、45モル%より多いと焼成時に結晶が析出して均質なガラスが得られない。ZnOの含有量は好ましくは25〜45モル%である。 ZnO is an intermediate oxide, and is a component that lowers the coefficient of thermal expansion without significantly increasing the melting temperature and softening point of glass. If ZnO is less than 20 mol%, the effect is not sufficient, and if it is more than 45 mol%, crystals are precipitated at the time of sintering and a homogeneous glass cannot be obtained. The content of ZnO is preferably 25 to 45 mol%.
TiO2は中間酸化物であり、本発明の特徴的な成分である。一般的なTiO2の効果は、ZnOと同じくガラスの溶融温度や軟化点を著しく上げることなく、熱膨張係数を下げることであるが、本発明においてはそれに加えて、ガラス構造を緻密化し、水分を含みにくくするというものである。またTiO2は、アルミニウムによる還元が比較的起こりやすいため、ガラス中の水分の還元量を減少させる効果もある。なお還元により析出する金属チタンは、溶出性が低く成長しにくいため、絶縁不良を引き起こすおそれがない。TiO2は0.1モル%より少ないと上記効果を十分に得ることができない。また7モル%より多いとガラスが不安定になって、焼成時に失透しやすくなる。このため設計通りの特性が得難くなり、例えば所望の流動性や熱膨張係数が得られなくなる。TiO2の好ましい範囲は0.5〜7モル%、特に1.5〜5モル%である。 TiO 2 is an intermediate oxide and is a characteristic component of the present invention. The general effect of TiO 2 is to lower the coefficient of thermal expansion without significantly increasing the melting temperature and softening point of the glass, as in ZnO, but in the present invention, in addition to this, it densifies the glass structure and increases the water content. Is difficult to include. Since TiO 2 is relatively easily reduced by aluminum, TiO 2 also has an effect of reducing the amount of reduction of water in glass. Note that titanium metal precipitated by reduction has low elution properties and is difficult to grow, and thus does not cause insulation failure. If the content of TiO 2 is less than 0.1 mol%, the above effects cannot be sufficiently obtained. On the other hand, if the content is more than 7 mol%, the glass becomes unstable and easily devitrifies during firing. For this reason, it becomes difficult to obtain the characteristics as designed, and for example, it becomes impossible to obtain desired fluidity and thermal expansion coefficient. The preferred range of TiO 2 is 0.5 to 7 mol%, in particular 1.5 to 5 mol%.
Al2O3は中間酸化物であり、ガラスの分相を抑え、安定化させる成分である。また熱膨張係数を低下させる効果がある。Al2O3が10モル%より多いとガラスの粘度が高くなり、適度な流動性が得られなくなる。またガラス転移点が高くなり好ましくない。Al2O3の好ましい範囲は0.1〜10モル%、より好ましくは0.5〜5モル%である。 Al 2 O 3 is an intermediate oxide, and is a component that suppresses and stabilizes the phase separation of glass. It also has the effect of lowering the coefficient of thermal expansion. If the content of Al 2 O 3 is more than 10 mol%, the viscosity of the glass becomes high, so that an appropriate fluidity cannot be obtained. Further, the glass transition point is undesirably high. The preferred range is 0.1 to 10 mole% Al 2 O 3, more preferably 0.5 to 5 mol%.
アルカリ金属酸化物であるLi2O、Na2O及びK2Oは、ガラスの軟化点を下げて低融点化する成分であり、その含有量は合量で2〜20モル%、好ましくは7〜15モル%である。2モル%より少ないと、上記効果に乏しくなり、20モル%より多いと、熱膨張係数が上昇すると共に、電気絶縁性が低下する。 Li 2 O is an alkali metal oxide, Na 2 O and K 2 O is a component to lower the melting point of lowering the softening point of the glass, the content thereof in total 2 to 20 mol%, preferably 7 ~ 15 mol%. When the amount is less than 2 mol%, the above effects are poor, and when the amount is more than 20 mol%, the thermal expansion coefficient increases and the electrical insulation decreases.
Li2O、Na2O及びK2Oの含有量は、それぞれLi2O 0〜6モル%(特に2〜3モル%)、Na2O 0〜10モル%(特に3〜6モル%)、K2O 0〜10モル%(特に3〜5モル%)であることが好ましい。各成分が多すぎると熱膨張係数が大きくなりすぎる。またアルカリ金属酸化物は、2種以上、特に3種全てを混合して使用することが望ましい。アルカリ金属酸化物を混合して使用することで、アルカリ混合効果により、熱膨張係数を増大させることなく、容易にガラスを低温化できる。 The contents of Li 2 O, Na 2 O and K 2 O are respectively 0 to 6 mol% (particularly 2 to 3 mol%) of Li 2 O and 0 to 10 mol% (particularly 3 to 6 mol%) of Na 2 O. , K 2 O is preferably 0 to 10 mol% (particularly 3 to 5 mol%). If each component is too large, the coefficient of thermal expansion becomes too large. It is desirable to use two or more, particularly all three, of the alkali metal oxides in combination. By mixing and using an alkali metal oxide, the temperature of the glass can be easily lowered without increasing the thermal expansion coefficient due to the alkali mixing effect.
MgO、CaO、SrO、BaO等のアルカリ土類金属酸化物は、耐水性や耐薬品性を向上させる成分である。特にBaOやSrOは本組成の安定性を向上させるのに有効である。なおアルカリ土類酸化物は、上記効果を得るために合量で3モル%以上添加することが好ましいが、ガラスの安定性及び膨張の面から合量で20モル%以下、好ましくは15モル%以下に制限すべきである。 Alkaline earth metal oxides such as MgO, CaO, SrO, and BaO are components that improve water resistance and chemical resistance. In particular, BaO and SrO are effective for improving the stability of the present composition. The alkaline earth oxide is preferably added in a total amount of 3 mol% or more in order to obtain the above effect, but from the viewpoint of stability and expansion of the glass, the total amount is 20 mol% or less, preferably 15 mol%. The following should be restricted:
MgO、CaO、SrO、BaOの含有量は、それぞれMgO 0〜10モル%(特に0〜5モル%)、CaO 0〜10モル%(特に0〜5モル%)、SrO 0〜10モル%(特に0.1〜5モル%)、BaO 0.1〜10モル%(特に1〜5モル%)であることが好ましい。各成分が多すぎると熱膨張係数が高くなりすぎ、基板との接着性が悪くなる等の不都合が生じる。 The contents of MgO, CaO, SrO, and BaO are respectively 0 to 10 mol% (particularly 0 to 5 mol%), 0 to 10 mol% (particularly 0 to 5 mol%), and 0 to 10 mol% of SrO ( It is preferable that the content of BaO is 0.1 to 5 mol%, and the content of BaO is 0.1 to 10 mol% (particularly 1 to 5 mol%). If each component is too large, the coefficient of thermal expansion becomes too high, causing inconvenience such as poor adhesion to the substrate.
また本発明におけるガラスは、モル比でB2O3/SiO2が3.5以下であることを特徴とする。表示管の絶縁被覆用途において、ガラスの組成成分が揮発すると、表示管の輝度低下の原因となることは前述の通りであるが、SiO2−B2O3−ZnO系のガラスは、分相傾向のある準不安定なガラスとなりやすい。このようなガラスは、組成成分が揮発しやすい傾向がある。そこで組成中のB2O3に対するSiO2の比率を高めることで、ガラスの分相傾向を小さくし、表示管の輝度低下を防止することができる。またB2O3に対するSiO2量が相対的に高まると、ガラス構造が緻密になり、水分を含みにくいガラスとなる。しかもB2O3の含有量が相対的に低下するために、B2O3の揮発量が減少する。加えてB2O3含有量の減少に伴ってガラスに持ち込まれる水分量も減少させることができる。B2O3/SiO2の好ましい比率は、B2O3/SiO2≦3.0である。 Further, the glass according to the present invention is characterized in that the molar ratio of B 2 O 3 / SiO 2 is 3.5 or less. As described above, in the case of insulating coating of a display tube, when the composition of the glass is volatilized, the brightness of the display tube is reduced as described above. However, the SiO 2 —B 2 O 3 —ZnO-based glass has phase separation. Prone to quasi-unstable glass with tendency. In such a glass, a composition component tends to be easily volatilized. Therefore, by increasing the ratio of SiO 2 to B 2 O 3 in the composition, the phase separation tendency of the glass can be reduced, and a decrease in the brightness of the display tube can be prevented. Further, when the amount of SiO 2 relative to B 2 O 3 is relatively increased, the glass structure becomes denser, and the glass becomes less likely to contain moisture. Moreover, since the content of B 2 O 3 is relatively reduced, the volatilization amount of B 2 O 3 is reduced. In addition, the amount of moisture brought into the glass can be reduced as the B 2 O 3 content decreases. The preferred ratio of B 2 O 3 / SiO 2 is B 2 O 3 / SiO 2 ≦ 3.0.
また本発明におけるガラスは、モル比でZnO/SiO2≦3であることが好ましい。ZnOに対するSiO2の比率を上記範囲に限定することで、ガラスの分相傾向をさらに小さくし、表示管の輝度をより安定化させることができる。ZnO/SiO2のより好ましい比率は、ZnO/SiO2≦2.5である。 Further, the glass in the present invention preferably has a molar ratio of ZnO / SiO 2 ≦ 3. By limiting the ratio of SiO 2 to ZnO to the above range, the phase separation tendency of the glass can be further reduced, and the luminance of the display tube can be further stabilized. More preferred ratio of ZnO / SiO 2 is a ZnO / SiO 2 ≦ 2.5.
上記成分の他にも、本発明の効果を損なわない範囲で他の成分を添加することができる。例えば耐水性や耐薬品性を向上させるためにZrO2を5モル%まで、またガラス安定化のためにP2O5を10モル%まで添加してもよい。 In addition to the above components, other components can be added as long as the effects of the present invention are not impaired. For example, ZrO 2 may be added up to 5 mol% to improve water resistance and chemical resistance, and P 2 O 5 may be added up to 10 mol% to stabilize glass.
ただしハロゲン(特にフッ素F2及び塩素Cl2)やSO3については、実質的に含まないことが望ましい。ハロゲンやSO3は焼成時に揮発し、電子を放出する電極であるカソード(陰極)や電子を授与するアノード(陽極)を汚染して電子の授受を阻害する。その結果、表示管の輝度を低下させる。このためこれらの成分は、焼成時の揮発による輝度の劣化が問題とならないレベルにまで低減することが必要である。より具体的には、ハロゲンを合量で100ppm以下、SO3を10ppm以下にすることが望ましい。ガラス中の塩素及び硫黄含有量を減少させるには、ガラス原料を選択する際にこれら不純物の絶対量が少ないものを選択すればよい。このようにすることにより、得られるガラスには理論量以上の不純物が含まれないことになる。実際には、これら不純物の含有量は理論量の半分以下となるのが普通である。さらに不純物量を減少させるには、(1)ガラス溶融時に、通常より溶融温度を50℃以上高くしたり、溶融時間を長くする、(2)ガラス溶融時に酸素ガスや不活性ガス(窒素ガス)でバブリングを行う、(3)ガラス溶融を真空中で行う等の方法があり、これらの方法を適宜選択して不純物の含有量が非常に少ないガラスを得ることができる。 However, it is desirable that halogen (particularly, fluorine F 2 and chlorine Cl 2 ) and SO 3 are not substantially contained. Halogen and SO 3 volatilize during firing and contaminate the cathode (cathode), which is an electrode that emits electrons, and the anode (anode), which donates electrons, and hinder the transfer of electrons. As a result, the brightness of the display tube is reduced. Therefore, it is necessary to reduce these components to a level at which deterioration in luminance due to volatilization during firing does not pose a problem. More specifically, it is desirable that the total amount of halogen is 100 ppm or less and that of SO 3 is 10 ppm or less. In order to reduce the chlorine and sulfur contents in the glass, a glass raw material having a small absolute amount of these impurities may be selected. By doing so, the glass obtained does not contain impurities in excess of the theoretical amount. In practice, the content of these impurities is usually less than half the theoretical amount. In order to further reduce the amount of impurities, (1) at the time of glass melting, the melting temperature is raised by 50 ° C. or higher than usual, or the melting time is lengthened. (2) Oxygen gas or inert gas (nitrogen gas) at the time of glass melting And (3) glass melting in a vacuum. These methods can be appropriately selected to obtain a glass having a very small impurity content.
本発明の表示管用絶縁材料は、基本的に上記組成を有するガラス粉末からなるが、必要に応じてセラミック粉末、例えばアルミナ、ジルコニア、ジルコン、チタニア、コージエライト、ムライト、シリカ、ウイレマイト、酸化錫、酸化亜鉛等の粉末を合量で15体積%以下添加してもよい。 The insulating material for a display tube of the present invention is basically composed of a glass powder having the above composition. Powder such as zinc may be added in a total amount of 15% by volume or less.
次に、本発明の表示管用絶縁材料を作製する方法を述べる。 Next, a method for producing the insulating material for a display tube of the present invention will be described.
まず、上記組成を有するようにガラス原料を調合し、混合した後、溶融する。続いて溶融ガラスを成形し、粉砕、分級してガラス粉末を得る。さらに必要に応じてセラミック粉末を添加し、本発明の表示管用絶縁材料を得る。 First, a glass raw material is prepared so as to have the above composition, mixed, and then melted. Subsequently, the molten glass is formed, pulverized and classified to obtain a glass powder. Further, if necessary, ceramic powder is added to obtain the display tube insulating material of the present invention.
続いて本発明の表示管用絶縁材料の使用方法を説明する。 Subsequently, a method of using the display tube insulating material of the present invention will be described.
本発明の表示管用絶縁材料は、例えばペーストの形態で使用することができる。ペーストの形態で使用する場合、絶縁材料とともに、バインダー、溶剤等を使用する。ペースト中の絶縁材料の含有量としては、50〜95質量%程度が一般的である。 The insulating material for a display tube of the present invention can be used, for example, in the form of a paste. When used in the form of a paste, a binder, a solvent and the like are used together with the insulating material. The content of the insulating material in the paste is generally about 50 to 95% by mass.
バインダーは、ペーストの粘性調節のために使用する成分であり、その含有量は、0.1〜20質量%程度が一般的である。バインダーとしてはポリブチルメタアクリレート、ポリビニルブチラール、ポリメチルメタアクリレート、ポリエチルメタアクリレート、エチルセルロース等が使用可能であり、これらを単独あるいは混合して使用する。 The binder is a component used for adjusting the viscosity of the paste, and its content is generally about 0.1 to 20% by mass. As the binder, polybutyl methacrylate, polyvinyl butyral, polymethyl methacrylate, polyethyl methacrylate, ethyl cellulose and the like can be used, and these can be used alone or in combination.
溶剤は、材料をペースト化するための材料であり、その含有量は10〜30質量%程度が一般的である。溶剤としては、例えばターピネオール、ジエチレングリコールモノブチルエーテルアセテート、2,2,4−トリメチル−1,3−ペンタジオールモノイソブチレート等を単独または混合して使用することができる。 The solvent is a material for making the material into a paste, and its content is generally about 10 to 30% by mass. As the solvent, for example, terpineol, diethylene glycol monobutyl ether acetate, 2,2,4-trimethyl-1,3-pentadiol monoisobutyrate, or the like can be used alone or as a mixture.
ペーストの作製は、用意した絶縁材料、バインダー、可塑剤、溶剤等を所定の割合で混練することにより行う。 The paste is produced by kneading the prepared insulating material, binder, plasticizer, solvent and the like at a predetermined ratio.
このようなペーストを用いて、絶縁膜を形成するには、まずこれらのペーストをスクリーン印刷法にて塗布した後、乾燥させ、500〜600℃程度の温度で焼成すればよい。なお本発明の材料を使用する形態は、ペースト形態に限定されるものではなく、例えばグリーンシートの形態で使用してもよい。 In order to form an insulating film using such a paste, first, these pastes may be applied by a screen printing method, dried, and fired at a temperature of about 500 to 600 ° C. The form in which the material of the present invention is used is not limited to the paste form, but may be in the form of a green sheet, for example.
PDP、VFD、FED等の表示管を製造する場合、絶縁被覆すべき箇所に上記方法を用いて上記材料からなる絶縁被膜を形成すればよく、これにより上記材料からなる絶縁膜を有する表示管を得ることができる。 When manufacturing a display tube such as a PDP, VFD, or FED, an insulating film made of the above-mentioned material may be formed using the above-described method at a place where the insulating tube is to be coated. Obtainable.
以下、実施例に基づいて本発明を説明する。 Hereinafter, the present invention will be described based on examples.
表1は、本発明の実施例(試料No.1〜5)を、表2は比較例(試料No.6、7)をそれぞれ示している。 Table 1 shows examples of the present invention (samples Nos. 1 to 5), and Table 2 shows comparative examples (samples Nos. 6 and 7).
各試料は次のようにして調製した。まず表1、2の組成となるように各種酸化物、炭酸塩等の原料を調合し、均一に混合した後、白金坩堝に入れて空気中、1250℃で1〜2時間溶融した。次いで溶融ガラスを水冷ローラー間に通して薄板状に成形し、ボールミルにて5時間粉砕後、空気分級を行って平均粒径約4μmのガラス粉末を得た。なおガラス中のF2、Cl2等のハロゲン及びSO3の含有量は、原料選択により、各試料ともハロゲンが合量で100ppm以下、SO3が10ppm以下となるようにした。 Each sample was prepared as follows. First, raw materials such as various oxides and carbonates were prepared so as to have the compositions shown in Tables 1 and 2, mixed uniformly, put into a platinum crucible, and melted at 1250 ° C. for 1 to 2 hours in air. Next, the molten glass was passed through a water-cooled roller to be formed into a thin plate, pulverized by a ball mill for 5 hours, and air-classified to obtain a glass powder having an average particle size of about 4 μm. In addition, the content of halogen such as F 2 and Cl 2 and SO 3 in the glass was adjusted so that the total amount of halogen was 100 ppm or less and SO 3 was 10 ppm or less in each sample by selecting raw materials.
得られた試料について、ガラス転移点、熱膨張係数、絶縁特性、ガラスの安定性及びガラス成分の揮発性について評価した。 About the obtained sample, the glass transition point, the thermal expansion coefficient, the insulating property, the stability of the glass, and the volatility of the glass component were evaluated.
その結果、各試料とも焼成時にガラスに失透は認められず、安定なガラスであることが確認された。また輝度及び絶縁性は各試料とも実用上問題のないレベルであった。特にNo.1〜3の試料は、絶縁性及び揮発性の両特性ともに非常に優れていた。 As a result, no devitrification was observed in the glass during firing for each sample, and it was confirmed that the glass was stable. In addition, the luminance and the insulating properties were at levels that did not cause any practical problems in each sample. In particular, no. The samples Nos. 1 to 3 were very excellent in both insulating and volatile properties.
一方、比較例である試料No.6はガラス成分が多量に揮発しており、この材料を用いて作製した蛍光表示管は輝度が低くなると予想される。またNo.7は絶縁性が悪かった。 On the other hand, the sample No. In No. 6, a glass component is volatilized in a large amount, and it is expected that a fluorescent display tube manufactured using this material will have low luminance. No. 7 had poor insulation.
なおガラス転移点は示差熱分析(DTA)により、また熱膨張係数は押棒式熱膨張測定装置により求めた。 The glass transition point was determined by differential thermal analysis (DTA), and the coefficient of thermal expansion was determined by a push-rod type thermal expansion measuring device.
絶縁性は、アルミニウム配線が施されたソーダ板の上に、ペースト化した試料を塗布し、560℃で15分間焼成して約25μmの絶縁被覆を施した後、電子顕微鏡による断面観察(1000倍)を行い、泡の状態を観察した。その結果、写真上の100μm幅で、絶縁膜に発泡が全く認められなかったものを◎、発泡は認められたが1〜4個のものを○、5個/cm2を超えるものを×と評価した。なおペーストは、試料粉末、エチルセルロース、及びターピネオールをそれぞれ80質量%、1質量%、19質量%の割合で混練したものを使用した。 The insulation was measured by applying a pasted sample on a soda plate on which aluminum wiring was applied, baking it at 560 ° C. for 15 minutes to give an insulation coating of about 25 μm, and then observing a cross section with an electron microscope (1000 ×). ) Was performed and the state of the foam was observed. As a result, those having a width of 100 μm on the photograph and in which no foaming was observed in the insulating film were evaluated as ◎, those in which foaming was observed but 1 to 4 were evaluated as ○, and those exceeding 5 / cm 2 were evaluated as ×. evaluated. The paste used was a sample powder, ethyl cellulose, and terpineol kneaded at a ratio of 80% by mass, 1% by mass, and 19% by mass, respectively.
ガラスの安定性は、溶融時の分相状態及び粉末焼成時の失透の有無を目視で観察したものであり、分相及び失透が認められないものを◎とした。なお焼成時の評価は、絶縁性の評価に用いたサンプル表面を観察することによって行った。 The stability of the glass was obtained by visually observing the state of phase separation during melting and the presence or absence of devitrification during firing of the powder, and ◎ indicates that neither phase separation nor devitrification was observed. The evaluation at the time of firing was performed by observing the sample surface used for the evaluation of the insulating property.
ガラスの揮発性の評価は次のようにして行った。まず評価する試料粉末について、密度分の重量を測定し、エアプレスによるφ20mmの圧粉体を作製した。この圧粉体をソーダガラス板上に置き(図1)、さらに石英ガラス管を、圧粉体の周囲を囲うようにして設置した(図2)。さらに管上にもう一枚のソーダガラス板を被せ、蓋をした(図3)。続いてこの状態のまま電気炉に入れ、560℃で30分間焼成した。焼成後、被せてあるガラス板に付着した揮発成分による汚れを観察し、評価した。観察の結果、汚れが認められないものを「◎」、50倍の顕微鏡観察でのみ汚れが認められるものを「○」、目視で汚れが確認できるものを「×」とした。例えば蛍光表示管用途の場合、材料(ガラス)から発生する揮発成分により、陰極(カソード)であるフィラメントが汚染されると、輝度が低下すると考えられる。 The evaluation of the volatility of the glass was performed as follows. First, for the sample powder to be evaluated, the weight corresponding to the density was measured, and a green compact having a diameter of 20 mm was produced by an air press. This green compact was placed on a soda glass plate (FIG. 1), and a quartz glass tube was installed so as to surround the green compact (FIG. 2). Further, another soda glass plate was placed on the tube, and the tube was covered (FIG. 3). Subsequently, it was placed in an electric furnace in this state and baked at 560 ° C. for 30 minutes. After firing, dirt due to volatile components adhering to the covered glass plate was observed and evaluated. As a result of the observation, "◎" indicates that no dirt was observed, "O" indicates that dirt was observed only with a microscope of 50 times magnification, and "X" indicates that dirt was visually observed. For example, in the case of a fluorescent display tube application, if a filament serving as a cathode (cathode) is contaminated with a volatile component generated from a material (glass), the brightness is considered to be reduced.
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EP1897861A1 (en) * | 2006-08-18 | 2008-03-12 | Corning Incorporated | Boro-silicate glass frits for hermetic sealing of light emitting device displays |
JP2008044839A (en) * | 2006-08-18 | 2008-02-28 | Corning Inc | Borosilicate glass frit for hermetic sealing of light emitting element display |
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