JP2004251789A - 温度測定装置及び被処理基板 - Google Patents

温度測定装置及び被処理基板 Download PDF

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Publication number
JP2004251789A
JP2004251789A JP2003043210A JP2003043210A JP2004251789A JP 2004251789 A JP2004251789 A JP 2004251789A JP 2003043210 A JP2003043210 A JP 2003043210A JP 2003043210 A JP2003043210 A JP 2003043210A JP 2004251789 A JP2004251789 A JP 2004251789A
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Japan
Prior art keywords
substrate
temperature
temperature sensor
processed
dimensional
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JP2003043210A
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Japanese (ja)
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JP2004251789A5 (enExample
Inventor
Katsuo Saibi
克男 齋尾
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Komatsu Ltd
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Komatsu Ltd
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Priority to JP2003043210A priority Critical patent/JP2004251789A/ja
Publication of JP2004251789A publication Critical patent/JP2004251789A/ja
Publication of JP2004251789A5 publication Critical patent/JP2004251789A5/ja
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  • Measuring Temperature Or Quantity Of Heat (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003043210A 2003-02-20 2003-02-20 温度測定装置及び被処理基板 Pending JP2004251789A (ja)

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JP2003043210A JP2004251789A (ja) 2003-02-20 2003-02-20 温度測定装置及び被処理基板

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JP2003043210A JP2004251789A (ja) 2003-02-20 2003-02-20 温度測定装置及び被処理基板

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JP2004251789A true JP2004251789A (ja) 2004-09-09
JP2004251789A5 JP2004251789A5 (enExample) 2005-06-02

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JP2003043210A Pending JP2004251789A (ja) 2003-02-20 2003-02-20 温度測定装置及び被処理基板

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007178253A (ja) * 2005-12-28 2007-07-12 Tokyo Electron Ltd 温度測定装置および温度測定方法
JP2007187619A (ja) * 2006-01-16 2007-07-26 Tokyo Electron Ltd ウェハ型温度センサ、温度測定装置、熱処理装置および温度測定方法
JP2010004037A (ja) * 2008-06-16 2010-01-07 Asml Netherlands Bv リソグラフィ装置、メトロロジー装置及び当該装置の使用方法
JP2011109040A (ja) * 2009-11-20 2011-06-02 Nikon Corp 半導体基板ホルダ及び温度検出装置
JP2013181931A (ja) * 2012-03-05 2013-09-12 Hitachi High-Technologies Corp 温度計測装置
JP2016128805A (ja) * 2014-12-19 2016-07-14 コミサリア ア レネルジー アトミック エ オ ゼネルジー アルテルナティブＣｏｍｍｉｓｓａｒｉａｔ Ａ Ｌ’Ｅｎｅｒｇｉｅ Ａｔｏｍｉｑｕｅ Ｅｔ Ａｕｘ Ｅｎｅｒｇｉｅｓ Ａｌｔｅｒｎａｔｉｖｅｓ 差温センサ

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007178253A (ja) * 2005-12-28 2007-07-12 Tokyo Electron Ltd 温度測定装置および温度測定方法
JP2007187619A (ja) * 2006-01-16 2007-07-26 Tokyo Electron Ltd ウェハ型温度センサ、温度測定装置、熱処理装置および温度測定方法
JP2010004037A (ja) * 2008-06-16 2010-01-07 Asml Netherlands Bv リソグラフィ装置、メトロロジー装置及び当該装置の使用方法
US8982316B2 (en) 2008-06-16 2015-03-17 Asml Netherlands B.V. Lithographic apparatus, a metrology apparatus and a method of using the apparatus
JP2011109040A (ja) * 2009-11-20 2011-06-02 Nikon Corp 半導体基板ホルダ及び温度検出装置
JP2013181931A (ja) * 2012-03-05 2013-09-12 Hitachi High-Technologies Corp 温度計測装置
JP2016128805A (ja) * 2014-12-19 2016-07-14 コミサリア ア レネルジー アトミック エ オ ゼネルジー アルテルナティブＣｏｍｍｉｓｓａｒｉａｔ Ａ Ｌ’Ｅｎｅｒｇｉｅ Ａｔｏｍｉｑｕｅ Ｅｔ Ａｕｘ Ｅｎｅｒｇｉｅｓ Ａｌｔｅｒｎａｔｉｖｅｓ 差温センサ

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