JP2004228601A5 - - Google Patents

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Publication number
JP2004228601A5
JP2004228601A5 JP2004127686A JP2004127686A JP2004228601A5 JP 2004228601 A5 JP2004228601 A5 JP 2004228601A5 JP 2004127686 A JP2004127686 A JP 2004127686A JP 2004127686 A JP2004127686 A JP 2004127686A JP 2004228601 A5 JP2004228601 A5 JP 2004228601A5
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JP
Japan
Prior art keywords
gas
reaction
chamber
reaction vessel
buffer
Prior art date
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Application number
JP2004127686A
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English (en)
Japanese (ja)
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JP2004228601A (ja
JP3960987B2 (ja
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Priority to JP2004127686A priority Critical patent/JP3960987B2/ja
Priority claimed from JP2004127686A external-priority patent/JP3960987B2/ja
Publication of JP2004228601A publication Critical patent/JP2004228601A/ja
Publication of JP2004228601A5 publication Critical patent/JP2004228601A5/ja
Application granted granted Critical
Publication of JP3960987B2 publication Critical patent/JP3960987B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004127686A 2004-04-23 2004-04-23 反応容器 Expired - Lifetime JP3960987B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004127686A JP3960987B2 (ja) 2004-04-23 2004-04-23 反応容器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004127686A JP3960987B2 (ja) 2004-04-23 2004-04-23 反応容器

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2002104011A Division JP3957549B2 (ja) 2002-04-05 2002-04-05 基板処埋装置

Publications (3)

Publication Number Publication Date
JP2004228601A JP2004228601A (ja) 2004-08-12
JP2004228601A5 true JP2004228601A5 (enExample) 2005-08-18
JP3960987B2 JP3960987B2 (ja) 2007-08-15

Family

ID=32906366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004127686A Expired - Lifetime JP3960987B2 (ja) 2004-04-23 2004-04-23 反応容器

Country Status (1)

Country Link
JP (1) JP3960987B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006173553A (ja) * 2004-11-18 2006-06-29 Toray Eng Co Ltd 触媒ｃｖｄ方法及び触媒ｃｖｄ装置
CN100554506C (zh) * 2005-03-09 2009-10-28 东京毅力科创株式会社 半导体处理用的成膜方法及装置
JP4803578B2 (ja) * 2005-12-08 2011-10-26 東京エレクトロン株式会社 成膜方法
JP5350329B2 (ja) * 2010-06-11 2013-11-27 株式会社日立国際電気 半導体デバイスの製造方法および基板処理装置
JP5457287B2 (ja) * 2010-06-24 2014-04-02 株式会社日立国際電気 基板処理装置、基板処理方法及び半導体デバイスの製造方法
JP5204809B2 (ja) * 2010-07-02 2013-06-05 株式会社日立国際電気 基板処理装置、基板処理方法及び半導体デバイスの製造方法
KR200461589Y1 (ko) * 2010-08-31 2012-07-23 주식회사 테라세미콘 대면적 기판처리 시스템의 가스 공급 장치
KR101217172B1 (ko) * 2011-01-10 2012-12-31 엘아이지에이디피 주식회사 화학기상증착장치
KR101487408B1 (ko) * 2013-07-09 2015-01-29 주식회사 엘지실트론 도펀트 반응 장치

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