JP3960987B2 - 反応容器 - Google Patents

反応容器 Download PDF

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Publication number
JP3960987B2
JP3960987B2 JP2004127686A JP2004127686A JP3960987B2 JP 3960987 B2 JP3960987 B2 JP 3960987B2 JP 2004127686 A JP2004127686 A JP 2004127686A JP 2004127686 A JP2004127686 A JP 2004127686A JP 3960987 B2 JP3960987 B2 JP 3960987B2
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JP
Japan
Prior art keywords
gas
buffer chamber
reaction
chamber
reaction tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004127686A
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English (en)
Japanese (ja)
Other versions
JP2004228601A (ja
JP2004228601A5 (enExample
Inventor
忠司 紺谷
一行 豊田
武敏 佐藤
徹 加賀谷
信人 嶋
信雄 石丸
正憲 境
和幸 奥田
泰志 八木
誠治 渡辺
泰夫 国井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2004127686A priority Critical patent/JP3960987B2/ja
Publication of JP2004228601A publication Critical patent/JP2004228601A/ja
Publication of JP2004228601A5 publication Critical patent/JP2004228601A5/ja
Application granted granted Critical
Publication of JP3960987B2 publication Critical patent/JP3960987B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004127686A 2004-04-23 2004-04-23 反応容器 Expired - Lifetime JP3960987B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004127686A JP3960987B2 (ja) 2004-04-23 2004-04-23 反応容器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004127686A JP3960987B2 (ja) 2004-04-23 2004-04-23 反応容器

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2002104011A Division JP3957549B2 (ja) 2002-04-05 2002-04-05 基板処埋装置

Publications (3)

Publication Number Publication Date
JP2004228601A JP2004228601A (ja) 2004-08-12
JP2004228601A5 JP2004228601A5 (enExample) 2005-08-18
JP3960987B2 true JP3960987B2 (ja) 2007-08-15

Family

ID=32906366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004127686A Expired - Lifetime JP3960987B2 (ja) 2004-04-23 2004-04-23 反応容器

Country Status (1)

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JP (1) JP3960987B2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101217172B1 (ko) * 2011-01-10 2012-12-31 엘아이지에이디피 주식회사 화학기상증착장치
KR101487408B1 (ko) * 2013-07-09 2015-01-29 주식회사 엘지실트론 도펀트 반응 장치

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006173553A (ja) * 2004-11-18 2006-06-29 Toray Eng Co Ltd 触媒ｃｖｄ方法及び触媒ｃｖｄ装置
CN100554506C (zh) * 2005-03-09 2009-10-28 东京毅力科创株式会社 半导体处理用的成膜方法及装置
JP4803578B2 (ja) * 2005-12-08 2011-10-26 東京エレクトロン株式会社 成膜方法
JP5350329B2 (ja) * 2010-06-11 2013-11-27 株式会社日立国際電気 半導体デバイスの製造方法および基板処理装置
JP5457287B2 (ja) * 2010-06-24 2014-04-02 株式会社日立国際電気 基板処理装置、基板処理方法及び半導体デバイスの製造方法
JP5204809B2 (ja) * 2010-07-02 2013-06-05 株式会社日立国際電気 基板処理装置、基板処理方法及び半導体デバイスの製造方法
KR200461589Y1 (ko) * 2010-08-31 2012-07-23 주식회사 테라세미콘 대면적 기판처리 시스템의 가스 공급 장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101217172B1 (ko) * 2011-01-10 2012-12-31 엘아이지에이디피 주식회사 화학기상증착장치
KR101487408B1 (ko) * 2013-07-09 2015-01-29 주식회사 엘지실트론 도펀트 반응 장치

Also Published As

Publication number Publication date
JP2004228601A (ja) 2004-08-12

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