JP2004189525A5 - - Google Patents

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Publication number
JP2004189525A5
JP2004189525A5 JP2002358169A JP2002358169A JP2004189525A5 JP 2004189525 A5 JP2004189525 A5 JP 2004189525A5 JP 2002358169 A JP2002358169 A JP 2002358169A JP 2002358169 A JP2002358169 A JP 2002358169A JP 2004189525 A5 JP2004189525 A5 JP 2004189525A5
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JP
Japan
Prior art keywords
hexafluorosilicate
tetrafluorosilane
thermal decomposition
hydrogen fluoride
temperature
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Application number
JP2002358169A
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English (en)
Japanese (ja)
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JP4439177B2 (ja
JP2004189525A (ja
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Priority to JP2002358169A priority Critical patent/JP4439177B2/ja
Priority claimed from JP2002358169A external-priority patent/JP4439177B2/ja
Publication of JP2004189525A publication Critical patent/JP2004189525A/ja
Publication of JP2004189525A5 publication Critical patent/JP2004189525A5/ja
Application granted granted Critical
Publication of JP4439177B2 publication Critical patent/JP4439177B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002358169A 2002-12-10 2002-12-10 テトラフルオロシランの製造方法およびその用途 Expired - Fee Related JP4439177B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002358169A JP4439177B2 (ja) 2002-12-10 2002-12-10 テトラフルオロシランの製造方法およびその用途

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002358169A JP4439177B2 (ja) 2002-12-10 2002-12-10 テトラフルオロシランの製造方法およびその用途

Publications (3)

Publication Number Publication Date
JP2004189525A JP2004189525A (ja) 2004-07-08
JP2004189525A5 true JP2004189525A5 (https=) 2006-01-26
JP4439177B2 JP4439177B2 (ja) 2010-03-24

Family

ID=32757970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002358169A Expired - Fee Related JP4439177B2 (ja) 2002-12-10 2002-12-10 テトラフルオロシランの製造方法およびその用途

Country Status (1)

Country Link
JP (1) JP4439177B2 (https=)

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