JP2004152934A - Circuit board and its manufacturing method - Google Patents

Circuit board and its manufacturing method Download PDF

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Publication number
JP2004152934A
JP2004152934A JP2002315530A JP2002315530A JP2004152934A JP 2004152934 A JP2004152934 A JP 2004152934A JP 2002315530 A JP2002315530 A JP 2002315530A JP 2002315530 A JP2002315530 A JP 2002315530A JP 2004152934 A JP2004152934 A JP 2004152934A
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Japan
Prior art keywords
circuit board
paste
manufacturing
conductive
insulating substrate
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JP2002315530A
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Japanese (ja)
Inventor
Kunio Nishihara
邦夫 西原
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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Priority to JP2002315530A priority Critical patent/JP2004152934A/en
Publication of JP2004152934A publication Critical patent/JP2004152934A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for efficiently, inexpensively forming a circuit board having a fine conductive circuit with a high aspect ratio, and to provide the circuit board formed by the method. <P>SOLUTION: The manufacturing method of the circuit board includes a process for applying a conductive paste containing metal powder onto an insulating board formed in a recess shape, curing the paste, polishing the surface of the insulating board, and removing the paste at a place other than a recess, thus efficiently, and inexpensively forming the circuit board having the fine conductive circuit with a high aspect ratio. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、電子回路基板の導電回路形成方法とその方法により得られた導電回路の形成された回路基板に関するものであり、更に詳しくは高アスペクト比の微細配線を有する回路基板に関する。
【0002】
【従来の技術】
従来、回路基板の製造方法は、絶縁基板に銅箔が接着された銅張り積層板の銅箔上にフォトレジストを塗布あるいはラミネートし、露光、現像、エッチングを行う事により導電回路を形成していた(サブトラクティブ法)。しかしながら、近年、電子機器の軽薄短小化に伴い導電回路の微細化が進み、サブトラクティブ法ではエッチング時に導体の側面からの浸蝕を生じ断面形状が台形となり、微細配線の形成が困難となる。この対策としては使用する銅箔の厚さを薄くするしかないが、薄くするとアスペクト比が小さくなり通電できる電流値に限界を生ずる。本問題に対し絶縁基板上にフォトレジスト層を前記同様に形成し、露光、現像後、無電解銅メッキおよび/または電解銅メッキを行う事による導電回路の形成が図られている(アディティブ法)。しかしながらアディティブ法によっても高アスペクト比の微細導電回路の形成にはフォトレジストの解像性に乏しい為に限界があること、銅メッキによる導電回路形成には時間を要し、効率的に劣り、高価となる等の問題を生じている。
【0003】
【発明が解決しようとする課題】
本発明の課題は、上述のように微細かつ高アスペクト比の導電回路を有する回路基板を効率的に、かつ安価に形成する方法および形成された回路基板を提供することにある。
【0004】
【課題を解決するための手段】
本発明者らは鋭意検討した結果、本発明を完成した。
すなわち、本発明は、導電回路部に凹形状を有する絶縁基板上に金属粉を含有する導電性ペーストを塗布し、該ペーストを硬化させた後、表面を研磨し、凹部以外のペーストを除去する事により導電回路を形成してなる回路基板の製造方法およびその方法により得られた回路基板。あるいは、導電回路部に凹形状を有する絶縁基板上に金属粉を含有する導電性ペーストを塗布し、該ペーストを乾燥させ、表面を研磨し、凹部以外のペーストを除去した後、該ペーストを硬化する事により導電回路を形成してなる回路基板の製造方法およびその方法により得られた回路基板である。
【0005】
【発明の実施の形態】
本発明の導電回路部に凹形状を有する絶縁基板において凹形状の形成方法は特に限定しないが、金型を使用する方法あるいはレーザーを使用する方法が好ましい。金型を使用する場合、凹形状に対応した凸形状を有する金型を作成し、樹脂を注入あるいは圧縮フローさせるトランスファー成型法あるいは射出成型法により導電回路部に凹形状を有する絶縁基板を得るのが好ましい。この金型の作成方法としては通常、ガラス板上に感光性樹脂の厚膜層を形成し、露光、現像して凹形状の樹脂型を作成する。ついで表面にニッケルメッキを施した後、感光性樹脂を除去し凸形状の金型を得る。
【0006】
また、レーザーを使用する場合には、平面状の絶縁基板上の導電回路部に炭酸ガスレーザー、YAGレーザー等のレーザービームを直接照射する事により凹形状の形成を実施しても構わない。絶縁基板を構成する樹脂としては金型を使用する場合は、ポリイミド樹脂、ポリアミド樹脂、ポリエステル樹脂、ポリエーテルスルホン樹脂、ポリエーテルエーテルケトン樹脂、ポリフェニレンオキサイド樹脂等の熱可塑性樹脂あるいはエポキシ樹脂、フェノール樹脂、ビスマレイミド樹脂等の熱硬化性樹脂が挙げられる。この中で特に液晶ポリマーが耐熱性、寸法安定性の面より望ましい。レーザーを使用する場合は、特に限定はしないが、ガラス/エポキシ基材、ガラス/ポリイミド基材、ガラス/ポリフェニレンオキサイド基材、ポリイミドフィルム等が挙げられる。いずれの場合も絶縁基板上に形成する微細配線の凹部形状としては、凹部の開口幅に対する深さの比(アスペクト比)が0.5以上であることが微細導電回路に電流を流す上で好ましい。
【0007】
本発明の金属粉を含有する導電性ペーストの金属粉としては、銀、銅、金、ニッケル等であり、粒子径としては10μm以下、好ましくは100nm以下である。これらは単独で使用しても2種以上混合して使用しても構わない。粒子径が10μm以上では微細な凹部への充填が難しくなるため好ましくない場合がある。該金属粉は、樹脂、溶剤および分散剤と共に,分散、混練されることにより導電性ペーストが得られる。
【0008】
使用される樹脂は、特に限定されないが耐熱性の面より、通常、エポキシ樹脂、フェノール樹脂、ポリイミド樹脂、ポリアミド樹脂、ポリシアネート樹脂、ポリフェニレンオキサイド樹脂等が挙げられ、更に柔軟性付与の面よりNBR樹脂、水素添加NBR樹脂、SBR樹脂、水素添加SBR樹脂、シリコーン樹脂等の樹脂が挙げられる。これらは単独で使用しても2種以上混合して使用しても構わない。
金属粉と樹脂の重量比は、通常98:2〜70:30である。本導電性ペーストの塗布方法としては、スクリーン印刷法、浸漬塗布法、ロールコート法、スプレーコート法、およびインクジェット法等が挙げられるが、凹部のみ塗布できるインクジェット法が導電性ペーストの使用量を少なくでき、合理的で好ましい。
【0009】
導電性ペーストの塗布、乾燥後あるいは硬化後にさらに塗布する工程を複数回繰り返して塗布しても構わない。
導電性ペーストを塗布する前に絶縁基板の表面を該ペーストで濡れやすくなるように処理しておいても構わない。この場合の処理方法としては、プラズマ処理、UV処理、コロナ放電処理等の乾式処理あるいは過マンガン酸液、アルカリ液等の湿式処理等が挙げられる。
【0010】
このようにして導電回路部に凹形状を有する絶縁基板上に金属粉を含有する導電性ペーストを塗布した後、該ペーストを乾燥あるいは硬化させ、表面を研磨する事により凹部以外のペーストを除去する。
乾燥、研磨、硬化の工程をとる場合の乾燥条件は50℃から120℃、好ましくは80℃から100℃にて15分から60分乾燥させ研磨後、更に180℃から250℃にて30分から120分の硬化を行う。また硬化、研磨の工程をとる場合は、180℃から300℃の温度にて30分から180分硬化させた後、研磨を行う。
【0011】
研磨は、導電性ペースト塗布面を定盤研磨機にてスラリーを流しながら、加重0.5〜10kg/cm、回転数30〜100rpm、研磨時間2〜30分の条件にて研磨する。本研磨工程をバフ研磨機、ベルトサンダー等によって行っても構わない。
【0012】
本製造工程を複数回繰り返す事により、多層の回路基板を製造することは、勿論可能である。
【0013】
【実施例】
次に、本発明の具体的な実施例について説明する。
[実施例1]
本発明の回路基板の製造プロセスを図−1に示す。図−1において、導体回路部に凸形状を有する金型を用いて、金型に樹脂としてエポキシ樹脂(三井化学社製、商品名エポックス)を用いトランスファ成型を行った。成型条件は,金型型絞圧力200kg/cm、樹脂加圧45kg/cm、充填温度180℃であった。これにより表面に凹部を有する絶縁基板を得た。
こうして得られた絶縁基板にインクジェット法を用いて銀ペーストを凹部に印刷した。使用した銀ペーストは、粒径7nmの銀粉98重量部に対しエポキシ樹脂(三井化学社製、商品名エポックス)2重量部、溶剤としてテトラデカン100重量部を混合分散したものを用いた。
この基板を200℃、1時間加熱し、銀ペーストを硬化させた後、ペースト印刷面を定盤研磨機にて凹部表面の余分のペーストを研磨除去した。研磨機の条件は、加重1kg/cm、回転数70rpm、研磨時間20分であった。
このようにして得られた回路基板の導体回路の微細配線部における導体回路幅は10μmであり、導体回路厚は12μmであった。
【0014】
[実施例−2]
絶縁基板としてガラス/エポキシ基材の表面にYAGレーザーを用い導体回路部に凹部を形成した。その後、粒子径10nmの銅粉25重量部、2μmの銅粉55重量部、フェノール樹脂(三井化学社製、ミレックスXLC)10重量部、エポキシ樹脂(日本化薬社製、EOCN−4400)10重量部会社名、商品名を追記して下さい)および溶剤としてデカノール30重量部を混合、分散した銅ペーストをスクリーン法により凹部に印刷した。100℃、5分の加熱条件により乾燥させ、ベルトサンダーにより印刷面を研磨し、余分の銅ペーストを除去した。研磨条件は加圧負荷電流5A、送り速度1m/mimであった。本基板を窒素雰囲気中で180℃、1時間加熱し、ペーストを硬化した。こうして得られた回路基板の微細配線部における導体回路幅は20μmであり、導体回路厚は12μmであった。
【0015】
[実施例―3]
実施例−1で作成した回路基板に更に成型により凹部を有する絶縁層を形成し、実施例−1と同様にして2層回路基板を作成した。製造プロセスを図−2に示す。
【0016】
【発明の効果】
本発明の方法により、微細かつ高アスペクト比の導電回路を有する回路基板を効率的に、かつ安価に形成することができる。
【図面の簡単な説明】
【図1】回路基板の製造プロセスの一例を示す図
【図2】回路基板の製造プロセスの一例を示す図
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for forming a conductive circuit on an electronic circuit board and a circuit board on which a conductive circuit obtained by the method is formed, and more particularly to a circuit board having fine wiring with a high aspect ratio.
[0002]
[Prior art]
Conventionally, in a method of manufacturing a circuit board, a conductive circuit is formed by applying or laminating a photoresist on a copper foil of a copper-clad laminate in which a copper foil is bonded to an insulating substrate, and performing exposure, development, and etching. (Subtractive method). However, in recent years, the miniaturization of conductive circuits has progressed as electronic devices have become lighter, thinner and shorter, and the subtractive method causes erosion from the side surfaces of conductors during etching, resulting in a trapezoidal cross-sectional shape, making it difficult to form fine wiring. The only solution to this problem is to reduce the thickness of the copper foil to be used. However, if the thickness is reduced, the aspect ratio becomes small, and the current value that can be passed is limited. In order to solve this problem, a photoresist layer is formed on an insulating substrate in the same manner as described above, and after exposure and development, a conductive circuit is formed by performing electroless copper plating and / or electrolytic copper plating (additive method). . However, even with the additive method, the formation of fine conductive circuits with a high aspect ratio has limitations due to poor resolution of photoresist, and the formation of conductive circuits by copper plating requires time, is inefficient and expensive. And so on.
[0003]
[Problems to be solved by the invention]
An object of the present invention is to provide a method for efficiently and inexpensively forming a circuit board having a fine and high aspect ratio conductive circuit as described above, and to provide a formed circuit board.
[0004]
[Means for Solving the Problems]
As a result of intensive studies, the present inventors have completed the present invention.
That is, the present invention applies a conductive paste containing metal powder on an insulating substrate having a concave shape in a conductive circuit portion, and after curing the paste, polishing the surface and removing the paste other than the concave portion. And a circuit board obtained by the method. Alternatively, a conductive paste containing metal powder is applied on an insulating substrate having a concave shape in the conductive circuit portion, the paste is dried, the surface is polished, and the paste other than the concave portions is removed, and then the paste is cured. A method of manufacturing a circuit board formed by forming a conductive circuit and a circuit board obtained by the method.
[0005]
BEST MODE FOR CARRYING OUT THE INVENTION
The method for forming the concave shape in the insulating substrate having a concave shape in the conductive circuit portion of the present invention is not particularly limited, but a method using a mold or a method using a laser is preferable. When a mold is used, a mold having a convex shape corresponding to the concave shape is prepared, and an insulating substrate having a concave shape in the conductive circuit portion is obtained by a transfer molding method or an injection molding method in which resin is injected or compressed. Is preferred. As a method for forming the mold, a thick resin film layer is usually formed on a glass plate, and is exposed and developed to form a concave resin mold. Next, after nickel plating is performed on the surface, the photosensitive resin is removed to obtain a convex mold.
[0006]
In the case of using a laser, a concave shape may be formed by directly irradiating a laser beam such as a carbon dioxide gas laser or a YAG laser to a conductive circuit portion on a planar insulating substrate. When a mold is used as the resin constituting the insulating substrate, a thermoplastic resin such as a polyimide resin, a polyamide resin, a polyester resin, a polyether sulfone resin, a polyether ether ketone resin, a polyphenylene oxide resin, or an epoxy resin, or a phenol resin And a thermosetting resin such as a bismaleimide resin. Among them, a liquid crystal polymer is particularly desirable in terms of heat resistance and dimensional stability. When a laser is used, there is no particular limitation, and examples thereof include a glass / epoxy substrate, a glass / polyimide substrate, a glass / polyphenylene oxide substrate, and a polyimide film. In any case, as the shape of the concave portion of the fine wiring formed on the insulating substrate, the ratio of the depth to the opening width (aspect ratio) of the concave portion is preferably 0.5 or more from the viewpoint of flowing a current to the fine conductive circuit. .
[0007]
The metal powder of the conductive paste containing the metal powder of the present invention is silver, copper, gold, nickel or the like, and has a particle diameter of 10 μm or less, preferably 100 nm or less. These may be used alone or in combination of two or more. If the particle diameter is 10 μm or more, it is difficult to fill the fine concave portions, which may not be preferable. The metal powder is dispersed and kneaded together with a resin, a solvent and a dispersant to obtain a conductive paste.
[0008]
The resin to be used is not particularly limited, but from the viewpoint of heat resistance, usually, an epoxy resin, a phenol resin, a polyimide resin, a polyamide resin, a polycyanate resin, a polyphenylene oxide resin, and the like are used. Resins such as resins, hydrogenated NBR resins, SBR resins, hydrogenated SBR resins, silicone resins, and the like. These may be used alone or in combination of two or more.
The weight ratio between the metal powder and the resin is usually 98: 2 to 70:30. Examples of the method for applying the present conductive paste include screen printing, dip coating, roll coating, spray coating, and ink-jet methods, and the like. Yes, reasonable and preferred.
[0009]
The step of applying the conductive paste after application, after drying or after curing may be repeated a plurality of times.
Before applying the conductive paste, the surface of the insulating substrate may be treated so as to be easily wetted with the paste. Examples of the treatment method in this case include a dry treatment such as a plasma treatment, a UV treatment, and a corona discharge treatment, and a wet treatment with a permanganic acid solution, an alkali solution, and the like.
[0010]
After the conductive paste containing the metal powder is applied on the insulating substrate having the concave shape in the conductive circuit portion in this manner, the paste is dried or cured, and the paste other than the concave portions is removed by polishing the surface. .
Drying, polishing, and curing steps are performed at 50 to 120 ° C., preferably at 80 to 100 ° C. for 15 to 60 minutes, and then polished. Is cured. When the curing and polishing steps are performed, the polishing is performed after curing at a temperature of 180 ° C. to 300 ° C. for 30 minutes to 180 minutes.
[0011]
Polishing is performed under the conditions of a load of 0.5 to 10 kg / cm 2 , a rotation speed of 30 to 100 rpm, and a polishing time of 2 to 30 minutes while flowing the slurry on the conductive paste application surface with a platen polishing machine. The main polishing step may be performed using a buffing machine, a belt sander, or the like.
[0012]
It is, of course, possible to manufacture a multilayer circuit board by repeating this manufacturing process a plurality of times.
[0013]
【Example】
Next, specific examples of the present invention will be described.
[Example 1]
FIG. 1 shows a manufacturing process of the circuit board of the present invention. In FIG. 1, transfer molding was performed using a mold having a convex shape in the conductor circuit portion and using an epoxy resin (Epox, trade name, manufactured by Mitsui Chemicals, Inc.) as the resin for the mold. The molding conditions were a mold pressing pressure of 200 kg / cm 2 , a resin pressure of 45 kg / cm 2 , and a filling temperature of 180 ° C. Thus, an insulating substrate having a concave portion on the surface was obtained.
A silver paste was printed in the recesses on the thus obtained insulating substrate by an inkjet method. The silver paste used was obtained by mixing and dispersing 2 parts by weight of an epoxy resin (trade name: Epox, manufactured by Mitsui Chemicals, Inc.) and 100 parts by weight of tetradecane as a solvent with 98 parts by weight of silver powder having a particle size of 7 nm.
After heating the substrate at 200 ° C. for 1 hour to cure the silver paste, the paste printed surface was polished and removed with a surface plate polisher to remove excess paste on the concave surface. The conditions of the polishing machine were a load of 1 kg / cm 2 , a rotation speed of 70 rpm, and a polishing time of 20 minutes.
The conductor circuit width in the fine wiring portion of the conductor circuit of the circuit board thus obtained was 10 μm, and the conductor circuit thickness was 12 μm.
[0014]
[Example-2]
Using an YAG laser on the surface of a glass / epoxy substrate as an insulating substrate, a recess was formed in the conductor circuit portion. Thereafter, 25 parts by weight of copper powder having a particle diameter of 10 nm, 55 parts by weight of copper powder having a particle size of 2 μm, 10 parts by weight of phenol resin (Mirex XLC, manufactured by Mitsui Chemicals, Inc.), and 10 parts by weight of epoxy resin (EOCN-4400, manufactured by Nippon Kayaku Co., Ltd.) A copper paste mixed and dispersed with 30 parts by weight of decanol as a solvent was printed in the recesses by a screen method. After drying at 100 ° C. for 5 minutes, the printing surface was polished with a belt sander to remove excess copper paste. Polishing conditions were a pressurized load current of 5 A and a feed rate of 1 m / mim. The substrate was heated at 180 ° C. for 1 hour in a nitrogen atmosphere to cure the paste. The conductor circuit width in the fine wiring portion of the circuit board thus obtained was 20 μm, and the conductor circuit thickness was 12 μm.
[0015]
[Example-3]
An insulating layer having a concave portion was further formed on the circuit board prepared in Example 1 by molding, and a two-layer circuit board was prepared in the same manner as in Example-1. Figure 2 shows the manufacturing process.
[0016]
【The invention's effect】
According to the method of the present invention, a circuit board having a fine and high aspect ratio conductive circuit can be efficiently and inexpensively formed.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating an example of a circuit board manufacturing process. FIG. 2 is a diagram illustrating an example of a circuit board manufacturing process.

Claims (8)

凹形状を有する絶縁基板上に金属粉を含有する導電性ペーストを塗布し、該ペーストを硬化させた後、絶縁基板表面を研磨し、凹部以外のペーストを除去することを特徴とする回路基板の製造方法。A conductive paste containing metal powder is applied on an insulating substrate having a concave shape, and after the paste is cured, the surface of the insulating substrate is polished to remove the paste other than the concave portion. Production method. 凹形状を有する絶縁基板上に金属粉を含有する導電性ペーストを塗布し、該ペーストを乾燥させたのち、絶縁基板表面を研磨し、凹部以外のペーストを除去した後、該ペーストを硬化することを特徴とする回路基板の製造方法。After applying a conductive paste containing metal powder on an insulating substrate having a concave shape, drying the paste, polishing the surface of the insulating substrate, removing the paste other than the concave portion, and curing the paste. A method for manufacturing a circuit board, comprising: 金属粉の粒径が10μm以下であることを特徴とする請求項1または2に記載の回路基板の製造方法。The method according to claim 1, wherein the metal powder has a particle size of 10 μm or less. 絶縁基板が凹形状部に対応した凸形状を有する金型を用い、トランスファー成型法、或いは射出成型法により成型してなる有機樹脂基板であることを特徴とする請求項1〜3のいずれかに記載の回路基板の製造方法。4. The organic resin substrate according to claim 1, wherein the insulating substrate is an organic resin substrate formed by transfer molding or injection molding using a mold having a convex shape corresponding to the concave portion. The method for manufacturing the circuit board described in the above. 凹形状をレーザーにより形成してなることを特徴とする請求項1〜3のいずれかに記載の回路基板の製造方法。The method for manufacturing a circuit board according to any one of claims 1 to 3, wherein the concave shape is formed by a laser. 上記導電性ペーストを凹形状部にインクジェット法にて塗布することを特徴とする請求項1〜5いずれかに記載の回路基板の製造方法。The method for manufacturing a circuit board according to any one of claims 1 to 5, wherein the conductive paste is applied to the concave portions by an inkjet method. 形成された導電回路のアスペクト比(導電回路厚/導電回路幅)が0.5以上であることを特徴とする請求項1〜6のいずれかに記載の回路基板の製造方法。The method for manufacturing a circuit board according to any one of claims 1 to 6, wherein an aspect ratio (conductive circuit thickness / conductive circuit width) of the formed conductive circuit is 0.5 or more. 請求項1〜7いずれかに記載の製造方法により得られた回路基板。A circuit board obtained by the manufacturing method according to claim 1.
JP2002315530A 2002-10-30 2002-10-30 Circuit board and its manufacturing method Pending JP2004152934A (en)

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Cited By (13)

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WO2005120140A1 (en) * 2004-06-01 2005-12-15 Exink Co., Ltd. Circuit board, and metal paste and method for manufacturing the same
JP2006332615A (en) * 2005-04-25 2006-12-07 Brother Ind Ltd Method for forming pattern
JP2007150180A (en) * 2005-11-30 2007-06-14 Matsushita Electric Ind Co Ltd Flexible circuit board and its production process
JP2008139730A (en) * 2006-12-05 2008-06-19 Nippon Oil Corp Wire-grid polarizer and its manufacturing method, and retardation film using the same and liquid crystal display element
JP2008235665A (en) * 2007-03-22 2008-10-02 Toyota Motor Corp Flexible substrate and manufacturing method therefor
US7666292B2 (en) 2005-04-20 2010-02-23 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing printed circuit board using imprinting process
US8035924B2 (en) 2007-03-30 2011-10-11 Nhk Spring Co., Ltd. Suspension for disc drive
US20120110839A1 (en) * 2010-11-05 2012-05-10 Ngk Spark Plug Co., Ltd. Method of manufacturing wiring board
JP2012099768A (en) * 2010-11-05 2012-05-24 Ngk Spark Plug Co Ltd Manufacturing method of wiring board
JP2012169476A (en) * 2011-02-15 2012-09-06 Fujikura Ltd Manufacturing method of printed wiring board
US8435440B2 (en) 2005-04-25 2013-05-07 Brother Kogyo Kabushiki Kaisha Method for forming a conductive pattern and a wired board
JP2016139688A (en) * 2015-01-27 2016-08-04 大日本印刷株式会社 Method for manufacturing conductive pattern substrate
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005120140A1 (en) * 2004-06-01 2005-12-15 Exink Co., Ltd. Circuit board, and metal paste and method for manufacturing the same
US7666292B2 (en) 2005-04-20 2010-02-23 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing printed circuit board using imprinting process
US8435440B2 (en) 2005-04-25 2013-05-07 Brother Kogyo Kabushiki Kaisha Method for forming a conductive pattern and a wired board
JP2006332615A (en) * 2005-04-25 2006-12-07 Brother Ind Ltd Method for forming pattern
US8647560B2 (en) 2005-04-25 2014-02-11 Brother Kogyo Kabushiki Kaisha Method for forming pattern and a wired board
JP2007150180A (en) * 2005-11-30 2007-06-14 Matsushita Electric Ind Co Ltd Flexible circuit board and its production process
JP4720462B2 (en) * 2005-11-30 2011-07-13 パナソニック株式会社 Flexible circuit board and manufacturing method thereof
JP2008139730A (en) * 2006-12-05 2008-06-19 Nippon Oil Corp Wire-grid polarizer and its manufacturing method, and retardation film using the same and liquid crystal display element
JP2008235665A (en) * 2007-03-22 2008-10-02 Toyota Motor Corp Flexible substrate and manufacturing method therefor
US8035924B2 (en) 2007-03-30 2011-10-11 Nhk Spring Co., Ltd. Suspension for disc drive
CN102468184A (en) * 2010-11-05 2012-05-23 日本特殊陶业株式会社 Method of manufacturing wiring board
JP2012099768A (en) * 2010-11-05 2012-05-24 Ngk Spark Plug Co Ltd Manufacturing method of wiring board
US20120110839A1 (en) * 2010-11-05 2012-05-10 Ngk Spark Plug Co., Ltd. Method of manufacturing wiring board
JP2012169476A (en) * 2011-02-15 2012-09-06 Fujikura Ltd Manufacturing method of printed wiring board
JP2016139688A (en) * 2015-01-27 2016-08-04 大日本印刷株式会社 Method for manufacturing conductive pattern substrate
JP2022094271A (en) * 2020-12-14 2022-06-24 イントップス カンパニー,リミテッド IME structure using electronic circuit plating method and its manufacturing method
JP7264923B2 (en) 2020-12-14 2023-04-25 イントップス カンパニー,リミテッド IME structure using electronic circuit plating method and its manufacturing method

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