JP2004146823A5 - - Google Patents
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- Publication number
- JP2004146823A5 JP2004146823A5 JP2003345276A JP2003345276A JP2004146823A5 JP 2004146823 A5 JP2004146823 A5 JP 2004146823A5 JP 2003345276 A JP2003345276 A JP 2003345276A JP 2003345276 A JP2003345276 A JP 2003345276A JP 2004146823 A5 JP2004146823 A5 JP 2004146823A5
- Authority
- JP
- Japan
- Prior art keywords
- laser
- scanning
- laser beam
- irradiated
- laser light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 14
- 238000004519 manufacturing process Methods 0.000 claims 9
- 238000000034 method Methods 0.000 claims 8
- 238000002834 transmittance Methods 0.000 claims 5
- 230000003287 optical effect Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003345276A JP4498716B2 (ja) | 2002-10-03 | 2003-10-03 | レーザ照射装置及び前記レーザ照射装置を用いた半導体装置の作製方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002291545 | 2002-10-03 | ||
| JP2003345276A JP4498716B2 (ja) | 2002-10-03 | 2003-10-03 | レーザ照射装置及び前記レーザ照射装置を用いた半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004146823A JP2004146823A (ja) | 2004-05-20 |
| JP2004146823A5 true JP2004146823A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2006-11-16 |
| JP4498716B2 JP4498716B2 (ja) | 2010-07-07 |
Family
ID=32473426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003345276A Expired - Fee Related JP4498716B2 (ja) | 2002-10-03 | 2003-10-03 | レーザ照射装置及び前記レーザ照射装置を用いた半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4498716B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1809598B (zh) | 2003-06-26 | 2010-05-12 | 积水化学工业株式会社 | 涂膏用粘合树脂 |
| WO2007069516A1 (en) * | 2005-12-16 | 2007-06-21 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus, laser irradiation method, and manufacturing method of semiconductor device |
| JP5500573B2 (ja) * | 2009-05-19 | 2014-05-21 | 株式会社日本製鋼所 | 半導体不純物の活性化方法 |
| CN102290342B (zh) * | 2011-09-05 | 2013-07-03 | 清华大学 | 一种采用六边形束斑的激光扫描退火方法 |
| SG195515A1 (en) * | 2012-06-11 | 2013-12-30 | Ultratech Inc | Laser annealing systems and methods with ultra-short dwell times |
| CN104395033B (zh) | 2012-07-04 | 2017-06-23 | 法国圣戈班玻璃厂 | 用于在使用至少两个桥情况下对大面积衬底进行激光处理的设备和方法 |
| JP6665624B2 (ja) * | 2015-03-27 | 2020-03-13 | 日本製鉄株式会社 | 試験装置およびそれを備えた電子顕微鏡 |
| CN111863342B (zh) * | 2019-04-28 | 2021-08-27 | 上海微电子装备（集团）股份有限公司 | 一种ito退火工艺 |
| JPWO2021256434A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2020-06-18 | 2021-12-23 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0795538B2 (ja) * | 1986-05-02 | 1995-10-11 | 旭硝子株式会社 | レ−ザ−アニ−ル装置 |
| JP2001326363A (ja) * | 2000-03-08 | 2001-11-22 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法 |
-
2003
- 2003-10-03 JP JP2003345276A patent/JP4498716B2/ja not_active Expired - Fee Related
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