JP2004143484A5 - - Google Patents

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Publication number
JP2004143484A5
JP2004143484A5 JP2002307326A JP2002307326A JP2004143484A5 JP 2004143484 A5 JP2004143484 A5 JP 2004143484A5 JP 2002307326 A JP2002307326 A JP 2002307326A JP 2002307326 A JP2002307326 A JP 2002307326A JP 2004143484 A5 JP2004143484 A5 JP 2004143484A5
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JP
Japan
Prior art keywords
tin oxide
ito target
powder
tin
particle diameter
Prior art date
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Granted
Application number
JP2002307326A
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English (en)
Japanese (ja)
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JP4120351B2 (ja
JP2004143484A (ja
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Priority to JP2002307326A priority Critical patent/JP4120351B2/ja
Priority claimed from JP2002307326A external-priority patent/JP4120351B2/ja
Publication of JP2004143484A publication Critical patent/JP2004143484A/ja
Publication of JP2004143484A5 publication Critical patent/JP2004143484A5/ja
Application granted granted Critical
Publication of JP4120351B2 publication Critical patent/JP4120351B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002307326A 2002-10-22 2002-10-22 高濃度酸化スズitoターゲットとその製造方法 Expired - Lifetime JP4120351B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002307326A JP4120351B2 (ja) 2002-10-22 2002-10-22 高濃度酸化スズitoターゲットとその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002307326A JP4120351B2 (ja) 2002-10-22 2002-10-22 高濃度酸化スズitoターゲットとその製造方法

Publications (3)

Publication Number Publication Date
JP2004143484A JP2004143484A (ja) 2004-05-20
JP2004143484A5 true JP2004143484A5 (fr) 2005-09-02
JP4120351B2 JP4120351B2 (ja) 2008-07-16

Family

ID=32453821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002307326A Expired - Lifetime JP4120351B2 (ja) 2002-10-22 2002-10-22 高濃度酸化スズitoターゲットとその製造方法

Country Status (1)

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JP (1) JP4120351B2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009173469A (ja) * 2008-01-22 2009-08-06 Sumitomo Metal Mining Co Ltd 高濃度酸化錫ito焼結体およびその製造方法
KR101240167B1 (ko) 2008-02-13 2013-03-07 삼성코닝정밀소재 주식회사 산화인듐주석 소결체 및 타겟
JP5199023B2 (ja) * 2008-10-24 2013-05-15 三井金属鉱業株式会社 酸化スズ粉末
JP2013256425A (ja) * 2012-06-14 2013-12-26 Sumitomo Metal Mining Co Ltd Itoスパッタリングターゲット用酸化スズ粉末、itoスパッタリングターゲット用酸化スズおよび酸化インジウムの混合粉末の製造方法、および、itoスパッタリングターゲット用焼結体
CN115482965B (zh) * 2022-09-16 2024-06-04 北京高压科学研究中心 一种提升透明导电氧化物电导率和蓝光过滤效率的方法

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