JP2004134568A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法 Download PDF

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Publication number
JP2004134568A
JP2004134568A JP2002297365A JP2002297365A JP2004134568A JP 2004134568 A JP2004134568 A JP 2004134568A JP 2002297365 A JP2002297365 A JP 2002297365A JP 2002297365 A JP2002297365 A JP 2002297365A JP 2004134568 A JP2004134568 A JP 2004134568A
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JP
Japan
Prior art keywords
insulating film
voltage mos
breakdown voltage
gate insulating
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002297365A
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English (en)
Japanese (ja)
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JP2004134568A5 (enExample
Inventor
Jun Osanai
小山内 潤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2002297365A priority Critical patent/JP2004134568A/ja
Publication of JP2004134568A publication Critical patent/JP2004134568A/ja
Publication of JP2004134568A5 publication Critical patent/JP2004134568A5/ja
Pending legal-status Critical Current

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  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
JP2002297365A 2002-10-10 2002-10-10 半導体装置の製造方法 Pending JP2004134568A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002297365A JP2004134568A (ja) 2002-10-10 2002-10-10 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002297365A JP2004134568A (ja) 2002-10-10 2002-10-10 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2004134568A true JP2004134568A (ja) 2004-04-30
JP2004134568A5 JP2004134568A5 (enExample) 2005-10-27

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ID=32287088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002297365A Pending JP2004134568A (ja) 2002-10-10 2002-10-10 半導体装置の製造方法

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JP (1) JP2004134568A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012195607A (ja) * 2012-06-13 2012-10-11 Lapis Semiconductor Co Ltd 高耐圧電界効果トランジスタ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012195607A (ja) * 2012-06-13 2012-10-11 Lapis Semiconductor Co Ltd 高耐圧電界効果トランジスタ

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