JP2004134568A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
- Publication number
- JP2004134568A JP2004134568A JP2002297365A JP2002297365A JP2004134568A JP 2004134568 A JP2004134568 A JP 2004134568A JP 2002297365 A JP2002297365 A JP 2002297365A JP 2002297365 A JP2002297365 A JP 2002297365A JP 2004134568 A JP2004134568 A JP 2004134568A
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- Prior art keywords
- insulating film
- voltage mos
- breakdown voltage
- gate insulating
- low
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- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002297365A JP2004134568A (ja) | 2002-10-10 | 2002-10-10 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002297365A JP2004134568A (ja) | 2002-10-10 | 2002-10-10 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004134568A true JP2004134568A (ja) | 2004-04-30 |
| JP2004134568A5 JP2004134568A5 (enExample) | 2005-10-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002297365A Pending JP2004134568A (ja) | 2002-10-10 | 2002-10-10 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004134568A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012195607A (ja) * | 2012-06-13 | 2012-10-11 | Lapis Semiconductor Co Ltd | 高耐圧電界効果トランジスタ |
-
2002
- 2002-10-10 JP JP2002297365A patent/JP2004134568A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012195607A (ja) * | 2012-06-13 | 2012-10-11 | Lapis Semiconductor Co Ltd | 高耐圧電界効果トランジスタ |
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