JP2004117883A5 - - Google Patents
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- Publication number
- JP2004117883A5 JP2004117883A5 JP2002281545A JP2002281545A JP2004117883A5 JP 2004117883 A5 JP2004117883 A5 JP 2004117883A5 JP 2002281545 A JP2002281545 A JP 2002281545A JP 2002281545 A JP2002281545 A JP 2002281545A JP 2004117883 A5 JP2004117883 A5 JP 2004117883A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alicyclic hydrocarbon
- general formula
- hydrocarbon group
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000002723 alicyclic group Chemical group 0.000 claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 3
- KPPVNWGJXFMGAM-UUILKARUSA-N (e)-2-methyl-1-(6-methyl-3,4-dihydro-2h-quinolin-1-yl)but-2-en-1-one Chemical compound CC1=CC=C2N(C(=O)C(/C)=C/C)CCCC2=C1 KPPVNWGJXFMGAM-UUILKARUSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002281545A JP4031334B2 (ja) | 2002-09-26 | 2002-09-26 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002281545A JP4031334B2 (ja) | 2002-09-26 | 2002-09-26 | ポジ型レジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004117883A JP2004117883A (ja) | 2004-04-15 |
JP2004117883A5 true JP2004117883A5 (enrdf_load_stackoverflow) | 2005-09-22 |
JP4031334B2 JP4031334B2 (ja) | 2008-01-09 |
Family
ID=32275968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002281545A Expired - Fee Related JP4031334B2 (ja) | 2002-09-26 | 2002-09-26 | ポジ型レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4031334B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4524207B2 (ja) * | 2005-03-02 | 2010-08-11 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
JP5314882B2 (ja) | 2007-02-15 | 2013-10-16 | 東京応化工業株式会社 | 高分子化合物、レジスト組成物及びレジストパターン形成方法 |
WO2008099725A1 (ja) * | 2007-02-15 | 2008-08-21 | Tokyo Ohka Kogyo Co., Ltd. | 高分子化合物、レジスト組成物及びレジストパターン形成方法 |
JP5542412B2 (ja) * | 2009-10-28 | 2014-07-09 | 東京応化工業株式会社 | ポジ型レジスト組成物、レジストパターン形成方法、高分子化合物 |
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2002
- 2002-09-26 JP JP2002281545A patent/JP4031334B2/ja not_active Expired - Fee Related