JP4031334B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4031334B2
JP4031334B2 JP2002281545A JP2002281545A JP4031334B2 JP 4031334 B2 JP4031334 B2 JP 4031334B2 JP 2002281545 A JP2002281545 A JP 2002281545A JP 2002281545 A JP2002281545 A JP 2002281545A JP 4031334 B2 JP4031334 B2 JP 4031334B2
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Japan
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group
general formula
carbon atoms
alkyl group
repeating unit
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Expired - Fee Related
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JP2002281545A
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English (en)
Japanese (ja)
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JP2004117883A5 (enrdf_load_stackoverflow
JP2004117883A (ja
Inventor
健一郎 佐藤
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2002281545A priority Critical patent/JP4031334B2/ja
Publication of JP2004117883A publication Critical patent/JP2004117883A/ja
Publication of JP2004117883A5 publication Critical patent/JP2004117883A5/ja
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Publication of JP4031334B2 publication Critical patent/JP4031334B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002281545A 2002-09-26 2002-09-26 ポジ型レジスト組成物 Expired - Fee Related JP4031334B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002281545A JP4031334B2 (ja) 2002-09-26 2002-09-26 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002281545A JP4031334B2 (ja) 2002-09-26 2002-09-26 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004117883A JP2004117883A (ja) 2004-04-15
JP2004117883A5 JP2004117883A5 (enrdf_load_stackoverflow) 2005-09-22
JP4031334B2 true JP4031334B2 (ja) 2008-01-09

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ID=32275968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002281545A Expired - Fee Related JP4031334B2 (ja) 2002-09-26 2002-09-26 ポジ型レジスト組成物

Country Status (1)

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JP (1) JP4031334B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4524207B2 (ja) * 2005-03-02 2010-08-11 富士フイルム株式会社 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP5314882B2 (ja) 2007-02-15 2013-10-16 東京応化工業株式会社 高分子化合物、レジスト組成物及びレジストパターン形成方法
WO2008099725A1 (ja) * 2007-02-15 2008-08-21 Tokyo Ohka Kogyo Co., Ltd. 高分子化合物、レジスト組成物及びレジストパターン形成方法
JP5542412B2 (ja) * 2009-10-28 2014-07-09 東京応化工業株式会社 ポジ型レジスト組成物、レジストパターン形成方法、高分子化合物

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Publication number Publication date
JP2004117883A (ja) 2004-04-15

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