JP2004116987A - Air cleaner and treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cleaned air feeder and a treatment device capable of stabilizing performance of an air filter and prolonging its lifetime. <P>SOLUTION: This air cleaner is provided with a blower 16, an ULPA filter 17b or a HEPA filter arranged on the downstream of the blower 16 for eliminating particles in gas, and a rectifying member 18 arranged on the upstream or downstream of the blower 16 for compensating an uneven in-plane air speed distribution by the blower 16 into an even in-pane air speed distribution. The rectifying member 18 is provided with an uneven in-plane opening ratio, and an area with the low opening ratio in the rectifying member corresponds to an area with a high air speed of the blower 16. <P>COPYRIGHT: (C)2004,JPO

Description

The present invention relates to an air cleaning device and a processing device.

2. Description of the Related Art In the manufacture of a semiconductor device, there are steps of performing various processes such as a film forming process and an etching process on an object to be processed, for example, a semiconductor wafer, and a processing device such as a vacuum processing device is used as a device for performing these processes. ing. In this type of processing apparatus, for example, when processing a wafer in a vacuum atmosphere, first, the wafer stored in a transport container such as a cassette is taken into a transfer chamber at normal pressure (atmospheric pressure), and After aligning the wafers, the wafer is loaded into the load lock chamber, and the inside of the chamber is evacuated to a vacuum atmosphere. The wafer is further transferred to the processing chamber for processing the wafer under the vacuum atmosphere via the load lock chamber and the transfer chamber under the vacuum atmosphere. The wafer is subjected to a predetermined process.

(4) In such a processing apparatus, it is necessary to prevent particles and the like that cause a decrease in yield from adhering to the wafer as much as possible. Therefore, for example, in a working room for transferring wafers or the like under a normal pressure atmosphere, for example, a clean room or a transfer room, a blower is provided above the room, and an air filter is provided downstream thereof, so that the cleanness of the room can be reduced. A high clean air downflow is formed to prevent particles and the like from adhering to the surface of the wafer being transported as much as possible (for example, JP-A-11-63604, Japanese Patent Application No. 2002-137644).

For example, as shown in FIG. 8, a clean air supply structure including a blower 40 and an air filter 41 provided downstream of the blower 40 is configured. Provided.

JP-A-11-63604

However, in the clean air supply structure or a processing apparatus provided with the clean air supply structure in a work chamber, as shown in FIG. This occurs, and the in-plane non-uniform wind speed distribution in the cross section of the air passage tends to appear remarkably especially when the blower 40 is a propeller fan. In the case of this propeller fan, the wind speed in the region corresponding to the blade portion of the rotating blade is the strongest, and the wind speed in the region corresponding to the central portion of the rotating blade is slightly weaker, although it depends on the shape of the rotating blade. The wind speed in the area corresponding to the surroundings is weaker.

Therefore, when the air passes through the air filter 41 with the in-plane non-uniform wind speed distribution, for example, when the air filter is a ULPA (Ultra Low Penetration Air) filter, as shown in FIG. Further, there is a problem that particles P are locally deposited and clogging easily occurs, the performance as an air filter is unstable, the service life is short, and early replacement is required. Further, since the wind speed below the air filter 41 becomes non-uniform, the airflow in the working chamber 42 is disturbed, and there is a problem that the cleanliness in the working chamber 42 is reduced due to the winding of the particles P.

Also, when the air filter is a chemical filter, it absorbs a large amount of chemical contaminants such as organic gas in a portion where the flow velocity is high. The performance is unstable, the life is short, and there is a problem that early replacement is required.

The present invention has been made in view of the above circumstances, and has as its object to provide an air purifying apparatus and a processing apparatus capable of stabilizing the performance of an air filter and extending the life.

The present invention has been made in consideration of the above circumstances, and has as its object to provide.

Among the present invention, the invention of claim 1 is provided with a blower, a ULPA filter or a HEPA filter provided downstream of the blower for removing particles in a gas, and provided so as to be located upstream or downstream of the blower. A rectifying member for compensating the in-plane non-uniform wind speed distribution by the blower to an in-plane uniform wind speed distribution, wherein the rectifying member has an in-plane non-uniform opening ratio, and the rectifying member has an opening ratio of The low region corresponds to a region where the wind speed of the blower is high.

According to a second aspect of the present invention, in the air purifying apparatus according to the first aspect, the blower includes a propeller fan.

According to a third aspect of the present invention, in the air purifying apparatus according to the first or second aspect, the blower, the rectifying member, and the ULPA filter or the HEPA filter are provided in a cylindrical housing.

According to a fourth aspect of the present invention, in the air cleaning device according to the first aspect, the rectifying member is provided so as to cover a flat plate having a large number of holes, and holes on the flat plate corresponding to regions where the wind speed is high in the wind speed distribution. And a ring-shaped baffle plate.

The invention according to claim 5 is the air purifying apparatus according to claim 1, further comprising a chemical filter for removing a chemical contaminant in a gas upstream of the blower, wherein the chemical filter and the blower are provided between the chemical filter and the blower. A rectifying member is provided.

According to a sixth aspect of the present invention, in the air cleaning device according to the first aspect, an auxiliary rectifying member is further provided downstream of the ULPA filter or the HEPA filter, and the auxiliary rectifying member has a uniform opening ratio in a plane. Features.

According to a seventh aspect of the present invention, there is provided a processing apparatus having a normal-pressure working chamber for carrying an object to be processed or the like, wherein the top of the working chamber is supplied with clean air into the working chamber. An air cleaning device according to any one of the above aspects is provided.

According to the invention of claim 1, a blower, a ULPA filter or a HEPA filter provided downstream of the blower for removing particles in gas, and provided so as to be located upstream or downstream of the blower, A rectifying member for compensating the in-plane non-uniform wind speed distribution to an in-plane uniform wind speed distribution, wherein the rectifying member has an in-plane non-uniform aperture ratio, and a region where the rectifying member has a low aperture ratio. Since it corresponds to the region where the wind speed of the blower is high, local clogging of the ULPA filter or the HEPA filter can be prevented, and the performance of the ULPA filter or the HEPA filter can be stabilized and the life can be extended.

According to the invention of claim 2, since the blower is composed of a propeller fan, unlike other fans such as a centrifugal fan, the structure can be simplified and the device can be made compact, and the in-plane unevenness that tends to occur in the propeller fan can be achieved. The problem of wind speed distribution can be solved.

According to the third aspect of the present invention, since the blower, the rectifying member, and the ULPA filter or the HEPA filter are provided in the cylindrical housing, the unit can be made compact and the apparatus can be made compact. It is possible to improve the mountability to a room or the like.

According to the fourth aspect of the present invention, the rectifying member includes a flat plate having a large number of holes, and an annular baffle plate provided on the flat plate so as to cover the holes corresponding to the high wind speed region in the wind speed distribution. Therefore, the in-plane non-uniform wind speed distribution can be easily changed to the in-plane uniform wind speed distribution with a simple structure.

According to the invention of claim 5, a chemical filter for removing a chemical contaminant in a gas is further provided upstream of the blower, and the rectifying member is disposed between the chemical filter and the blower. Therefore, the air flow passing through the chemical filter can be made uniform in the plane, and clogging of the chemical filter can be suppressed.

According to the sixth aspect of the present invention, an auxiliary rectifying member is further provided downstream of the ULPA filter or the HEPA filter, and the auxiliary rectifying member has a uniform opening ratio in a plane. Even in the case of a single-stage configuration instead of a multi-stage configuration, the air flow sent out by the blower can be captured in the air filter and a uniform in-plane downflow can be formed downstream of the air filter.

According to the seventh aspect of the present invention, in a processing apparatus having a normal-pressure working chamber for transporting an object to be processed or the like, the top of the working chamber is supplied with clean air into the working chamber. 6, the downflow of clean air having a high degree of cleanness can be stably formed in the working chamber, and particles and the like in the processing apparatus for the object to be processed can be stably formed. The adhesion can be prevented, and the yield can be improved.

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the accompanying drawings. 1 is a schematic configuration diagram showing an example in which the present invention is applied to a vacuum processing apparatus, FIG. 2 is a schematic perspective view showing a transfer chamber, FIG. 3 is a cross-sectional view of an air cleaning device provided in the transfer chamber, and FIG. It is a schematic plan view which shows an example of a member.

In FIG. 1, reference numeral 1 denotes a so-called multi-chamber type vacuum processing apparatus shown as an example of a processing apparatus, which accommodates an object to be processed, for example, a semiconductor wafer w one by one, and performs predetermined processing such as film forming processing, etching processing and the like. A plurality of, for example, four processing chambers 2a, 2b, 2c, 2d capable of performing a vacuum, a transfer chamber 3 capable of performing a vacuum in common therewith, a load lock chamber 4a, 4b having a load lock function, and a normal pressure ( A transfer chamber 5 which is a working chamber on the (atmospheric pressure) side is mainly provided.

The vacuum can transfer chamber 3 is formed in a flat, substantially hexagonal, the processing chamber 2a to the four faces of the periphery, 2b, 2c, 2d and each gate valve _{G 1, G 2, G 3} , G 4 Connected through. Two load lock chambers 4a of the other two sides of the outer periphery of the transfer chamber 5 for the loading or unloading, 4b are connected respectively through gate valves G _5, G _6. Moreover, both the load-lock chambers 4a, common atmospheric pressure side transfer chamber to 4b are (working chamber) 5 is connected via a gate valve G _7, G _8. In the transfer chamber 3 capable of vacuuming, a transfer arm mechanism 6 for transferring a wafer w to each of the load lock chambers 4a and 4b and each of the processing chambers 2a, 2b, 2c and 2d is provided. I have.

The transfer chamber 5 on the normal pressure side is defined by a horizontally long box-shaped housing 7 made of metal such as stainless steel, and a wafer w is loaded and unloaded to the front surface thereof as shown in FIG. One or more, in the illustrated example, three loading / unloading ports 8a, 8b, 8c are provided. Further, a carrier (also referred to as a cassette) 9 which is a transport container storing a plurality of wafers in multiple stages is mounted on the front surface of the transfer chamber 5 corresponding to each of the loading / unloading ports 8a, 8b, 8c. Mounting tables 10a, 10b, and 10c are provided. The carrier 9 may be a so-called closed carrier, for example, a plastic transport container with a lid capable of storing about 13 or 25 wafers having a diameter of 300 mm at predetermined intervals in the vertical direction. The loading / unloading ports 8a, 8b, 8c may be provided with an opening / closing door, a lid attaching / detaching mechanism for attaching / detaching a lid of a closed type carrier, or the like.

搬 送 A transfer mechanism 11 for transferring the wafer w is provided in the transfer chamber 5. Since the transfer chamber 5 is horizontally long, the transfer mechanism 11 is provided so as to be movable along a guide rail 12 provided in the center of the transfer chamber 5 in the longitudinal direction (left-right direction). At one end of the transfer chamber 5, an orienter 13, which is a positioning mechanism for positioning the wafer w, is provided. The transfer mechanism 11 has a transfer arm mechanism 14 for transferring the wafer w to the carrier 9, orienter 13, and load lock chambers 4a, 4b on the mounting tables 10a, 10b, 10c.

At the upper part of the transfer chamber 5, one or a plurality of air purifiers 15 for supplying clean air having a high degree of cleanness into the transfer chamber 5 to form a downflow of the clean air, and three air purifiers 15 in the illustrated example are provided. Have been. As shown in FIG. 3, the air cleaning device 15 includes a blower 16 and an air filter 17 provided downstream of the blower 16 and is configured as a fan / filter unit. A rectifying member 18 is provided between the blower 16 and the air filter 17 to make the in-plane non-uniform wind speed distribution by the blower 16 into a substantially uniform in-plane wind speed distribution. The rectifying member 18 is provided upstream of the air filter 17, and improves the in-plane uniform wind velocity distribution of the wind (air flow) from the blower 16 to the in-plane uniform wind velocity distribution, and passes the air through the air filter 17. Although a gap or space Sa is provided between the blower 16 and the rectifying member 18, a gap Sb of at least about 1 mm is provided between the air filter 17 and the rectifying member 18. This is preferable for achieving in-plane uniformity.

The air purifying device 15 has a housing 19 having a tubular shape, for example, a rectangular tubular shape, and a blower 16 is attached to an upper portion, preferably a central portion of the upper portion of the housing 19. A circular vent 20 is provided at the center of the top of the housing 19, and a cylindrical fan case 21 having substantially the same opening diameter as the vent 20 communicates with the vent 20 at the top of the housing 19. It is provided as follows. The blower 16 is mainly composed of a rotating blade 22 and an electric motor 23 for driving the rotating blade 22 to rotate. The electric motor 23 has a plurality of support rods 24 at a substantially central portion in the fan case 21. Mounted through.

エ ア As the air filter 17, a chemical filter 17a for removing chemical contaminants such as organic substances in a gas, an ULPA filter 17b for removing fine particles (particles) in a gas, or a HEPA filter is used. It is preferable that the chemical filter 17a and the ULPA filter 17b are arranged in order in the blowing direction. The chemical filter 17a mainly includes a filter main body 25 formed by forming an inorganic fiber paper supporting an adsorbent such as activated carbon into a honeycomb shape, and a metal frame 26 holding the filter main body 25, for example. Is configured.

The ULPA filter 17b mainly includes a filter main body 27 made of, for example, bellows-shaped inorganic fiber paper, and a metal rectangular frame 28 holding the filter main body 27, for example. The frame 26 of the chemical filter 17a and the frame 28 of the ULPA filter 17b are formed to have substantially the same diameter as the housing 19, and constitute a part of the housing 19. The frame 26 of the chemical filter 17a is placed on the frame 28 of the ULPA filter 17b and connected with screws 29. At the lower opening end of the housing 19, a flange portion 30 mounted on the frame 26 of the chemical filter 17a is formed, and the flange portion 30 of the housing 19 is mounted on the frame 26 of the chemical filter 17a. 31 are connected. In this case, the rim of the rectifying member 18 is interposed between the frame 26 of the chemical filter 17a and the flange 30 of the housing 19 so as to be sandwiched. The air cleaning device 15 is configured such that a blower 16, a rectifying member 18, and an air filter 17 are provided in a cylindrical housing 19.

The rectifying member 18 includes a flat plate 33 having a plurality of openings, for example, holes 32 as shown in FIG. The aperture ratio is changed according to the uneven wind speed distribution. In other words, the rectifying member 18 has an in-plane non-uniform aperture ratio, and a position where the in-plane non-uniform opening ratio of the rectifying member 18 is low corresponds to a position where the wind speed of the blower 16 is high. The rectifying member 18 is preferably made of a punching metal having a plurality of holes formed in a metal flat plate, but may be a member having a plurality of holes formed in a resin flat plate. The rectifying member 18 may be referred to as a rectifying plate.

Specifically, in the casing 19 downstream of the blower 16, generally, the wind speed in the region corresponding to the blade of the rotating blade is highest (highest), and the wind speed in the region corresponding to the center of the rotating blade is generally high. Is slightly weaker (lower), and an in-plane non-uniform wind speed distribution occurs in which the wind speed in the region corresponding to the periphery of the rotating blade is further weakened. Therefore, the flat plate 33 has a small diameter in the region corresponding to the blade portion of the rotating blade. A plurality of holes or small holes 32a are provided, and a plurality of slightly larger holes or medium holes 32b are provided in a region corresponding to the center of the rotating blade, and a large hole or large holes are provided in a region corresponding to the periphery of the rotating blade. 32c are provided. As a result, air passes through the air filter 17 with an in-plane uniform wind speed distribution as indicated by arrows in FIG. 3, thereby preventing local clogging of the air filter 17. In this way, it is possible to stabilize the performance and extend the service life (improve the durability).

An opening 34 for introducing clean air is provided at the top of the transfer chamber 5. The top of the transfer chamber 5 is connected so that the opening 34 communicates with the inside of the housing 19 of the air cleaning device 15. Is provided with an air purifying device 15. In this case, the frame body 28 of the ULPA filter 17b in the air cleaning device 15 is placed on the top of the transfer chamber 5 and is fixed by screws 35.

According to the air cleaning device 15 having the above-described configuration, the air cleaner 16 includes the blower 16 and the air filter 17 provided downstream of the blower 16, and an in-plane air blow by the blower 16 is provided between the blower 16 and the air filter 17. Since the rectifying member 18 for changing the uniform wind speed distribution to a substantially uniform in-plane wind speed distribution is provided, local clogging of the air filter 17 can be prevented, and the performance of the air filter 17 can be stabilized. The life can be extended. In other words, the blower 16, a ULPA filter 17 b or a HEPA filter provided downstream of the blower 16 for removing particles in the gas, and provided so as to be located upstream or downstream of the blower 16. A rectifying member 18 for compensating the in-plane non-uniform wind speed distribution to an in-plane uniform wind speed distribution, wherein the rectifying member 18 has an in-plane non-uniform aperture ratio; Since the low area corresponds to the high wind speed area of the blower 16, local clogging of the ULPA filter or the HEPA filter can be prevented, and the performance of the ULPA filter or the HEPA filter is stabilized and the life is extended. Can be achieved.

The air filter 17 is preferably a combination of a chemical filter and a ULPA filter or a HEPA filter, but may be any one. For example, when the air filter is an ULPA filter, particles do not pass through at the initial stage, the particles do not locally accumulate and do not cause clogging, and the performance as an air filter is stabilized and the life is extended. The replacement time can be extended. When the air filter is a chemical filter, chemical contaminants such as organic gas are dispersed and adsorbed.Therefore, there is no danger that the chemical contaminants will pass beyond the allowable adsorption amount, and the performance of the air filter will be stable. Life can be extended, and replacement time can be extended.

Since the blower 16 is composed of a propeller fan, unlike the other fans such as the centrifugal fan, the structure can be simplified and the device can be downsized. Can be eliminated. Since the blower 16, the rectifying member 18 and the air filter (chemical filter, ULPA filter or HEPA filter) 17 are provided in the cylindrical housing 19, the unit can be made compact and the apparatus can be made compact. And the mountability to the transfer chamber 5 and the like can be improved. Since the rectifying member 18 is formed of a flat plate having a plurality of openings, for example, holes 32, and the aperture ratio is changed in accordance with the wind speed distribution, the in-plane non-uniform wind speed distribution can be reduced with a simple structure by the substantially uniform in-plane wind speed. Can easily be changed to distribution.

As the air filter 17, it is preferable to combine different kinds of filters and stack them in multiple stages. As in the embodiment of FIG. 3, the chemical filter and the ULPA filter differ in the material and shape of the filter medium, and the air flow (conductance) in each filter (on the surface of the filter medium) is different from each other. An appropriate air reservoir can be formed to form a uniform air flow that does not face the downstream of the filter.

Since the air filter 17 is configured by arranging the chemical filter 17a and the ULPA filter 17b in order in the air blowing direction, it is possible to remove chemical contaminants and particles floating in the air, thereby increasing the cleanliness, and in particular, the chemical filter. Particles passing through the filter 17a can be captured by the ULPA filter 17b. Note that a particle removal filter such as a HEPA filter having the same function and structure as the ULPA filter 17b can be used. Further, in a processing apparatus such as a vacuum processing apparatus 1 having a normal-pressure working chamber for transferring the wafer w, for example, the transfer chamber 5, an air cleaning device 15 is provided at the top of the transfer chamber 5. A downflow of clean air having a high degree of cleanliness can be stably formed in the chamber 5, and adhesion of particles and the like in the vacuum processing apparatus 1 of the wafer w can be prevented, thereby improving the yield.

FIG. 5 is a view showing another example of the rectifying member, (a) is a schematic plan view, and (b) is a sectional view. The rectifying member 18 includes a flat plate 33 having a large number of holes 32 and an annular baffle plate 36 provided on the flat plate 33 to cover the holes 32 corresponding to the high wind speed region in the wind speed distribution. The flat plate 33 is provided with a large number of holes 32 having a diameter of, for example, 2 mm at a pitch of 3.5 mm. An annular baffle plate 36 having an inner diameter of 130 mm and an outer diameter of 180 mm is mounted on the flat plate 32 by spot welding or the like. According to the rectifying member 18 configured as described above, the in-plane non-uniform wind speed distribution can be easily changed to the in-plane uniform wind speed distribution with a simple structure. Further, according to the processing apparatus such as the vacuum processing apparatus 1 in which the air cleaning device 15 having the rectifying member 18 is provided at the top of the transfer chamber 5, the downflow of clean air having a high degree of cleanness in the transfer chamber 5 is stabilized. Thus, adhesion of particles and the like in the processing apparatus of the wafer w can be prevented, and the yield can be improved.

FIG. 6 is a schematic sectional view showing another example of the air cleaning device. In this embodiment, the same parts as those in the above embodiment are denoted by the same reference numerals, and description thereof will be omitted. In the air cleaning device 15, a blower 16, a chemical filter 17 a as a first air filter provided upstream of the blower 16, and a ULPA as a second air filter provided downstream of the blower 16. A filter 17b or a HEPA filter, between the blower 16 and the chemical filter 17a serving as the first air filter, in order to make the in-plane non-uniform wind speed distribution by the blower 16 into a substantially uniform in-plane wind speed distribution. A rectifying member 18 as shown in FIGS. 4 and 5 is provided. By providing the rectifying member 18 at this position, the air flow passing through the chemical filter 17a as the first air filter is made uniform in the plane, and clogging of the chemical filter 17a as the first air filter is suppressed. Can be.

FIG. 7 is a schematic sectional view showing another example of the air cleaning device. In this embodiment, the same parts as those in the above embodiment are denoted by the same reference numerals, and description thereof will be omitted. The air purifying device 15 includes a blower 16 and an air filter provided downstream of the blower 16 such as an ULPA filter 17 or a HEPA filter, and the air cleaner is provided between the blower and the air filter such as the ULPA filter 17 as shown in FIG. Alternatively, a rectifying member 18 having a different opening ratio in the plane as in the embodiment of FIG. 5 is provided, and an opening like a punching metal (a flat plate having many holes) is provided downstream of the air filter, for example, the ULPA filter 17. An auxiliary rectifying member 38 having a uniform rate in the plane is provided. As the air filter 17, it is preferable to form a multi-stage structure by combining different types of filters. However, in the case where the filter has a single-stage structure as in the embodiment of FIG. 7 and the effect of retaining air in the filter cannot be expected. By arranging an auxiliary rectifying member 38 made of punching metal downstream of the air filter, for example, the ULPA filter 17, the air flow sent by the blower 16 is captured in the air filter, for example, the ULPA filter 17, and the air filter, for example, An in-plane uniform downflow can be formed downstream of the ULPA filter 17.

As described above, the embodiments of the present invention have been described in detail with reference to the drawings. However, the present invention is not limited to the above embodiments, and various design changes and the like can be made without departing from the gist of the present invention. is there. The processing apparatus according to the present invention may be a normal pressure processing apparatus. The air cleaning device according to the present invention is also applicable to an inspection device or an inspection room (working room) for inspecting an object to be processed. The object to be processed may be an LCD substrate, a glass substrate, or the like other than the semiconductor wafer. The rectifying member is preferably provided with a plurality of holes (openings) in a flat plate, but may be formed of a mesh having a mesh opening ratio changed according to the wind speed distribution of the blower. Further, the air purifying apparatus of the present invention is applied not only as a clean air supply apparatus for supplying clean air to a transfer chamber or the like where cleanliness is required, but also for a path for discharging dirty air to the outside. be able to.

It is a schematic structure figure showing an example which applied the present invention to a vacuum processing device. It is a schematic perspective view which shows a transfer chamber. It is sectional drawing of the air cleaning device provided in the transfer chamber. It is a schematic plan view which shows an example of a rectifying member. It is a figure which shows the other example of a rectification | straightening member, (a) is a schematic plan view, (b) is sectional drawing. It is an outline sectional view showing other examples of an air purifier. It is an outline sectional view showing other examples of an air purifier. It is a schematic sectional drawing which shows an example of the conventional clean air supply structure. It is a schematic sectional drawing which shows the dust collection state of an air filter.

Explanation of reference numerals

1 vacuum processing equipment (processing equipment)
w Semiconductor wafer (object to be processed)
5 transfer room (working room)
Reference Signs List 15 air cleaning device 16 blower 17 air filter 17a chemical filter 17b ULPA filter 18 rectifying member 19 housing 32 hole (opening)
33 flat plate 36 baffle plate 38 auxiliary rectifying member

Claims (7)

A blower, a ULPA filter or a HEPA filter provided downstream of the blower for removing particles in a gas, and a blower provided to be located upstream or downstream of the blower, and having an in-plane nonuniform wind speed distribution by the blower. A rectifying member for compensating for a uniform wind speed distribution inside the rectifying member, wherein the rectifying member has an in-plane non-uniform aperture ratio, and a region where the rectifying member has a low aperture ratio corresponds to a region where the wind speed of the blower is high. An air purifier characterized by performing. The air purifier according to claim 1, wherein the blower comprises a propeller fan. (3) The air purifying apparatus according to (1) or (2), wherein the blower, the rectifying member, and the ULPA filter or the HEPA filter are provided in a cylindrical housing. 2. The rectifying member comprises a flat plate having a large number of holes, and an annular baffle plate provided on the flat plate so as to cover the holes corresponding to the high wind speed region in the wind speed distribution. Air purifier. 2. The rectifying member according to claim 1, further comprising a chemical filter for removing a chemical contaminant in a gas upstream of the blower, wherein the rectifying member is disposed between the chemical filter and the blower. Air purifier. The air purification apparatus according to claim 1, further comprising an auxiliary rectifying member downstream of the ULPA filter or the HEPA filter, wherein the auxiliary rectifying member has a uniform opening ratio in a plane. 7. The air purifier according to claim 1, wherein a processing apparatus having a normal-pressure working chamber for carrying an object to be processed or the like is configured to supply clean air into the working chamber at an upper portion of the working chamber. A processing device comprising a device.

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