JP2004103578A5 - - Google Patents
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- Publication number
- JP2004103578A5 JP2004103578A5 JP2003299045A JP2003299045A JP2004103578A5 JP 2004103578 A5 JP2004103578 A5 JP 2004103578A5 JP 2003299045 A JP2003299045 A JP 2003299045A JP 2003299045 A JP2003299045 A JP 2003299045A JP 2004103578 A5 JP2004103578 A5 JP 2004103578A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma processing
- processing method
- plasma
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003672 processing method Methods 0.000 claims 6
- 239000000919 ceramic Substances 0.000 claims 5
- 238000007599 discharging Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
Images
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003299045A JP2004103578A (ja) | 2002-08-23 | 2003-08-22 | プラズマ処理方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002244202 | 2002-08-23 | ||
| JP2003299045A JP2004103578A (ja) | 2002-08-23 | 2003-08-22 | プラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004103578A JP2004103578A (ja) | 2004-04-02 |
| JP2004103578A5 true JP2004103578A5 (https=) | 2005-07-14 |
Family
ID=32301161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003299045A Pending JP2004103578A (ja) | 2002-08-23 | 2003-08-22 | プラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004103578A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100541867B1 (ko) * | 2005-08-22 | 2006-01-11 | (주)케이.씨.텍 | 상압 플라즈마 발생용 전극 제조방법 및 전극구조와 이를이용한 상압 플라즈마 발생장치 |
| US10892158B2 (en) | 2019-04-01 | 2021-01-12 | Hitachi High-Tech Corporation | Manufacturing method of a semiconductor device and a plasma processing apparatus |
-
2003
- 2003-08-22 JP JP2003299045A patent/JP2004103578A/ja active Pending
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