JP2005243988A5 - - Google Patents

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Publication number
JP2005243988A5
JP2005243988A5 JP2004052808A JP2004052808A JP2005243988A5 JP 2005243988 A5 JP2005243988 A5 JP 2005243988A5 JP 2004052808 A JP2004052808 A JP 2004052808A JP 2004052808 A JP2004052808 A JP 2004052808A JP 2005243988 A5 JP2005243988 A5 JP 2005243988A5
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JP
Japan
Prior art keywords
sample
outer peripheral
plasma
processing chamber
covering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004052808A
Other languages
English (en)
Japanese (ja)
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JP2005243988A (ja
JP4098259B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004052808A priority Critical patent/JP4098259B2/ja
Priority claimed from JP2004052808A external-priority patent/JP4098259B2/ja
Publication of JP2005243988A publication Critical patent/JP2005243988A/ja
Publication of JP2005243988A5 publication Critical patent/JP2005243988A5/ja
Application granted granted Critical
Publication of JP4098259B2 publication Critical patent/JP4098259B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004052808A 2004-02-27 2004-02-27 プラズマ処理装置 Expired - Lifetime JP4098259B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004052808A JP4098259B2 (ja) 2004-02-27 2004-02-27 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004052808A JP4098259B2 (ja) 2004-02-27 2004-02-27 プラズマ処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007312196A Division JP2008098660A (ja) 2007-12-03 2007-12-03 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2005243988A JP2005243988A (ja) 2005-09-08
JP2005243988A5 true JP2005243988A5 (https=) 2005-11-17
JP4098259B2 JP4098259B2 (ja) 2008-06-11

Family

ID=35025390

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004052808A Expired - Lifetime JP4098259B2 (ja) 2004-02-27 2004-02-27 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP4098259B2 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4508054B2 (ja) * 2005-09-12 2010-07-21 パナソニック株式会社 電極部材の製造方法
JP2007115973A (ja) * 2005-10-21 2007-05-10 Shin Etsu Chem Co Ltd 耐食性部材
KR101046902B1 (ko) * 2005-11-08 2011-07-06 도쿄엘렉트론가부시키가이샤 샤워 플레이트 및 샤워 플레이트를 사용한 플라즈마 처리장치
WO2008035508A1 (fr) * 2006-09-20 2008-03-27 Sharp Kabushiki Kaisha Composant pour appareil de traitement, appareil de traitement, procédé pour fabriquer un composant pour appareil de traitement et procédé pour fabriquer cet appareil de traitement
JP5193481B2 (ja) * 2007-03-16 2013-05-08 株式会社日立ハイテクノロジーズ プラズマ処理方法及びプラズマ処理装置
JP2008270595A (ja) * 2007-04-23 2008-11-06 Texas Instr Japan Ltd 反応生成物剥離防止構造及びその製作方法、並びに当該構造を用いる半導体装置の製造方法
US9238863B2 (en) 2012-02-03 2016-01-19 Tocalo Co., Ltd. Method for blackening white fluoride spray coating, and fluoride spray coating covered member having a blackened layer on its surface
US9421570B2 (en) 2012-02-09 2016-08-23 Tocalo Co., Ltd. Method for forming fluoride spray coating and fluoride spray coating covered member
CN104701125A (zh) * 2013-12-05 2015-06-10 中微半导体设备(上海)有限公司 气体分布板
KR101671671B1 (ko) 2016-05-25 2016-11-01 주식회사 티씨케이 반도체 제조용 부품의 재생방법과 그 재생장치 및 재생부품
KR102411272B1 (ko) * 2018-03-26 2022-06-22 엔지케이 인슐레이터 엘티디 정전척 히터

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