JP2004075864A5 - - Google Patents
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- Publication number
- JP2004075864A5 JP2004075864A5 JP2002238712A JP2002238712A JP2004075864A5 JP 2004075864 A5 JP2004075864 A5 JP 2004075864A5 JP 2002238712 A JP2002238712 A JP 2002238712A JP 2002238712 A JP2002238712 A JP 2002238712A JP 2004075864 A5 JP2004075864 A5 JP 2004075864A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- bis
- oxazolin
- methyl
- oxazolinyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002238712A JP2004075864A (ja) | 2002-08-20 | 2002-08-20 | 樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002238712A JP2004075864A (ja) | 2002-08-20 | 2002-08-20 | 樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004075864A JP2004075864A (ja) | 2004-03-11 |
| JP2004075864A5 true JP2004075864A5 (https=) | 2005-07-28 |
Family
ID=32022014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002238712A Pending JP2004075864A (ja) | 2002-08-20 | 2002-08-20 | 樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004075864A (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200622494A (en) * | 2004-09-30 | 2006-07-01 | Kyowa Hakko Chemical Co Ltd | Photoresist composition for positive liquid crystal device |
| JP2007238781A (ja) * | 2006-03-09 | 2007-09-20 | Sumitomo Bakelite Co Ltd | 液状封止樹脂組成物、及びそれを用いた半導体装置 |
| JP4983532B2 (ja) * | 2007-10-17 | 2012-07-25 | 日油株式会社 | カラーフィルター保護膜用の熱硬化性樹脂組成物、およびカラーフィルター |
| US9034556B2 (en) | 2007-12-21 | 2015-05-19 | Tokyo Ohka Kogyo Co., Ltd. | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
| JP5484671B2 (ja) * | 2007-12-21 | 2014-05-07 | 東京応化工業株式会社 | 新規な化合物およびその製造方法 |
| JP6107420B2 (ja) * | 2012-07-24 | 2017-04-05 | 住友化学株式会社 | 塩、レジスト組成物及びレジストパターンの製造方法 |
-
2002
- 2002-08-20 JP JP2002238712A patent/JP2004075864A/ja active Pending
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