JP2004074799A - Insulating substrate to which copper is bonded - Google Patents

Insulating substrate to which copper is bonded Download PDF

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JP2004074799A
JP2004074799A JP2003291585A JP2003291585A JP2004074799A JP 2004074799 A JP2004074799 A JP 2004074799A JP 2003291585 A JP2003291585 A JP 2003291585A JP 2003291585 A JP2003291585 A JP 2003291585A JP 2004074799 A JP2004074799 A JP 2004074799A
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adhesive
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butadiene rubber
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JP3975984B2 (en
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Shin Takanezawa
高根沢 伸
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate on which a coating film, excellent in the strength of bonding with a plated copper and used for an additive-method wiring board, is formed without spoiling the insulating property. <P>SOLUTION: The insulating substrate is configured with the state of bonding each other using the bond which contains the particles of an acrylonitrile-butadiene rubber crosslinked with an epoxy resin. <P>COPYRIGHT: (C)2004,JPO

Description

 本発明は、絶縁基材に関し、さらに詳細には、エポキシ樹脂と架橋したアクリロニトリルブタジエンゴム粒子とを含有する接着剤によって、銅と接着状態にある絶縁基材に関する。 The present invention relates to an insulating substrate, and more particularly, to an insulating substrate bonded to copper by an adhesive containing epoxy resin and crosslinked acrylonitrile butadiene rubber particles.

 周知のように、アディティブ法プリント配線板は、接着剤付き絶縁基材に無電解めっきで必要な配線パターンを形成するものである。 As is well known, an additive printed wiring board forms a necessary wiring pattern on an insulating base material with an adhesive by electroless plating.

 例えば、めっき触媒等を含有する絶縁基材上にめっき触媒を含有する接着剤層を形成し、140〜190℃の温度で20〜90分加熱して硬化させる。次いで、回路形成部以外をめっきレジストでマスクし、無電解めっき銅との接着力を向上するための前処理として、クロム−硫酸等の酸化性エッチング液で回路形成部の接着剤表面を選択的に化学粗化する。その後、中和及び水洗工程を経て無電解めっき液に浸漬し、回路部に銅を析出させて配線パターンを形成する。 (4) For example, an adhesive layer containing a plating catalyst is formed on an insulating substrate containing a plating catalyst and the like, and cured by heating at a temperature of 140 to 190 ° C. for 20 to 90 minutes. Next, the portions other than the circuit forming portion are masked with a plating resist, and as a pretreatment for improving the adhesive force with electroless plated copper, the adhesive surface of the circuit forming portion is selectively treated with an oxidizing etching solution such as chromium-sulfuric acid. To be chemically roughened. Then, after a neutralization and water washing process, it is immersed in an electroless plating solution, and copper is deposited on a circuit portion to form a wiring pattern.

 このようなアディティブ法プリント配線板用接着剤としては、一般にめっき銅との接着性が良いアクリロニトリルブタジエンゴムを主成分とし、かつ耐熱性を確保するためにアルキルフェノール樹脂でアクリロニトリルブタジエンゴムを架橋し、また電気特性を確保するためにエポキシ樹脂を配合する。さらに、接着剤塗膜の補強や化学粗化時の接着剤凹凸増加のために、無機充填剤等を配合した接着剤が提案されてきた。このような接着剤に関する技術を開示するものとしては、特許文献1〜4等がある。
特公昭48−24250号公報 特公昭45−9843号公報 特公昭55−16391号公報 特公平1−53910号公報
Such an additive method printed wiring board adhesive generally has acrylonitrile butadiene rubber as a main component having good adhesion to plated copper, and crosslinks acrylonitrile butadiene rubber with an alkylphenol resin to ensure heat resistance, and Epoxy resin is blended to ensure electrical characteristics. Further, an adhesive compounded with an inorganic filler or the like has been proposed to reinforce the adhesive coating film or increase the adhesive unevenness during chemical roughening. Patent Literatures 1 to 4 disclose techniques relating to such an adhesive.
JP-B-48-24250 Japanese Patent Publication No. 45-9843 Japanese Patent Publication No. 55-16391 Japanese Patent Publication No. 1-53910

 ところで、近年、電子機器の小型化、多機能化に伴い、プリント配線板はより配線密度
を増す必要が生じており、配線幅の細線化が急激に進行している。このような背景から、回路導体を支える接着剤塗膜は、絶縁性が重要な特性となりつつある。
In recent years, as electronic devices have become smaller and more multifunctional, it has become necessary to increase the wiring density of printed wiring boards, and wiring widths have been rapidly reduced. Against this background, the adhesive coating supporting the circuit conductor is becoming an important property in terms of insulation.

 このため、一般的には、絶縁性がエポキシ樹脂等より劣るアクリロニトリルブタジエンゴムの配合量を減らし、エポキシ樹脂の配合量を増すことが行われる。しかしながら、この場合、粗化液溶解性がアクリロニトリルブタジエンゴムより著しく低いエポキシ樹脂を増加するために、粗化の凹凸が小さくなり、このため、めっき銅との接着力は実用上使用できないレベルまで低下してしまう。また、細線化になるほど、めっき銅との接着力が高いことが有利になることは言うまでもない。 Therefore, in general, the amount of acrylonitrile-butadiene rubber, whose insulation is inferior to that of epoxy resin, is reduced, and the amount of epoxy resin is increased. However, in this case, in order to increase the epoxy resin whose solubility of the roughening solution is significantly lower than that of the acrylonitrile-butadiene rubber, the roughness of the roughening is reduced, and therefore, the adhesive strength with the plated copper is reduced to a level that cannot be used practically. Resulting in. It goes without saying that the thinner the wire, the more advantageous it is that the adhesive strength to the plated copper becomes higher.

 本発明は、絶縁性を損なうことなく、めっき銅との接着力に優れた接着剤によって銅と接着状態にある絶縁基材を提供することを目的とする。 An object of the present invention is to provide an insulating base material that is in an adhesion state with copper by an adhesive having excellent adhesion to plated copper without impairing insulation properties.

 本発明の絶縁基材は、絶縁基材表面に塗布する接着剤が、エポキシ樹脂と架橋したアクリロニトリルブタジエンゴム粒子を含有することを特徴とする。 絶 縁 The insulating base material of the present invention is characterized in that the adhesive applied to the surface of the insulating base material contains acrylonitrile-butadiene rubber particles crosslinked with an epoxy resin.

 本発明に用いる架橋したアクリロニトリルブタジエンゴム粒子は、乳化重合後のエマルジョン状態でアクリロニトリルブタジエンゴムを架橋した一次平均粒子径約50〜500nmの微小高分子粒子架橋ゴム粒子であり、カルボキシル基変成または未変成のアクリロニトリルブタジエンゴムの何れも使用できる。 The crosslinked acrylonitrile-butadiene rubber particles used in the present invention are crosslinked rubber particles of fine polymer particles having a primary average particle diameter of about 50 to 500 nm obtained by cross-linking acrylonitrile-butadiene rubber in an emulsion state after emulsion polymerization. Any of the acrylonitrile butadiene rubbers can be used.

 その配合量は、接着剤中に2〜40重量%であることが好ましい。その理由は、2重量%未満では、めっき銅との接着力向上に効果がなく、40重量%を超えると、接着剤表面の粘着性が増し、後工程でのごみの付着等の問題が生じてくるためである。 The compounding amount is preferably 2 to 40% by weight in the adhesive. The reason is that if it is less than 2% by weight, there is no effect in improving the adhesive strength with the plated copper, and if it exceeds 40% by weight, the tackiness of the surface of the adhesive increases, and problems such as adhesion of dust in a later step occur. To come.

 この架橋NBRを含有する基本となる樹脂組成は、アディティブ法配線板に用いられる一般的な樹脂組成が適用でき、耐めっき液性、塗膜形成性、粗化性等を考慮して、エポキシ樹脂、及び好ましくはアクリロニトリルブタジエンゴム、レゾール型フェノール樹脂、無機充填剤等を含む混合物である。 As the basic resin composition containing this crosslinked NBR, a general resin composition used for an additive method wiring board can be applied, and in consideration of plating solution resistance, coating film forming property, roughening property, etc., epoxy resin is used. And preferably a mixture containing acrylonitrile butadiene rubber, a resol type phenol resin, an inorganic filler and the like.

 エポキシ樹脂としては、ビスフェノールA型エポキシ樹脂が例示される。 ビ ス As the epoxy resin, a bisphenol A type epoxy resin is exemplified.

 本発明において、接着剤中に無電解めっきの析出核となるめっき触媒を含有することができる。めっき触媒としては、元素周期率表の8族及び4B族の金属の塩あるいは酸化物が使用できる。例えば、白金、バラジウム、スズ等の化合物が用いられ、固体粒子あるいは有機溶媒に溶解させるか、又は他の樹脂とともに溶解分散させた溶液状態として、接着剤中に混合することができる。めっき触媒の接着剤中の配合量は、2〜15重量%の範囲であれば、無電解めっきによって銅が析出する。 に お い て In the present invention, the adhesive may contain a plating catalyst that serves as a deposition nucleus for electroless plating. As the plating catalyst, salts or oxides of metals of Groups 8 and 4B of the periodic table can be used. For example, a compound such as platinum, palladium, tin or the like is used, and can be dissolved in solid particles or an organic solvent, or can be mixed with an adhesive in a solution state of being dissolved and dispersed together with another resin. If the amount of the plating catalyst in the adhesive is in the range of 2 to 15% by weight, copper is deposited by electroless plating.

 上記接着剤の各成分は、有機溶媒中で混練り混合された溶液状混合物に調製される。用いる有機溶媒としては、トルエン、メチルエチルケトン、アセトン、メチルイソブチルケトン、キシレン、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノメチルエーテルアセテート、3−エトキシプロピオン酸エチル、プロピレングリコールモノメチルエーテル等の単独又は混合系を用いることができる。 各 Each component of the adhesive is prepared as a solution mixture kneaded and mixed in an organic solvent. As the organic solvent to be used, a single or mixed system of toluene, methyl ethyl ketone, acetone, methyl isobutyl ketone, xylene, diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate, ethyl 3-ethoxypropionate, and propylene glycol monomethyl ether can be used.

 本発明に係る絶縁基材としては、フェノール樹脂系又はエポキシ樹脂系、あるいは無機系又は有機複合物からなる基材等を用いることができる。 基材 As the insulating base material according to the present invention, a base material made of a phenol resin or epoxy resin, or an inorganic or organic composite can be used.

 前記接着剤は、絶縁基材に10〜50μm塗布され、140〜190℃の温度で30〜90分加熱硬化が行われる。 接着 The adhesive is applied to the insulating base material in a thickness of 10 to 50 μm, and is heated and cured at a temperature of 140 to 190 ° C. for 30 to 90 minutes.

 無電解めっきを析出させるに際しては、接着剤表面を化学的に粗化して接着に適した形状にする。化学的粗化に用いる粗化液は、クロム−硫酸系、クロム−硫酸−フッ化ナトリウム系、アルカリ−過マンガン酸系、ホウフッ化水素酸−重クロム酸系等が使用できる。また、パターン形成は、めっきレジストをスクリーン印刷、あるいはフォトマスクを紫外線硬化し現像して形成する。これらのめっきレジストは、化学的粗化処理工程の前あるいは処理した後で行われる。 析出 When depositing electroless plating, the surface of the adhesive is chemically roughened to a shape suitable for bonding. As a roughening solution used for chemical roughening, a chromium-sulfuric acid system, a chromium-sulfuric acid-sodium fluoride system, an alkali-permanganate system, a borofluoric acid-bichromic system system, and the like can be used. The pattern is formed by screen-printing a plating resist or by curing and developing a photomask with ultraviolet rays. These plating resists are performed before or after the chemical roughening process.

 本発明に用いられる架橋NBRは、微小な粒子状であり、この架橋NBRが粗化液に溶解することで、接着剤表面に、接着に適した微小凹凸形状を形成することができる。また、架橋したNBRであるため、配合量に比例した絶縁性の低下が全くない。 (4) The crosslinked NBR used in the present invention is in the form of fine particles, and by dissolving the crosslinked NBR in the roughening liquid, it is possible to form, on the surface of the adhesive, fine irregularities suitable for bonding. In addition, since it is a crosslinked NBR, there is no decrease in insulation in proportion to the blending amount.

 以下、実施例によって、本発明をさらに詳細に説明する。 Hereinafter, the present invention will be described in more detail with reference to examples.

 以下に示す接着剤成分を、ガラス布エポキシ積層板であるLE−168(日立化成工業株式会社製、商品名)にディップコート法で塗布し、膜厚25μmの接着剤層を両面に形成した。
(接着剤組成)
 ・架橋NBR、
  XER−91(日本合成ゴム株式会社製、商品名)・・・・・20重量部
 ・ビスフェノールA型エポキシ樹脂、
  エピコート1001(油化シェル株式会社製、商品名)・・・20重量部
 ・アクリロニトリルブタジエンゴム、
  ニポール1031(日本ゼオン株式会社製、商品名)・・・・50重量部
 ・アルキルフェノール樹脂、
  ヒタノール2400(日立化成工業株式会社製、商品名)・・・5重量部
 ・熱硬化剤、
  2E4MZ(四国化成株式会社製、商品名)・・・・・・・0.1重量部
 ・充填剤(ケイ酸ジルコニウム)
  ミクロパックス(白水化学株式会社製、商品名)・・・・・・10重量部
 ・無電解めっき用触媒(塩化パラジウムの樹脂混合物)
  PEC−8(日立化成工業株式会社製、商品名)・・・・・・・4重量部
The adhesive component shown below was applied to LE-168 (trade name, manufactured by Hitachi Chemical Co., Ltd.), a glass cloth epoxy laminate, by dip coating to form an adhesive layer having a thickness of 25 μm on both surfaces.
(Adhesive composition)
・ Cross-linked NBR,
XER-91 (Nippon Synthetic Rubber Co., Ltd., trade name) 20 parts by weight Bisphenol A type epoxy resin,
Epicoat 1001 (trade name, manufactured by Yuka Shell Co., Ltd.): 20 parts by weight ・ Acrylonitrile butadiene rubber,
Nipol 1031 (trade name, manufactured by Zeon Corporation) ... 50 parts by weight-Alkyl phenol resin,
Hitanol 2400 (trade name, manufactured by Hitachi Chemical Co., Ltd.): 5 parts by weight
2E4MZ (Shikoku Chemicals Co., Ltd., trade name) 0.1 parts by weight Filler (zirconium silicate)
Micropacks (trade name, manufactured by Hakusui Chemical Co., Ltd.) 10 parts by weight ・ Catalyst for electroless plating (resin mixture of palladium chloride)
PEC-8 (trade name, manufactured by Hitachi Chemical Co., Ltd.): 4 parts by weight

 次に、この接着剤層を形成させた絶縁基材を、170℃で60分間加熱して硬化させた。さらに、めっき用レジストであるSR−3000(日立化成工業株式会社製、商品名)をラミネートして、回路形成用フォトマスクを介して紫外線露光し、現像した。次に、クロム−硫酸−フッ化ナトリウム(クロム酸40g/l、濃硫酸300ml/l、フッ化ナトリウム10g/l)の粗化液に40℃で5分間浸漬して、接着剤露出部のみ選択的に化学粗化し、その後中和、水洗した。さらに、無電解銅めっき浴であるCC−41液(日立化成工業株式会社製、商品名)に投入して、35μmのめっき銅を析出させた後、160℃で60分間アニーリングして、アディティブ法プリント配線板を作製した。 Next, the insulating substrate on which the adhesive layer was formed was cured by heating at 170 ° C. for 60 minutes. Further, a plating resist SR-3000 (trade name, manufactured by Hitachi Chemical Co., Ltd.) was laminated, exposed to ultraviolet light through a circuit-forming photomask, and developed. Next, it is immersed in a roughening solution of chromium-sulfuric acid-sodium fluoride (chromic acid 40 g / l, concentrated sulfuric acid 300 ml / l, sodium fluoride 10 g / l) at 40 ° C. for 5 minutes, and only the exposed portion of the adhesive is selected. Chemically roughened, then neutralized and washed with water. Further, the solution was put into a CC-41 solution (trade name, manufactured by Hitachi Chemical Co., Ltd.) as an electroless copper plating bath to precipitate 35 μm of plated copper, and then annealed at 160 ° C. for 60 minutes to obtain an additive method. A printed wiring board was manufactured.

 接着剤組成として、実施例1と比較して絶縁性を向上させた組成、すなわちエポキシ樹脂を増量した配合系として、以下の組成を用いた。その他は、実施例1と同様にして、アディティブ法プリント配線板を作製した。
(接着剤組成)
 ・架橋NBR、
  XER−91(日本合成ゴム株式会社製、商品名)・・・・・20重量部
 ・ビスフェノールA型エポキシ樹脂、
  エピコート1001(油化シェル株式会社製、商品名)・・・50重量部
 ・アクリロニトリルブタジエンゴム、
  ニポール1031(日本ゼオン株式会社製、商品名)・・・・20重量部
 ・アルキルフェノール樹脂、
  ヒタノール2400(日立化成工業株式会社製、商品名)・・・5重量部
 ・熱硬化剤、
  2E4MZ(四国化成株式会社製、商品名)・・・・・・・0.1重量部
 ・充填剤(ケイ酸ジルコニウム)
  ミクロパックス(白水化学株式会社製、商品名)・・・・・・10重量部
 ・無電解めっき用触媒(塩化パラジウムの樹脂混合物)
  PEC−8(日立化成工業株式会社製、商品名)・・・・・・・4重量部
As the adhesive composition, the following composition was used as a composition in which the insulating property was improved as compared with Example 1, that is, as a compounding system in which an epoxy resin was increased. Except for this, the additive method printed wiring board was manufactured in the same manner as in Example 1.
(Adhesive composition)
・ Cross-linked NBR,
XER-91 (Nippon Synthetic Rubber Co., Ltd., trade name) 20 parts by weight Bisphenol A type epoxy resin,
Epicoat 1001 (trade name, manufactured by Yuka Shell Co., Ltd.): 50 parts by weight ・ Acrylonitrile butadiene rubber,
Nipol 1031 (manufactured by Nippon Zeon Co., Ltd., trade name) 20 parts by weight alkylphenol resin,
Hitanol 2400 (trade name, manufactured by Hitachi Chemical Co., Ltd.): 5 parts by weight
2E4MZ (Shikoku Chemicals Co., Ltd., trade name) 0.1 parts by weight Filler (zirconium silicate)
Micropacks (trade name, manufactured by Hakusui Chemical Co., Ltd.) 10 parts by weight ・ Catalyst for electroless plating (resin mixture of palladium chloride)
PEC-8 (trade name, manufactured by Hitachi Chemical Co., Ltd.): 4 parts by weight

 実施例2の接着剤組成において、架橋NBRの配合量を増加した。その他は、実施例2と同様にして、アディティブ法プリント配線板を作製した。
(接着剤組成)
 ・架橋NBR、
  XER−91(日本合成ゴム株式会社製、商品名)・・・・・35重量部
 ・ビスフェノールA型エポキシ樹脂、
  エピコート1001(油化シェル株式会社製、商品名)・・・50重量部
 ・アクリロニトリルブタジエンゴム、
  ニポール1031(日本ゼオン株式会社製、商品名)・・・・15重量部
 ・アルキルフェノール樹脂、
  ヒタノール2400(日立化成工業株式会社製、商品名)・・・5重量部
 ・熱硬化剤、
  2E4MZ(四国化成株式会社製、商品名)・・・・・・・0.1重量部
 ・充填剤(ケイ酸ジルコニウム)
  ミクロパックス(白水化学株式会社製、商品名)・・・・・・10重量部
In the adhesive composition of Example 2, the amount of the crosslinked NBR was increased. Otherwise, in the same manner as in Example 2, an additive method printed wiring board was manufactured.
(Adhesive composition)
・ Cross-linked NBR,
XER-91 (Nippon Synthetic Rubber Co., Ltd., trade name) 35 parts by weight Bisphenol A type epoxy resin,
Epicoat 1001 (trade name, manufactured by Yuka Shell Co., Ltd.): 50 parts by weight ・ Acrylonitrile butadiene rubber,
Nipol 1031 (manufactured by Nippon Zeon Co., Ltd., trade name) 15 parts by weight Alkyl phenol resin,
Hitanol 2400 (trade name, manufactured by Hitachi Chemical Co., Ltd.): 5 parts by weight
2E4MZ (Shikoku Chemicals Co., Ltd., trade name) 0.1 parts by weight Filler (zirconium silicate)
Micropacks (trade name, manufactured by Hakusui Chemical Co., Ltd.): 10 parts by weight

  比較例1〜2
 実施例1と実施例2において、接着剤中の架橋NBRを用いない組成とした。その他は、各実施例と同様にして、アディティブ法プリント配線板を作製した。
Comparative Examples 1-2
In Examples 1 and 2, the composition was such that the crosslinked NBR in the adhesive was not used. Otherwise, an additive method printed wiring board was manufactured in the same manner as in each example.

 以上のようにして作製したアディティブ法プリント配線板の特性結果を表1に示す。 Table 1 shows the characteristic results of the additive printed wiring board manufactured as described above.

Figure 2004074799
Figure 2004074799

 以上に説明したように、接着剤組成中に架橋したアクリロニトリルブタジエンゴム粒子を用いることで、絶縁性、耐熱性を損なうことなくめっき銅との接着力を向上できる接着剤によって、銅と接着状態にある絶縁基材を提供することができる。
As described above, by using acrylonitrile-butadiene rubber particles cross-linked in the adhesive composition, insulation, an adhesive capable of improving the adhesive strength with plated copper without impairing the heat resistance, the adhesive state with copper. A certain insulating substrate can be provided.

Claims (3)

 エポキシ樹脂と架橋したアクリロニトリルブタジエンゴム粒子とを含有する接着剤によって、銅と接着状態にあることを特徴とする絶縁基材。 (4) An insulating base material which is in an adhesive state with copper by an adhesive containing an epoxy resin and crosslinked acrylonitrile butadiene rubber particles.  架橋したアクリロニトリルブタジエンゴム粒子を、接着剤中に2〜40重量%含有する、請求項1に記載の絶縁基材。 2. The insulating base material according to claim 1, wherein the adhesive contains 2 to 40% by weight of crosslinked acrylonitrile butadiene rubber particles.  架橋したアクリロニトリルブタジエンゴム粒子の平均粒子径が、50〜100nmである、請求項1又は2に記載の絶縁基材。
3. The insulating substrate according to claim 1, wherein the crosslinked acrylonitrile butadiene rubber particles have an average particle size of 50 to 100 nm.
JP2003291585A 2003-08-11 2003-08-11 Insulating substrate in adhesive state with copper Expired - Fee Related JP3975984B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011086729A (en) * 2009-10-14 2011-04-28 Hitachi Chem Co Ltd Laminated board for wiring board and method of manufacturing the same, resin film for primer layer, and multilayer wiring board and method of manufacturing the same
CN104015456A (en) * 2014-06-11 2014-09-03 郭长奇 Production method of anion insulation composite plate
US20140378580A1 (en) * 2012-05-16 2014-12-25 Hitachi Industrial Equipment Systems Co., Ltd. Epoxy-Vinyl Copolymerization Type Liquid Resin Composition, Cured Product of the Same, Electronic/Electric Apparatus using the Cured Product, and Method of Producing the Cured Product
CN110055006A (en) * 2019-04-18 2019-07-26 广东东华光电科技有限公司 A kind of antiultraviolet thermal isolation film and its manufacturing process

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011086729A (en) * 2009-10-14 2011-04-28 Hitachi Chem Co Ltd Laminated board for wiring board and method of manufacturing the same, resin film for primer layer, and multilayer wiring board and method of manufacturing the same
US20140378580A1 (en) * 2012-05-16 2014-12-25 Hitachi Industrial Equipment Systems Co., Ltd. Epoxy-Vinyl Copolymerization Type Liquid Resin Composition, Cured Product of the Same, Electronic/Electric Apparatus using the Cured Product, and Method of Producing the Cured Product
US9493605B2 (en) * 2012-05-16 2016-11-15 Hitachi Industrial Equipment Systems Co., Ltd. Epoxy-vinyl copolymerization type liquid resin composition, cured product of the same, electronic/electric apparatus using the cured product, and method of producing the cured product
CN104015456A (en) * 2014-06-11 2014-09-03 郭长奇 Production method of anion insulation composite plate
CN110055006A (en) * 2019-04-18 2019-07-26 广东东华光电科技有限公司 A kind of antiultraviolet thermal isolation film and its manufacturing process

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