JP2004020735A5 - - Google Patents
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- Publication number
- JP2004020735A5 JP2004020735A5 JP2002173071A JP2002173071A JP2004020735A5 JP 2004020735 A5 JP2004020735 A5 JP 2004020735A5 JP 2002173071 A JP2002173071 A JP 2002173071A JP 2002173071 A JP2002173071 A JP 2002173071A JP 2004020735 A5 JP2004020735 A5 JP 2004020735A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- resist composition
- negative resist
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 6
- 239000002253 acid Substances 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- 125000005843 halogen group Chemical group 0.000 claims 4
- 239000003431 cross linking reagent Substances 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 3
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 claims 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims 2
- 125000002252 acyl group Chemical group 0.000 claims 2
- 150000001555 benzenes Chemical group 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 125000004849 alkoxymethyl group Chemical group 0.000 claims 1
- -1 alkoxymethylated melamine compound Chemical class 0.000 claims 1
- 150000007514 bases Chemical class 0.000 claims 1
- 239000000470 constituent Substances 0.000 claims 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002173071A JP2004020735A (ja) | 2002-06-13 | 2002-06-13 | ネガ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002173071A JP2004020735A (ja) | 2002-06-13 | 2002-06-13 | ネガ型レジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004020735A JP2004020735A (ja) | 2004-01-22 |
| JP2004020735A5 true JP2004020735A5 (enrdf_load_stackoverflow) | 2005-09-29 |
Family
ID=31172467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002173071A Abandoned JP2004020735A (ja) | 2002-06-13 | 2002-06-13 | ネガ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004020735A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4441931B2 (ja) | 2005-05-06 | 2010-03-31 | 村田機械株式会社 | 搬送台車システム |
| JP2015134904A (ja) * | 2013-11-18 | 2015-07-27 | 東洋合成工業株式会社 | 化学種発生向上化合物 |
| KR102482292B1 (ko) * | 2017-03-30 | 2022-12-29 | 제이에스알 가부시끼가이샤 | 감방사선성 조성물 및 레지스트 패턴 형성 방법 |
| US12134690B2 (en) * | 2019-12-31 | 2024-11-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist composition and method of manufacturing a semiconductor device |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4112965A1 (de) * | 1991-04-20 | 1992-10-22 | Hoechst Ag | Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE4125042A1 (de) * | 1991-07-29 | 1993-02-04 | Hoechst Ag | Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| JPH0534921A (ja) * | 1991-07-30 | 1993-02-12 | Mitsubishi Kasei Corp | ネガ型感光性組成物 |
| JPH0784361A (ja) * | 1993-07-21 | 1995-03-31 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
| JP2002049150A (ja) * | 2000-08-03 | 2002-02-15 | Fuji Photo Film Co Ltd | 電子線又はｘ線用ネガ型レジスト組成物 |
| JP2003066609A (ja) * | 2001-08-24 | 2003-03-05 | Mitsubishi Electric Corp | 感光性樹脂組成物およびこれを用いたマイクロデバイスの製造方法 |
| JP2003330191A (ja) * | 2002-05-16 | 2003-11-19 | Fuji Photo Film Co Ltd | ネガ型レジスト組成物 |
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2002
- 2002-06-13 JP JP2002173071A patent/JP2004020735A/ja not_active Abandoned