JP2003526110A - 設計ルールの照合システム及び方法 - Google Patents

設計ルールの照合システム及び方法

Info

Publication number
JP2003526110A
JP2003526110A JP2000512112A JP2000512112A JP2003526110A JP 2003526110 A JP2003526110 A JP 2003526110A JP 2000512112 A JP2000512112 A JP 2000512112A JP 2000512112 A JP2000512112 A JP 2000512112A JP 2003526110 A JP2003526110 A JP 2003526110A
Authority
JP
Japan
Prior art keywords
design
correction
corrected
data
layout
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000512112A
Other languages
English (en)
Japanese (ja)
Inventor
ファン チェン チャン
ヤオ ティン ワン
ヤグエンシュ シー パティ
Original Assignee
ニューメリカル テクノロジーズ インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/931,921 external-priority patent/US5858580A/en
Priority claimed from US09/130,996 external-priority patent/US6757645B2/en
Priority claimed from US09/154,397 external-priority patent/US6453452B1/en
Priority claimed from US09/153,783 external-priority patent/US6470489B1/en
Application filed by ニューメリカル テクノロジーズ インコーポレイテッド filed Critical ニューメリカル テクノロジーズ インコーポレイテッド
Publication of JP2003526110A publication Critical patent/JP2003526110A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/10—Integrated device layouts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000512112A 1997-09-17 1998-09-17 設計ルールの照合システム及び方法 Pending JP2003526110A (ja)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US5930697P 1997-09-17 1997-09-17
US08/931,921 1997-09-17
US08/931,921 US5858580A (en) 1997-09-17 1997-09-17 Phase shifting circuit manufacture method and apparatus
US60/059,306 1997-09-17
US6954997P 1997-12-12 1997-12-12
US60/069,549 1997-12-12
US09/130,996 1998-08-07
US09/130,996 US6757645B2 (en) 1997-09-17 1998-08-07 Visual inspection and verification system
US09/154,397 1998-09-16
US09/154,397 US6453452B1 (en) 1997-12-12 1998-09-16 Method and apparatus for data hierarchy maintenance in a system for mask description
US09/153,783 1998-09-16
US09/153,783 US6470489B1 (en) 1997-09-17 1998-09-16 Design rule checking system and method
PCT/US1998/019510 WO1999014638A1 (en) 1997-09-17 1998-09-17 Design rule checking system and method

Publications (1)

Publication Number Publication Date
JP2003526110A true JP2003526110A (ja) 2003-09-02

Family

ID=27556793

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000512112A Pending JP2003526110A (ja) 1997-09-17 1998-09-17 設計ルールの照合システム及び方法
JP2000512110A Expired - Lifetime JP4624550B2 (ja) 1997-09-17 1998-09-17 マスク記述のためのシステムにおけるデータ階層維持の方法及び装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2000512110A Expired - Lifetime JP4624550B2 (ja) 1997-09-17 1998-09-17 マスク記述のためのシステムにおけるデータ階層維持の方法及び装置

Country Status (5)

Country Link
EP (2) EP1023641A4 (enExample)
JP (2) JP2003526110A (enExample)
KR (2) KR20010024113A (enExample)
AU (3) AU9396198A (enExample)
WO (1) WO1999014638A1 (enExample)

Cited By (4)

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JP2006085175A (ja) * 2004-09-14 2006-03-30 Kla Tencor Technologies Corp レチクル・レイアウト・データを評価するための方法、システム及び搬送媒体
JP2009169680A (ja) * 2008-01-16 2009-07-30 Toshiba Corp データベースの作成方法、データベース装置および設計データの評価方法
JP2010049268A (ja) * 2000-07-10 2010-03-04 Mentor Graphics Corp モデルベース光近接補正用収束技術
JP4755655B2 (ja) * 2005-01-21 2011-08-24 インターナショナル・ビジネス・マシーンズ・コーポレーション 差分交互位相シフト・マスクの最適化

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US6453452B1 (en) 1997-12-12 2002-09-17 Numerical Technologies, Inc. Method and apparatus for data hierarchy maintenance in a system for mask description
US7412676B2 (en) 2000-06-13 2008-08-12 Nicolas B Cobb Integrated OPC verification tool
EP1330742B1 (en) * 2000-06-13 2015-03-25 Mentor Graphics Corporation Integrated verification and manufacturability tool
US6425113B1 (en) 2000-06-13 2002-07-23 Leigh C. Anderson Integrated verification and manufacturability tool
US6978436B2 (en) 2000-07-05 2005-12-20 Synopsys, Inc. Design data format and hierarchy management for phase processing
JP2002122977A (ja) * 2000-10-17 2002-04-26 Sony Corp フォトマスクの作成法、フォトマスク、並びに露光方法
KR100649969B1 (ko) * 2000-12-26 2006-11-27 주식회사 하이닉스반도체 마스크 제작방법
US6395438B1 (en) 2001-01-08 2002-05-28 International Business Machines Corporation Method of etch bias proximity correction
US6505327B2 (en) 2001-04-13 2003-01-07 Numerical Technologies, Inc. Generating an instance-based representation of a design hierarchy
JP3572053B2 (ja) * 2001-05-31 2004-09-29 株式会社東芝 露光マスクの製造方法、マスク基板情報生成方法、半導体装置の製造方法およびサーバー
US6560766B2 (en) 2001-07-26 2003-05-06 Numerical Technologies, Inc. Method and apparatus for analyzing a layout using an instance-based representation
US6721928B2 (en) 2001-07-26 2004-04-13 Numerical Technologies, Inc. Verification utilizing instance-based hierarchy management
US6738958B2 (en) 2001-09-10 2004-05-18 Numerical Technologies, Inc. Modifying a hierarchical representation of a circuit to process composite gates
US6735752B2 (en) 2001-09-10 2004-05-11 Numerical Technologies, Inc. Modifying a hierarchical representation of a circuit to process features created by interactions between cells
US6880135B2 (en) 2001-11-07 2005-04-12 Synopsys, Inc. Method of incorporating lens aberration information into various process flows
US7085698B2 (en) 2001-12-18 2006-08-01 Synopsys, Inc. Method for providing flexible and dynamic reporting capability using simulation tools
US7159197B2 (en) 2001-12-31 2007-01-02 Synopsys, Inc. Shape-based geometry engine to perform smoothing and other layout beautification operations
JP4138318B2 (ja) * 2002-01-08 2008-08-27 株式会社ルネサステクノロジ リソグラフィプロセスマージン評価装置、リソグラフィプロセスマージン評価方法およびリソグラフィプロセスマージン評価プログラム
US7293249B2 (en) 2002-01-31 2007-11-06 Juan Andres Torres Robles Contrast based resolution enhancement for photolithographic processing
US7386433B2 (en) 2002-03-15 2008-06-10 Synopsys, Inc. Using a suggested solution to speed up a process for simulating and correcting an integrated circuit layout
US6944844B2 (en) 2002-04-03 2005-09-13 Synopsys, Inc. System and method to determine impact of line end shortening
US6931613B2 (en) 2002-06-24 2005-08-16 Thomas H. Kauth Hierarchical feature extraction for electrical interaction calculations
US6687895B2 (en) 2002-07-03 2004-02-03 Numerical Technologies Inc. Method and apparatus for reducing optical proximity correction output file size
US7069534B2 (en) 2003-12-17 2006-06-27 Sahouria Emile Y Mask creation with hierarchy management using cover cells
US7861207B2 (en) 2004-02-25 2010-12-28 Mentor Graphics Corporation Fragmentation point and simulation site adjustment for resolution enhancement techniques
US7448012B1 (en) 2004-04-21 2008-11-04 Qi-De Qian Methods and system for improving integrated circuit layout
EP1747520B1 (en) 2004-05-07 2018-10-24 Mentor Graphics Corporation Integrated circuit layout design methodology with process variation bands
US7240305B2 (en) 2004-06-02 2007-07-03 Lippincott George P OPC conflict identification and edge priority system
JP4266189B2 (ja) 2004-07-09 2009-05-20 株式会社東芝 半導体集積回路パターンの検証方法、フォトマスクの作成方法、半導体集積回路装置の製造方法、及び半導体集積回路パターンの検証方法を実現するためのプログラム
US7506285B2 (en) 2006-02-17 2009-03-17 Mohamed Al-Imam Multi-dimensional analysis for predicting RET model accuracy
US7739650B2 (en) 2007-02-09 2010-06-15 Juan Andres Torres Robles Pre-bias optical proximity correction
US8230371B2 (en) 2007-05-23 2012-07-24 Nxp B.V. Process-window aware detection and correction of lithographic printing issues at mask level
US7805699B2 (en) 2007-10-11 2010-09-28 Mentor Graphics Corporation Shape-based photolithographic model calibration
US7975244B2 (en) 2008-01-24 2011-07-05 International Business Machines Corporation Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks
US10008422B2 (en) * 2015-08-17 2018-06-26 Qoniac Gmbh Method for assessing the usability of an exposed and developed semiconductor wafer

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EP0608657A1 (en) * 1993-01-29 1994-08-03 International Business Machines Corporation Apparatus and method for preparing shape data for proximity correction
US5631110A (en) * 1994-07-05 1997-05-20 Nec Corporation Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer
JPH08297692A (ja) * 1994-09-16 1996-11-12 Mitsubishi Electric Corp 光近接補正装置及び方法並びにパタン形成方法
US5682323A (en) * 1995-03-06 1997-10-28 Lsi Logic Corporation System and method for performing optical proximity correction on macrocell libraries
JP3409493B2 (ja) * 1995-03-13 2003-05-26 ソニー株式会社 マスクパターンの補正方法および補正装置
US5553273A (en) * 1995-04-17 1996-09-03 International Business Machines Corporation Vertex minimization in a smart optical proximity correction system
JP2917879B2 (ja) * 1995-10-31 1999-07-12 日本電気株式会社 フォトマスク及びその製造方法
US5705301A (en) * 1996-02-27 1998-01-06 Lsi Logic Corporation Performing optical proximity correction with the aid of design rule checkers
US5801954A (en) * 1996-04-24 1998-09-01 Micron Technology, Inc. Process for designing and checking a mask layout
US5707765A (en) * 1996-05-28 1998-01-13 Microunity Systems Engineering, Inc. Photolithography mask using serifs and method thereof
DE19818440C2 (de) * 1998-04-24 2002-10-24 Pdf Solutions Gmbh Verfahren zur Erzeugung von Daten für die Herstellung einer durch Entwurfsdaten definierten Struktur

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010049268A (ja) * 2000-07-10 2010-03-04 Mentor Graphics Corp モデルベース光近接補正用収束技術
JP2006085175A (ja) * 2004-09-14 2006-03-30 Kla Tencor Technologies Corp レチクル・レイアウト・データを評価するための方法、システム及び搬送媒体
JP4755655B2 (ja) * 2005-01-21 2011-08-24 インターナショナル・ビジネス・マシーンズ・コーポレーション 差分交互位相シフト・マスクの最適化
JP2009169680A (ja) * 2008-01-16 2009-07-30 Toshiba Corp データベースの作成方法、データベース装置および設計データの評価方法
US8195697B2 (en) 2008-01-16 2012-06-05 Kabushiki Kaisha Toshiba Database creation method, database device and design data evaluation method

Also Published As

Publication number Publication date
AU9396198A (en) 1999-04-05
JP4624550B2 (ja) 2011-02-02
JP2003523545A (ja) 2003-08-05
WO1999014638A1 (en) 1999-03-25
EP1023641A4 (en) 2009-04-22
EP1023641A1 (en) 2000-08-02
AU9775198A (en) 1999-04-05
KR20010024113A (ko) 2001-03-26
EP1023639A4 (en) 2009-04-29
AU9396098A (en) 1999-04-05
KR20010024117A (ko) 2001-03-26
EP1023639A1 (en) 2000-08-02

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