JP2003515656A5 - - Google Patents

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JP2003515656A5
JP2003515656A5 JP2001541145A JP2001541145A JP2003515656A5 JP 2003515656 A5 JP2003515656 A5 JP 2003515656A5 JP 2001541145 A JP2001541145 A JP 2001541145A JP 2001541145 A JP2001541145 A JP 2001541145A JP 2003515656 A5 JP2003515656 A5 JP 2003515656A5
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JP
Japan
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JP2001541145A
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JP4070461B2 (ja
JP2003515656A (ja
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Priority claimed from PCT/US2000/031101 external-priority patent/WO2001040404A1/en
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Publication of JP2003515656A5 publication Critical patent/JP2003515656A5/ja
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JP2001541145A 1999-12-03 2000-11-13 重合およびポリマー成長を抑制するための組成物および方法 Expired - Fee Related JP4070461B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US16862399P 1999-12-03 1999-12-03
US60/168,623 1999-12-03
US58034300A 2000-05-25 2000-05-25
US09/580,343 2000-05-25
PCT/US2000/031101 WO2001040404A1 (en) 1999-12-03 2000-11-13 Composition and method for inhibiting polymerization and polymer growth

Publications (3)

Publication Number Publication Date
JP2003515656A JP2003515656A (ja) 2003-05-07
JP2003515656A5 true JP2003515656A5 (OSRAM) 2008-02-07
JP4070461B2 JP4070461B2 (ja) 2008-04-02

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JP2001541145A Expired - Fee Related JP4070461B2 (ja) 1999-12-03 2000-11-13 重合およびポリマー成長を抑制するための組成物および方法

Country Status (15)

Country Link
US (3) US20050113626A1 (OSRAM)
EP (1) EP1235885B1 (OSRAM)
JP (1) JP4070461B2 (OSRAM)
KR (1) KR100763663B1 (OSRAM)
CN (1) CN1230492C (OSRAM)
AR (1) AR026669A1 (OSRAM)
AT (1) ATE370210T1 (OSRAM)
BR (1) BR0016113B1 (OSRAM)
CA (1) CA2392526C (OSRAM)
DE (1) DE60036018T2 (OSRAM)
ES (1) ES2292487T3 (OSRAM)
MX (1) MXPA02005502A (OSRAM)
MY (1) MY144939A (OSRAM)
TW (1) TWI259185B (OSRAM)
WO (1) WO2001040404A1 (OSRAM)

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CN112645789A (zh) * 2020-12-26 2021-04-13 中海油天津化工研究设计院有限公司 一种用于苯乙烯精馏的复配阻聚剂及其制备方法
CN116253633A (zh) * 2021-12-10 2023-06-13 中国石油化工股份有限公司 萘基亚甲基醌类化合物及其制备方法与应用
TW202348786A (zh) 2022-04-01 2023-12-16 美商藝康美國公司 用於蒸氣空間應用之防汙劑組成物
TW202404930A (zh) 2022-04-01 2024-02-01 美商藝康美國公司 在共軛二烯單體之萃取蒸餾期間減少非所要之乳化聚合
TW202348787A (zh) 2022-04-01 2023-12-16 美商藝康美國公司 用於乙烯系單體流之高苛刻度加工的防汙劑組成物

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