JP2003514386A5 - - Google Patents

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Publication number
JP2003514386A5
JP2003514386A5 JP2001537767A JP2001537767A JP2003514386A5 JP 2003514386 A5 JP2003514386 A5 JP 2003514386A5 JP 2001537767 A JP2001537767 A JP 2001537767A JP 2001537767 A JP2001537767 A JP 2001537767A JP 2003514386 A5 JP2003514386 A5 JP 2003514386A5
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JP
Japan
Prior art keywords
magnetic
plasma
magnetic field
processing chamber
processing apparatus
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Application number
JP2001537767A
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English (en)
Japanese (ja)
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JP2003514386A (ja
JP5331283B2 (ja
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Publication date
Priority claimed from US09/439,759 external-priority patent/US6322661B1/en
Application filed filed Critical
Publication of JP2003514386A publication Critical patent/JP2003514386A/ja
Publication of JP2003514386A5 publication Critical patent/JP2003514386A5/ja
Application granted granted Critical
Publication of JP5331283B2 publication Critical patent/JP5331283B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001537767A 1999-11-15 2000-11-14 プラズマの体積を制御する装置 Expired - Fee Related JP5331283B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/439,759 US6322661B1 (en) 1999-11-15 1999-11-15 Method and apparatus for controlling the volume of a plasma
US09/439,759 1999-11-15
PCT/US2000/042158 WO2001037311A2 (en) 1999-11-15 2000-11-14 Method and apparatus for controlling the volume of a plasma

Publications (3)

Publication Number Publication Date
JP2003514386A JP2003514386A (ja) 2003-04-15
JP2003514386A5 true JP2003514386A5 (https=) 2008-10-23
JP5331283B2 JP5331283B2 (ja) 2013-10-30

Family

ID=23746030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001537767A Expired - Fee Related JP5331283B2 (ja) 1999-11-15 2000-11-14 プラズマの体積を制御する装置

Country Status (10)

Country Link
US (1) US6322661B1 (https=)
EP (1) EP1230667B1 (https=)
JP (1) JP5331283B2 (https=)
KR (1) KR100778258B1 (https=)
CN (2) CN1225005C (https=)
AT (1) ATE420455T1 (https=)
AU (1) AU3082201A (https=)
DE (1) DE60041350D1 (https=)
TW (1) TW530523B (https=)
WO (1) WO2001037311A2 (https=)

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US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
JP6382830B2 (ja) 2012-11-30 2018-08-29 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 医療シリンジ、カートリッジ等上でのpecvd堆積の均一性制御
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