JP2003512519A5 - - Google Patents
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- Publication number
- JP2003512519A5 JP2003512519A5 JP2001531122A JP2001531122A JP2003512519A5 JP 2003512519 A5 JP2003512519 A5 JP 2003512519A5 JP 2001531122 A JP2001531122 A JP 2001531122A JP 2001531122 A JP2001531122 A JP 2001531122A JP 2003512519 A5 JP2003512519 A5 JP 2003512519A5
- Authority
- JP
- Japan
- Prior art keywords
- process layer
- autonomously
- control variable
- wafer
- measured thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 description 38
- 238000004886 process control Methods 0.000 description 21
- 238000001514 detection method Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 2
- 230000003287 optical Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/421,803 | 1999-10-20 | ||
US09/421,803 US6706541B1 (en) | 1999-10-20 | 1999-10-20 | Method and apparatus for controlling wafer uniformity using spatially resolved sensors |
PCT/US2000/010364 WO2001029873A1 (fr) | 1999-10-20 | 2000-04-18 | Procede et appareil de controle de l'uniformite d'une tranche au moyen de capteurs a resolution spatiale |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003512519A JP2003512519A (ja) | 2003-04-02 |
JP2003512519A5 true JP2003512519A5 (fr) | 2007-04-19 |
Family
ID=23672101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001531122A Pending JP2003512519A (ja) | 1999-10-20 | 2000-04-18 | 空間的に分解されたセンサを用いてウェハの均一性を制御するための方法および装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6706541B1 (fr) |
EP (1) | EP1222679B1 (fr) |
JP (1) | JP2003512519A (fr) |
KR (1) | KR100687823B1 (fr) |
DE (1) | DE60033166T2 (fr) |
WO (1) | WO2001029873A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7116753B2 (ja) | 2013-12-22 | 2022-08-10 | アプライド マテリアルズ インコーポレイテッド | 堆積用監視システム及びその操作方法 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7067440B1 (en) | 2001-08-24 | 2006-06-27 | Novellus Systems, Inc. | Gap fill for high aspect ratio structures |
US20040016402A1 (en) * | 2002-07-26 | 2004-01-29 | Walther Steven R. | Methods and apparatus for monitoring plasma parameters in plasma doping systems |
US7402257B1 (en) * | 2002-07-30 | 2008-07-22 | Advanced Micro Devices, Inc. | Plasma state monitoring to control etching processes and across-wafer uniformity, and system for performing same |
US6922603B1 (en) * | 2002-09-26 | 2005-07-26 | Lam Research Corporation | System and method for quantifying uniformity patterns for tool development and monitoring |
US7122485B1 (en) | 2002-12-09 | 2006-10-17 | Novellus Systems, Inc. | Deposition profile modification through process chemistry |
US6770852B1 (en) * | 2003-02-27 | 2004-08-03 | Lam Research Corporation | Critical dimension variation compensation across a wafer by means of local wafer temperature control |
US6902646B2 (en) * | 2003-08-14 | 2005-06-07 | Advanced Energy Industries, Inc. | Sensor array for measuring plasma characteristics in plasma processing environments |
US7163896B1 (en) * | 2003-12-10 | 2007-01-16 | Novellus Systems, Inc. | Biased H2 etch process in deposition-etch-deposition gap fill |
US7344996B1 (en) | 2005-06-22 | 2008-03-18 | Novellus Systems, Inc. | Helium-based etch process in deposition-etch-deposition gap fill |
US7476621B1 (en) * | 2003-12-10 | 2009-01-13 | Novellus Systems, Inc. | Halogen-free noble gas assisted H2 plasma etch process in deposition-etch-deposition gap fill |
US7018855B2 (en) * | 2003-12-24 | 2006-03-28 | Lam Research Corporation | Process controls for improved wafer uniformity using integrated or standalone metrology |
US7878145B2 (en) * | 2004-06-02 | 2011-02-01 | Varian Semiconductor Equipment Associates, Inc. | Monitoring plasma ion implantation systems for fault detection and process control |
WO2005123335A1 (fr) * | 2004-06-21 | 2005-12-29 | Ebara Corporation | Appareil et procédé de polissage |
US7217658B1 (en) | 2004-09-07 | 2007-05-15 | Novellus Systems, Inc. | Process modulation to prevent structure erosion during gap fill |
US7176039B1 (en) | 2004-09-21 | 2007-02-13 | Novellus Systems, Inc. | Dynamic modification of gap fill process characteristics |
US7109499B2 (en) * | 2004-11-05 | 2006-09-19 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and methods for two-dimensional ion beam profiling |
US7381451B1 (en) | 2004-11-17 | 2008-06-03 | Novellus Systems, Inc. | Strain engineering—HDP thin film with tensile stress for FEOL and other applications |
US7211525B1 (en) | 2005-03-16 | 2007-05-01 | Novellus Systems, Inc. | Hydrogen treatment enhanced gap fill |
US7482245B1 (en) | 2006-06-20 | 2009-01-27 | Novellus Systems, Inc. | Stress profile modulation in STI gap fill |
CN101511539B (zh) * | 2006-09-12 | 2012-08-22 | 株式会社荏原制作所 | 研磨装置及研磨方法 |
US8133797B2 (en) * | 2008-05-16 | 2012-03-13 | Novellus Systems, Inc. | Protective layer to enable damage free gap fill |
EP2331294A1 (fr) * | 2008-10-01 | 2011-06-15 | Peter Wolters GmbH | Procédé de mesure de l'épaisseur d'une pièce à usiner en forme de disque |
US8537020B2 (en) * | 2008-12-23 | 2013-09-17 | Honeywell International Inc. | Visual indicator of gas sensor impairment |
US20120021136A1 (en) * | 2010-07-20 | 2012-01-26 | Varian Semiconductor Equipment Associates, Inc. | System and method for controlling plasma deposition uniformity |
DE102012101717A1 (de) | 2012-03-01 | 2013-09-05 | Aixtron Se | Verfahren und Vorrichtung zur Regelung der Oberflächentemperatur eines Suszeptors einer Substratbeschichtungseinrichtung |
WO2019067323A1 (fr) * | 2017-09-26 | 2019-04-04 | Lam Research Corporation | Systèmes et procédés de contrôle des doses modulé par impulsions en durée |
CN117637554B (zh) * | 2024-01-24 | 2024-05-17 | 北京北方华创微电子装备有限公司 | 晶圆刻蚀或沉积及模型获取方法、半导体工艺设备 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3004149A1 (de) * | 1980-02-05 | 1981-08-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur reproduzierbaren herstellung metallischer schichten |
JPS60245778A (ja) | 1984-05-21 | 1985-12-05 | Hitachi Ltd | 薄膜形成装置 |
JPS62260078A (ja) * | 1986-05-02 | 1987-11-12 | Hitachi Ltd | 膜厚変動量測定器 |
JP2773294B2 (ja) * | 1989-09-22 | 1998-07-09 | 富士通株式会社 | エッチング方法 |
JPH03281780A (ja) * | 1990-03-30 | 1991-12-12 | Hitachi Ltd | Cvd装置 |
JPH07316811A (ja) | 1994-05-23 | 1995-12-05 | Hitachi Ltd | 多点温度モニタによる温度制御方法及び半導体製造装置 |
JPH08172054A (ja) * | 1994-12-19 | 1996-07-02 | Mitsubishi Electric Corp | プラズマcvd方法、その装置およびそれを用いた半導体装置の製法 |
US5653811A (en) | 1995-07-19 | 1997-08-05 | Chan; Chung | System for the plasma treatment of large area substrates |
US6162488A (en) * | 1996-05-14 | 2000-12-19 | Boston University | Method for closed loop control of chemical vapor deposition process |
US5937142A (en) | 1996-07-11 | 1999-08-10 | Cvc Products, Inc. | Multi-zone illuminator for rapid thermal processing |
US5983906A (en) * | 1997-01-24 | 1999-11-16 | Applied Materials, Inc. | Methods and apparatus for a cleaning process in a high temperature, corrosive, plasma environment |
US6071811A (en) * | 1997-02-26 | 2000-06-06 | Applied Materials, Inc. | Deposition of titanium nitride films having improved uniformity |
US6123766A (en) * | 1997-05-16 | 2000-09-26 | Applied Materials, Inc. | Method and apparatus for achieving temperature uniformity of a substrate |
JPH11222673A (ja) | 1998-01-30 | 1999-08-17 | Hoya Corp | スパッタリング装置 |
-
1999
- 1999-10-20 US US09/421,803 patent/US6706541B1/en not_active Expired - Lifetime
-
2000
- 2000-04-18 JP JP2001531122A patent/JP2003512519A/ja active Pending
- 2000-04-18 DE DE60033166T patent/DE60033166T2/de not_active Expired - Lifetime
- 2000-04-18 WO PCT/US2000/010364 patent/WO2001029873A1/fr active IP Right Grant
- 2000-04-18 KR KR1020027005132A patent/KR100687823B1/ko active IP Right Grant
- 2000-04-18 EP EP00923460A patent/EP1222679B1/fr not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7116753B2 (ja) | 2013-12-22 | 2022-08-10 | アプライド マテリアルズ インコーポレイテッド | 堆積用監視システム及びその操作方法 |
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