JP2003338459A5 - - Google Patents
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- Publication number
- JP2003338459A5 JP2003338459A5 JP2003118859A JP2003118859A JP2003338459A5 JP 2003338459 A5 JP2003338459 A5 JP 2003338459A5 JP 2003118859 A JP2003118859 A JP 2003118859A JP 2003118859 A JP2003118859 A JP 2003118859A JP 2003338459 A5 JP2003338459 A5 JP 2003338459A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/127,505 US6888615B2 (en) | 2002-04-23 | 2002-04-23 | System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position |
| US10/127505 | 2002-04-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003338459A JP2003338459A (ja) | 2003-11-28 |
| JP2003338459A5 true JP2003338459A5 (enExample) | 2006-06-15 |
Family
ID=28790941
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003118859A Pending JP2003338459A (ja) | 2002-04-23 | 2003-04-23 | 照明装置における光の角分布を照明野位置の関数として変化させることによって、リソグラフィ装置における線幅のコントロールを改善するシステムおよび方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6888615B2 (enExample) |
| EP (1) | EP1357430A3 (enExample) |
| JP (1) | JP2003338459A (enExample) |
| KR (1) | KR100733547B1 (enExample) |
| CN (1) | CN1288505C (enExample) |
| SG (1) | SG105575A1 (enExample) |
| TW (1) | TWI278725B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6842223B2 (en) | 2003-04-11 | 2005-01-11 | Nikon Precision Inc. | Enhanced illuminator for use in photolithographic systems |
| US7292315B2 (en) * | 2003-12-19 | 2007-11-06 | Asml Masktools B.V. | Optimized polarization illumination |
| US7206652B2 (en) * | 2004-08-20 | 2007-04-17 | International Business Machines Corporation | Method and system for intelligent automated reticle management |
| CN100353508C (zh) * | 2004-12-08 | 2007-12-05 | 上海华虹Nec电子有限公司 | 一种精确控制铝线宽的方法 |
| US8081295B2 (en) * | 2005-03-15 | 2011-12-20 | Carl Zeiss Smt Gmbh | Projection exposure method and projection exposure system therefor |
| KR100780863B1 (ko) | 2005-06-29 | 2007-11-29 | 삼성전자주식회사 | 노광 장치 및 방법, 그리고 이에 사용되는 마스크 스테이지 |
| US7525645B2 (en) * | 2005-06-29 | 2009-04-28 | Samsung Electronics Co., Ltd. | Exposure apparatus and method, and mask stage therefor |
| US7934172B2 (en) | 2005-08-08 | 2011-04-26 | Micronic Laser Systems Ab | SLM lithography: printing to below K1=.30 without previous OPC processing |
| WO2007018464A2 (en) * | 2005-08-08 | 2007-02-15 | Micronic Laser Systems Ab | Method and apparatus for projection printing |
| US7382438B2 (en) * | 2005-08-23 | 2008-06-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20070109520A1 (en) * | 2005-11-17 | 2007-05-17 | Whitney Theodore R | Modular illuminator for a scanning printer |
| JP5058337B2 (ja) * | 2007-06-21 | 2012-10-24 | エーエスエムエル ネザーランズ ビー．ブイ． | クランプデバイス、リソグラフィ装置およびオブジェクトロード方法 |
| US10761430B2 (en) * | 2018-09-13 | 2020-09-01 | Applied Materials, Inc. | Method to enhance the resolution of maskless lithography while maintaining a high image contrast |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6461716A (en) * | 1987-08-31 | 1989-03-08 | Canon Kk | Illuminator |
| JPH05217855A (ja) * | 1992-02-01 | 1993-08-27 | Nikon Corp | 露光用照明装置 |
| JP3278896B2 (ja) * | 1992-03-31 | 2002-04-30 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
| US5329336A (en) * | 1992-07-06 | 1994-07-12 | Nikon Corporation | Exposure method and apparatus |
| JP2917704B2 (ja) * | 1992-10-01 | 1999-07-12 | 日本電気株式会社 | 露光装置 |
| US5631721A (en) * | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
| US5724122A (en) * | 1995-05-24 | 1998-03-03 | Svg Lithography Systems, Inc. | Illumination system having spatially separate vertical and horizontal image planes for use in photolithography |
| US5896188A (en) * | 1996-11-25 | 1999-04-20 | Svg Lithography Systems, Inc. | Reduction of pattern noise in scanning lithographic system illuminators |
| US6259513B1 (en) * | 1996-11-25 | 2001-07-10 | Svg Lithography Systems, Inc. | Illumination system with spatially controllable partial coherence |
| US6628370B1 (en) * | 1996-11-25 | 2003-09-30 | Mccullough Andrew W. | Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system |
| US6013401A (en) * | 1997-03-31 | 2000-01-11 | Svg Lithography Systems, Inc. | Method of controlling illumination field to reduce line width variation |
| US5966202A (en) * | 1997-03-31 | 1999-10-12 | Svg Lithography Systems, Inc. | Adjustable slit |
| JP3101613B2 (ja) * | 1998-01-30 | 2000-10-23 | キヤノン株式会社 | 照明光学装置及び投影露光装置 |
| DE69931690T2 (de) * | 1998-04-08 | 2007-06-14 | Asml Netherlands B.V. | Lithographischer Apparat |
| US6072852A (en) * | 1998-06-09 | 2000-06-06 | The Regents Of The University Of California | High numerical aperture projection system for extreme ultraviolet projection lithography |
| US6541750B1 (en) * | 1999-03-17 | 2003-04-01 | Rochester Institute Of Technology | Modification of a projection imaging system with a non-circular aperture and a method thereof |
| JP2001319871A (ja) * | 2000-02-29 | 2001-11-16 | Nikon Corp | 露光方法、濃度フィルタの製造方法、及び露光装置 |
| JP4545874B2 (ja) * | 2000-04-03 | 2010-09-15 | キヤノン株式会社 | 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法 |
| JP2002043214A (ja) * | 2000-07-26 | 2002-02-08 | Toshiba Corp | 走査型露光方法 |
| JP4646367B2 (ja) * | 2000-08-25 | 2011-03-09 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体装置 |
| US6573975B2 (en) | 2001-04-04 | 2003-06-03 | Pradeep K. Govil | DUV scanner linewidth control by mask error factor compensation |
| US6784976B2 (en) * | 2002-04-23 | 2004-08-31 | Asml Holding N.V. | System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control |
-
2002
- 2002-04-23 US US10/127,505 patent/US6888615B2/en not_active Expired - Lifetime
-
2003
- 2003-04-17 TW TW092108966A patent/TWI278725B/zh not_active IP Right Cessation
- 2003-04-22 KR KR1020030025335A patent/KR100733547B1/ko not_active Expired - Fee Related
- 2003-04-23 EP EP03008807A patent/EP1357430A3/en not_active Withdrawn
- 2003-04-23 JP JP2003118859A patent/JP2003338459A/ja active Pending
- 2003-04-23 CN CNB031222374A patent/CN1288505C/zh not_active Expired - Fee Related
- 2003-04-23 SG SG200302345A patent/SG105575A1/en unknown