JP2003318546A - Multilayer wiring board, base material for the same and their manufacturing method - Google Patents

Multilayer wiring board, base material for the same and their manufacturing method

Info

Publication number
JP2003318546A
JP2003318546A JP2003029816A JP2003029816A JP2003318546A JP 2003318546 A JP2003318546 A JP 2003318546A JP 2003029816 A JP2003029816 A JP 2003029816A JP 2003029816 A JP2003029816 A JP 2003029816A JP 2003318546 A JP2003318546 A JP 2003318546A
Authority
JP
Japan
Prior art keywords
base material
conductive layer
conductive
wiring board
multilayer wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003029816A
Other languages
Japanese (ja)
Other versions
JP3996521B2 (en
Inventor
Shoji Ito
彰二 伊藤
Reiji Higuchi
令史 樋口
Masahiro Okamoto
誠裕 岡本
Satoru Nakao
知 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003029816A priority Critical patent/JP3996521B2/en
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to CNB038044218A priority patent/CN100562224C/en
Priority to US10/505,094 priority patent/US7312400B2/en
Priority to KR1020047013058A priority patent/KR100975258B1/en
Priority to TW092103697A priority patent/TW200306770A/en
Priority to EP03703355A priority patent/EP1484952A4/en
Priority to PCT/JP2003/001916 priority patent/WO2003071843A1/en
Publication of JP2003318546A publication Critical patent/JP2003318546A/en
Application granted granted Critical
Publication of JP3996521B2 publication Critical patent/JP3996521B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide a base material for a multilayer wiring board by which a thin multilayer wiring board can be obtained without failing connection reliability between a conductive resin composition and a conductive circuit and lowering the flatness of the board. <P>SOLUTION: The diameter of a conductive layer 14b of a through hole 14 is made smaller than those of an insulation layer and an adhesion layer part 14a, and conductive connection between a conductive resin composition 15 and a conductive layer 12 is ensured on the rear surface 12a of the conductive layer 12, and then the conductive layer 14b is also filled with the conductive resin composition 15 in addition to the insulation layer and the adhesion layer part 14a. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、多層配線基板
(多層プリント配線板)、多層配線基板用基材およびそ
の製造方法に関し、特に、フリップチップ実装などの高
密度実装が可能な多層のフレキシブルプリント配線板等
の多層配線基板、多層配線基板用基材およびその製造方
法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer wiring board (multilayer printed wiring board), a base material for a multilayer wiring board, and a method for manufacturing the same, and in particular, a multilayer flexible print capable of high-density mounting such as flip-chip mounting. The present invention relates to a multilayer wiring board such as a wiring board, a base material for a multilayer wiring board, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】高耐熱性、電気絶縁性、高屈曲性を有す
るポリイミドフィルムを絶縁層材料として使用したフレ
キシブルプリント配線板(FPC)は知られている。ま
た、FPCを多層積層し、スルーホールによって層間導
通を得る多層FPCが開発されている。
2. Description of the Related Art A flexible printed wiring board (FPC) using a polyimide film having high heat resistance, electric insulation and high flexibility as an insulating layer material is known. Further, a multilayer FPC in which FPCs are laminated in multiple layers and interlayer conduction is achieved by through holes has been developed.

【0003】スルーホールによる多層FPCでは、層間
接続位置の制約のために、配線設計の自由度が低く、ス
ルーホール上にチップを実装することができないため、
実装密度を高くすることに限界があり、近年のより一層
の高密度実装化の要求に対応できなくなっている。
In a multi-layer FPC using through holes, the degree of freedom in wiring design is low due to the restriction of the interlayer connection position, and the chip cannot be mounted on the through holes.
There is a limit to increase the packaging density, and it has become impossible to meet the recent demand for higher density packaging.

【0004】このことに対処して、層間接続をスルーホ
ールによらずにIVH(Interstitial V
ia Hole)によって行い、ビア・オン・ビアが可
能な樹脂多層プリント配線板、例えば、松下電器産業社
のALIVH(Any Layer Intersti
tial Via Hole)基板や、ポリイミドによ
るFPCをスルーホールを使用せずにビルドアップ方式
で多層に積層するソニーケミカル社のポリイミド複合多
層ビルドアップ集積回路基板(MOSAIC)等が開発
されている。
In order to cope with this, the IVH (Interstitial V
ia Hole) to enable via-on-via resin multilayer printed wiring boards, for example, ALIVH (Any Layer Intersti) from Matsushita Electric Industrial Co., Ltd.
Tial Via Hole) and a polyimide composite multilayer build-up integrated circuit board (MOSAIC) of Sony Chemical Co., in which FPCs made of polyimide are stacked in multiple layers by a build-up method without using through holes, have been developed.

【0005】また、ポリイミドフィルムを絶縁層とし
て、それの片面に銅箔による導電層を貼り付けられてい
る汎用の銅張樹脂基材(積層材)を出発基材として、簡
便な工程によりIVH構造の多層FPCを得る構造と製
法が提案されている(例えば、特許文献1参照)。
In addition, a general-purpose copper-clad resin base material (laminated material) having a polyimide film as an insulating layer and a conductive layer made of copper foil attached to one surface of the insulating film is used as a starting base material, and an IVH structure is formed by a simple process. There is proposed a structure and a manufacturing method for obtaining the multilayer FPC (see, for example, Patent Document 1).

【0006】特許文献1に示されている多層配線基板用
基材では、絶縁層の一方の面に銅箔を設けた銅張樹脂基
材に貫通孔を穴あけした後、導電性樹脂組成物(樹脂系
の導電性ペースト)を銅箔側からスクリーン印刷法等に
よる印刷法によって充填することで、図9に示されてい
るようなIVH部分を形成している。
In the base material for a multilayer wiring board disclosed in Patent Document 1, a through hole is formed in a copper clad resin base material having a copper foil provided on one surface of an insulating layer, and then a conductive resin composition ( An IVH portion as shown in FIG. 9 is formed by filling a resin-based conductive paste) from the copper foil side by a printing method such as a screen printing method.

【0007】なお、図9において、101は絶縁層を、
102は銅箔部を、104は貫通孔を、105は貫通孔
104に充填された導電性樹脂組成物を各々示してい
る。
In FIG. 9, 101 is an insulating layer,
Reference numeral 102 denotes a copper foil portion, 104 denotes a through hole, and 105 denotes a conductive resin composition filled in the through hole 104.

【0008】そして、スクリーン印刷時のマスク(ステ
ンシル)の開口部の口径をIVH径より大きくすること
により、印刷時の位置合わせ精度にある程度の余裕がで
きると共に、銅箔部102上に導電性樹脂組成物105
によってマスク開口部口径相当の大きさのヘッド状部1
05Aが形成される。
When the aperture of the mask (stencil) at the time of screen printing is made larger than the IVH diameter, a certain degree of alignment accuracy can be provided at the time of printing, and a conductive resin is formed on the copper foil portion 102. Composition 105
By the head-shaped portion 1 having a size corresponding to the aperture of the mask
05A is formed.

【0009】このヘッド状部105Aによって貫通孔1
04に充填された導電性樹脂組成物105と銅箔部10
2との接触面積を大きくすることができる。また、ヘッ
ド状部105Aの存在により、貫通孔104に充填され
た導電性樹脂組成物105が貫通孔104より抜け落ち
ることを防止できる。
The through hole 1 is formed by the head-shaped portion 105A.
04 filled with conductive resin composition 105 and copper foil portion 10
The contact area with 2 can be enlarged. In addition, the presence of the head-shaped portion 105A can prevent the conductive resin composition 105 filled in the through hole 104 from falling off from the through hole 104.

【0010】[0010]

【特許文献1】特開2002−353621号公報[Patent Document 1] Japanese Patent Laid-Open No. 2002-353621

【0011】[0011]

【発明が解決しようとする課題】しかしながら、特許文
献1に示されているような多層配線基板用基材では、図
9に示すように導電性樹脂組成物105の銅箔部102
より上の部分、すなわちヘッド状部105Aの厚さのた
め、導電性樹脂組成物105の硬化後に多層化のための
積層接着を行う場合には、銅箔による回路部の厚さに、
導電性樹脂組成物105の銅箔より上部(ヘッド状部1
05A)の厚さを加えた厚さを埋め込むのに十分な接着
層の厚さが必要となり、接着層を厚くしないと、多層配
線基板の表面平滑性の低下を招くことになる。
However, in the base material for a multilayer wiring board as disclosed in Patent Document 1, the copper foil portion 102 of the conductive resin composition 105 as shown in FIG. 9 is used.
Due to the thickness of the upper portion, that is, the head-shaped portion 105A, in the case where the conductive resin composition 105 is cured and then laminated and laminated for multilayering, the thickness of the circuit portion is formed by a copper foil.
Above the copper foil of the conductive resin composition 105 (head-shaped portion 1
The thickness of the adhesive layer is sufficient to fill the thickness including the thickness of 05A), and if the adhesive layer is not thickened, the surface smoothness of the multilayer wiring board will be deteriorated.

【0012】このため、ポリイミドフィルムを絶縁層と
してそれの片面に銅箔による導電層が貼り付けられてい
る汎用の銅張樹脂基材では、絶縁層の厚さが15〜30
μm、銅箔の厚さが5〜20μm程度であることに対し
て、15〜30μm程度の厚さを有する接着層が必要に
なり、接着層の厚肉化に伴う基板の厚膜化を招くことに
なる。
Therefore, in a general-purpose copper-clad resin substrate in which a polyimide film is used as an insulating layer and a conductive layer made of copper foil is attached to one surface of the polyimide film, the insulating layer has a thickness of 15 to 30.
μm, and the thickness of the copper foil is about 5 to 20 μm, an adhesive layer having a thickness of about 15 to 30 μm is required, which leads to thickening of the substrate due to thickening of the adhesive layer. It will be.

【0013】一方で、導電性樹脂組成物と他層の銅箔と
の接触が密接に行われるように、導電性樹脂組成物が硬
化前の柔らかい状態で積層することが考えられている。
On the other hand, it has been considered that the conductive resin composition is laminated in a soft state before curing so that the conductive resin composition and the copper foil of the other layer are brought into close contact with each other.

【0014】しかし、特許文献1に示されている多層配
線基板用基材に、これを適応すると、図10に示されて
いるように、導電性樹脂組成物105の銅箔部102よ
り上の部分(ヘッド状部105A)が、多層積層時の積
層圧Pによって過剰に押しつぶれ、圧潰状態で広がって
しまう。
However, when this is applied to the base material for a multilayer wiring board shown in Patent Document 1, as shown in FIG. 10, the conductive resin composition 105 is provided above the copper foil portion 102. The portion (head-shaped portion 105A) is excessively crushed by the stacking pressure P during multilayer stacking and spreads in a crushed state.

【0015】このため、基板表面上から見たヘッド状部
105Aの大きさを均一化することが困難であるばかり
か、他配線部102’までヘッド状部105Aの導電性
樹脂組成物が広がってしまい、回路の短絡を招く虞れが
ある。
For this reason, it is difficult to make the size of the head-shaped portion 105A uniform when viewed from the surface of the substrate, and the conductive resin composition of the head-shaped portion 105A spreads to the other wiring portion 102 '. This may result in short circuit.

【0016】この発明は、上述の如き課題に鑑みてなさ
れたものであり、導電性樹脂組成物と導電回路部の接触
信頼性を損なうことなく、基板の平滑性を低下させるこ
となく薄い多層配線基板を得ることができ、しかも、高
温に曝すような信頼性試験を行われても、剥離、剥がれ
等の障害を生じることがなく、併せてビアホールに充填
された導電性ペーストと導電回路部の接触面積の増大で
きる多層配線基板用基材およびその製造方法および多層
配線基板を提供することを目的としている。
The present invention has been made in view of the above-mentioned problems, and it does not impair the contact reliability between the conductive resin composition and the conductive circuit portion, and does not reduce the smoothness of the substrate, and thus thin multilayer wiring is provided. The substrate can be obtained, and even if a reliability test such as exposure to high temperature is performed, no problems such as peeling and peeling occur, and the conductive paste filled in the via hole and the conductive circuit section are also prevented. It is an object of the present invention to provide a base material for a multilayer wiring board capable of increasing a contact area, a method for manufacturing the same, and a multilayer wiring board.

【0017】[0017]

【課題を解決するための手段】上述の目的を達成するた
めに、この発明による多層配線基板用基材は、絶縁性基
材の片面に配線パターンをなす導電層を設けられ、前記
絶縁性基材と前記導電層を貫通する貫通孔に層間導通を
得るための導電性樹脂組成物を充填された多層配線基板
用基材であって、前記貫通孔の導電層部分の口径が絶縁
性基材部分の口径より小さく、前記貫通孔の絶縁性基材
部分と導電層部分の全てに導電性樹脂組成物が充填され
ている。
In order to achieve the above object, the base material for a multilayer wiring board according to the present invention is provided with a conductive layer forming a wiring pattern on one surface of an insulating base material. A material for a multilayer wiring board in which a through hole penetrating the material and the conductive layer is filled with a conductive resin composition for obtaining interlayer conduction, and the diameter of the conductive layer portion of the through hole is an insulating base material. The diameter of the portion is smaller than that of the portion, and the conductive resin composition is filled in all of the insulating base material portion and the conductive layer portion of the through hole.

【0018】この多層配線基板用基材によれば、導電層
と導電性樹脂組成物との導通接触を、貫通孔の絶縁性基
材部分と導電層部分との口径差から、導電層裏側で取る
構造になり、導電性樹脂組成物の導電層より上の部分と
導電層との接触面積確保から派生する諸問題から解放さ
れる。
According to this base material for a multilayer wiring board, the conductive contact between the conductive layer and the conductive resin composition is made on the back side of the conductive layer due to the difference in diameter between the insulating base material portion of the through hole and the conductive layer portion. The structure is taken, and it is freed from various problems derived from securing the contact area between the portion of the conductive resin composition above the conductive layer and the conductive layer.

【0019】そして、貫通孔の絶縁性基材部分(ビアホ
ール)に加えて導電層部分にも導電性樹脂組成物が充填
されているから、積層後、多層配線板の内部に空洞がで
きることがなく、高温に曝すような信頼性試験を行われ
ても、剥離、剥がれ等の障害を生じることがない。併せ
て導電層部分の内周面の面積分、ビアホールに充填され
た導電性ペーストと導電層との接触面積が増大する。
Since the conductive resin composition is filled not only in the insulating base material portion (via hole) of the through hole but also in the conductive layer portion, a cavity is not formed inside the multilayer wiring board after the lamination. Even if a reliability test such as exposure to a high temperature is performed, no trouble such as peeling or peeling occurs. At the same time, the contact area between the conductive paste filled in the via hole and the conductive layer is increased by the area of the inner peripheral surface of the conductive layer portion.

【0020】また、上述の目的を達成するために、この
発明による多層配線基板用基材は、絶縁性基材の一方の
面に配線パターンをなす導電層を、他方の面に層間接着
のための接着層を設けられ、前記導電層と前記絶縁性基
材と前記接着層を貫通する貫通孔に層間導通を得るため
の導電性樹脂組成物を充填された多層配線基板用基材で
あって、前記貫通孔の導電層部分の口径が絶縁性基材部
分および接着層部分の口径より小さく、前記貫通孔の絶
縁性基材部分と接着層部分と導電層部分の全てに導電性
樹脂組成物が充填されている。
In order to achieve the above object, the base material for a multilayer wiring board according to the present invention has a conductive layer forming a wiring pattern on one surface of an insulating base material and an interlayer adhesive for the other surface. Which is provided with an adhesive layer and is filled with a conductive resin composition for obtaining interlayer conduction in a through hole penetrating the conductive layer, the insulating substrate and the adhesive layer, , The diameter of the conductive layer portion of the through hole is smaller than the diameters of the insulating base material portion and the adhesive layer portion, and the conductive resin composition for all of the insulating base material portion, the adhesive layer portion and the conductive layer portion of the through hole Is filled.

【0021】この多層配線基板用基材によれば、導電層
と導電性樹脂組成物との導通接触を、貫通孔の絶縁性基
材部分および接着層部分と導電層部分との口径差から、
導電層裏側で取る構造になり、導電性樹脂組成物の導電
層より上の部分と導電層との接触面積確保から派生する
諸問題から解放される。
According to this base material for a multilayer wiring board, the conductive contact between the conductive layer and the conductive resin composition can be obtained from the difference in the diameter between the insulating base material portion of the through hole and the adhesive layer portion and the conductive layer portion.
The structure is taken on the back side of the conductive layer, and is free from various problems derived from securing the contact area between the conductive resin composition and the portion above the conductive layer.

【0022】そして、貫通孔の絶縁性基材部分および接
着層部分(ビアホール)に加えて導電層部分にも導電性
樹脂組成物が充填されているから、積層後、多層配線板
の内部に空洞ができることがなく、高温に曝すような信
頼性試験を行われても、剥離、剥がれ等の障害を生じる
ことがない。併せて導電層部分の内周面の面積分、ビア
ホールに充填された導電性ペーストと導電層との接触面
積が増大する。
Since the conductive resin composition is filled not only in the insulating base material portion and the adhesive layer portion (via hole) of the through hole but also in the conductive layer portion, after the lamination, a cavity is formed inside the multilayer wiring board. Even if a reliability test such as exposure to a high temperature is performed, problems such as peeling and peeling do not occur. At the same time, the contact area between the conductive paste filled in the via hole and the conductive layer is increased by the area of the inner peripheral surface of the conductive layer portion.

【0023】この発明による多層配線基板用基材では、
絶縁性基材をポリイミド等の可撓性樹脂フィルムにより
構成し、可撓性樹脂フィルムの一方の面に銅箔による導
電層を貼り付けられている汎用の銅張樹脂基材を出発基
材とすることができる。また、接着層は、熱可塑性ポリ
イミドあるいは熱可塑性ポリイミドに熱硬化機能を付与
したものにより構成することができる。
In the base material for a multilayer wiring board according to the present invention,
The insulating base material is made of a flexible resin film such as polyimide, and a general-purpose copper-clad resin base material having a conductive layer made of copper foil attached to one surface of the flexible resin film is used as a starting base material. can do. The adhesive layer may be made of thermoplastic polyimide or a thermoplastic polyimide having a thermosetting function.

【0024】また、貫通孔に充填された導電性樹脂組成
物を層間接着面側に突出させ、導電性樹脂組成物による
突起部を形成することが好ましい。この突起部は、隣接
層の導電層に圧着あるいは突き刺さり、層間の電気接続
抵抗を低下する効果を奏する。
Further, it is preferable that the conductive resin composition filled in the through-holes is projected toward the interlayer adhesion surface side to form a projection of the conductive resin composition. The protrusion has the effect of lowering the electrical connection resistance between the layers by pressing or piercing the conductive layer of the adjacent layer.

【0025】この発明による多層配線基板用基材は、上
述の発明による多層配線基板用基材を少なくとも1枚、
含んでいるものである。
A substrate for a multilayer wiring board according to the present invention comprises at least one substrate for a multilayer wiring board according to the above-mentioned invention,
It is one that includes.

【0026】また、上述の目的を達成するために、この
発明による多層配線基板用基材の製造方法は、絶縁性基
材の片面に配線パターンをなす導電層を設けられた積層
材に、導電層部分の口径が絶縁性基材部分の口径より小
さい貫通孔を穿孔する穿孔工程と、導電性樹脂組成物を
前記貫通孔の絶縁性基材部分と導電層部分の全てに充填
する充填工程とを有する。
In order to achieve the above-mentioned object, in the method for manufacturing a base material for a multilayer wiring board according to the present invention, a laminated material having a conductive layer forming a wiring pattern on one surface of an insulating base material is electrically conductive. A piercing step of piercing a through hole having a layer portion having a diameter smaller than that of the insulating base material portion, and a filling step of filling the conductive resin composition into all of the insulating base material portion and the conductive layer portion of the through hole. Have.

【0027】また、上述の目的を達成するために、この
発明による多層配線基板用基材の製造方法は、絶縁性基
材の一方の面に配線パターンをなす導電層を、他方の面
に層間接着のための接着層を設けられた積層材に、導電
層部分の口径が絶縁性基材部分および接着層部分の口径
より小さい貫通孔を穿孔する穿孔工程と、導電性樹脂組
成物を前記貫通孔の絶縁性基材部分と接着層部分と導電
層部分の全てに充填する充填工程とを有する。
In order to achieve the above-mentioned object, the method for manufacturing a base material for a multilayer wiring board according to the present invention comprises a conductive layer forming a wiring pattern on one surface of an insulating base material and an interlayer on the other surface. In a laminated material provided with an adhesive layer for adhesion, a perforation step of perforating a through hole in which the diameter of the conductive layer portion is smaller than the diameters of the insulating base material portion and the adhesive layer portion, and the conductive resin composition is penetrated. And a filling step of filling all of the insulating base material portion, the adhesive layer portion, and the conductive layer portion of the hole.

【0028】この発明による多層配線基板用基材の製造
方法における好ましい穿孔工程として、レーザビーム照
射によって導電層部分以外の樹脂部分に口径が大きい穴
あけを行い、当該穴あけ完了後に導電層部分に口径が小
さい穴あけを行って貫通孔を穿設する工程か、あるい
は、ビーム径方向にレーザ強度分布を有するレーザビー
ム照射を導電層とは反対側の面に対し行い、導電層部分
以外の樹脂部分に口径が大きい穴あけを、導電層部分に
口径が小さい穴あけを一括して行なって貫通孔を穿設す
る工程の何れかを選択できる。
As a preferable perforating step in the method for manufacturing a base material for a multilayer wiring board according to the present invention, a resin portion other than the conductive layer portion is perforated by laser beam irradiation, and after the perforation is completed, the conductive layer portion is perforated. Either in the process of making a small hole to form a through hole, or by irradiating the surface opposite to the conductive layer with a laser beam having a laser intensity distribution in the beam diameter direction, and calibrating the resin part other than the conductive layer. It is possible to select any one of the steps of forming holes having a large diameter in the conductive layer portion at one time to form the through holes.

【0029】また、この発明による多層配線基板用基材
の製造方法では、レーザ穿孔により生成されるスミアを
除去するために、レーザビーム照射による穿孔工程後
に、デスミア工程を有することが好ましい。
Further, in the method for manufacturing a base material for a multilayer wiring board according to the present invention, it is preferable to have a desmear step after the perforation step by laser beam irradiation in order to remove smear generated by laser perforation.

【0030】この発明による多層配線基板用基材の製造
方法における充填工程は、導電性樹脂組成物を前記導電
層とは反対側よりスクイジングによって前記貫通孔に穴
埋め充填する工程とすることができる。
The filling step in the method for producing a substrate for a multilayer wiring board according to the present invention may be a step of filling the through hole with a conductive resin composition from the side opposite to the conductive layer by squeezing.

【0031】[0031]

【発明の実施の形態】以下に添付の図を参照してこの発
明の実施形態を説明する。図1、図2はこの発明による
一実施形態に係わる多層配線基板用基材の基本構成を示
している。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. 1 and 2 show the basic structure of a base material for a multilayer wiring board according to an embodiment of the present invention.

【0032】図1に示されている多層配線基板用基材
は、絶縁性基材をなす絶縁樹脂層11の一方の面に配線
パターンをなす銅箔等による導電層12を、他方の面に
層間接着のための接着層13を各々設けられ、接着層1
3と絶縁樹脂層11と導電層12とを貫通する貫通孔1
4を穿設されている。貫通孔14には導電性樹脂組成物
15が充填され、IVH(バイアホール)を形成してい
る。
The base material for a multilayer wiring board shown in FIG. 1 has a conductive layer 12 made of copper foil or the like forming a wiring pattern on one surface of an insulating resin layer 11 forming an insulating base material and the other surface on the other surface. Adhesive layers 13 for inter-layer adhesion are provided respectively, and the adhesive layers 1
Through hole 1 penetrating through 3, insulating resin layer 11 and conductive layer 12
4 are drilled. The through hole 14 is filled with the conductive resin composition 15 to form an IVH (via hole).

【0033】FPCでは、絶縁樹脂層11は、全芳香族
ポリイミド(API)等によるポリイミドフィルムやポ
リエステルフィルム等の可撓性を有する樹脂フィルムで
構成されている。絶縁樹脂層11と導電層12と接着層
13との3層構造は、汎用の片面銅箔付きポリイミド基
材のポリイミド部(絶縁樹脂層11)の銅箔(導電層1
2)とは反対側の面に接着層13としてポリイミド系接
着材を貼付したもので構成できる。
In the FPC, the insulating resin layer 11 is made of a flexible resin film such as a polyimide film made of wholly aromatic polyimide (API) or a polyester film. The three-layer structure of the insulating resin layer 11, the conductive layer 12, and the adhesive layer 13 has a copper foil (conductive layer 1) of a polyimide part (insulating resin layer 11) of a general-purpose polyimide base material with a single-sided copper foil.
The adhesive layer 13 may be formed by adhering a polyimide adhesive on the surface opposite to that of 2).

【0034】多層配線基板用基材に形成された貫通孔1
4のうち、接着層13と絶縁樹脂層11を貫通する部分
(バイアホール)14aの口径は通常のバイアホール径
とされ、導電層12を貫通する部分(小孔)14bの口
径は接着層13および絶縁樹脂層11を貫通する部分1
4aの口径より小径になっている。
Through hole 1 formed in the base material for a multilayer wiring board
4, the diameter of a portion (via hole) 14a penetrating the adhesive layer 13 and the insulating resin layer 11 is a normal via hole diameter, and the diameter of a portion (small hole) 14b penetrating the conductive layer 12 is an adhesive layer 13 And a portion 1 penetrating the insulating resin layer 11
The diameter is smaller than the diameter of 4a.

【0035】接着層13は、接着剤の塗布以外に、熱可
塑性ポリイミド、あるいは熱可塑性ポリイミドに熱硬化
機能を付与したフィルムの貼り付けにより形成すること
ができる。熱可塑性ポリイミドの場合、基板の耐熱性を
考慮し、ガラス転移点の高いものを使用するのが好まし
い。
The adhesive layer 13 can be formed by applying a thermoplastic polyimide or a film obtained by adding a thermosetting function to a thermoplastic polyimide, in addition to applying the adhesive. In the case of thermoplastic polyimide, it is preferable to use one having a high glass transition point in consideration of the heat resistance of the substrate.

【0036】なお、絶縁樹脂層11は、ポリイミドフィ
ルム以外に、エポキシ系、イミド系のプリプレグなどを
絶縁材として利用することも可能であり、その場合に
は、絶縁樹脂層11が接着材としても機能するため、接
着層13を別途形成する必要が省かれる。
In addition to the polyimide film, the insulating resin layer 11 may be made of epoxy-based or imide-based prepreg as an insulating material. In that case, the insulating resin layer 11 may be used as an adhesive material. Since it functions, it is not necessary to separately form the adhesive layer 13.

【0037】導電性樹脂組成物15は、導電機能を有す
る金属粉末を樹脂バインダに混入し、溶剤を含む粘性媒
体に混ぜてペースト状にした導電性ペーストを、絶縁樹
脂層11の側よりスクイジング等によって貫通孔14に
満遍なく穴埋め充填したものである。すなわち、貫通孔
14の接着層−絶縁樹脂層部分14aと導電層部分14
bの全てに導電性樹脂組成物15が満遍なく充填されて
いる。
The conductive resin composition 15 is prepared by mixing a metal powder having a conductive function into a resin binder and mixing it with a viscous medium containing a solvent to form a conductive paste from the insulating resin layer 11 side by squeezing or the like. The through holes 14 are evenly filled and filled with. That is, the adhesive layer-insulating resin layer portion 14 a and the conductive layer portion 14 of the through hole 14
The conductive resin composition 15 is evenly filled in all of b.

【0038】導電性樹脂組成物15は、導電層12の裏
面12aで導通を取るものであり、導電層12の上表面
との接触で導通を取るものではないので、導電層12の
上方に突出した拡張部分を必要としない。
Since the conductive resin composition 15 conducts electricity on the back surface 12a of the conductive layer 12 and does not conduct electricity on contact with the upper surface of the conductive layer 12, it projects above the conductive layer 12. No need for extended extensions.

【0039】導電層12、すなわち、銅箔部には、樹脂
部(絶縁樹脂層11+接着層13)よりも小さい孔14
bを穿設しているが、これは、図11に示されているよ
うに、銅箔部102と樹脂部(絶縁層101)の孔径を
同じにした場合には、銅箔部102と絶縁層101との
接触部分が銅箔部102の孔壁面部102Aのみとな
り、銅箔部102と導電性樹脂組成物105との導通接
続に関して信頼性に乏しくなるからである。
The conductive layer 12, that is, the copper foil portion, has a hole 14 smaller than the resin portion (insulating resin layer 11 + adhesive layer 13).
Although b is provided, when the copper foil portion 102 and the resin portion (insulating layer 101) have the same hole diameter as shown in FIG. 11, the copper foil portion 102 is insulated from the copper foil portion 102. This is because the contact portion with the layer 101 is only the hole wall surface portion 102A of the copper foil portion 102, and the reliability of the conductive connection between the copper foil portion 102 and the conductive resin composition 105 becomes poor.

【0040】また、図12に示されているように、銅箔
部102に孔を穿設しないで、樹脂部絶縁層101のみ
に孔を穿った場合には、スクイジング等による導電性ペ
ーストの穴埋め充填時にIVHの空気抜きが充分に行わ
れず、IVHに気泡hが残存し、銅箔部102と導電性
樹脂組成物105との接触面積が不安定になるからであ
る。
Further, as shown in FIG. 12, when holes are not formed in the copper foil part 102 but only the resin part insulating layer 101 is formed, the conductive paste is filled with holes by squeezing or the like. This is because the IVH is not sufficiently deaerated during filling, bubbles h remain in the IVH, and the contact area between the copper foil portion 102 and the conductive resin composition 105 becomes unstable.

【0041】導電層12に設けられる小さい孔14b
は、エアーブリード孔として機能し、導電性ペーストの
穴埋め充填時に、気泡はこの小さい孔14bから確実に
排出され、導電層12と導電性樹脂組成物15との接触
面積を的確に確保できる。
Small holes 14b provided in the conductive layer 12
Functions as an air bleed hole, and when filling the filling with the conductive paste, the air bubbles are surely discharged from the small holes 14b, and the contact area between the conductive layer 12 and the conductive resin composition 15 can be accurately secured.

【0042】図2に示されている多層配線基板用基材
は、絶縁性基材をなす絶縁樹脂層21自体が層間接着の
ための接着性を有している。この基材は、絶縁樹脂層2
1の一方の面に配線パターンをなす銅箔等による導電層
22を設けられ、絶縁樹脂層21と導電層22とを貫通
する貫通孔24を穿設されている。貫通孔24には導電
性樹脂組成物25が充填され、IVH(バイアホール)
を形成している。
In the base material for a multilayer wiring board shown in FIG. 2, the insulating resin layer 21 itself, which is an insulating base material, has adhesiveness for interlayer adhesion. This base material is the insulating resin layer 2
A conductive layer 22 made of copper foil or the like forming a wiring pattern is provided on one surface of No. 1 and a through hole 24 penetrating the insulating resin layer 21 and the conductive layer 22 is formed. The through hole 24 is filled with a conductive resin composition 25, and IVH (via hole) is formed.
Is formed.

【0043】FPCでは、接着性を有する絶縁樹脂層2
1は、熱可塑性ポリイミド(TPI)あるいは熱可塑性
ポリイミドに熱硬化機能を付与したもので構成される。
熱可塑性ポリイミドの場合、基板の耐熱性を考慮し、ガ
ラス転移点の高いものを使用するのが好ましい。
In the FPC, the insulating resin layer 2 having adhesiveness
1 is composed of a thermoplastic polyimide (TPI) or a thermoplastic polyimide having a thermosetting function.
In the case of thermoplastic polyimide, it is preferable to use one having a high glass transition point in consideration of the heat resistance of the substrate.

【0044】貫通孔24のうち、絶縁樹脂層21を貫通
する部分(バイアホール)24aの口径は通常のバイア
ホール径とされ、導電層22を貫通する部分(小孔)2
4bの口径は絶縁樹脂層21を貫通する部分24aの口
径より小径になっている。
Of the through holes 24, the diameter of a portion (via hole) 24a penetrating the insulating resin layer 21 is a normal via hole diameter, and a portion (small hole) 2 penetrating the conductive layer 22.
The diameter of 4b is smaller than the diameter of the portion 24a penetrating the insulating resin layer 21.

【0045】導電性樹脂組成物25は、導電機能を有す
る金属粉末を樹脂バインダに混入し、溶剤を含む粘性媒
体に混ぜてペースト状にした導電性ペーストを、絶縁樹
脂層21の側よりスクイジング等によって貫通孔24に
満遍なく穴埋め充填したものである。すなわち、貫通孔
24の絶縁樹脂層部分24aと導電層部分24bの全て
に導電性樹脂組成物25が満遍なく充填されている。
The conductive resin composition 25 is prepared by mixing a metal powder having a conductive function into a resin binder and mixing it with a viscous medium containing a solvent to form a conductive paste from the insulating resin layer 21 side by squeezing or the like. The through holes 24 are evenly filled and filled. That is, the conductive resin composition 25 is evenly filled in all of the insulating resin layer portion 24a and the conductive layer portion 24b of the through hole 24.

【0046】導電性樹脂組成物25は、導電層22の裏
面22aで導通を取るものであり、導電層22の上表面
との接触で導通を取るものではないので、導電層22の
上方に突出した拡張部分を必要としない。
Since the conductive resin composition 25 conducts electricity on the back surface 22a of the conductive layer 22 and does not conduct electricity on contact with the upper surface of the conductive layer 22, it projects above the conductive layer 22. No need for extended extensions.

【0047】導電層22に設けられる小さい孔24b
は、エアーブリード孔として機能し、の穴埋め充填時に
気泡はこの小さい孔24bから確実に排出され、導電層
22と導電性樹脂組成物25との接触面積を的確に確保
できる。
Small holes 24b provided in the conductive layer 22
Functions as an air bleed hole, and the bubbles are surely discharged from the small holes 24b during filling and filling, and the contact area between the conductive layer 22 and the conductive resin composition 25 can be accurately secured.

【0048】図1、図2に示されている何れの多層配線
基板用基材においても、大きい孔14a、24aと小さ
い孔14b、24bとによる貫通孔14、24は、レー
ザビーム照射によるレーザ穴あけ加工により形成するこ
とができる。この他、エッチング、レーザビーム照射と
エッチングとの組み合わせによっても、大きい孔14
a、24aと小さい孔14b、24bとによる貫通孔1
4、24を加工することができる。
In both of the base materials for multilayer wiring boards shown in FIGS. 1 and 2, the through holes 14 and 24 formed by the large holes 14a and 24a and the small holes 14b and 24b are laser drilled by laser beam irradiation. It can be formed by processing. In addition, a large hole 14 can be formed by a combination of etching, laser beam irradiation and etching.
a, 24a and small hole 14b, 24b through hole 1
4, 24 can be processed.

【0049】レーザ穴あけ加工の場合、まず、レーザビ
ーム照射によって絶縁樹脂層11と接着層13とに大き
い孔14a、あるいは絶縁樹脂層21に大きい孔24a
を穿設したのち、再びレーザビーム照射によって導電層
12あるいは22に小さい孔14bあるいは24bを穿
設し、その後、導電性樹脂組成物(導電性ペースト)1
5、25を貫通孔14、24に穴埋め充填する方法をと
ってもよいが、通常、レーザビーム強度(レーザ強度)
は、ビーム径方向に見て、ビーム中央が高く(強く)、
周りは低く(弱く)なっているために、これを利用し
て、導電層12、22に形成する中心部の小さい孔14
b、24bと、樹脂部の大きい孔14a、24aとを一
度に穿設することができる。これにより、より短時間
で、効率よく上記構造のバイアホールを得ることができ
る。
In the case of laser drilling, first, a large hole 14a is formed in the insulating resin layer 11 and the adhesive layer 13 or a large hole 24a is formed in the insulating resin layer 21 by laser beam irradiation.
After piercing, a small hole 14b or 24b is bored in the conductive layer 12 or 22 again by laser beam irradiation, and then the conductive resin composition (conductive paste) 1
Although the method of filling 5 and 25 in the through holes 14 and 24 may be used, the laser beam intensity (laser intensity) is usually used.
Is higher (stronger) in the center of the beam when viewed in the beam radial direction,
Since the circumference is low (weak), this is used to form the small hole 14 in the central portion formed in the conductive layers 12 and 22.
b and 24b and the holes 14a and 24a having a large resin portion can be formed at one time. This makes it possible to efficiently obtain the via hole having the above structure in a shorter time.

【0050】さらに、ビーム強度の被加工面内分布が、
図8(a)、(b)に示されているように、レーザ被加
工面内の中心付近が強く、周辺部が弱い2段階になって
いるレーザビームによって穴あけすることで、より確実
に上記構造のIVHを形成することができる。このよう
な2段階レーザ強度のレーザビームは、レーザビームの
絞り込み以前に、ビーム透過率が、中心部で高く、周辺
部で低いフィルタにレーザビームを通すことで得ること
ができる。
Further, the in-plane distribution of the beam intensity is
As shown in FIGS. 8 (a) and 8 (b), it is possible to more reliably perform the above-mentioned drilling by using a two-step laser beam in which the vicinity of the center of the laser-processed surface is strong and the peripheral part is weak. A structural IVH can be formed. A laser beam having such a two-step laser intensity can be obtained by passing the laser beam through a filter having a high beam transmittance in the central portion and a low beam transmittance in the peripheral portion before narrowing down the laser beam.

【0051】図3はこの発明による多層配線基板の一つ
の実施形態を示している。この多層配線基板は、図1に
示されている多層配線基板用基材を、1層目の基板10
Aと2層目の基材10Bとして、2枚重ね合わせ、1層
目の基材10Aの接着層13によって1層目の基材10
Aと2層目の基材10Bとを互いに接着接合してなる。
2層目の基材10Bの接着層13上には表面部の配線パ
ターンをなす銅箔による導電層16が形成されている。
FIG. 3 shows one embodiment of the multilayer wiring board according to the present invention. This multilayer wiring board uses the base material for a multilayer wiring board shown in FIG.
As the base material 10B for the second layer A and the base material 10B for the second layer, the base material 10 for the first layer is laminated by the adhesive layer 13 of the base material 10A for the first layer.
A and the second-layer base material 10B are adhesively bonded to each other.
On the adhesive layer 13 of the second layer base material 10B, a conductive layer 16 made of copper foil forming a wiring pattern on the surface is formed.

【0052】導電性樹脂組成物15を充填された各貫通
孔14はIVHをなし、導電性樹脂組成物15によって
各層の導電層15、あるいは導電層15と16の層間導
通が行われる。
The through holes 14 filled with the conductive resin composition 15 form IVH, and the conductive resin composition 15 allows the conductive layer 15 of each layer or the conductive layers 15 and 16 to be electrically connected to each other.

【0053】導電性樹脂組成物15は、貫通孔14の接
着層−絶縁樹脂層部分14aに加えて、導電層部分14
bにも充填されているから、この多層配線基板におい
て、内部に空洞ができることがなく、高温に曝すような
信頼性試験を行われても、剥離、剥がれ等の障害を生じ
ることがない。
In addition to the adhesive layer-insulating resin layer portion 14a of the through hole 14, the conductive resin composition 15 is added to the conductive layer portion 14
Since it is also filled in b, no void is formed inside the multilayer wiring board, and even if a reliability test such as exposure to a high temperature is performed, no problems such as peeling and peeling occur.

【0054】また、導電層部分14bにも導電性樹脂組
成物15が充填されているから、導電層部分の内周面の
面積分、ビアホールに充填された導電性樹脂組成物15
と導電層15との接触面積が増大する効果も得られる。
Since the conductive layer portion 14b is also filled with the conductive resin composition 15, the conductive resin composition 15 filled in the via hole by the area of the inner peripheral surface of the conductive layer portion.
The effect of increasing the contact area between the conductive layer 15 and the conductive layer 15 is also obtained.

【0055】また、導電層部分14bにも導電性樹脂組
成物15が充填されていることにより、投錨的効果が得
られる。これにより、絶縁樹脂層11、接着層13、導
電性樹脂組成物15の熱膨張係数の違いからくる熱応力
によって導電性樹脂組成物15が絶縁樹脂層11や接着
層13より剥離し難くなり、耐久性、信頼性が向上す
る。
Since the conductive layer portion 14b is also filled with the conductive resin composition 15, an anchoring effect can be obtained. Thereby, the conductive resin composition 15 is less likely to be peeled from the insulating resin layer 11 and the adhesive layer 13 due to the thermal stress caused by the difference in the thermal expansion coefficient of the insulating resin layer 11, the adhesive layer 13, and the conductive resin composition 15. Durability and reliability are improved.

【0056】なお、図2に示されている多層配線基板用
基材を、複数枚、重ねて互いに接着接合することによっ
ても、同様の機能を備えた多層配線基板を得ることがで
きる。
A multilayer wiring board having the same function can be obtained by stacking a plurality of base materials for a multilayer wiring board shown in FIG. 2 and adhering them to each other.

【0057】また、図4、図5に示されているように、
貫通孔14、24に充填された導電性樹脂組成物15、
25を層間接着面側に突出させ、導電性樹脂組成物1
5、25による突起部15A、25Aを形成することが
好ましい。
Further, as shown in FIGS. 4 and 5,
The conductive resin composition 15 filled in the through holes 14 and 24,
25 is projected to the side of the interlayer adhesion surface to form the conductive resin composition 1
It is preferable to form the protrusions 15A and 25A by 5 and 25.

【0058】この突起部15A、25Aは、隣接層の導
電層に圧着あるいは突き刺さり、層間の電気接続抵抗を
低下する。
The protrusions 15A and 25A are pressed or pierced into the adjacent conductive layers to reduce the electrical connection resistance between the layers.

【0059】つぎに、図1に示されている多層配線基板
用基材、およびその多層配線基板用基材による多層配線
基板の製造方法の一実施形態を図6、図7を参照して説
明する。
Next, one embodiment of the multilayer wiring board base material shown in FIG. 1 and a method of manufacturing a multilayer wiring board using the multilayer wiring board base material will be described with reference to FIGS. 6 and 7. To do.

【0060】図6(a)に示されているように、絶縁樹
脂層(ポリイミドフィルム)11の片面に配線パターン
をなす銅箔による導電層12を設けられた片面銅張積層
材(CCL)を出発材とし、図6(b)に示されている
ように、絶縁樹脂層11側に、可塑性ポリイミドあるい
は熱可塑性ポリイミドに熱硬化機能を付与したフィルム
を貼り付けて接着層13を形成する。
As shown in FIG. 6A, a single-sided copper-clad laminate (CCL) having a conductive layer 12 made of copper foil forming a wiring pattern on one surface of an insulating resin layer (polyimide film) 11 is formed. As a starting material, as shown in FIG. 6B, an adhesive layer 13 is formed on the insulating resin layer 11 side by adhering a film obtained by applying a thermosetting function to plastic polyimide or thermoplastic polyimide.

【0061】つぎに、図6(c)に示されているよう
に、導電層12にエッチング等を行って導電層12によ
る配線パターン(回路パターン)を形成する。
Next, as shown in FIG. 6C, the conductive layer 12 is etched to form a wiring pattern (circuit pattern) by the conductive layer 12.

【0062】つぎに、図6(d)に示されているよう
に、接着層13上にPETマスキングテープ17を貼り
付け、レーザ穴あけ加工等により、図6(e)に示され
ているように、PETマスキングテープ17、接着層1
3、絶縁樹脂層11、導電層12を貫通する貫通孔14
を穿設する。
Next, as shown in FIG. 6 (d), a PET masking tape 17 is attached on the adhesive layer 13 and laser drilling is performed to obtain a pattern as shown in FIG. 6 (e). , PET masking tape 17, adhesive layer 1
3, through hole 14 penetrating insulating resin layer 11 and conductive layer 12
To drill.

【0063】この貫通孔14は、PETマスキングテー
プ17、接着層13、絶縁樹脂層11を貫通する部分1
4aの口径を通常のバイアホール径、例えば、100μ
mとすると、導電層12を貫通する部分14bの口径
は、バイアホール径より小径の30〜50μm程度にな
っている。
The through hole 14 is a portion 1 penetrating the PET masking tape 17, the adhesive layer 13, and the insulating resin layer 11.
The diameter of 4a is the usual via hole diameter, for example, 100μ.
m, the diameter of the portion 14b penetrating the conductive layer 12 is about 30 to 50 μm, which is smaller than the via hole diameter.

【0064】貫通孔14の穿孔が完了すれば、貫通孔1
4内に残存している穿孔による樹脂や銅箔の酸化物等に
よるスミア18を除去するデスミアを行う。デスミア
は、プラズマによるソウトエッチングや、過マンガン塩
素系のデスミア液によるウエットデスミアにより行うこ
とができる。
When the through hole 14 is completed, the through hole 1
Desmear is carried out to remove the smear 18 due to the resin or the oxide of the copper foil, etc., which is caused by the perforations remaining inside 4. The desmear can be performed by soot etching using plasma or wet desmear using a permanganese chlorine-based desmear solution.

【0065】図6(f)に示されているように、デスミ
アが完了すれば、図6(g)に示されているように、ス
クリーン印刷で使用するようなスクイジプレート(スキ
ージプレート)50を使用してPETマスキングテープ
17の面側から導電性樹脂組成物(導電ペースト)15
をスクイジングによって貫通孔14に穴埋め充填する。
When desmearing is completed, as shown in FIG. 6 (f), a squeegee plate (squeegee plate) 50 as used in screen printing is shown in FIG. 6 (g). From the surface side of the PET masking tape 17 to the conductive resin composition (conductive paste) 15
Are squeezed to fill the through holes 14 with holes.

【0066】図6(h)は、導電性樹脂組成物15の穴
埋め充填完了状態を示している。この導電性樹脂組成物
の穴埋め充填は、貫通孔14の接着層−絶縁樹脂層部分
14aに加えて導電層部分14bにも隙間なく充分に行
う。
FIG. 6 (h) shows a state where the filling of the conductive resin composition 15 is completed. This filling of the conductive resin composition is sufficiently performed without gaps in the conductive layer portion 14b in addition to the adhesive layer-insulating resin layer portion 14a of the through hole 14.

【0067】導電性樹脂組成物15は、後の工程におけ
る加熱に対する酸化を避けるため、銀ペーストを使用し
た。この時、粘度を300dPa・sのものを使用した
ところ、銅箔部(導電層12)の小孔14bから導電ペ
ーストが抜け落ちることなく的確に穴埋め充填すること
ができた。なお、導電性樹脂組成物15としては、銀ペ
ースト以外に、銅フィラーやカーボン混合物による導電
性ペーストを使用することも可能である。
As the conductive resin composition 15, a silver paste was used in order to avoid oxidation due to heating in the subsequent steps. At this time, when the one having a viscosity of 300 dPa · s was used, the conductive paste could be properly filled and filled without coming off from the small holes 14b of the copper foil portion (conductive layer 12). As the conductive resin composition 15, it is possible to use a conductive paste made of a copper filler or a carbon mixture other than the silver paste.

【0068】この実施形態では、基材表面にPETマス
キングテープ17が貼付されているために、メタルマス
クやスクリーンマスクを介さず、スクイジプレート50
を直接基板に接触させてスクイジングを行ってよいが、
もちろん、メタルマスクやスクリーンマスクを介してス
クイジングすることにより、導電性樹脂組成物の無駄を
削減することができる。
In this embodiment, since the PET masking tape 17 is attached to the surface of the base material, the squeegee plate 50 does not use a metal mask or a screen mask.
May be directly contacted with the substrate for squeezing,
Of course, squeezing through a metal mask or a screen mask can reduce waste of the conductive resin composition.

【0069】このスクイジングの際に、銅箔部(導電層
12)の小孔14bから気泡が排出され、貫通孔14内
に気泡が残存することがなく、銅箔部(導電層12)と
導電性樹脂組成物15との密着が導電層12の裏面12
aで十分に行われる。
At the time of this squeezing, air bubbles are discharged from the small holes 14b of the copper foil portion (conductive layer 12), and no air bubbles remain in the through holes 14, and the copper foil portion (conductive layer 12) and the conductive layer 12 are electrically conductive. Of the conductive resin composition 15 to the back surface 12 of the conductive layer 12
a is sufficient.

【0070】上述したように、貫通孔14の樹脂部分の
大きい孔14aの口径が100μm程度であれば、銅箔
部分の小さい孔14bの口径は30〜50μm径程度で
よく、この小孔14bの口径は、導電性樹脂組成物15
との接触抵抗からの要求に加えて、導電性樹脂組成物1
5の粘度やチキソ性といった諸特性に応じ、気泡の残留
と導電性樹脂組成物15の脱落を回避できるように選定
することになる。
As described above, if the diameter of the large hole 14a of the resin portion of the through hole 14 is about 100 μm, the diameter of the small hole 14b of the copper foil portion may be about 30 to 50 μm. The diameter of the conductive resin composition 15
In addition to the requirement from the contact resistance with the conductive resin composition 1
Depending on various properties such as viscosity and thixotropy of No. 5, the selection is made so as to avoid remaining of air bubbles and dropping of the conductive resin composition 15.

【0071】つぎに、図6(i)に示されているよう
に、表面に導電性樹脂組成物15の残りが付いているP
ETマスキングテープ17を剥がす。これにより一枚の
基材10が完成する。この基材10Aは、PETマスキ
ングテープ17の剥離により、層間接着面側、すなわ
ち、接着層13の表面より突出した導電性樹脂組成物1
5による突起部15Aを形成される。突起部15Aの高
さはPETマスキングテープ17の厚さ相当である。
Next, as shown in FIG. 6 (i), P having the rest of the conductive resin composition 15 attached to the surface
Peel off the ET masking tape 17. As a result, one base material 10 is completed. This base material 10A has the conductive resin composition 1 which is protruded from the surface of the adhesive layer 13, that is, the interlayer adhesive surface side by peeling off the PET masking tape 17.
5 to form a protrusion 15A. The height of the protrusion 15A is equivalent to the thickness of the PET masking tape 17.

【0072】この基材10Aを1層目の基材とし、図6
(a)〜(i)に示されているこれまでと同様の製法で
作製した基材10Bと、銅箔による導電層16を各々適
当な位置合わせ法によって位置合わせしつつ積層加熱圧
着(ラミネーション)することで、図7(j)、(k)
に示されているように、多層化が達成される。
This base material 10A is used as the base material of the first layer, and FIG.
(A) to (i) the base material 10B manufactured by the same manufacturing method as before, and the conductive layer 16 made of copper foil are aligned by a proper alignment method, respectively, and are laminated by thermocompression bonding (lamination). 7 (j), (k)
Multiple layers are achieved, as shown in.

【0073】ラミネーションの際、基材を真空下に曝し
ながら加熱圧着することで、導電層12による回路パタ
ーンの凹凸に対する接着層13の追従性を高くすること
ができる。また、導電性樹脂組成物15が柔らかい状態
で積層を行い、導電性樹脂組成物15と他層の銅箔との
接触を密接にすることができる。
At the time of lamination, by heating and pressing the base material while exposing it to a vacuum, the followability of the adhesive layer 13 to the irregularities of the circuit pattern by the conductive layer 12 can be enhanced. In addition, the conductive resin composition 15 can be laminated in a soft state, and the conductive resin composition 15 and the copper foil of the other layer can be brought into close contact with each other.

【0074】最後に、図7(l)に示されているよう
に、最外層の導電層16をエッチングによって回路形成
することで、多層配線板として完成を見る。この多層配
線板の内部に空洞部が残ることがない。
Finally, as shown in FIG. 7 (l), the outermost conductive layer 16 is formed into a circuit by etching to complete the wiring board. No cavity is left inside the multilayer wiring board.

【0075】上述した多層配線基板用基材の製造手順、
およびその多層配線基板用基材による多層配線基板の製
造手順は、図2に示されている多層配線基板用基材の製
造、およびその多層配線基板用基材による多層配線基板
の製造にも同様に適用できる。
Procedure for manufacturing the above-mentioned base material for multilayer wiring board,
The procedure for manufacturing a multilayer wiring board using the base material for a multilayer wiring board is the same as that for manufacturing the base material for a multilayer wiring board shown in FIG. 2 and for manufacturing a multilayer wiring board using the base material for a multilayer wiring board. Applicable to

【0076】なお、この発明による多層配線基板、多層
配線基板用基材およびその製造方法は、ポリイミドフィ
ルムを使用したフレキシブルプリント配線板に限られる
ことはなく、ポリエステルフィルムを使用したフレキシ
ブルプリント配線板、エポキシ樹脂や、ガラス布、アラ
ミド不織布等によるプリプレグ材を絶縁材として使用し
たリジッドタイプのものにも同様に適用することができ
る。
The multilayer wiring board, the substrate for a multilayer wiring board, and the method for manufacturing the same according to the present invention are not limited to the flexible printed wiring board using the polyimide film, and the flexible printed wiring board using the polyester film, The same can be applied to a rigid type using an epoxy resin, a prepreg material made of glass cloth, aramid nonwoven cloth or the like as an insulating material.

【0077】以上に於ては、この発明を特定の実施の形
態について詳細に説明したが、この発明は、これに限定
されるものではなく、この発明に係わる技術的思想の範
囲内にて種々の実施の形態が可能であることは当業者に
とって明らかであろう。
In the above, the present invention has been described in detail with respect to a specific embodiment, but the present invention is not limited to this and various modifications are possible within the scope of the technical idea of the present invention. It will be apparent to those skilled in the art that the embodiments of are possible.

【0078】[0078]

【発明の効果】以上の説明から理解される如く、この発
明による多層配線基板、多層配線基板用基材およびその
製造方法によれば、導電層と導電性樹脂組成物との導通
接触を、貫通孔の絶縁性基材部分と導電層部分との口径
差から、導電層裏側で取る構造になり、導電性樹脂組成
物の導電層より上の部分と導電層との接触面積確保から
派生する諸問題から解放され、汎用の銅張樹脂基材を出
発材料として、導電性樹脂組成物と導電回路部との接触
信頼性を損なうことなく、しかも基板の平滑性を低下さ
せることなく、薄い多層配線基板を得ることができる。
As can be understood from the above description, according to the multilayer wiring board, the multilayer wiring board substrate and the method for producing the same of the present invention, the conductive contact between the conductive layer and the conductive resin composition is penetrated. Due to the difference in diameter between the insulating base material portion of the hole and the conductive layer portion, the structure is taken on the back side of the conductive layer, which is derived from securing the contact area between the portion above the conductive layer of the conductive resin composition and the conductive layer. Free from problems, using a general-purpose copper-clad resin base material as a starting material, thin multilayer wiring without impairing the contact reliability between the conductive resin composition and the conductive circuit part, and without lowering the smoothness of the substrate. A substrate can be obtained.

【0079】また、貫通孔の絶縁性基材部分や接着層部
分(ビアホール)に加えて導電層部分にも導電性樹脂組
成物が充填されているから、積層後、多層配線板の内部
に空洞ができることがなく、高温に曝すような信頼性試
験を行われても、剥離、剥がれ等の障害を生じることが
ない。併せて導電層部分の内周面の面積分、ビアホール
に充填された導電性ペーストと導電層との接触面積を増
大できる。
Since the conductive resin composition is filled not only in the insulating base material portion and the adhesive layer portion (via hole) of the through hole but also in the conductive layer portion, after the lamination, a cavity is formed inside the multilayer wiring board. Even if a reliability test such as exposure to a high temperature is performed, problems such as peeling and peeling do not occur. In addition, the contact area between the conductive paste filled in the via hole and the conductive layer can be increased by the area of the inner peripheral surface of the conductive layer portion.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の一実施形態に係わる多層配線基板用
基材の一つの基本構成を示す断面図である。
FIG. 1 is a cross-sectional view showing one basic structure of a base material for a multilayer wiring board according to an embodiment of the present invention.

【図2】この発明の一実施形態に係わる多層配線基板用
基材の他の一つの基本構成を示す断面図である。
FIG. 2 is a cross-sectional view showing another basic structure of a base material for a multilayer wiring board according to an embodiment of the present invention.

【図3】この発明の一実施形態に係わる多層配線基板を
示す断面図である。
FIG. 3 is a sectional view showing a multilayer wiring board according to an embodiment of the present invention.

【図4】この発明の他の実施形態に係わる多層配線基板
用基材を示す断面図である。
FIG. 4 is a sectional view showing a base material for a multilayer wiring board according to another embodiment of the present invention.

【図5】この発明の他の実施形態に係わる多層配線基板
用基材を示す断面図である。
FIG. 5 is a cross-sectional view showing a base material for a multilayer wiring board according to another embodiment of the present invention.

【図6】(a)〜(i)はこの発明の一実施形態に係わ
る多層配線基板用基材の製造方法の一実施形態を示す工
程図である。
6A to 6I are process diagrams showing an embodiment of a method for manufacturing a base material for a multilayer wiring board according to an embodiment of the present invention.

【図7】(j)〜(l)はこの発明の一実施形態に係わ
る多層配線基板の製造方法の一実施形態を示す工程図で
ある。
7 (j) to (l) are process drawings showing an embodiment of a method for manufacturing a multilayer wiring board according to an embodiment of the present invention.

【図8】(a)はこの発明の一実施形態に係わる多層配
線基板用基材の穿孔工程でのレーザ被加工面を示す説明
図、(b)は同じくそれのレーザ強度分布を示す説明図
である。
FIG. 8A is an explanatory view showing a laser processed surface in a perforating step of a base material for a multilayer wiring board according to an embodiment of the present invention, and FIG. 8B is an explanatory view showing a laser intensity distribution of the same. Is.

【図9】従来の多層配線基板用基材のIVH構造を示す
断面図である。
FIG. 9 is a cross-sectional view showing an IVH structure of a conventional base material for a multilayer wiring board.

【図10】従来の多層配線基板用基材のIVH構造にお
ける不具合を示す断面図である。
FIG. 10 is a cross-sectional view showing a defect in the IVH structure of the conventional base material for a multilayer wiring board.

【図11】銅箔部と絶縁層の孔径を同じにしたIVH構
成を示す断面図である。
FIG. 11 is a cross-sectional view showing an IVH structure in which the hole diameters of the copper foil portion and the insulating layer are the same.

【図12】銅箔部に孔を穿設しない構成を示す断面図で
ある。
FIG. 12 is a cross-sectional view showing a configuration in which a hole is not formed in a copper foil portion.

【符号の説明】[Explanation of symbols]

10A…1層目の基材 10B…2層目の基材 11…絶縁樹脂層 12…導電層 13…接着層 14…貫通孔 14a…絶縁樹脂層−接着層部分 14b… 導電層部分 15…導電性樹脂組成物 15A…突出部 16…導電層 17…PETマスキングテープ 21…絶縁樹脂層 22…導電層 24…貫通孔 24a…絶縁樹脂層部分 24b… 導電層部分 25…導電性樹脂組成物 25A…突出部 10A ... Base material of the first layer 10B ... Second layer base material 11 ... Insulating resin layer 12 ... Conductive layer 13 ... Adhesive layer 14 ... Through hole 14a ... Insulating resin layer-adhesive layer portion 14b ... Conductive layer portion 15 ... Conductive resin composition 15A ... projection 16 ... Conductive layer 17 ... PET masking tape 21 ... Insulating resin layer 22 ... Conductive layer 24 ... Through hole 24a ... Insulating resin layer portion 24b ... Conductive layer portion 25 ... Conductive resin composition 25A ... Projection

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/00 H05K 3/40 K 3/40 H01L 23/12 N (72)発明者 岡本 誠裕 千葉県佐倉市六崎1440 株式会社フジクラ 佐倉事業所内 (72)発明者 中尾 知 千葉県佐倉市六崎1440 株式会社フジクラ 佐倉事業所内 Fターム(参考) 5E317 AA24 BB03 BB11 BB25 CC22 CC25 CD32 GG14 5E346 AA02 AA12 AA15 AA16 AA41 AA43 BB01 CC10 CC31 DD02 DD12 DD32 EE02 EE06 EE07 EE42 FF03 FF18 FF24 FF35 GG02 GG15 GG16 GG28 HH07 HH24 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 3/00 H05K 3/40 K 3/40 H01L 23/12 N (72) Inventor Masahiro Okamoto Sakura, Chiba Prefecture 1440 Rokuzaki, Ichi Fujikura Co., Ltd.Sakura Works (72) Inventor Satoshi Nakao 1440, Fujikura, Sakura-shi, Chiba F-Terms inside Sakura Works, 5E317 AA24 BB03 BB11 BB25 CC22 CC25 CD32 GG14 5E346 AA02 AA12 AA15 AA16 AA41 AA43 CC10 CC31 DD02 DD12 DD32 EE02 EE06 EE07 EE42 FF03 FF18 FF24 FF35 GG02 GG15 GG16 GG28 HH07 HH24

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性基材の片面に配線パターンをなす
導電層を設けられ、前記絶縁性基材と前記導電層を貫通
する貫通孔に層間導通を得るための導電性樹脂組成物を
充填された多層配線基板用基材であって、 前記貫通孔の導電層部分の口径が絶縁性基材部分の口径
より小さく、前記貫通孔の絶縁性基材部分と導電層部分
の全てに導電性樹脂組成物が充填されている多層配線基
板用基材。
1. A conductive layer forming a wiring pattern is provided on one surface of an insulating base material, and a through hole penetrating the insulating base material and the conductive layer is filled with a conductive resin composition for obtaining interlayer conduction. In the base material for a multilayer wiring board, the diameter of the conductive layer portion of the through hole is smaller than the diameter of the insulating base material portion, and the conductive material is formed in all of the insulating base material portion and the conductive layer portion of the through hole. A base material for a multilayer wiring board, which is filled with a resin composition.
【請求項2】 絶縁性基材の一方の面に配線パターンを
なす導電層を、他方の面に層間接着のための接着層を設
けられ、前記導電層と前記絶縁性基材と前記接着層を貫
通する貫通孔に層間導通を得るための導電性樹脂組成物
を充填された多層配線基板用基材であって、 前記貫通孔の導電層部分の口径が絶縁性基材部分および
接着層部分の口径より小さく、前記貫通孔の絶縁性基材
部分と接着層部分と導電層部分の全てに導電性樹脂組成
物が充填されている多層配線基板用基材。
2. A conductive layer forming a wiring pattern is provided on one surface of an insulating base material, and an adhesive layer for interlayer adhesion is provided on the other surface of the insulating base material, and the conductive layer, the insulating base material and the adhesive layer are provided. Is a substrate for a multilayer wiring board filled with a conductive resin composition for obtaining interlayer conduction in a through hole penetrating through, wherein the diameter of the conductive layer portion of the through hole is an insulating base material portion and an adhesive layer portion. A substrate for a multilayer wiring board, which has a diameter smaller than that of the above, and in which the conductive resin composition is filled in all of the insulating base material portion, the adhesive layer portion, and the conductive layer portion of the through hole.
【請求項3】 絶縁性基材はポリイミド等の可撓性樹脂
フィルムであることを特徴とする請求項1または2記載
の多層配線基板用基材。
3. The base material for a multilayer wiring board according to claim 1, wherein the insulating base material is a flexible resin film such as polyimide.
【請求項4】 接着層は熱可塑性ポリイミドあるいは熱
可塑性ポリイミドに熱硬化機能を付与したものにより構
成されていることを特徴とする請求項2記載の多層配線
基板用基材。
4. The substrate for a multilayer wiring board according to claim 2, wherein the adhesive layer is made of thermoplastic polyimide or a thermoplastic polyimide having a thermosetting function.
【請求項5】 前記貫通孔に充填された導電性樹脂組成
物が層間接着面側に突出し、突出部を形成している請求
項1〜4の何れか1項記載の多層配線基板用基材。
5. The base material for a multilayer wiring board according to claim 1, wherein the conductive resin composition filled in the through holes projects toward the interlayer adhesive surface to form a projection. .
【請求項6】 請求項1〜5の何れか1項記載の多層配
線基板用基材を含む多層配線基板。
6. A multilayer wiring board including the base material for a multilayer wiring board according to claim 1.
【請求項7】 絶縁性基材の片面に配線パターンをなす
導電層を設けられた積層材に、導電層部分の口径が絶縁
性基材部分の口径より小さい貫通孔を穿孔する穿孔工程
と、 導電性樹脂組成物を前記貫通孔の絶縁性基材部分と導電
層部分の全てに充填する充填工程と、 を有する多層配線基板用基材の製造方法。
7. A punching step of punching a through hole having a diameter of a conductive layer portion smaller than a diameter of an insulating base material portion in a laminated material in which a conductive layer forming a wiring pattern is provided on one surface of an insulating base material. A method for producing a base material for a multilayer wiring board, which comprises a filling step of filling a conductive resin composition in all of the insulating base material portion and the conductive layer portion of the through hole.
【請求項8】 絶縁性基材の一方の面に配線パターンを
なす導電層を、他方の面に層間接着のための接着層を設
けられた積層材に、導電層部分の口径が絶縁性基材部分
および接着層部分の口径より小さい貫通孔を穿孔する穿
孔工程と、 導電性樹脂組成物を前記貫通孔の絶縁性基材部分と接着
層部分と導電層部分の全てに充填する充填工程と、 を有する多層配線基板用基材の製造方法。
8. A laminated material having a conductive layer forming a wiring pattern on one surface of an insulating base material and an adhesive layer for interlayer adhesion on the other surface, and a conductive layer portion having an insulating base. A perforating step of perforating a through hole smaller than the diameter of the material portion and the adhesive layer portion, and a filling step of filling the conductive resin composition in all of the insulating base material portion, the adhesive layer portion and the conductive layer portion of the through hole A method for producing a base material for a multilayer wiring board, comprising:
【請求項9】 前記穿孔工程は、レーザビーム照射によ
って導電層部分以外の樹脂部分に口径が大きい穴あけを
行い、当該穴あけ完了後に導電層部分に口径が小さい穴
あけを行って貫通孔を穿設する請求項7または8記載の
多層配線基板用基材の製造方法。
9. The perforating step is performed by piercing a resin portion other than the conductive layer portion with a large diameter by laser beam irradiation, and after completing the perforation, the conductive layer portion is drilled with a small diameter hole to form a through hole. The method for manufacturing a base material for a multilayer wiring board according to claim 7.
【請求項10】 前記穿孔工程は、ビーム径方向にレー
ザ強度分布を有するレーザビーム照射を導電層とは反対
側の面に対し行い、導電層部分以外の樹脂部分に口径が
大きい穴あけを、導電層部分に口径が小さい穴あけを一
括して行なって貫通孔を穿設する請求項8または9記載
の多層配線基板用基材の製造方法。
10. In the perforating step, a laser beam having a laser intensity distribution in a beam diameter direction is irradiated to a surface opposite to the conductive layer, and a resin portion other than the conductive layer portion is perforated with a large diameter to make a conductive layer. The method for producing a base material for a multilayer wiring board according to claim 8 or 9, wherein holes having a small diameter are collectively formed in the layer portion to form the through holes.
【請求項11】 レーザビーム照射による穿孔工程後
に、レーザ穿孔により生成されるスミアを除去するデス
ミア工程を有する請求項9または10記載の多層配線基
板用基材の製造方法。
11. The method for manufacturing a base material for a multilayer wiring board according to claim 9, further comprising a desmear step of removing smear generated by laser perforation after the perforation step by laser beam irradiation.
【請求項12】 前記充填工程は、導電性樹脂組成物を
前記導電層とは反対側よりスクイジングによって前記貫
通孔に穴埋め充填する請求項6〜10の何れか1項記載
の多層配線基板用基材の製造方法。
12. The base for a multilayer wiring board according to claim 6, wherein in the filling step, the conductive resin composition is filled into the through hole by squeezing from the side opposite to the conductive layer. Method of manufacturing wood.
JP2003029816A 2002-02-22 2003-02-06 Manufacturing method of substrate for multilayer wiring board Expired - Fee Related JP3996521B2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2003029816A JP3996521B2 (en) 2002-02-22 2003-02-06 Manufacturing method of substrate for multilayer wiring board
US10/505,094 US7312400B2 (en) 2002-02-22 2003-02-21 Multilayer wiring board, base for multilayer wiring board, printed wiring board and its manufacturing method
KR1020047013058A KR100975258B1 (en) 2002-02-22 2003-02-21 Multilayer wiring board, base for multilayer wiring board, printed wiring board, and its manufacturing method
TW092103697A TW200306770A (en) 2002-02-22 2003-02-21 Multilayer wiring board, base for multilayer wiring board, printed wiring board, and its manufacturing method
CNB038044218A CN100562224C (en) 2002-02-22 2003-02-21 Multilayer wiring board, base for multilayer wiring board, printed circuit substrate and manufacture method thereof
EP03703355A EP1484952A4 (en) 2002-02-22 2003-02-21 Multilayer wiring board, base for multilayer wiring board, printed wiring board, and its manufacturing method
PCT/JP2003/001916 WO2003071843A1 (en) 2002-02-22 2003-02-21 Multilayer wiring board, base for multilayer wiring board, printed wiring board, and its manufacturing method

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JP2002-46160 2002-02-22
JP2002046160 2002-02-22
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US7849591B2 (en) 2005-10-14 2010-12-14 Fujikura Ltd. Method of manufacturing a printed wiring board
JP2008270362A (en) * 2007-04-17 2008-11-06 Fujikura Ltd Multilayer wiring board and manufacturing method thereof
US8502086B2 (en) 2007-05-17 2013-08-06 Fujikura Ltd. Laminated wiring board and method for manufacturing the same
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JP2015534287A (en) * 2012-11-09 2015-11-26 アムコア テクノロジー インコーポレイテッドAmkor Technology, Inc. Semiconductor device and manufacturing method thereof
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WO2023054094A1 (en) * 2021-09-30 2023-04-06 日亜化学工業株式会社 Wiring board, planar light-emitting device, and production methods therefor

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