JP2003315995A5 - - Google Patents

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Publication number
JP2003315995A5
JP2003315995A5 JP2003008326A JP2003008326A JP2003315995A5 JP 2003315995 A5 JP2003315995 A5 JP 2003315995A5 JP 2003008326 A JP2003008326 A JP 2003008326A JP 2003008326 A JP2003008326 A JP 2003008326A JP 2003315995 A5 JP2003315995 A5 JP 2003315995A5
Authority
JP
Japan
Prior art keywords
photosensitive composition
composition according
residue
photosensitive
main chain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003008326A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003315995A (ja
JP4184813B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2003008326A external-priority patent/JP4184813B2/ja
Priority to JP2003008326A priority Critical patent/JP4184813B2/ja
Priority to PCT/JP2003/001720 priority patent/WO2003071355A2/en
Priority to EP03742662A priority patent/EP1476786B1/en
Priority to DE60330843T priority patent/DE60330843D1/de
Priority to US10/370,385 priority patent/US6824947B2/en
Publication of JP2003315995A publication Critical patent/JP2003315995A/ja
Publication of JP2003315995A5 publication Critical patent/JP2003315995A5/ja
Publication of JP4184813B2 publication Critical patent/JP4184813B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003008326A 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 Expired - Fee Related JP4184813B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003008326A JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法
PCT/JP2003/001720 WO2003071355A2 (en) 2002-02-19 2003-02-18 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same
EP03742662A EP1476786B1 (en) 2002-02-19 2003-02-18 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same
DE60330843T DE60330843D1 (de) 2002-02-19 2003-02-18 Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit
US10/370,385 US6824947B2 (en) 2002-02-19 2003-02-19 Photosensitive composition comprising a phenol resin having a urea bond in the main chain

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002042116 2002-02-19
JP2002-42116 2002-02-19
JP2003008326A JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法

Publications (3)

Publication Number Publication Date
JP2003315995A JP2003315995A (ja) 2003-11-06
JP2003315995A5 true JP2003315995A5 (cg-RX-API-DMAC7.html) 2006-01-26
JP4184813B2 JP4184813B2 (ja) 2008-11-19

Family

ID=27759642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003008326A Expired - Fee Related JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法

Country Status (5)

Country Link
US (1) US6824947B2 (cg-RX-API-DMAC7.html)
EP (1) EP1476786B1 (cg-RX-API-DMAC7.html)
JP (1) JP4184813B2 (cg-RX-API-DMAC7.html)
DE (1) DE60330843D1 (cg-RX-API-DMAC7.html)
WO (1) WO2003071355A2 (cg-RX-API-DMAC7.html)

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US7358032B2 (en) * 2002-11-08 2008-04-15 Fujifilm Corporation Planographic printing plate precursor
JP2004226472A (ja) * 2003-01-20 2004-08-12 Fuji Photo Film Co Ltd 平版印刷版原版
CN1802603A (zh) 2003-07-17 2006-07-12 霍尼韦尔国际公司 用于高级微电子应用的平面化薄膜及其生产装置和方法
DE602005007070D1 (de) * 2004-01-09 2008-07-10 Fujifilm Corp Blindplattenvorläufer für Flachdruck
US7005227B2 (en) * 2004-01-21 2006-02-28 Intel Corporation One component EUV photoresist
US7901863B2 (en) * 2004-01-27 2011-03-08 Asahi Kasei Chemicals Corporation Photosensitive resin composition for laser engravable printing substrate
JP4308687B2 (ja) * 2004-03-11 2009-08-05 富士フイルム株式会社 平版印刷版原版
EP1754614B1 (en) * 2004-04-09 2009-06-17 FUJIFILM Corporation Lithographic printing plate precursor and lithographic printing method
KR101232249B1 (ko) * 2004-08-10 2013-02-12 간또 가가꾸 가부시끼가이샤 반도체 기판 세정액 및 반도체 기판 세정방법
JP2006096838A (ja) * 2004-09-29 2006-04-13 Air Water Chemical Inc エポキシ樹脂の硬化剤、その組成物及びその用途
US6969579B1 (en) 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element
JP4738827B2 (ja) * 2005-02-08 2011-08-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US20080131812A1 (en) * 2006-11-30 2008-06-05 Konica Minolta Medical & Graphic, Inc. Resin for printing plate material and lithographic printing plate material by use thereof
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
WO2008104881A1 (en) 2007-02-27 2008-09-04 Az Electronic Materials Usa Corp. Silicon-based antifrelective coating compositions
JP5002399B2 (ja) * 2007-09-28 2012-08-15 富士フイルム株式会社 平版印刷版原版の処理方法
JP5444933B2 (ja) * 2008-08-29 2014-03-19 富士フイルム株式会社 ネガ型平版印刷版原版及びそれを用いる平版印刷方法
JP5251985B2 (ja) * 2008-09-19 2013-07-31 Ｊｓｒ株式会社 レジストパターンコーティング剤及びレジストパターン形成方法
CN101762982B (zh) * 2008-12-24 2013-03-13 成都新图新材料股份有限公司 一种红外阳图热敏平版印刷版
EP2233288A1 (en) 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition
KR20120066924A (ko) * 2010-12-15 2012-06-25 제일모직주식회사 오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
US8906594B2 (en) 2012-06-15 2014-12-09 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working thick film photoresist
US9012126B2 (en) 2012-06-15 2015-04-21 Az Electronic Materials (Luxembourg) S.A.R.L. Positive photosensitive material
JP6116954B2 (ja) * 2013-03-22 2017-04-19 旭化成株式会社 感光性樹脂組成物及び硬化レリーフパターンの製造方法
EP3106921A4 (en) 2014-02-12 2017-10-04 Nissan Chemical Industries, Ltd. Film-forming composition including fluorine-containing surfactant
US9868868B2 (en) * 2014-03-06 2018-01-16 Lg Chem, Ltd. Offset printing composition, printing method using same, and pattern comprising offset printing composition
JP6243010B2 (ja) * 2014-03-31 2017-12-06 富士フイルム株式会社 感光性樹脂組成物、平版印刷版原版、及び、平版印刷版の作製方法
EP3346331A1 (en) 2015-08-31 2018-07-11 FUJIFILM Corporation Photosensitive resin composition, lithographic printing original plate and plate making method for lithographic printing plate
TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法
KR102275345B1 (ko) * 2018-05-16 2021-07-09 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자
KR102871189B1 (ko) 2018-09-05 2025-10-14 메르크 파텐트 게엠베하 포지티브형 감광성 물질
US20200096865A1 (en) * 2018-09-21 2020-03-26 Eastman Kodak Company Lithographic printing plate precursor and color-forming composition

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