JP2003311400A5 - - Google Patents

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Publication number
JP2003311400A5
JP2003311400A5 JP2003107373A JP2003107373A JP2003311400A5 JP 2003311400 A5 JP2003311400 A5 JP 2003311400A5 JP 2003107373 A JP2003107373 A JP 2003107373A JP 2003107373 A JP2003107373 A JP 2003107373A JP 2003311400 A5 JP2003311400 A5 JP 2003311400A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003107373A
Other versions
JP2003311400A (ja
JP4550369B2 (ja
Filing date
Publication date
Priority claimed from US10/124,174 external-priority patent/US6732905B2/en
Application filed filed Critical
Publication of JP2003311400A publication Critical patent/JP2003311400A/ja
Publication of JP2003311400A5 publication Critical patent/JP2003311400A5/ja
Application granted granted Critical
Publication of JP4550369B2 publication Critical patent/JP4550369B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003107373A 2002-04-16 2003-04-11 通気孔を設けた空洞の気密はんだ封止法 Expired - Fee Related JP4550369B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/124,174 US6732905B2 (en) 2002-04-16 2002-04-16 Vented cavity, hermetic solder seal
US10/124174 2002-04-16

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010135812A Division JP2010228006A (ja) 2002-04-16 2010-06-15 通気孔を設けた空洞の気密はんだ封止法

Publications (3)

Publication Number Publication Date
JP2003311400A JP2003311400A (ja) 2003-11-05
JP2003311400A5 true JP2003311400A5 (ja) 2006-05-25
JP4550369B2 JP4550369B2 (ja) 2010-09-22

Family

ID=22413248

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003107373A Expired - Fee Related JP4550369B2 (ja) 2002-04-16 2003-04-11 通気孔を設けた空洞の気密はんだ封止法
JP2010135812A Withdrawn JP2010228006A (ja) 2002-04-16 2010-06-15 通気孔を設けた空洞の気密はんだ封止法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010135812A Withdrawn JP2010228006A (ja) 2002-04-16 2010-06-15 通気孔を設けた空洞の気密はんだ封止法

Country Status (3)

Country Link
US (1) US6732905B2 (ja)
JP (2) JP4550369B2 (ja)
GB (1) GB2387562B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100831793B1 (ko) * 2002-02-04 2008-05-28 엘지전자 주식회사 쿨러
DE102007005345B4 (de) * 2007-02-02 2014-06-18 Seho Systemtechnik Gmbh Verfahren zum Reflow-Löten sowie Vorrichtung zur Durchführung des Verfahrens
DE112008000886T5 (de) * 2007-12-28 2011-01-27 Onamba Co., Ltd. Anschlussplattenschaltung
EP3422826A1 (en) 2017-06-26 2019-01-02 Koninklijke Philips N.V. An apparatus and a method of manufacturing an apparatus
CN113369823B (zh) * 2021-06-30 2023-01-03 西安远航真空钎焊技术有限公司 基于真空钎焊的镶嵌式叠片制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5123759A (en) * 1974-08-22 1976-02-25 Asahi Glass Co Ltd Ekishohyojisoshino fushihoho
JPS5145980A (en) * 1974-10-17 1976-04-19 Matsushita Electronics Corp Handotaisochino seizohoho
JPS5376372A (en) * 1976-12-17 1978-07-06 Matsushita Electric Ind Co Ltd Device for attaching chip circuit parts
JPS5743830A (en) * 1980-08-29 1982-03-12 Kasai Kogyo Co Ltd Pasting method of skin for pasted molding
US4413766A (en) * 1981-04-03 1983-11-08 General Electric Company Method of forming a conductor pattern including fine conductor runs on a ceramic substrate
DE3562581D1 (en) 1984-04-09 1988-06-16 Michelin & Cie Method to adhere two rubber elements by vulcanisation of a binding layer and products suited for such a method
DE3442537A1 (de) * 1984-11-22 1986-05-22 BBC Aktiengesellschaft Brown, Boveri & Cie., Baden, Aargau Verfahren zum blasenfreien verbinden eines grossflaechigen halbleiter-bauelements mit einem als substrat dienenden bauteil mittels loeten
JPS6377730A (ja) * 1986-09-22 1988-04-07 Hitachi Ltd 多層基板
JPH0698478B2 (ja) * 1991-03-22 1994-12-07 住友軽金属工業株式会社 アルミニウムハニカムパネルの製造方法
JPH05100236A (ja) * 1991-10-09 1993-04-23 Canon Inc 液晶表示素子の製造方法
JPH05259014A (ja) * 1992-03-12 1993-10-08 Fujitsu Ltd 半導体装置の製造方法
JPH0737768A (ja) * 1992-11-26 1995-02-07 Sumitomo Electric Ind Ltd 半導体ウェハの補強方法及び補強された半導体ウェハ
JP2962385B2 (ja) * 1993-01-07 1999-10-12 松下電子工業株式会社 半導体装置の製造方法
JP4077888B2 (ja) * 1995-07-21 2008-04-23 株式会社東芝 セラミックス回路基板
JPH09148481A (ja) 1995-11-24 1997-06-06 Hitachi Ltd 半導体装置およびその製造方法
JPH10261661A (ja) * 1997-03-19 1998-09-29 Toshiba Corp アンダーフィル充填方法及びプリント配線板構造
US6195478B1 (en) 1998-02-04 2001-02-27 Agilent Technologies, Inc. Planar lightwave circuit-based optical switches using micromirrors in trenches
US6055344A (en) 1998-02-18 2000-04-25 Hewlett-Packard Company Fabrication of a total internal reflection optical switch with vertical fluid fill-holes
US6338985B1 (en) * 2000-02-04 2002-01-15 Amkor Technology, Inc. Making chip size semiconductor packages
JP4493219B2 (ja) * 2001-01-31 2010-06-30 京セラ株式会社 弾性波装置の製造方法

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