JP2003292547A5 - - Google Patents
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- Publication number
- JP2003292547A5 JP2003292547A5 JP2002103576A JP2002103576A JP2003292547A5 JP 2003292547 A5 JP2003292547 A5 JP 2003292547A5 JP 2002103576 A JP2002103576 A JP 2002103576A JP 2002103576 A JP2002103576 A JP 2002103576A JP 2003292547 A5 JP2003292547 A5 JP 2003292547A5
- Authority
- JP
- Japan
- Prior art keywords
- resist material
- alkyl group
- branched
- carbon atoms
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 5
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 150000007514 bases Chemical class 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 239000003112 inhibitor Substances 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002103576A JP3856122B2 (ja) | 2002-04-05 | 2002-04-05 | レジスト材料及びパターン形成方法 |
| US10/406,278 US6790591B2 (en) | 2002-04-05 | 2003-04-04 | Polymers, resist compositions and patterning process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002103576A JP3856122B2 (ja) | 2002-04-05 | 2002-04-05 | レジスト材料及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003292547A JP2003292547A (ja) | 2003-10-15 |
| JP2003292547A5 true JP2003292547A5 (OSRAM) | 2005-09-02 |
| JP3856122B2 JP3856122B2 (ja) | 2006-12-13 |
Family
ID=28786308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002103576A Expired - Fee Related JP3856122B2 (ja) | 2002-04-05 | 2002-04-05 | レジスト材料及びパターン形成方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6790591B2 (OSRAM) |
| JP (1) | JP3856122B2 (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003330196A (ja) * | 2002-03-05 | 2003-11-19 | Jsr Corp | 感放射線性樹脂組成物 |
| JP4186054B2 (ja) * | 2002-04-05 | 2008-11-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| US7232638B2 (en) * | 2002-05-02 | 2007-06-19 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
| TW200404818A (en) | 2002-08-21 | 2004-04-01 | Asahi Glass Co Ltd | Fluorine compounds, fluoropolymers, and process for production thereof |
| JP4289937B2 (ja) * | 2003-03-28 | 2009-07-01 | 東京応化工業株式会社 | ホトレジスト組成物及びそれを用いたレジストパターン形成方法 |
| US7700257B2 (en) | 2003-03-28 | 2010-04-20 | Tokyo Ohka Kogyo Co., Ltd. | Photoresist composition and resist pattern formation method by the use thereof |
| JP4013063B2 (ja) * | 2003-08-26 | 2007-11-28 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP2005172949A (ja) * | 2003-12-08 | 2005-06-30 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト組成物およびレジストパターン形成方法 |
| JP2005173463A (ja) * | 2003-12-15 | 2005-06-30 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト組成物およびレジストパターン形成方法 |
| CN1946751B (zh) * | 2004-04-27 | 2010-12-08 | 东京应化工业株式会社 | 用于形成液浸曝光工艺用光刻胶保护膜的材料、以及使用该保护膜的光刻胶图案形成方法 |
| JP4368267B2 (ja) * | 2004-07-30 | 2009-11-18 | 東京応化工業株式会社 | レジスト保護膜形成用材料、およびこれを用いたレジストパターン形成方法 |
| US20070065756A1 (en) * | 2005-09-16 | 2007-03-22 | Quantiscript Inc., Universite De Sherbrooke | High sensitivity electron beam resist processing |
| JP4600681B2 (ja) * | 2006-03-22 | 2010-12-15 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP5761892B2 (ja) | 2006-03-31 | 2015-08-12 | Jsr株式会社 | 感放射線性樹脂組成物 |
| JP5013119B2 (ja) * | 2007-09-20 | 2012-08-29 | 信越化学工業株式会社 | パターン形成方法並びにこれに用いるレジスト材料 |
| JP7667105B2 (ja) | 2021-03-23 | 2025-04-22 | 信越化学工業株式会社 | ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品 |
| JP7495897B2 (ja) | 2021-03-23 | 2024-06-05 | 信越化学工業株式会社 | ポジ型感光性樹脂組成物、ポジ型感光性ドライフィルム、ポジ型感光性ドライフィルムの製造方法、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| EP0249139B2 (en) * | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Resist compositions and use |
| US5310619A (en) * | 1986-06-13 | 1994-05-10 | Microsi, Inc. | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable |
| JPH02257282A (ja) * | 1989-02-02 | 1990-10-18 | Toshiba Corp | 作表処理装置 |
| EP0523957A1 (en) * | 1991-07-17 | 1993-01-20 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition |
| EP0537524A1 (en) * | 1991-10-17 | 1993-04-21 | Shipley Company Inc. | Radiation sensitive compositions and methods |
| JPH05158239A (ja) * | 1991-12-03 | 1993-06-25 | Fuji Photo Film Co Ltd | ネガ型感光性組成物 |
| JP2976414B2 (ja) * | 1992-04-10 | 1999-11-10 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
| JP3010607B2 (ja) * | 1992-02-25 | 2000-02-21 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
| JPH05289322A (ja) * | 1992-04-10 | 1993-11-05 | Hitachi Ltd | パタン形成材料及びそれを用いたパタン形成方法 |
| JPH06327829A (ja) | 1993-05-24 | 1994-11-29 | Sophia Co Ltd | 遊技機の集中管理装置 |
| TW316266B (OSRAM) * | 1993-07-30 | 1997-09-21 | Commw Scient Ind Res Org | |
| JP3751065B2 (ja) * | 1995-06-28 | 2006-03-01 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
| JPH09230595A (ja) * | 1996-02-26 | 1997-09-05 | Nippon Zeon Co Ltd | レジスト組成物およびその利用 |
| CN1198181C (zh) * | 1996-03-07 | 2005-04-20 | 住友电木株式会社 | 包括具有酸不稳定侧基的多环聚合物的光刻胶组合物 |
| US5843624A (en) * | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| DE60223654T2 (de) * | 2001-02-09 | 2008-10-30 | Asahi Glass Co., Ltd. | Resistzusammensetzung |
| WO2002064648A1 (en) * | 2001-02-09 | 2002-08-22 | Asahi Glass Company, Limited | Fluorine-containing compounds and polymers and processes for producing the same |
| JP4010160B2 (ja) * | 2002-03-04 | 2007-11-21 | 旭硝子株式会社 | レジスト組成物 |
| JP2003330196A (ja) * | 2002-03-05 | 2003-11-19 | Jsr Corp | 感放射線性樹脂組成物 |
-
2002
- 2002-04-05 JP JP2002103576A patent/JP3856122B2/ja not_active Expired - Fee Related
-
2003
- 2003-04-04 US US10/406,278 patent/US6790591B2/en not_active Expired - Lifetime