JP2003249444A5 - - Google Patents

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JP2003249444A5
JP2003249444A5 JP2002366804A JP2002366804A JP2003249444A5 JP 2003249444 A5 JP2003249444 A5 JP 2003249444A5 JP 2002366804 A JP2002366804 A JP 2002366804A JP 2002366804 A JP2002366804 A JP 2002366804A JP 2003249444 A5 JP2003249444 A5 JP 2003249444A5
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Japan
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ultraviolet light
polymer
mechanical
mask
light transmitting
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JP2002366804A
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JP2003249444A (ja
JP4242145B2 (ja
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Priority claimed from US10/058,744 external-priority patent/US6653030B2/en
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JP2002366804A 2002-01-23 2002-12-18 ミクロンおよびサブミクロン構造を有する半導体および他のマイクロ装置およびナノ装置の製造中の光学−機械式構造作製方法 Expired - Fee Related JP4242145B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/058,744 US6653030B2 (en) 2002-01-23 2002-01-23 Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features
US10/058744 2002-01-23

Publications (3)

Publication Number Publication Date
JP2003249444A JP2003249444A (ja) 2003-09-05
JP2003249444A5 true JP2003249444A5 (cg-RX-API-DMAC7.html) 2005-05-19
JP4242145B2 JP4242145B2 (ja) 2009-03-18

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JP2002366804A Expired - Fee Related JP4242145B2 (ja) 2002-01-23 2002-12-18 ミクロンおよびサブミクロン構造を有する半導体および他のマイクロ装置およびナノ装置の製造中の光学−機械式構造作製方法

Country Status (7)

Country Link
US (1) US6653030B2 (cg-RX-API-DMAC7.html)
EP (1) EP1331516B1 (cg-RX-API-DMAC7.html)
JP (1) JP4242145B2 (cg-RX-API-DMAC7.html)
KR (1) KR20030080183A (cg-RX-API-DMAC7.html)
CN (1) CN1434349A (cg-RX-API-DMAC7.html)
DE (1) DE60310460T2 (cg-RX-API-DMAC7.html)
TW (1) TWI271785B (cg-RX-API-DMAC7.html)

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