JP2003221517A - 増感色素の製造方法及びそれを用いた感光性組成物 - Google Patents

増感色素の製造方法及びそれを用いた感光性組成物

Info

Publication number
JP2003221517A
JP2003221517A JP2002021723A JP2002021723A JP2003221517A JP 2003221517 A JP2003221517 A JP 2003221517A JP 2002021723 A JP2002021723 A JP 2002021723A JP 2002021723 A JP2002021723 A JP 2002021723A JP 2003221517 A JP2003221517 A JP 2003221517A
Authority
JP
Japan
Prior art keywords
group
compound
general formula
acid
atomic group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002021723A
Other languages
English (en)
Japanese (ja)
Inventor
Akinori Shibuya
明規 渋谷
Kazuto Kunida
一人 國田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP2002021723A priority Critical patent/JP2003221517A/ja
Priority to CNB031019153A priority patent/CN1306339C/zh
Priority to CN2006100958124A priority patent/CN1932644B/zh
Publication of JP2003221517A publication Critical patent/JP2003221517A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2002021723A 2002-01-30 2002-01-30 増感色素の製造方法及びそれを用いた感光性組成物 Pending JP2003221517A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002021723A JP2003221517A (ja) 2002-01-30 2002-01-30 増感色素の製造方法及びそれを用いた感光性組成物
CNB031019153A CN1306339C (zh) 2002-01-30 2003-01-23 增感色素的制造方法及使用其的感光性组合物
CN2006100958124A CN1932644B (zh) 2002-01-30 2003-01-23 增感色素的制造方法及使用其的感光性组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002021723A JP2003221517A (ja) 2002-01-30 2002-01-30 増感色素の製造方法及びそれを用いた感光性組成物

Publications (1)

Publication Number Publication Date
JP2003221517A true JP2003221517A (ja) 2003-08-08

Family

ID=27654403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002021723A Pending JP2003221517A (ja) 2002-01-30 2002-01-30 増感色素の製造方法及びそれを用いた感光性組成物

Country Status (2)

Country Link
JP (1) JP2003221517A (zh)
CN (2) CN1306339C (zh)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1491536A1 (en) * 2003-05-09 2004-12-29 Fuji Photo Film Co., Ltd. Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image
JP2005208561A (ja) * 2003-09-09 2005-08-04 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
EP1615073A1 (en) * 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
JP2006137876A (ja) * 2004-11-12 2006-06-01 Fuji Photo Film Co Ltd 放射線の照射により硬化可能なインクジェット記録用インク及びこれを用いた平版印刷版作製方法
EP1669195A1 (en) 2004-12-13 2006-06-14 Fuji Photo Film Co., Ltd. Lithographic printing method
JP2006154637A (ja) * 2004-12-01 2006-06-15 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物及びそれを用いたフォトレジストフィルム、レジストパターン形成方法
EP1708025A1 (en) 2005-03-25 2006-10-04 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
JP2008181143A (ja) * 2003-09-09 2008-08-07 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
EP1621929A3 (en) * 2004-07-29 2009-02-11 FUJIFILM Corporation Photosensitive composition comprising a sensitising dye
DE112008000778T5 (de) 2007-03-23 2010-04-08 Mitsubishi Paper Mills Limited Wasserentwickelbares photoempfindliches Lithographiedruckplattenmaterial
KR100970357B1 (ko) * 2003-09-25 2010-07-16 니뽄 고오세이가가꾸 고오교오 가부시끼가이샤 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법
EP2618215A1 (en) 2004-05-31 2013-07-24 Fujifilm Corporation Method for producing a lithographic printing plate
KR101398503B1 (ko) * 2006-06-23 2014-05-27 후지필름 가부시키가이샤 화합물, 감광성 조성물, 경화성 조성물, 컬러 필터용 경화성 조성물, 컬러 필터, 및 그 제조 방법
CN104190333A (zh) * 2014-01-10 2014-12-10 齐鲁工业大学 一种荧光中空二氧化硅微球的制备方法
JP2016196546A (ja) * 2015-04-03 2016-11-24 株式会社スリーボンド 光遅延硬化性樹脂組成物、接合体および接着方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1705913B (zh) * 2003-09-25 2011-11-30 日本合成化学工业株式会社 负型青紫色激光感光性组合物、图像形成材料、图像形成元件和图像形成方法
EP2009497A4 (en) * 2006-04-18 2011-09-07 Hitachi Chemical Co Ltd PHOTOSENSITIVE ELEMENT, METHOD FOR TRACING A PROTECTIVE COATING PATTERN, AND METHOD FOR PRODUCING A PRINTED CIRCUIT BOARD
CN110028456B (zh) * 2019-04-19 2021-02-23 齐鲁工业大学 一种巴比妥酸衍生物及制备方法与应用

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2550756B2 (ja) * 1990-06-27 1996-11-06 日立化成工業株式会社 非線形光学材料および非線形光学素子
JP3400586B2 (ja) * 1995-02-10 2003-04-28 富士写真フイルム株式会社 光重合性組成物
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1491536A1 (en) * 2003-05-09 2004-12-29 Fuji Photo Film Co., Ltd. Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image
JP4556531B2 (ja) * 2003-09-09 2010-10-06 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP2005208561A (ja) * 2003-09-09 2005-08-04 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP2008181143A (ja) * 2003-09-09 2008-08-07 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
KR100970357B1 (ko) * 2003-09-25 2010-07-16 니뽄 고오세이가가꾸 고오교오 가부시끼가이샤 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법
EP2618215A1 (en) 2004-05-31 2013-07-24 Fujifilm Corporation Method for producing a lithographic printing plate
EP1615073A1 (en) * 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1621929A3 (en) * 2004-07-29 2009-02-11 FUJIFILM Corporation Photosensitive composition comprising a sensitising dye
JP2006137876A (ja) * 2004-11-12 2006-06-01 Fuji Photo Film Co Ltd 放射線の照射により硬化可能なインクジェット記録用インク及びこれを用いた平版印刷版作製方法
JP2006154637A (ja) * 2004-12-01 2006-06-15 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物及びそれを用いたフォトレジストフィルム、レジストパターン形成方法
EP1669195A1 (en) 2004-12-13 2006-06-14 Fuji Photo Film Co., Ltd. Lithographic printing method
EP1708025A1 (en) 2005-03-25 2006-10-04 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
KR101398503B1 (ko) * 2006-06-23 2014-05-27 후지필름 가부시키가이샤 화합물, 감광성 조성물, 경화성 조성물, 컬러 필터용 경화성 조성물, 컬러 필터, 및 그 제조 방법
DE112008000778T5 (de) 2007-03-23 2010-04-08 Mitsubishi Paper Mills Limited Wasserentwickelbares photoempfindliches Lithographiedruckplattenmaterial
CN104190333A (zh) * 2014-01-10 2014-12-10 齐鲁工业大学 一种荧光中空二氧化硅微球的制备方法
JP2016196546A (ja) * 2015-04-03 2016-11-24 株式会社スリーボンド 光遅延硬化性樹脂組成物、接合体および接着方法

Also Published As

Publication number Publication date
CN1306339C (zh) 2007-03-21
CN1932644B (zh) 2010-05-12
CN1932644A (zh) 2007-03-21
CN1435730A (zh) 2003-08-13

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