JP2003207885A5 - - Google Patents

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Publication number
JP2003207885A5
JP2003207885A5 JP2002003899A JP2002003899A JP2003207885A5 JP 2003207885 A5 JP2003207885 A5 JP 2003207885A5 JP 2002003899 A JP2002003899 A JP 2002003899A JP 2002003899 A JP2002003899 A JP 2002003899A JP 2003207885 A5 JP2003207885 A5 JP 2003207885A5
Authority
JP
Japan
Prior art keywords
compound
film
hydroxyl groups
fluorine atom
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002003899A
Other languages
English (en)
Japanese (ja)
Other versions
JP4025075B2 (ja
JP2003207885A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002003899A priority Critical patent/JP4025075B2/ja
Priority claimed from JP2002003899A external-priority patent/JP4025075B2/ja
Priority to US10/338,737 priority patent/US7214465B2/en
Publication of JP2003207885A publication Critical patent/JP2003207885A/ja
Publication of JP2003207885A5 publication Critical patent/JP2003207885A5/ja
Application granted granted Critical
Publication of JP4025075B2 publication Critical patent/JP4025075B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002003899A 2002-01-10 2002-01-10 ポジ型感光性組成物 Expired - Fee Related JP4025075B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002003899A JP4025075B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物
US10/338,737 US7214465B2 (en) 2002-01-10 2003-01-09 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002003899A JP4025075B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2003207885A JP2003207885A (ja) 2003-07-25
JP2003207885A5 true JP2003207885A5 (enExample) 2005-04-07
JP4025075B2 JP4025075B2 (ja) 2007-12-19

Family

ID=27643367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002003899A Expired - Fee Related JP4025075B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP4025075B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI527792B (zh) * 2012-06-26 2016-04-01 羅門哈斯電子材料有限公司 光酸產生劑、含該光酸產生劑之光阻劑及含該光阻劑之經塗覆物件
JP6442965B2 (ja) * 2014-10-07 2018-12-26 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
JP6571177B2 (ja) * 2015-05-14 2019-09-04 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3340864B2 (ja) * 1994-10-26 2002-11-05 富士写真フイルム株式会社 ポジ型化学増幅レジスト組成物
JP4007570B2 (ja) * 1998-10-16 2007-11-14 富士フイルム株式会社 ポジ型レジスト組成物
JP4604367B2 (ja) * 2000-03-27 2011-01-05 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4025074B2 (ja) * 2001-09-19 2007-12-19 富士フイルム株式会社 ポジ型レジスト組成物

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