JP2003197590A - 基板処理装置および基板処理方法 - Google Patents

基板処理装置および基板処理方法

Info

Publication number
JP2003197590A
JP2003197590A JP2001390135A JP2001390135A JP2003197590A JP 2003197590 A JP2003197590 A JP 2003197590A JP 2001390135 A JP2001390135 A JP 2001390135A JP 2001390135 A JP2001390135 A JP 2001390135A JP 2003197590 A JP2003197590 A JP 2003197590A
Authority
JP
Japan
Prior art keywords
substrate
nozzle
wafer
vapor
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2001390135A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003197590A5 (enExample
Inventor
Yosuke Okuya
洋介 奥谷
Atsuaki Naganori
篤朗 永徳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP2001390135A priority Critical patent/JP2003197590A/ja
Publication of JP2003197590A publication Critical patent/JP2003197590A/ja
Publication of JP2003197590A5 publication Critical patent/JP2003197590A5/ja
Abandoned legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2001390135A 2001-12-21 2001-12-21 基板処理装置および基板処理方法 Abandoned JP2003197590A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001390135A JP2003197590A (ja) 2001-12-21 2001-12-21 基板処理装置および基板処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001390135A JP2003197590A (ja) 2001-12-21 2001-12-21 基板処理装置および基板処理方法

Publications (2)

Publication Number Publication Date
JP2003197590A true JP2003197590A (ja) 2003-07-11
JP2003197590A5 JP2003197590A5 (enExample) 2005-05-19

Family

ID=27598152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001390135A Abandoned JP2003197590A (ja) 2001-12-21 2001-12-21 基板処理装置および基板処理方法

Country Status (1)

Country Link
JP (1) JP2003197590A (enExample)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005086181A (ja) * 2003-09-11 2005-03-31 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
WO2006041077A1 (ja) 2004-10-12 2006-04-20 Tokyo Electron Limited 基板処理方法および基板処理装置
JP2007173308A (ja) * 2005-12-19 2007-07-05 Tokyo Electron Ltd 基板洗浄方法、基板洗浄装置、制御プログラム、およびコンピュータ読取可能な記憶媒体
KR100776282B1 (ko) 2006-06-22 2007-11-13 세메스 주식회사 매엽식 기판 처리 장치 및 방법
US7806989B2 (en) 2005-06-23 2010-10-05 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
JP2011014935A (ja) * 2010-10-18 2011-01-20 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法。
US7927429B2 (en) 2003-11-18 2011-04-19 Tokyo Electron Limited Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium
JP2011135002A (ja) * 2009-12-25 2011-07-07 Tokyo Electron Ltd 基板処理方法、その基板処理方法を実行させるためのプログラムを記録した記録媒体及び基板処理装置
US8043469B2 (en) 2006-10-06 2011-10-25 Tokyo Electron Limited Substrate processing method, substrate processing apparatus, and storage medium
KR20110139645A (ko) 2010-06-23 2011-12-29 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 이 기판 처리 방법을 실행하기 위한 컴퓨터 프로그램이 기록된 기록 매체 및 기판 처리 장치
JP2012119522A (ja) * 2010-12-01 2012-06-21 Sumitomo Electric Ind Ltd 回折格子を有する半導体レーザ素子の製造方法
US8906165B2 (en) 2010-06-17 2014-12-09 Tokyo Electron Limited Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005086181A (ja) * 2003-09-11 2005-03-31 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
US8113221B2 (en) 2003-11-18 2012-02-14 Tokyo Electron Limited Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium
US7927429B2 (en) 2003-11-18 2011-04-19 Tokyo Electron Limited Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium
JPWO2006041077A1 (ja) * 2004-10-12 2008-05-15 東京エレクトロン株式会社 基板処理方法および基板処理装置
WO2006041077A1 (ja) 2004-10-12 2006-04-20 Tokyo Electron Limited 基板処理方法および基板処理装置
KR100766844B1 (ko) * 2004-10-12 2007-10-17 동경 엘렉트론 주식회사 기판 처리 방법 및 기판 처리 장치
EP1801860A4 (en) * 2004-10-12 2009-08-12 Tokyo Electron Ltd METHOD AND DEVICE FOR SUBSTRATE PROCESSING
JP2010045389A (ja) * 2004-10-12 2010-02-25 Tokyo Electron Ltd 基板処理方法および基板処理装置
US8794250B2 (en) 2004-10-12 2014-08-05 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
US8337659B2 (en) 2004-10-12 2012-12-25 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
US7806989B2 (en) 2005-06-23 2010-10-05 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
US8137478B2 (en) 2005-06-23 2012-03-20 Tokyo Electron Limited Substrate processing method and substrate processing apparatus
JP2007173308A (ja) * 2005-12-19 2007-07-05 Tokyo Electron Ltd 基板洗浄方法、基板洗浄装置、制御プログラム、およびコンピュータ読取可能な記憶媒体
KR100776282B1 (ko) 2006-06-22 2007-11-13 세메스 주식회사 매엽식 기판 처리 장치 및 방법
US8043469B2 (en) 2006-10-06 2011-10-25 Tokyo Electron Limited Substrate processing method, substrate processing apparatus, and storage medium
JP2011135002A (ja) * 2009-12-25 2011-07-07 Tokyo Electron Ltd 基板処理方法、その基板処理方法を実行させるためのプログラムを記録した記録媒体及び基板処理装置
US8906165B2 (en) 2010-06-17 2014-12-09 Tokyo Electron Limited Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus
KR20110139645A (ko) 2010-06-23 2011-12-29 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 이 기판 처리 방법을 실행하기 위한 컴퓨터 프로그램이 기록된 기록 매체 및 기판 처리 장치
US8545640B2 (en) 2010-06-23 2013-10-01 Tokyo Electron Limited Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus
JP2011014935A (ja) * 2010-10-18 2011-01-20 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法。
JP2012119522A (ja) * 2010-12-01 2012-06-21 Sumitomo Electric Ind Ltd 回折格子を有する半導体レーザ素子の製造方法

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