JP2003171578A - Coating liquid and photocatalyst functional product - Google Patents
Coating liquid and photocatalyst functional productInfo
- Publication number
- JP2003171578A JP2003171578A JP2001372868A JP2001372868A JP2003171578A JP 2003171578 A JP2003171578 A JP 2003171578A JP 2001372868 A JP2001372868 A JP 2001372868A JP 2001372868 A JP2001372868 A JP 2001372868A JP 2003171578 A JP2003171578 A JP 2003171578A
- Authority
- JP
- Japan
- Prior art keywords
- coating liquid
- oxide
- oxalate
- hydroxide
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 55
- 238000000576 coating method Methods 0.000 title claims abstract description 50
- 239000007788 liquid Substances 0.000 title claims abstract description 49
- 239000011941 photocatalyst Substances 0.000 title abstract description 11
- 239000000919 ceramic Substances 0.000 claims abstract description 37
- 229910052751 metal Inorganic materials 0.000 claims abstract description 35
- 239000002184 metal Substances 0.000 claims abstract description 32
- 229910010272 inorganic material Inorganic materials 0.000 claims abstract description 19
- 239000011147 inorganic material Substances 0.000 claims abstract description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 5
- 229910052802 copper Inorganic materials 0.000 claims abstract description 5
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 5
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 5
- 229910052738 indium Inorganic materials 0.000 claims abstract description 5
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 5
- 229910052742 iron Inorganic materials 0.000 claims abstract description 5
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 5
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 5
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 5
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 5
- 229910052709 silver Inorganic materials 0.000 claims abstract description 5
- 229910052716 thallium Inorganic materials 0.000 claims abstract description 5
- 229910052718 tin Inorganic materials 0.000 claims abstract description 5
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 5
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- 229910052745 lead Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 4
- 229910000323 aluminium silicate Inorganic materials 0.000 claims abstract description 3
- 239000001506 calcium phosphate Substances 0.000 claims abstract description 3
- 229910000389 calcium phosphate Inorganic materials 0.000 claims abstract description 3
- 235000011010 calcium phosphates Nutrition 0.000 claims abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims abstract description 3
- 239000002808 molecular sieve Substances 0.000 claims abstract description 3
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 3
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052713 technetium Inorganic materials 0.000 claims abstract description 3
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 claims abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 3
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims abstract 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims abstract 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims abstract 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract 2
- -1 carboxylic acid compound Chemical class 0.000 claims description 42
- 229910052755 nonmetal Inorganic materials 0.000 claims description 15
- 239000002612 dispersion medium Substances 0.000 claims description 13
- 230000001699 photocatalysis Effects 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 15
- 150000001875 compounds Chemical class 0.000 abstract description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 7
- 229910052684 Cerium Inorganic materials 0.000 abstract description 4
- 229910052793 cadmium Inorganic materials 0.000 abstract description 4
- 229910052763 palladium Inorganic materials 0.000 abstract description 4
- 150000005325 alkali earth metal hydroxides Chemical class 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 description 23
- 150000001735 carboxylic acids Chemical class 0.000 description 18
- 239000006185 dispersion Substances 0.000 description 18
- 239000000047 product Substances 0.000 description 16
- 238000011282 treatment Methods 0.000 description 16
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 7
- 235000011114 ammonium hydroxide Nutrition 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000010955 niobium Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 239000011259 mixed solution Substances 0.000 description 5
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 5
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229910001930 tungsten oxide Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000004567 concrete Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000002609 medium Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- CPRMKOQKXYSDML-UHFFFAOYSA-M rubidium hydroxide Chemical compound [OH-].[Rb+] CPRMKOQKXYSDML-UHFFFAOYSA-M 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- 150000007942 carboxylates Chemical class 0.000 description 3
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- 239000010944 silver (metal) Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 150000003609 titanium compounds Chemical class 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000005083 Zinc sulfide Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- QWSKCLGHRUDBNG-UHFFFAOYSA-H iridium(3+);oxalate Chemical compound [Ir+3].[Ir+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O QWSKCLGHRUDBNG-UHFFFAOYSA-H 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 229910052747 lanthanoid Inorganic materials 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229940039748 oxalate Drugs 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 description 2
- 229940039790 sodium oxalate Drugs 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 2
- 150000003658 tungsten compounds Chemical class 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- NGCDGPPKVSZGRR-UHFFFAOYSA-J 1,4,6,9-tetraoxa-5-stannaspiro[4.4]nonane-2,3,7,8-tetrone Chemical compound [Sn+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O NGCDGPPKVSZGRR-UHFFFAOYSA-J 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- AXIFGFAGYFPNFC-UHFFFAOYSA-I 2-hydroxy-2-oxoacetate;niobium(5+) Chemical compound [Nb+5].OC(=O)C([O-])=O.OC(=O)C([O-])=O.OC(=O)C([O-])=O.OC(=O)C([O-])=O.OC(=O)C([O-])=O AXIFGFAGYFPNFC-UHFFFAOYSA-I 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- JHAFEVXNMDQGTR-UHFFFAOYSA-L C(C(=O)[O-])(=O)[O-].[Ge+2] Chemical compound C(C(=O)[O-])(=O)[O-].[Ge+2] JHAFEVXNMDQGTR-UHFFFAOYSA-L 0.000 description 1
- 239000005973 Carvone Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 102000003729 Neprilysin Human genes 0.000 description 1
- 108090000028 Neprilysin Proteins 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- JGIBNXVWKYGFLY-UHFFFAOYSA-M [NH4+].C(C(=O)[O-])(=O)[O-].[Fe+] Chemical compound [NH4+].C(C(=O)[O-])(=O)[O-].[Fe+] JGIBNXVWKYGFLY-UHFFFAOYSA-M 0.000 description 1
- LXASOGUHMSNFCR-UHFFFAOYSA-D [V+5].[V+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O Chemical compound [V+5].[V+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O LXASOGUHMSNFCR-UHFFFAOYSA-D 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- AJGPQPPJQDDCDA-UHFFFAOYSA-N azanium;hydron;oxalate Chemical compound N.OC(=O)C(O)=O AJGPQPPJQDDCDA-UHFFFAOYSA-N 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- GXUARMXARIJAFV-UHFFFAOYSA-L barium oxalate Chemical compound [Ba+2].[O-]C(=O)C([O-])=O GXUARMXARIJAFV-UHFFFAOYSA-L 0.000 description 1
- 229940094800 barium oxalate Drugs 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- ZCLVNIZJEKLGFA-UHFFFAOYSA-H bis(4,5-dioxo-1,3,2-dioxalumolan-2-yl) oxalate Chemical compound [Al+3].[Al+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZCLVNIZJEKLGFA-UHFFFAOYSA-H 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- QXDMQSPYEZFLGF-UHFFFAOYSA-L calcium oxalate Chemical compound [Ca+2].[O-]C(=O)C([O-])=O QXDMQSPYEZFLGF-UHFFFAOYSA-L 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229960001759 cerium oxalate Drugs 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- ZMZNLKYXLARXFY-UHFFFAOYSA-H cerium(3+);oxalate Chemical compound [Ce+3].[Ce+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZMZNLKYXLARXFY-UHFFFAOYSA-H 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- XFVGXQSSXWIWIO-UHFFFAOYSA-N chloro hypochlorite;titanium Chemical compound [Ti].ClOCl XFVGXQSSXWIWIO-UHFFFAOYSA-N 0.000 description 1
- UBFMILMLANTYEU-UHFFFAOYSA-H chromium(3+);oxalate Chemical compound [Cr+3].[Cr+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O UBFMILMLANTYEU-UHFFFAOYSA-H 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- MULYSYXKGICWJF-UHFFFAOYSA-L cobalt(2+);oxalate Chemical compound [Co+2].[O-]C(=O)C([O-])=O MULYSYXKGICWJF-UHFFFAOYSA-L 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- QYCVHILLJSYYBD-UHFFFAOYSA-L copper;oxalate Chemical compound [Cu+2].[O-]C(=O)C([O-])=O QYCVHILLJSYYBD-UHFFFAOYSA-L 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- YXVFQADLFFNVDS-UHFFFAOYSA-N diammonium citrate Chemical compound [NH4+].[NH4+].[O-]C(=O)CC(O)(C(=O)O)CC([O-])=O YXVFQADLFFNVDS-UHFFFAOYSA-N 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- YNQRWVCLAIUHHI-UHFFFAOYSA-L dilithium;oxalate Chemical compound [Li+].[Li+].[O-]C(=O)C([O-])=O YNQRWVCLAIUHHI-UHFFFAOYSA-L 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- IRXRGVFLQOSHOH-UHFFFAOYSA-L dipotassium;oxalate Chemical group [K+].[K+].[O-]C(=O)C([O-])=O IRXRGVFLQOSHOH-UHFFFAOYSA-L 0.000 description 1
- 238000010130 dispersion processing Methods 0.000 description 1
- VEPSWGHMGZQCIN-UHFFFAOYSA-H ferric oxalate Chemical compound [Fe+3].[Fe+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O VEPSWGHMGZQCIN-UHFFFAOYSA-H 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- WHGJDDLRCCAERM-UHFFFAOYSA-H gold(3+) oxalate Chemical compound [Au+3].[Au+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O WHGJDDLRCCAERM-UHFFFAOYSA-H 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 229910052622 kaolinite Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- OXHNIMPTBAKYRS-UHFFFAOYSA-H lanthanum(3+);oxalate Chemical compound [La+3].[La+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O OXHNIMPTBAKYRS-UHFFFAOYSA-H 0.000 description 1
- DXUUIDJNCBRHDV-UHFFFAOYSA-M lithium;hydron;oxalate Chemical compound [Li+].OC(=O)C([O-])=O DXUUIDJNCBRHDV-UHFFFAOYSA-M 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- UHNWOJJPXCYKCG-UHFFFAOYSA-L magnesium oxalate Chemical compound [Mg+2].[O-]C(=O)C([O-])=O UHNWOJJPXCYKCG-UHFFFAOYSA-L 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- RGVLTEMOWXGQOS-UHFFFAOYSA-L manganese(2+);oxalate Chemical compound [Mn+2].[O-]C(=O)C([O-])=O RGVLTEMOWXGQOS-UHFFFAOYSA-L 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- YJEJUIVHAMABCA-UHFFFAOYSA-J molybdenum(4+);oxalate Chemical compound [Mo+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O YJEJUIVHAMABCA-UHFFFAOYSA-J 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- DOLZKNFSRCEOFV-UHFFFAOYSA-L nickel(2+);oxalate Chemical compound [Ni+2].[O-]C(=O)C([O-])=O DOLZKNFSRCEOFV-UHFFFAOYSA-L 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000002822 niobium compounds Chemical class 0.000 description 1
- XNHGKSMNCCTMFO-UHFFFAOYSA-D niobium(5+);oxalate Chemical compound [Nb+5].[Nb+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O XNHGKSMNCCTMFO-UHFFFAOYSA-D 0.000 description 1
- LZRGWUCHXWALGY-UHFFFAOYSA-N niobium(5+);propan-2-olate Chemical compound [Nb+5].CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-] LZRGWUCHXWALGY-UHFFFAOYSA-N 0.000 description 1
- ZTILUDNICMILKJ-UHFFFAOYSA-N niobium(v) ethoxide Chemical compound CCO[Nb](OCC)(OCC)(OCC)OCC ZTILUDNICMILKJ-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HQDHAWGBNPUGAD-UHFFFAOYSA-J osmium(4+);oxalate Chemical compound [Os+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O HQDHAWGBNPUGAD-UHFFFAOYSA-J 0.000 description 1
- QNEIVTNMGMUAEX-UHFFFAOYSA-H oxalate rhodium(3+) Chemical compound [Rh+3].[Rh+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O QNEIVTNMGMUAEX-UHFFFAOYSA-H 0.000 description 1
- GKEBANQXMVUDHF-UHFFFAOYSA-H oxalate;ruthenium(3+) Chemical compound [Ru+3].[Ru+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O GKEBANQXMVUDHF-UHFFFAOYSA-H 0.000 description 1
- DABIZUXUJGHLMW-UHFFFAOYSA-H oxalate;samarium(3+) Chemical compound [Sm+3].[Sm+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O DABIZUXUJGHLMW-UHFFFAOYSA-H 0.000 description 1
- OSYUGTCJVMTNTO-UHFFFAOYSA-D oxalate;tantalum(5+) Chemical compound [Ta+5].[Ta+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O OSYUGTCJVMTNTO-UHFFFAOYSA-D 0.000 description 1
- IBSDADOZMZEYKD-UHFFFAOYSA-H oxalate;yttrium(3+) Chemical compound [Y+3].[Y+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O IBSDADOZMZEYKD-UHFFFAOYSA-H 0.000 description 1
- PZKNFJIOIKQCPA-UHFFFAOYSA-N oxalic acid palladium Chemical compound [Pd].OC(=O)C(O)=O PZKNFJIOIKQCPA-UHFFFAOYSA-N 0.000 description 1
- GEVPUGOOGXGPIO-UHFFFAOYSA-N oxalic acid;dihydrate Chemical compound O.O.OC(=O)C(O)=O GEVPUGOOGXGPIO-UHFFFAOYSA-N 0.000 description 1
- HNKLPNDFOVJIFG-UHFFFAOYSA-N oxalic acid;platinum Chemical compound [Pt].OC(=O)C(O)=O HNKLPNDFOVJIFG-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- JMTCDHVHZSGGJA-UHFFFAOYSA-M potassium hydrogenoxalate Chemical compound [K+].OC(=O)C([O-])=O JMTCDHVHZSGGJA-UHFFFAOYSA-M 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- XNGYKPINNDWGGF-UHFFFAOYSA-L silver oxalate Chemical compound [Ag+].[Ag+].[O-]C(=O)C([O-])=O XNGYKPINNDWGGF-UHFFFAOYSA-L 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- UJRAXLUXHBUNDO-UHFFFAOYSA-M sodium;hydron;oxalate Chemical compound [Na+].OC(=O)C([O-])=O UJRAXLUXHBUNDO-UHFFFAOYSA-M 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 description 1
- 229910001866 strontium hydroxide Inorganic materials 0.000 description 1
- KQAGKTURZUKUCH-UHFFFAOYSA-L strontium oxalate Chemical compound [Sr+2].[O-]C(=O)C([O-])=O KQAGKTURZUKUCH-UHFFFAOYSA-L 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 150000003627 tricarboxylic acid derivatives Chemical class 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、コーティング液お
よび光触媒機能製品に関するものである。このコーティ
ング液は、各種材料へ親水性等を付与するために利用さ
れるものである。TECHNICAL FIELD The present invention relates to a coating liquid and a photocatalyst functional product. This coating liquid is used for imparting hydrophilicity to various materials.
【0002】[0002]
【従来の技術】これまでに種々のコーティング液が報告
されている。特に近年、各種材料の表面を光触媒的に親
水性にする方法およびそのときに用いるコーティング液
が注目されている。ここで、「光触媒的に親水性にす
る」とは、材料表面にある膜中の触媒を光照射により活
性化して、膜をそれ自身親水性とするか、膜表面にある
低親水性物質(親油性物質等)を分解して膜の親水性を
回復させるか、またはこれらの両方を行うことを意味す
る。このような膜を形成するものとして、光触媒用酸化
チタンコーティング液が市販されている。ところが、市
販の光触媒用酸化チタンコーティング液から得られる膜
は、太陽光が照射されると、ある程度の親水性を有して
防曇効果や自己洗浄効果を示すものの、親油性物質の汚
染が膜全面にまで一旦広がると、親水性を回復するまで
に長時間が必要となる問題があり、改良が要望されてい
た。2. Description of the Related Art Various coating liquids have been reported so far. Particularly in recent years, attention has been focused on a method of making the surface of various materials hydrophilic by a photocatalyst and a coating liquid used at that time. Here, "to make the catalyst catalytically hydrophilic" means that the catalyst in the film on the surface of the material is activated by light irradiation to make the film hydrophilic by itself or a low hydrophilic substance ( Lipophilic substances, etc.) to restore the hydrophilicity of the membrane, or both. As a material for forming such a film, a titanium oxide coating liquid for photocatalyst is commercially available. However, a film obtained from a commercially available titanium oxide coating liquid for photocatalyst has a hydrophilic property to some extent and exhibits an antifogging effect and a self-cleaning effect when exposed to sunlight, but the film is contaminated with lipophilic substances. Once it spreads over the entire surface, there is a problem that it takes a long time to restore hydrophilicity, and improvement has been demanded.
【0003】また屋外の側壁や標識等では風雨、降雪に
曝されることがあり、消波ブロック等では荒天時に波に
激しくあらわれることから、これらの表面に形成する膜
は、親水性に加えて十分な機械的強度をもつことが必要
であった。Further, since the outdoor side walls and signs may be exposed to wind and rain and snowfall, and the wave-dissipating blocks and the like may be exposed to waves during stormy weather, the films formed on these surfaces are not only hydrophilic but also hydrophilic. It was necessary to have sufficient mechanical strength.
【0004】[0004]
【発明が解決しようとする課題】本発明は、親油性物質
で汚染されても光照射によって容易に親水性を回復し、
かつ機械的強度に優れる膜を有する光触媒機能製品およ
びこのような膜を形成できるコーティング液およびそれ
を用いてなる光触媒機能製品を提供することを目的とす
る。DISCLOSURE OF THE INVENTION The present invention can easily recover hydrophilicity by irradiation with light even if it is contaminated with a lipophilic substance,
An object of the present invention is to provide a photocatalytic functional product having a film having excellent mechanical strength, a coating liquid capable of forming such a film, and a photocatalytic functional product using the coating liquid.
【0005】[0005]
【課題を解決するための手段】本発明者等は、親水性を
損なうことなく機械的強度を高めた膜の形成方法につい
て検討した結果、ある種の非金属無機材料および有機物
を含むコーティング液からは、親油性物質で汚染されて
も光照射によって容易に親水性を回復する膜であって、
かつ機械的強度に優れるものが得られることを見出し
て、本発明を完成するに至った。Means for Solving the Problems As a result of studying a method for forming a film having enhanced mechanical strength without impairing hydrophilicity, the present inventors have found that a coating liquid containing a certain non-metal inorganic material and an organic substance is used. Is a film that easily recovers hydrophilicity by light irradiation even if it is contaminated with a lipophilic substance.
Moreover, they have found that a material having excellent mechanical strength can be obtained, and have completed the present invention.
【0006】すなわち本発明は、セラミックス、前記セ
ラミックス以外の非金属無機材料、分散媒およびカルボ
ン酸系化合物を含むことを特徴とするコーティング液を
提供するものである。That is, the present invention provides a coating solution containing ceramics, a non-metal inorganic material other than the ceramics, a dispersion medium and a carboxylic acid compound.
【0007】また本発明は、基材表面に、前記のコーテ
ィング液を用いて膜形成してなる光触媒機能製品を提供
するものである。The present invention also provides a photocatalyst functional product obtained by forming a film on the surface of a substrate using the above coating liquid.
【0008】[0008]
【発明の実施の形態】以下、本発明を詳細に説明する。
本発明のコーティング液は、セラミックス、前記セラミ
ックス以外の非金属無機材料、分散媒およびカルボン酸
系化合物を含む。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below.
The coating liquid of the present invention contains ceramics, a non-metal inorganic material other than the ceramics, a dispersion medium, and a carboxylic acid compound.
【0009】コーティング液に含まれるセラミックス
は、膜の構成成分となり、かつ膜としたとき可視光、紫
外光のような光の照射に対して光触媒活性を示すことが
できる非金属無機材料であればよく、例えば、Ti、Z
r、Hf、V、Nb、Ta、Cr、Mo、W、Mn、T
c、Re、Fe、Co、Ni、Ru、Rh、Pd、O
s、Ir、Pt、Cu、Ag、Au、Zn、Cd、G
a、In、Tl、Ge、Sn、Pb、Bi、La、Ce
のような金属元素の1種または2種以上の酸化物、窒化
物、硫化物、酸窒化物または酸硫化物等が挙げられる。
中でも、光照射により高い触媒活性を示す、Ti、Wま
たはNbの酸化物の適用が推奨され、とりわけ、アナタ
ーゼ型酸化チタンが好ましい。このセラミックスは、平
均粒子径500nm以下の粒子であることが好ましく、
さらには200nm以下、とりわけ100nm以下の粒
子であることが好ましい。セラミックスが平均粒子径5
00nmを超える粒子であると、長期間保管したとき、
セラミックスが沈降する不具合が生じることがある。ま
たこのセラミックスは、光触媒的に親水性を示す膜が得
られやすいことから、結晶質のものであることが好まし
い。The ceramic contained in the coating liquid is a non-metal inorganic material which is a constituent of the film and can exhibit photocatalytic activity when exposed to light such as visible light and ultraviolet light when formed into a film. Well, for example, Ti, Z
r, Hf, V, Nb, Ta, Cr, Mo, W, Mn, T
c, Re, Fe, Co, Ni, Ru, Rh, Pd, O
s, Ir, Pt, Cu, Ag, Au, Zn, Cd, G
a, In, Tl, Ge, Sn, Pb, Bi, La, Ce
Examples include oxides, nitrides, sulfides, oxynitrides, oxysulfides, and the like of one or more metal elements such as.
Above all, it is recommended to use an oxide of Ti, W, or Nb, which exhibits high catalytic activity upon irradiation with light, and anatase-type titanium oxide is particularly preferable. This ceramic is preferably particles having an average particle diameter of 500 nm or less,
Furthermore, it is preferable that the particles are 200 nm or less, and particularly 100 nm or less. Ceramics have an average particle size of 5
When the particles are larger than 00 nm, when stored for a long time,
There may be a problem that the ceramics settle. Further, it is preferable that this ceramic is crystalline, because a film that exhibits photocatalytic hydrophilicity is easily obtained.
【0010】上のアナターゼ型酸化チタンは、例えば、
三塩化チタン〔TiCl3〕、四塩化チタン〔TiC
l4〕、硫酸チタン〔Ti(SO4)2・mH2O、0≦m
≦20〕、オキシ硫酸チタン〔TiOSO4・nH2O、
0≦n≦20〕、オキシ塩化チタン〔TiOCl2〕の
ようなチタン化合物と、水酸化ナトリウム、水酸化カリ
ウム、炭酸ナトリウム、炭酸カリウム、アンモニア、ヒ
ドラジン、ヒドロキシルアミン、モノエタノールアミ
ン、非環式アミン化合物、環式脂肪族アミン化合物のよ
うな塩基をpH2〜7、好ましくはpH3〜5で反応さ
せ、得られる生成物にアンモニアのような塩基を混合
し、熟成した後、この熟成物を洗浄、乾燥し、焼成する
方法、またはオキシ硫酸チタンのようなチタン化合物と
過酸化水素の混合溶液に、該チタン化合物を水酸化チタ
ンにするための必要量を超える量のアンモニアを混合し
て反応させた後、この生成物を固液分離して得られる固
形物を洗浄、乾燥し、300℃〜500℃で焼成する方
法等で調製することができる。この酸化チタンには、必
要に応じて、タングステン酸化物、ニオブ酸化物、鉄酸
化物、ニッケル酸化物のような固体酸性を示す化合物ま
たはランタン酸化物、セリウム酸化物、亜鉛酸化物のよ
うな固体塩基性を示す化合物や、ビスマス酸化物やイン
ジウム酸化物のような化合物を担持してもよい。The above anatase type titanium oxide is, for example,
Titanium trichloride [TiCl 3 ], titanium tetrachloride [TiC
l 4 ], titanium sulfate [Ti (SO 4 ) 2 · mH 2 O, 0 ≦ m
≦ 20], titanium oxysulfate [TiOSO 4 · nH 2 O,
0 ≦ n ≦ 20], titanium compound such as titanium oxychloride [TiOCl 2 ] and sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, ammonia, hydrazine, hydroxylamine, monoethanolamine, acyclic amine The compound, a base such as a cycloaliphatic amine compound, is reacted at pH 2 to 7, preferably pH 3 to 5, the resulting product is mixed with a base such as ammonia, and after aging, the aged product is washed, A method of drying and firing, or a mixed solution of a titanium compound such as titanium oxysulfate and hydrogen peroxide, was mixed with an amount of ammonia in excess of the amount required to convert the titanium compound into titanium hydroxide and reacted. After that, the solid product obtained by solid-liquid separation of this product can be washed, dried, and calcined at 300 ° C. to 500 ° C. Wear. The titanium oxide may be, if necessary, a compound showing solid acidity such as tungsten oxide, niobium oxide, iron oxide, nickel oxide or a solid such as lanthanum oxide, cerium oxide and zinc oxide. A basic compound or a compound such as bismuth oxide or indium oxide may be supported.
【0011】コーティング液に含まれるセラミックスと
して、酸化タングステン(WO3)を用いるとき、この
酸化タングステンは、例えば、メタタングステン酸アン
モニウムのようなタングステン化合物を焼成する方法で
得ることができる。焼成は、タングステン化合物を酸化
タングステンにすることができる条件で行えばよく、例
えば、250℃〜600℃の空気中で行うことができ
る。また酸化ニオブ(Nb2O5)は、例えば、シュウ酸
水素ニオブのようなニオブ化合物を焼成する方法、また
はニオブペンタエトキシド、ニオブペンタイソプロポキ
シドのようなニオブアルコキシドをアルコールに溶解
し、この溶液に無機酸とアルコールとからなる酸性溶液
を混合し、濃縮して粘稠溶液を得、これを焼成する方法
で得ることができる。When tungsten oxide (WO 3 ) is used as the ceramic contained in the coating liquid, the tungsten oxide can be obtained by, for example, a method of firing a tungsten compound such as ammonium metatungstate. The firing may be performed under the condition that the tungsten compound can be changed to tungsten oxide, and can be performed in the air at 250 ° C. to 600 ° C., for example. Further, niobium oxide (Nb 2 O 5 ) can be obtained, for example, by baking a niobium compound such as niobium hydrogen oxalate or by dissolving a niobium alkoxide such as niobium pentaethoxide or niobium pentaisopropoxide in an alcohol. It can be obtained by a method in which an acidic solution consisting of an inorganic acid and an alcohol is mixed with the solution and concentrated to obtain a viscous solution, which is then calcined.
【0012】ここでは、光照射により高い触媒活性を示
すアナターゼ型酸化チタン、酸化タングステンまたは酸
化ニオブが分散質であるコーティング液について詳しく
述べたが、分散質として、前記の酸化チタン、酸化タン
グステンまたは酸化ニオブ以外の、例えば酸化亜鉛(Z
nO)、硫化亜鉛(ZnS)、酸化錫(SnO2)のよ
うなセラミックスを含むコーティング液についても、後
で示す非金属無機材料およびカルボン酸系化合物を含む
ものであれば、同様に、持続的に親水性を示し、かつ高
い機械的強度を有する膜を形成可能なコーティング液と
して用いることができる。Here, the coating liquid in which anatase type titanium oxide, tungsten oxide or niobium oxide, which exhibits high catalytic activity upon irradiation with light, is a dispersoid has been described in detail. As the dispersoid, the above-mentioned titanium oxide, tungsten oxide or oxide is used. Other than niobium, for example, zinc oxide (Z
nO), zinc sulfide (ZnS), tin oxide (SnO 2 ), etc., coating liquids containing ceramics, such as a non-metallic inorganic material and a carboxylic acid-based compound, are also sustained. It can be used as a coating liquid capable of forming a film having hydrophilicity and having high mechanical strength.
【0013】コーティング液に含まれる非金属無機材料
は、前記セラミックス以外のものであり、例えば、非晶
質シリカ、シリカゾルのようなシリカ、非晶質アルミ
ナ、アルミナゾルのようなアルミニウム(水)酸化物、ゼ
オライト、カオリナイトのようなアルミノ珪酸塩、酸化
マグネシウム、酸化カルシウム、酸化ストロンチウム、
酸化バリウム、水酸化マグネシウム、水酸化カルシウ
ム、水酸化ストロンチウムおよび水酸化バリウムのよう
なアルカリ土類金属(水)酸化物、リン酸カルシウム、モ
レキュラーシーブまたは活性炭である。またこの非金属
無機材料は、Ti、Zr、Hf、V、Nb、Ta、C
r、Mo、W、Mn、Tc、Re、Fe、Co、Ni、
Ru、Rh、Pd、Os、Ir、Pt、Cu、Ag、A
u、Zn、Cd、Ga、In、Tl、Ge、Sn、P
b、Bi、LaまたはCeのような金属元素の水酸化物
またはこれらの金属元素の非晶質酸化物であってもよ
い。これらは1種または2種以上組み合わせて用いるこ
とができる。これらの非金属無機材料は、乾燥したとき
比表面積が大きくなる傾向にあることから、セラミック
スとの接触および非金属無機材料同士の接触の面積が大
きくなって、それぞれの結合を強固なものにしていると
推察される。非金属無機材料の量は、コーティング液中
のセラミックスに対して、通常0.01モル倍以上、好
ましくは0.05モル倍以上である。非金属無機材料の
量が多いほど、膜にしたときの機械的強度が向上する。
一方、非金属無機材料の量があまり多くなると、機械的
強度は向上するものの、光触媒活性は低下することがあ
るので、コーティング液中のセラミックスに対して、5
モル倍以下、さらには2モル倍以下であることが好まし
い。The non-metal inorganic material contained in the coating liquid is other than the above-mentioned ceramics, for example, amorphous silica, silica such as silica sol, amorphous alumina, aluminum (hydr) oxide such as alumina sol. Aluminosilicates such as zeolites, kaolinite, magnesium oxide, calcium oxide, strontium oxide,
Alkaline earth metal (hydr) oxides such as barium oxide, magnesium hydroxide, calcium hydroxide, strontium hydroxide and barium hydroxide, calcium phosphate, molecular sieves or activated carbon. In addition, this non-metal inorganic material is Ti, Zr, Hf, V, Nb, Ta, C.
r, Mo, W, Mn, Tc, Re, Fe, Co, Ni,
Ru, Rh, Pd, Os, Ir, Pt, Cu, Ag, A
u, Zn, Cd, Ga, In, Tl, Ge, Sn, P
It may be a hydroxide of a metal element such as b, Bi, La or Ce, or an amorphous oxide of these metal elements. These can be used alone or in combination of two or more. Since these non-metal inorganic materials tend to have a large specific surface area when dried, the contact area between the ceramics and the non-metal inorganic materials becomes large, and each bond is strengthened. Presumed to be present. The amount of the non-metal inorganic material is usually 0.01 mol times or more, preferably 0.05 mol times or more with respect to the ceramic in the coating liquid. The larger the amount of the non-metal inorganic material, the higher the mechanical strength when formed into a film.
On the other hand, when the amount of the non-metallic inorganic material is too large, the mechanical strength is improved, but the photocatalytic activity may be decreased.
It is preferably not more than 2 times, more preferably not more than 2 times.
【0014】コーティング液に含まれるカルボン酸系化
合物は、例えば、ギ酸、酢酸、プロピオン酸のようなモ
ノカルボン酸、蓚酸、グルタル酸、コハク酸、マロン
酸、マレイン酸、アジピン酸のようなジカルボン酸、ク
エン酸のようなトリカルボン酸、酢酸アンモニウム、蓚
酸アンモニウム、蓚酸水素アンモニウム、クエン酸アン
モニウム、クエン酸水素アンモニウムのようなカルボン
酸アンモニウム、蓚酸リチウム、蓚酸水素リチウム、蓚
酸ナトリウム、蓚酸水素ナトリウム、蓚酸カリウム、蓚
酸水素カリウムのようなカルボン酸のIa族金属(アルカ
リ金属)塩、蓚酸マグネシウム、蓚酸カルシウム、蓚酸
ストロンチウム、蓚酸バリウムのようなカルボン酸のII
a族金属(アルカリ土類金属)塩、蓚酸イットリウムの
ようなカルボン酸のIIIa族金属塩、蓚酸バナジウム、蓚
酸ニオブ、蓚酸タンタルのようなカルボン酸のVa族金属
塩、蓚酸クロム、蓚酸モリブデン、蓚酸タングステンの
ようなカルボン酸のVIa族金属塩、蓚酸マンガンのよう
なカルボン酸のVIIa族金属塩、蓚酸鉄、蓚酸鉄アンモニ
ウム、蓚酸コバルト、蓚酸ニッケル、蓚酸ルテニウム、
蓚酸ロジウム、蓚酸パラジウム、蓚酸オスミウム、蓚酸
イリジウム、蓚酸白金のようなカルボン酸のVIII族金属
塩、蓚酸銅、蓚酸銀、蓚酸金のようなカルボン酸のIb族
金属塩、蓚酸亜鉛のようなカルボン酸のIIb族金属塩、
蓚酸アルミニウム、蓚酸ガリウム、蓚酸イリジウムのよ
うなカルボン酸のIIIb族金属塩、蓚酸ゲルマニウム、蓚
酸錫、蓚酸鉛のようなカルボン酸のIVb族金属塩、蓚酸
ランタン、蓚酸セリウム、蓚酸サマリウムのようなカル
ボン酸のランタノイド塩等である。また、本発明のコー
ティング液を製造するにあたっては、カルボン酸系化合
物として、上記各化合物のほか、分散媒中でこれらとな
り得る化合物、例えば、上記カルボン酸塩の水和物やカ
ルボン酸無水物を用いることもできる。カルボン酸塩の
水和物を用いた場合、分散媒中にはカルボン酸塩が含ま
れることになり、またカルボン酸無水物を用いた場合、
分散媒中にはカルボン酸が含まれることになる。このよ
うなカルボン酸系化合物を含むことにより、コーティン
グ液は高い親水性を示す膜、すなわち膜全面が親油性物
質で汚染された場合でも、光照射により親水性を回復し
て、持続的に親水性を示す膜を形成することが可能とな
る。カルボン酸系化合物の量は、コーティング液中のセ
ラミックスに対して、通常0.005モル倍以上であ
る。カルボン酸系化合物の量は多いほど、コーティング
液中のセラミックスの分散安定性が向上し、かつ得られ
る膜の親水性が向上するので好ましく、例えば0.01
モル倍以上、さらには0.03モル倍以上であることが
好ましい。一方、カルボン酸系化合物の量があまり多く
なると、量に見合う効果が得られないばかりか、得られ
る膜の親水性が低下することがあるので、400モル倍
以下、さらには5モル倍以下であることが好ましい。Examples of the carboxylic acid compound contained in the coating liquid include monocarboxylic acids such as formic acid, acetic acid and propionic acid, dicarboxylic acids such as oxalic acid, glutaric acid, succinic acid, malonic acid, maleic acid and adipic acid. Tricarboxylic acids such as citric acid, ammonium acetate, ammonium oxalate, ammonium hydrogen oxalate, ammonium citrate, ammonium carboxylates such as ammonium hydrogen citrate, lithium oxalate, lithium hydrogen oxalate, sodium oxalate, sodium hydrogen oxalate, sodium oxalate, potassium oxalate Group IIa metal (alkali metal) salts of carboxylic acids, such as potassium hydrogen oxalate, magnesium oxalate, calcium oxalate, strontium oxalate, barium oxalate II
Group a metal (alkaline earth metal) salts, Group IIIa metal salts of carboxylic acids such as yttrium oxalate, vanadium oxalate, niobium oxalate, Group Va metal salts of carboxylic acids such as tantalum oxalate, chromium oxalate, molybdenum oxalate, oxalic acid Group VIa metal salts of carboxylic acids such as tungsten, Group VIIa metal salts of carboxylic acids such as manganese oxalate, iron oxalate, ammonium iron oxalate, cobalt oxalate, nickel oxalate, ruthenium oxalate,
Group VIII metal salts of carboxylic acids such as rhodium oxalate, palladium oxalate, osmium oxalate, iridium oxalate, platinum oxalate, Group Ib metal salts of carboxylic acids such as copper oxalate, silver oxalate, gold oxalate, and carvone such as zinc oxalate. Group IIb metal salts of acids,
Group IIIb metal salts of carboxylic acids such as aluminum oxalate, gallium oxalate and iridium oxalate, group IVb metal salts of carboxylic acids such as germanium oxalate, tin oxalate, lead oxalate, carboxylic acids such as lanthanum oxalate, cerium oxalate and samarium oxalate. Examples thereof include lanthanoid salts of acids. Further, in the production of the coating liquid of the present invention, as the carboxylic acid compound, in addition to each of the above compounds, a compound capable of becoming these in a dispersion medium, for example, a hydrate of the above carboxylate salt or a carboxylic acid anhydride, It can also be used. When a hydrate of a carboxylate is used, the dispersion medium contains a carboxylate, and when a carboxylic anhydride is used,
A carboxylic acid will be contained in the dispersion medium. By including such a carboxylic acid compound, the coating liquid has a highly hydrophilic film, that is, even when the entire surface of the film is contaminated with a lipophilic substance, the hydrophilic property is restored by light irradiation and the hydrophilic property is continuously maintained. It becomes possible to form a film exhibiting the property. The amount of the carboxylic acid compound is usually 0.005 mol times or more based on the ceramic in the coating liquid. The larger the amount of the carboxylic acid compound, the better the dispersion stability of the ceramics in the coating solution and the hydrophilicity of the obtained film.
It is preferably molar times or more, and more preferably 0.03 times or more. On the other hand, if the amount of the carboxylic acid compound is too large, not only the effect commensurate with the amount is not obtained, but the hydrophilicity of the obtained film may be reduced, so that the amount is 400 mol times or less, further 5 mol times or less. Preferably there is.
【0015】本発明において、セラミックスを分散させ
る分散媒には、各種の水性媒体、エタノール、メタノー
ル、2−プロパノール、ブタノールのようなアルコール
性媒体、アセトン、2−ブタノンのようなケトン性媒体
等を適用することができる。用いる分散媒は、コーティ
ング液に含ませるカルボン酸系化合物を溶解するもので
あることが好ましく、カルボン酸系化合物に応じて適宜
選択することが好ましい。コーティング液に含ませるカ
ルボン酸系化合物が蓚酸の金属塩である場合、その金属
塩の多くのものは水溶性であるので、分散媒には水性媒
体、具体的には、イオン交換水のような水、過酸化水素
水を用いることができる。またその金属塩が水に難溶性
であっても蓚酸を併用することにより、水に溶解させる
ことができる場合がある。In the present invention, the dispersion medium in which the ceramics are dispersed includes various aqueous media, alcoholic media such as ethanol, methanol, 2-propanol and butanol, and ketone media such as acetone and 2-butanone. Can be applied. The dispersion medium used is preferably one that dissolves the carboxylic acid compound contained in the coating liquid, and is preferably selected appropriately according to the carboxylic acid compound. When the carboxylic acid compound contained in the coating liquid is a metal salt of oxalic acid, many of the metal salts are water-soluble, and therefore the dispersion medium is an aqueous medium, specifically, ion-exchanged water. Water or hydrogen peroxide water can be used. Even if the metal salt is poorly soluble in water, it may be possible to dissolve it in water by using oxalic acid together.
【0016】またコーティング剤には、その使用方法、
用途に応じて、上で示したカルボン酸系化合物以外の有
機化合物を含ませることができる。この有機化合物とし
ては、例えば、シリル化剤や界面活性剤がある。In addition, the coating agent, the method of using it,
Organic compounds other than the carboxylic acid compounds shown above can be included depending on the application. Examples of the organic compound include a silylating agent and a surfactant.
【0017】特定の非金属無機材料および有機物を含
む、本発明のコーティング剤を用いることにより、親水
性を示す、強固な膜を形成することができる。膜形成
は、例えば、ガラス、プラスチック、金属、陶磁器、コ
ンクリートのような基材の表面にコーティング剤を塗布
した後、この基材を室温〜200℃の空気中で保持する
方法、または基材表面にコーティング剤を塗布した後、
80〜200℃の熱風を吹き付ける方法で行うことがで
きる。こうして形成される膜に、太陽光または水銀灯、
蛍光灯、ハロゲンランプ、ナトリウムランプ、発光ダイ
オード、ELランプ、ガス灯等により光を照射すると、
膜は高い親水性を示す。By using the coating agent of the present invention containing a specific non-metal inorganic material and organic substance, a strong film exhibiting hydrophilicity can be formed. The film is formed by, for example, applying a coating agent to the surface of a substrate such as glass, plastic, metal, ceramics, or concrete, and then maintaining the substrate in air at room temperature to 200 ° C., or the substrate surface. After applying the coating agent to
It can be performed by a method of blowing hot air of 80 to 200 ° C. In the film thus formed, sunlight or mercury lamp,
When light is emitted from a fluorescent lamp, halogen lamp, sodium lamp, light emitting diode, EL lamp, gas lamp, etc.,
The membrane exhibits high hydrophilicity.
【0018】上で示したコーティング液は、例えば、セ
ラミックスと、非金属無機材料と、カルボン酸系化合物
と、水性媒体、アルコール性媒体およびケトン性媒体か
ら選ばれる分散媒とを混合し、この混合物に分散処理を
施す方法、またはセラミックスと、カルボン酸系化合物
と、前記分散媒とを混合し、この混合物に分散処理を施
した後、非金属無機材料を混合する方法により得ること
ができる。The coating liquid shown above is prepared by mixing, for example, ceramics, a non-metal inorganic material, a carboxylic acid compound, and a dispersion medium selected from an aqueous medium, an alcoholic medium and a ketonic medium, and a mixture thereof. Can be obtained by a dispersion treatment, or a method of mixing ceramics, a carboxylic acid compound, and the dispersion medium, subjecting this mixture to a dispersion treatment, and then mixing a nonmetallic inorganic material.
【0019】ここで用いるセラミックスは、X線回折で
求められる結晶構造をもつ、金属元素と酸素、窒素また
はイオウとの化合物であればよく、例えば、Ti、Z
r、Hf、V、Nb、Ta、Cr、Mo、W、Mn、T
c、Re、Fe、Co、Ni、Ru、Rh、Pd、O
s、Ir、Pt、Cu、Ag、Au、Zn、Cd、G
a、In、Tl、Ge、Sn、Pb、Bi、Laまたは
Ceのような金属元素の酸化物、窒化物、硫化物、酸窒
化物または酸硫化物等である。これらは1種または2種
以上組合せて用いることができる。The ceramic used here may be a compound of a metal element and oxygen, nitrogen or sulfur, which has a crystal structure determined by X-ray diffraction, and is, for example, Ti or Z.
r, Hf, V, Nb, Ta, Cr, Mo, W, Mn, T
c, Re, Fe, Co, Ni, Ru, Rh, Pd, O
s, Ir, Pt, Cu, Ag, Au, Zn, Cd, G
It is an oxide, nitride, sulfide, oxynitride or oxysulfide of a metal element such as a, In, Tl, Ge, Sn, Pb, Bi, La or Ce. These can be used alone or in combination of two or more.
【0020】セラミックスと混合されるカルボン酸系化
合物には、上で示したモノカルボン酸、ジカルボン酸、
トリカルボン酸、カルボン酸アンモニウム、カルボン酸
のアルカリ金属塩、カルボン酸のアルカリ土類金属塩、
カルボン酸のIIIa族金属塩、カルボン酸のVa族金属塩、
カルボン酸のVIa族金属塩、カルボン酸のVIIa族金属
塩、カルボン酸のVIII族金属塩、カルボン酸のIb族金属
塩、カルボン酸のIIb族金属塩、カルボン酸のIIIb族金
属塩、カルボン酸のIVb族金属塩およびカルボン酸のラ
ンタノイド塩のほか、これらとなり得る化合物、例えば
上のカルボン酸塩の水和物、無水カルボン酸等がある。
カルボン酸系化合物の混合量は、通常、所望とするコー
ティング液のカルボン酸系化合物含有量に見合う量であ
ればよい。セラミックスを分散させる観点からは、カル
ボン酸系化合物を多く用いるほど、容易に分散できるの
で、所望とするコーティング液のカルボン酸系化合物含
有量より多くのカルボン酸系化合物を混合して、分散処
理を行ってもよい。この場合には、分散処理後、後で示
すコーティング液中のカルボン酸系化合物の一部を除去
する操作を施す。また分散処理時、必要に応じて、酸ま
たは塩基を添加することによるpHを調整する操作が施
される。このとき用いる酸としては、例えば、塩酸、硝
酸、リン酸、硫酸等が挙げられ、塩基としては、例え
ば、アンモニア、尿素、ヒドラジン、水酸化リチウム、
水酸化ナトリウム、水酸化カリウム、水酸化セシウム、
水酸化ルビジウム等が挙げられる。The carboxylic acid compound mixed with the ceramic includes monocarboxylic acid, dicarboxylic acid,
Tricarboxylic acid, ammonium carboxylate, alkali metal salt of carboxylic acid, alkaline earth metal salt of carboxylic acid,
Group IIIa metal salt of carboxylic acid, Group Va metal salt of carboxylic acid,
Group VIa metal salts of carboxylic acids, Group VIIa metal salts of carboxylic acids, Group VIII metal salts of carboxylic acids, Group Ib metal salts of carboxylic acids, Group IIb metal salts of carboxylic acids, Group IIIb metal salts of carboxylic acids, Carboxylic acids Group IVb metal salts and lanthanoid salts of carboxylic acids, as well as compounds that can be these, for example, hydrates of the above carboxylates, carboxylic acid anhydrides, and the like.
The amount of the carboxylic acid compound to be mixed may be generally an amount commensurate with the desired content of the carboxylic acid compound in the coating liquid. From the viewpoint of dispersing ceramics, the more carboxylic acid compounds are used, the more easily they can be dispersed. Therefore, a dispersion treatment is performed by mixing more carboxylic acid compounds than the desired carboxylic acid compound content of the coating liquid. You can go. In this case, after the dispersion treatment, an operation of removing a part of the carboxylic acid compound in the coating liquid described later is performed. In addition, during the dispersion treatment, an operation of adjusting the pH by adding an acid or a base is performed, if necessary. Examples of the acid used at this time include hydrochloric acid, nitric acid, phosphoric acid, sulfuric acid and the like, and examples of the base include ammonia, urea, hydrazine, lithium hydroxide, and the like.
Sodium hydroxide, potassium hydroxide, cesium hydroxide,
Rubidium hydroxide etc. are mentioned.
【0021】分散処理は、例えば、湿式ミルによる方
法、超音波照射による方法、または混合物を急激に減圧
したり、高速回転する羽根で攪拌して、液中に空洞(キ
ャビティ)を発生させ、その空洞が消滅するときに生じ
る圧力変化を利用する方法、攪拌羽根やスクリュー等の
回転により発生するせん断力で分散する方法等で行うこ
とができる。これらの方法は、単独で行うこともできる
し、2以上組合せて行うこともできる。湿式ミルによる
方法の場合、分散媒体としてジルコニア、アルミナのよ
うな材質からなるビーズまたはボールを用いることがで
きる。これらの外径は、0.65mm以下、さらには
0.5mm以下、とりわけ0.3mm以下であることが
好ましい。また超音波照射による方法の場合、分散処理
は、セラミックス1g当り超音波出力として通常1Wh
以上、好ましくは10Wh以上、また10kWh以下、
好ましくは3kWh以下となる条件で行うことができ
る。これらの分散処理は、前記セラミックス主成分の結
晶構造を実質的に変えることなく、すなわちセラミック
ス主成分について、相転移させることなくX線回折スペ
クトルから求められる結晶構造を保持することができる
条件で行うことが好ましく、例えば90℃未満の温度で
行うことが推奨される。セラミックスの結晶構造を保持
する観点からは、低温で分散処理を行うことが好まし
く、80℃以下、さらには75℃以下で行うことがより
好ましい。一方、分散処理の温度があまり低くなると、
得られるコーティング液の安定性が低下することがある
ので、10℃以上、さらには20℃以上が適当である。
分散処理の時間は、分散処理の温度、使用する装置の種
類に応じて適宜選択すればよく、通常1分以上、好まし
くは1時間以上、また50時間以下、好ましくは24時
間以下である。分散処理は、複数回に分けて行ってもよ
い。The dispersion treatment is carried out by, for example, a method using a wet mill, a method using ultrasonic irradiation, abrupt depressurization of the mixture, or stirring with a blade rotating at a high speed to generate cavities in the liquid. It can be carried out by a method of utilizing a pressure change generated when the cavity disappears, a method of dispersing by a shearing force generated by rotation of a stirring blade or a screw, and the like. These methods can be performed alone or in combination of two or more. In the case of the wet mill method, beads or balls made of a material such as zirconia or alumina can be used as the dispersion medium. The outer diameter of these is preferably 0.65 mm or less, more preferably 0.5 mm or less, and particularly preferably 0.3 mm or less. Also, in the case of the method using ultrasonic irradiation, the dispersion treatment is usually performed at 1 Wh as ultrasonic output per 1 g of ceramics.
Or more, preferably 10 Wh or more, and 10 kWh or less,
It can be preferably performed under the condition of 3 kWh or less. These dispersion treatments are performed under the condition that the crystal structure of the ceramic main component is not substantially changed, that is, the crystal structure obtained from the X-ray diffraction spectrum of the ceramic main component can be retained without causing phase transition. Preference is given to performing at temperatures below 90 ° C., for example. From the viewpoint of maintaining the crystal structure of ceramics, the dispersion treatment is preferably performed at a low temperature, more preferably 80 ° C. or lower, and further preferably 75 ° C. or lower. On the other hand, if the temperature of the dispersion process becomes too low,
Since the stability of the obtained coating liquid may be lowered, 10 ° C. or higher, more preferably 20 ° C. or higher is suitable.
The time of the dispersion treatment may be appropriately selected depending on the temperature of the dispersion treatment and the type of equipment used, and is usually 1 minute or longer, preferably 1 hour or longer, and 50 hours or shorter, preferably 24 hours or shorter. The dispersion processing may be performed in multiple times.
【0022】分散処理された混合物には、必要に応じ
て、遠心分離による粗大粒子を除去する操作または希釈
によるセラミックス含有量を調整する操作が施される。
また、所望とするカルボン酸系化合物含有量に対して過
剰のカルボン酸系化合物を用いて分散処理された混合物
には、カルボン酸系化合物の一部を除去する操作を施し
て所定の濃度に調整する。カルボン酸系化合物の除去
は、例えば、光照射、加熱、酸化剤もしくは還元剤の添
加、イオン交換膜処理、オゾン処理または水熱処理等に
より行うことができる。さらに、分散処理された混合物
には、必要に応じて、酸または塩基を添加することによ
るpHを調整する操作が施される。このとき用いる酸と
しては、例えば、塩酸、硝酸、リン酸、硫酸等が挙げら
れ、塩基としては、例えば、アンモニア、尿素、ヒドラ
ジン、水酸化リチウム、水酸化ナトリウム、水酸化カリ
ウム、水酸化セシウム、水酸化ルビジウム等が挙げられ
る。If necessary, the dispersion-treated mixture is subjected to an operation of removing coarse particles by centrifugation or an operation of adjusting the ceramic content by dilution.
Further, the mixture subjected to the dispersion treatment with an excess of the carboxylic acid compound with respect to the desired carboxylic acid compound content is subjected to an operation of removing a part of the carboxylic acid compound to adjust the concentration to a predetermined value. To do. The carboxylic acid compound can be removed by, for example, light irradiation, heating, addition of an oxidizing agent or a reducing agent, ion exchange membrane treatment, ozone treatment, hydrothermal treatment, or the like. Further, the mixture subjected to the dispersion treatment is subjected to an operation of adjusting the pH by adding an acid or a base, if necessary. Examples of the acid used at this time include hydrochloric acid, nitric acid, phosphoric acid, sulfuric acid and the like, and examples of the base include ammonia, urea, hydrazine, lithium hydroxide, sodium hydroxide, potassium hydroxide, cesium hydroxide, Rubidium hydroxide etc. are mentioned.
【0023】分散処理された混合物または任意の前記操
作を施された混合物は、コーティング液として使用する
ことができる。コーティング液のセラミックス含有量
は、膜形成対象である基材の種類、所望とする膜の厚み
に応じて適宜選択すればよいが、通常0.1重量%以
上、30重量%以下であり、好ましくは1重量%以上、
10重量%以下である。このコーティング液をガラス、
プラスチック、金属、陶磁器、コンクリートのような材
料に塗布し、乾燥することにより、基材表面に膜を形成
することができる。The dispersion-treated mixture or the mixture subjected to any of the above operations can be used as a coating liquid. The ceramic content of the coating liquid may be appropriately selected according to the type of the substrate to be the film forming target and the desired film thickness, but is usually 0.1% by weight or more and 30% by weight or less, and preferably Is 1% by weight or more,
It is 10% by weight or less. This coating liquid is glass,
A film can be formed on the surface of a substrate by applying it to a material such as plastic, metal, ceramics, or concrete and drying it.
【0024】本発明のコーティング液は、光が当たらな
い条件で保管することが好ましく、例えば暗室で保管し
たり、または紫外線および可視光線の透過率が各々10
%以下の遮光性容器に入れて保管することが好ましい。
コーティング液を透明ガラス製容器に入れて、照明装置
がある屋内に長期間保管した場合には、平滑な膜を形成
することが困難になることがある。The coating liquid of the present invention is preferably stored under the condition that it is not exposed to light. For example, it is stored in a dark room, or the transmittance of ultraviolet light and visible light is 10 each.
It is preferable to store it in a light-shielding container whose content is not more than%.
When the coating liquid is put in a transparent glass container and stored indoors for a long time with a lighting device, it may be difficult to form a smooth film.
【0025】本発明の光触媒機能製品は、基材表面に、
前記のコーティング液を用いて膜形成してなる。The photocatalyst functional product of the present invention comprises a substrate surface,
A film is formed using the above coating liquid.
【0026】基材としては、光触媒機能製品を構成する
各種材料が挙げられ、例えば、ガラス、プラスチック、
金属、陶磁器、コンクリート等がある。膜形成は、スピ
ンコート、ディップコート、ドクターブレード、スプレ
ーまたはハケ塗り等により行うことができる。膜形成で
は、通常、コーティング液をスプレーまたはハケ塗り等
した後、乾燥操作を行う。乾燥温度は、コーティング液
に含まれる分散媒および非金属無機材料の種類に応じ
て、適宜選定すればよい。この光触媒機能製品は、通
常、その表面に厚さ0.02μm以上、好ましくは0.
1μm以上、また1μm以下の膜を有するものである。
この膜が光照射で活性化されることにより、膜は親水性
を示して、光触媒機能製品の汚れを防止したり、また曇
りを防止したりする。光触媒機能製品の例としては、窓
硝子、鏡、洗面台、タイル、道路側壁、道路標識、道路
照明灯、道路反射鏡、遮音板、建物外壁、街路灯、門
柱、門、郵便ポスト、雨どい、瓦、太陽電池、太陽熱温
水器、自動車、自転車、電車、飛行機、船、ドアミラ
ー、コンテナ、冷蔵庫、電子レンジ、食器乾燥機、消波
ブロック、テント、犬小屋、自動販売機等が挙げられ
る。Examples of the base material include various materials constituting the photocatalyst functional product, such as glass, plastic,
There are metals, ceramics, concrete, etc. The film formation can be performed by spin coating, dip coating, doctor blade, spraying or brush coating. In the film formation, the coating liquid is usually sprayed or brushed and then dried. The drying temperature may be appropriately selected depending on the types of the dispersion medium and the non-metal inorganic material contained in the coating liquid. This photocatalyst functional product usually has a thickness of 0.02 μm or more, preferably 0.
It has a film of 1 μm or more and 1 μm or less.
When the film is activated by irradiation with light, the film exhibits hydrophilicity and prevents the photocatalytically functional product from being soiled or fogging. Examples of photocatalytic functional products are window glass, mirrors, washbasins, tiles, road side walls, road signs, road lighting, road reflectors, sound insulation plates, building exterior walls, street lights, gate posts, gates, post boxes, rain gutters. , Roof tiles, solar cells, solar water heaters, automobiles, bicycles, trains, airplanes, ships, door mirrors, containers, refrigerators, microwave ovens, tableware dryers, wave-dissipating blocks, tents, kennels, vending machines, and the like.
【0027】[0027]
【実施例】以下、本発明を実施例により詳細に説明す
る。本実施例では、酸化チタンコーティング液について
述べるが、本発明は本実施例に限定されるものではな
い。EXAMPLES The present invention will be described in detail below with reference to examples. In this embodiment, the titanium oxide coating liquid will be described, but the present invention is not limited to this embodiment.
【0028】実施例1
オキシ硫酸チタン(テイカ製)3388gを水2258
gに溶解させ、得られた溶液に35重量%過酸化水素水
(キシダ化学製)1309gを添加して、混合溶液を調
製した。pH電極と、このpH電極に接続され、25重
量%アンモニア水(試薬特級、和光純薬工業製)を供給
してpHを一定に調整する機構を有するpHコントロー
ラーとを備えた反応容器にイオン交換水4700gを入
れた。pHコントローラーのpH設定を4とし、水のp
Hを希硫酸を用いて設定値に調整した。またアンモニア
水を供給するときの速度は17.9ml/分に設定し
た。この反応容器では、容器内の液のpHが設定値より
低くなると、アンモニア水が供給されはじめ、pHが設
定値になるまで前記速度にて連続供給される。この反応
容器に、117rpmで攪拌しながら、上で得られた混
合溶液を14.9ml/分で添加し、pHコントローラ
ーにより反応容器に供給されるアンモニア水と反応させ
て、生成物を得た。このときの反応温度は、23℃〜3
5℃の範囲であった。得られた生成物を攪拌しながら1
時間保持し、ついで25重量%アンモニア水(試薬特
級、和光純薬工業製)を供給して、スラリーを得た。反
応容器に供給されたアンモニア水の合計量は3746g
であり、オキシ硫酸チタンを水酸化チタンに変えるため
に必要な量の2倍であった。上のスラリーを濾過し、得
られた固形物をイオン交換水で洗浄し、乾燥して、粉末
を得た。この粉末を370℃の空気中で1時間焼成した
後、室温まで冷却して、含水率15重量%の粒子状アナ
ターゼ型酸化チタンを得た。Example 1 3388 g of titanium oxysulfate (made by Teika) was added to 2258 of water.
g, and 1309 g of 35 wt% hydrogen peroxide solution (Kishida Chemical Co., Ltd.) was added to the resulting solution to prepare a mixed solution. Ion exchange into a reaction vessel equipped with a pH electrode and a pH controller connected to the pH electrode and having a mechanism for supplying 25 wt% ammonia water (special grade reagent, manufactured by Wako Pure Chemical Industries) to adjust the pH to a constant value 4700 g of water was added. Set the pH of the pH controller to 4 and p
H was adjusted to the set value with dilute sulfuric acid. The rate of supplying the ammonia water was set to 17.9 ml / min. In this reaction container, when the pH of the liquid in the container becomes lower than the set value, ammonia water starts to be supplied and is continuously supplied at the above rate until the pH reaches the set value. The mixed solution obtained above was added to this reaction vessel at 14.9 ml / min while stirring at 117 rpm, and reacted with aqueous ammonia supplied to the reaction vessel by a pH controller to obtain a product. The reaction temperature at this time is 23 ° C to 3 ° C.
It was in the range of 5 ° C. 1 while stirring the resulting product
After maintaining for a while, 25% by weight aqueous ammonia (special grade reagent, manufactured by Wako Pure Chemical Industries, Ltd.) was supplied to obtain a slurry. The total amount of ammonia water supplied to the reaction vessel is 3746 g
And twice the amount required to convert titanium oxysulfate to titanium hydroxide. The above slurry was filtered, and the obtained solid substance was washed with ion-exchanged water and dried to obtain a powder. This powder was calcined in air at 370 ° C. for 1 hour and then cooled to room temperature to obtain particulate anatase-type titanium oxide having a water content of 15% by weight.
【0029】蓚酸二水和物〔C2H2O4・2H2O〕(二
酸化硫黄自動分析機用試薬、和光純薬工業製)1.58
gを水88.42gに溶解させ、得られた蓚酸水溶液に
上の粒子状アナターゼ型酸化チタン10gを混合した。
この混合物を媒体攪拌式粉砕機(商品名“4TSG-1/8”、
五十嵐機械製作所製)を用いて、媒体:外径0.3mm
のジルコニア製ビーズ、処理温度:20℃、処理時間:
9時間の条件で、分散処理して、混合液を得た。Oxalic acid dihydrate [C 2 H 2 O 4 .2H 2 O] (reagent for sulfur dioxide automatic analyzer, manufactured by Wako Pure Chemical Industries, Ltd.) 1.58
g was dissolved in 88.42 g of water, and 10 g of the particulate anatase-type titanium oxide was mixed with the obtained aqueous oxalic acid solution.
This mixture was mixed with a medium agitator (trade name "4TSG-1 / 8",
Igarashi Machinery Co., Ltd.), medium: outer diameter 0.3 mm
Zirconia beads, processing temperature: 20 ° C., processing time:
The dispersion treatment was performed under the condition of 9 hours to obtain a mixed liquid.
【0030】この混合液100gとシリカゾル(商品名
“スノーテックスST-O”、日産化学工業製)20gを混合し
て、コーティング液を得る。ガラス板をアンモニア水と
過酸化水素水の混合溶液に浸漬し、超音波洗浄し、つい
で取り出したガラス板の片面に上記のコーティング液を
ハケ塗りし、自然乾燥して、膜を形成すれば、ガラス板
に光触媒機能を付与することができる。100 g of this mixed solution and 20 g of silica sol (trade name "Snowtex ST-O", manufactured by Nissan Chemical Industries) are mixed to obtain a coating solution. If the glass plate is immersed in a mixed solution of ammonia water and hydrogen peroxide solution, ultrasonically cleaned, then the above coating solution is brushed on one side of the glass plate taken out, and naturally dried to form a film. A photocatalytic function can be imparted to the glass plate.
【0031】[0031]
【発明の効果】本発明のコーティング剤によれば、ガラ
ス、プラスチック、金属、陶磁器、コンクリートのよう
な材料の表面に親水性を付与することができる。また本
発明の光触媒機能製品は親水性を示す強固な膜を有する
ものであり、この膜は汚れまたは曇りを防止するもので
あるので、この製品を用いれば、長期にわたって洗浄等
の回数を低減できる。According to the coating agent of the present invention, hydrophilicity can be imparted to the surface of materials such as glass, plastic, metal, ceramics and concrete. Further, the photocatalyst functional product of the present invention has a strong film exhibiting hydrophilicity, and since this film prevents fouling or fogging, the number of times of washing etc. can be reduced over a long period of time by using this product. .
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C09D 5/00 C09D 5/00 Z C09K 3/00 C09K 3/00 R 112 112 (72)発明者 安東 博幸 愛媛県新居浜市惣開町5番1号 住友化学 工業株式会社内 Fターム(参考) 4G047 CA02 CB05 CC03 CD03 CD07 4G069 BA01A BA02A BA02B BA04A BA04B BA05A BA07A BA08A BA48A BB04A BB06A BB14A BC08A BC15A BC16A BC20A BC25A BC30A BC35A BC36A BC42A BC43A BC52A BC53A BC57A BC61A BC65A BC69A BD05A CD10 DA06 EC22Y ED02 FA03 FB23 ZA43A 4J038 AA01 HA146 HA186 HA426 HA436 HA446 HA456 JA43 KA06 KA09 NA06 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C09D 5/00 C09D 5/00 Z C09K 3/00 C09K 3/00 R 112 112 (72) Inventor Hiroyuki Ando Sumitomo Chemical Industrial Co., Ltd. F-term 5-1 Sokai-cho, Niihama-shi, Ehime (reference) 4G047 CA02 CB05 CC03 CD03 CD07 4G069 BA01A BA02A BA02B BA04A BA04B BA05A BA07A BA08A BA48A BCA25 BC36A30A BC30A16A BC16A BC52A BC53A BC57A BC61A BC65A BC69A BD05A CD10 DA06 EC22Y ED02 FA03 FB23 ZA43A 4J038 AA01 HA146 HA186 HA426 HA436 HA446 HA456 JA43 KA06 KA09 NA06
Claims (4)
非金属無機材料、分散媒およびカルボン酸系化合物を含
むことを特徴とするコーティング液。1. A coating liquid comprising ceramics, a non-metal inorganic material other than the ceramics, a dispersion medium, and a carboxylic acid compound.
記載のコーティング液。2. The ceramic is crystalline.
The coating liquid described.
ム酸化物、アルミニウム水酸化物、アルミノ珪酸塩、ア
ルカリ土類金属酸化物、アルカリ土類金属水酸化物、リ
ン酸カルシウム、モレキュラーシーブ、活性炭または、
Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、
Mn、Tc、Re、Fe、Co、Ni、Ru、Rh、P
d、Os、Ir、Pt、Cu、Ag、Au、Zn、C
d、Ga、In、Tl、Ge、Sn、Pb、Bi、La
およびCeから選ばれる金属元素の水酸化物もしくはこ
れらの金属元素の非晶質酸化物である請求項2記載のコ
ーティング液。3. The non-metal inorganic material is silica, aluminum oxide, aluminum hydroxide, aluminosilicate, alkaline earth metal oxide, alkaline earth metal hydroxide, calcium phosphate, molecular sieve, activated carbon, or
Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W,
Mn, Tc, Re, Fe, Co, Ni, Ru, Rh, P
d, Os, Ir, Pt, Cu, Ag, Au, Zn, C
d, Ga, In, Tl, Ge, Sn, Pb, Bi, La
The coating liquid according to claim 2, which is a hydroxide of a metal element selected from and Ce or an amorphous oxide of these metal elements.
項に記載のコーティング液を用いて膜形成してなる光触
媒機能製品。4. The substrate according to any one of claims 1 to 3 on the surface thereof.
A photocatalytic functional product obtained by forming a film using the coating liquid according to the item.
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JP2001372868A JP2003171578A (en) | 2001-12-06 | 2001-12-06 | Coating liquid and photocatalyst functional product |
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Family
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