JP2003160315A - Method for synthesizing polycrystalline semiconductor compound - Google Patents

Method for synthesizing polycrystalline semiconductor compound

Info

Publication number
JP2003160315A
JP2003160315A JP2001355587A JP2001355587A JP2003160315A JP 2003160315 A JP2003160315 A JP 2003160315A JP 2001355587 A JP2001355587 A JP 2001355587A JP 2001355587 A JP2001355587 A JP 2001355587A JP 2003160315 A JP2003160315 A JP 2003160315A
Authority
JP
Japan
Prior art keywords
boat
group
raw material
synthesizing
iii
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001355587A
Other languages
Japanese (ja)
Other versions
JP3888142B2 (en
Inventor
Yasushi Sugano
保至 菅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP2001355587A priority Critical patent/JP3888142B2/en
Publication of JP2003160315A publication Critical patent/JP2003160315A/en
Application granted granted Critical
Publication of JP3888142B2 publication Critical patent/JP3888142B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for synthesizing a III-V group polycrystalline semiconductor compound by which a reusable life of a boat for synthesis can be improved. <P>SOLUTION: The method for synthesizing the III-V group polycrystalline semiconductor compound is said that the boat 4 with a slit 51 packed with a III group raw material is placed at one end side in a sealed tube and meanwhile a V group raw material is placed at another end side and then the sealed tube is heated in this condition. The boat 4 is comprised of belt-like notched parts 52 lengthened from the open peripheries at the both open ends of the cylindrical wall of the boat body 50 to the slit ends direction and cover parts 60 screwed at the both open ends of the boat body holding the heat-resistant film disks 70 with projection parts 71 fitted to the belt-like notched parts. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、GaP等III−V
族化合物半導体多結晶の合成方法に係り、特に、合成用
ボート内に充填されたIII族原料がボート本体と蓋材と
の螺着部位へ漏出する現象を防止できると共に、合成終
了後に蓋材をボート本体から外す際の合成用ボートの欠
けや破損も防止されてその再使用寿命の改善が図れるII
I−V族化合物半導体多結晶の合成方法に関するもので
ある。
TECHNICAL FIELD The present invention relates to GaP, etc. III-V
The present invention relates to a method for synthesizing a group-compound semiconductor polycrystal, and in particular, it can prevent a phenomenon in which a group III raw material filled in a synthesis boat leaks to a screwing portion between a boat body and a lid material, and a lid material is used after the synthesis is completed. The synthetic boat is prevented from being chipped or damaged when it is removed from the boat body, and its reuse life can be improved. II
The present invention relates to a method for synthesizing a group IV compound semiconductor polycrystal.

【0002】[0002]

【従来の技術】GaP等のIII−V族化合物半導体は、
従来、レーザダイオード、発光ダイオードのようなオプ
トデバイスやHEMTのような高速デバイス等の材料に
利用されている。
2. Description of the Related Art III-V group compound semiconductors such as GaP are
Conventionally, it has been used as a material for optical devices such as laser diodes and light emitting diodes and high-speed devices such as HEMTs.

【0003】そして、このようなIII−V族化合物半導
体は、Ga等のIII族原料とP等のV族原料を直接反応
させて単結晶を成長させることが困難なため、III−V
族化合物半導体多結晶をまず合成し、次いでこのIII−
V族化合物半導体多結晶を用いてLEC法等によりIII
−V族化合物半導体単結晶を成長させる方法が採られて
いる。
In such III-V group compound semiconductors, it is difficult to directly react a III group material such as Ga and a V group material such as P to grow a single crystal.
Group III compound semiconductor polycrystals were first synthesized and then III-
Using the VEC compound semiconductor polycrystal by the LEC method etc. III
A method of growing a group V compound semiconductor single crystal has been adopted.

【0004】ところで、上記III−V族化合物半導体多
結晶は、図2に示すように各原料が充填された石英等か
ら成る封管1を横型高圧炉2内に搬入して合成する方法
が採られている。
The III-V group compound semiconductor polycrystal is synthesized by loading a sealed tube 1 made of quartz or the like filled with each raw material into a horizontal high-pressure furnace 2 as shown in FIG. Has been.

【0005】すなわち、図2に示すようにGa等のIII
族原料3は、スリット51が設けられた合成用ボート4
(図3参照)内に充填されると共に、ボート4全体を石
英等から成る内管5内に収容して上記封管1の一端側に
配置され、P等のV族原料6は、熱遮蔽板7を介し上記
封管1の他端側に配置される。尚、原料等が充填された
封管1は、その後真空にして封じ切られる。
That is, as shown in FIG.
The group raw material 3 is the boat 4 for synthesis provided with the slit 51.
(See FIG. 3) and the entire boat 4 is housed in an inner tube 5 made of quartz or the like and arranged on one end side of the sealed tube 1. The V group raw material 6 such as P is heat shielded. It is arranged on the other end side of the sealed tube 1 via a plate 7. The sealed tube 1 filled with the raw material and the like is then evacuated and completely sealed.

【0006】次に、真空にして封じ切られた上記封管1
は、中央に高周波コイル8を有しこの高周波コイル8を
中央に挟んでその両側に抵抗ヒータ9を有する高圧容器
にて構成された横型高圧炉2内に搬入される。
Next, the sealed tube 1 is evacuated and sealed.
Is carried into a horizontal high-pressure furnace 2 constituted by a high-pressure vessel having a high-frequency coil 8 in the center and sandwiching the high-frequency coil 8 in the center and having resistance heaters 9 on both sides thereof.

【0007】そして、横型高圧炉2内において封管1全
体が加熱され、高周波コイル8により合成用ボート4内
のIII族原料3が局所的に更に高温に加熱されると共
に、V族原料6から発生した原料ガスが上記熱遮蔽板7
に取付けられた導入管10を介し内管5内に導入されて
上記III族原料3と反応し、かつ、上記封管1を矢印α
方向へ横型高圧炉2内を移動させるか封管1を固定して
上記横型高圧炉2を逆方向へ移動させる等して(すなわ
ち、高温部を相対移動させる)III−V族化合物半導体
多結晶が合成される。
Then, the whole sealed tube 1 is heated in the horizontal high-pressure furnace 2, the group III raw material 3 in the synthesis boat 4 is locally heated to a higher temperature by the high-frequency coil 8, and the group V raw material 6 is also heated. The generated source gas is the heat shield plate 7
Is introduced into the inner pipe 5 through the introduction pipe 10 attached to the inner pipe 5 and reacts with the group III raw material 3 and the sealed pipe 1 is connected with the arrow α.
III-V group compound semiconductor polycrystal by moving the inside of the horizontal high-pressure furnace 2 or fixing the sealed tube 1 and moving the horizontal high-pressure furnace 2 in the opposite direction (that is, relatively moving the high temperature part). Is synthesized.

【0008】[0008]

【発明が解決しようとする課題】ところで、III−V族
化合物半導体多結晶の合成方法に用いられる合成用ボー
ト4は、図3および図4に示すように上部長手方向に直
線状のスリット51が開設された円筒状ボート本体50
とこのボート本体50の両開放端に螺着される蓋材60
とでその主要部が構成されており、上記スリット51の
みが開放されて原料ガスがボート4内に出入りできるよ
うになっている。
By the way, as shown in FIGS. 3 and 4, the synthesizing boat 4 used in the method for synthesizing a III-V group compound semiconductor polycrystal has a linear slit 51 in the upper longitudinal direction. Cylindrical boat body 50 opened
And a lid member 60 screwed to both open ends of the boat body 50.
The main part is constituted by and, and only the slit 51 is opened so that the raw material gas can enter and exit the boat 4.

【0009】そして、上記蓋材60とボート本体50に
設けられた螺子部を介して互いに螺着される構造になっ
ているため、蓋材60の螺子部やボート本体50の螺子
部に欠けが存在したり緩みが生ずると、これ等螺着部位
に隙間ができ、合成用ボート4内に充填されたIII族原
料が上記螺着部位へ漏出することがあった。
Since the lid member 60 and the boat body 50 are screwed to each other via the screw portions provided on the boat body 50, the screw portion of the lid member 60 and the screw portion of the boat body 50 are not damaged. If they were present or loosened, gaps were created at these screwed parts, and the group III raw material filled in the synthesis boat 4 could leak to the screwed parts.

【0010】この状態でIII−V族化合物半導体多結晶
の合成を行った場合、上記螺着部位へ漏出したIII族原
料の一部とV族の原料ガスとがこの部位で反応してIII
−V族化合物半導体多結晶を生成してしまうことがあ
り、螺着部位に生成した上記結晶が原因となって化合物
半導体多結晶の合成を終了した時点でボート本体50か
ら蓋材60を外す場合に蓋材60が外れ難くなる問題を
有していた。
When the III-V compound semiconductor polycrystal is synthesized in this state, a part of the group III raw material leaked to the screwing portion reacts with the group V raw material gas at this portion, and III
A case where a group V compound semiconductor polycrystal may be generated, and the cover material 60 is removed from the boat body 50 at the time when the synthesis of the compound semiconductor polycrystal is completed due to the crystal formed in the screwing portion. In addition, there is a problem that the lid member 60 is difficult to come off.

【0011】尚、ボート本体50から蓋材60を強引に
外そうとした場合、合成用ボート4に欠けや破損が発生
し易く、合成用ボート4の再使用が阻害されてIII−V
族化合物半導体多結晶の製造コストを上昇させる問題が
あつた。
When the lid member 60 is forcibly removed from the boat body 50, the synthesis boat 4 is apt to be chipped or damaged, which hinders the reuse of the synthesis boat 4 and III-V.
There is a problem of increasing the manufacturing cost of the group compound semiconductor polycrystal.

【0012】また、蓋材60近傍にIII族原料が未反応
状態で残留した場合、未反応のIII族原料を介し合成さ
れたIII−V族化合物半導体多結晶と蓋材60とが接着
してしまうことがあり、上記同様、蓋材60を強引に外
そうとした場合、合成用ボート4に欠けや破損が発生し
易く、合成用ボート4の再使用が阻害されてIII−V族
化合物半導体多結晶の製造コストを上昇させる問題があ
つた。
Further, when the group III raw material remains in the unreacted state in the vicinity of the lid member 60, the III-V compound semiconductor polycrystal synthesized through the unreacted group III raw material and the lid member 60 adhere to each other. Similarly to the above, if the lid member 60 is forcibly removed, the synthesis boat 4 is likely to be chipped or damaged, and the reuse of the synthesis boat 4 is hindered and the III-V group compound semiconductor is prevented. There was a problem of increasing the manufacturing cost of the polycrystal.

【0013】本発明はこの様な問題点に着目してなされ
たもので、その課題とするところは、ボート内に充填さ
れたIII族原料がボート本体と蓋材との螺着部位へ漏出
する現象を防止できると共に、合成終了後に蓋材をボー
ト本体から外す際の合成用ボートの欠けや破損も防止さ
れてその再使用寿命の改善が図れるIII−V族化合物半
導体多結晶の合成方法を提供することにある。
The present invention has been made by paying attention to such a problem, and the problem is that the group III raw material filled in the boat leaks to the screwed portion between the boat body and the lid. A method for synthesizing a group III-V compound semiconductor polycrystal, which can prevent the phenomenon, and also prevent the synthetic boat from being chipped or damaged when the lid material is removed from the boat body after the synthesis is completed to improve the reuse life thereof. To do.

【0014】[0014]

【課題を解決するための手段】すなわち、請求項1に係
る発明は、上部長手方向に直線状のスリットが開設され
た円筒状ボート本体とこのボート本体の両開放端に螺着
される蓋材とでその主要部が構成されるボート内にIII
族原料を充填し、このボートを封管内の一端側に配置す
る一方、封管内の他端側にはV族原料を配置し、上記封
管全体を加熱すると共にボート内のIII族原料を局所的
に更に高温に加熱してV族原料から発生した原料ガスと
上記III族原料を反応させ、かつ、上記高温部を徐々に
相対移動させながらIII−V族化合物半導体多結晶を合
成する化合物半導体多結晶の合成方法を前提とし、ボー
ト本体の両開放端側筒壁面にその開放縁部から上記スリ
ット端方向へ延びる帯状切欠部をそれぞれ設けると共
に、ボート本体の開放面よりわずかに大きくかつその外
周縁の一部に上記帯状切欠部に嵌合される突起片が設け
られた円形若しくは多角形状の耐熱性フィルム体を間に
介在させた状態でボート本体の両開放端に蓋材をそれぞ
れ螺着して上記ボートが構成されていることを特徴と
し、請求項2に係る発明は、請求項1記載の発明に係る
化合物半導体多結晶の合成方法を前提とし、上記ボート
本体並びに蓋体が黒鉛で構成され、かつ、耐熱性フィル
ム体がカーボンフィルムで構成されていることを特徴と
するものである。
That is, the invention according to claim 1 is to provide a cylindrical boat body having a linear slit formed in the upper longitudinal direction and a lid screwed to both open ends of the boat body. In the boat, the main part of which is made of timber and
A group V raw material is filled, and the boat is placed on one end side in the sealed tube, while a group V raw material is placed on the other end side in the sealed tube to heat the entire sealed tube and locally feed the group III raw material in the boat. Compound semiconductor for synthesizing a group III-V compound semiconductor polycrystal while heating the gas to a higher temperature by reacting the source gas generated from the group V source with the group III source and gradually moving the high temperature part relatively Assuming a method of synthesizing a polycrystal, strip-shaped notches extending from the open edge toward the slit end are provided on both open end side cylinder wall surfaces of the boat body, respectively, and are slightly larger than the open surface of the boat body and outside thereof. With a circular or polygonal heat-resistant film body provided with a protruding piece fitted to the above-mentioned band-shaped cutout part at a part of the peripheral edge, a lid member is screwed to both open ends of the boat main body, respectively. Then the above boat is constructed The invention according to claim 2 is based on the method for synthesizing a compound semiconductor polycrystal according to claim 1, wherein the boat body and the lid are made of graphite, and the heat resistance is high. The characteristic film body is composed of a carbon film.

【0015】そして、これ等請求項1〜2記載の発明に
係る化合物半導体多結晶の合成方法によれば、ボート本
体の両開放端側筒壁面にその開放縁部から上記スリット
端方向へ延びる帯状切欠部をそれぞれ設けると共に、ボ
ート本体の開放面よりわずかに大きくかつその外周縁の
一部に上記帯状切欠部に嵌合される突起片が設けられた
円形若しくは多角形状の耐熱性フィルム体を間に介在さ
せた状態でボート本体の両開放端に蓋材をそれぞれ螺着
して上記ボートが構成されているため、蓋材の螺子部や
ボート本体の螺子部に欠けが存在したり緩みが生じてこ
れ等螺着部位に隙間ができても、蓋材とボート本体の開
放端間に介在された上記耐熱性フィルム体の作用により
ボート内に充填されたIII族原料が上記螺着部位へ漏出
することがなく、更に、上記蓋材近傍にIII族原料が未
反応状態で残留した場合でも、上記耐熱性フィルム体の
作用により合成されたIII−V族化合物半導体多結晶と
蓋材とが接着してしまうこともない。
According to the method for synthesizing a compound semiconductor polycrystal according to the present invention, the strip shape extending from the open edges toward the slit ends on both open end side cylinder wall surfaces of the boat body. A circular or polygonal heat-resistant film body is provided, which is provided with notches, is slightly larger than the open surface of the boat body, and is provided with a protruding piece that fits into the above-mentioned notch on a part of its outer peripheral edge. Since the boat is constructed by screwing the lid material to both open ends of the boat body in a state of being interposed in the boat, the screw portion of the lid material and the screw portion of the boat body may be chipped or loosened. Even if a gap is created at these screwed parts, the heat-resistant film body interposed between the lid material and the open end of the boat body causes the group III raw material filled in the boat to leak to the screwed parts. Without doing Even when the group III raw material remains in the unreacted state in the vicinity of the lid material, the III-V compound semiconductor polycrystal synthesized by the action of the heat resistant film body and the lid material do not adhere to each other. .

【0016】従って、化合物半導体多結晶の合成を終了
した時点で蓋材をボート本体から容易に外すことがで
き、かつ、上記ボートの再使用が阻害されることもな
い。
Therefore, the lid member can be easily removed from the boat body when the synthesis of the compound semiconductor polycrystal is completed, and the reuse of the boat is not hindered.

【0017】[0017]

【発明の実施の形態】以下、本発明の実施の形態につい
て、図面を参照して詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below in detail with reference to the drawings.

【0018】すなわち、この実施の形態に係る化合物半
導体多結晶の合成方法は、III族原料を充填するボート
が図1に示すような構造に変更されている点を除き従来
の合成方法と略同一である。
That is, the method of synthesizing the compound semiconductor polycrystal according to this embodiment is substantially the same as the conventional synthesis method except that the boat for filling the group III raw material has a structure as shown in FIG. Is.

【0019】まず、ボート4は、図1に示すように筒壁
面の上部長手方向に直線状のスリット51が開設されか
つ両開放端側筒壁面に上記スリット51より広幅で筒壁
開放縁部から延びてスリット51端に接続される帯状切
欠部52がそれぞれ設けられた黒鉛製の円筒状ボート本
体50と、この円筒状ボート本体50の両開放端にそれ
ぞれ螺着される黒鉛製の蓋材60と、上記円筒状ボート
本体50と蓋材60との間に介在され円筒状ボート本体
50の内径よりわずかに大きい直径を有しかつその外周
縁の一部に上記帯状切欠部52に嵌合される突起片71
を有する円形状の耐熱性フィルム体70とでその主要部
が構成され、このボート4内には図2に示すようにIII
族原料3が充填されている。
First, in the boat 4, as shown in FIG. 1, linear slits 51 are formed in the upper longitudinal direction of the cylindrical wall surface, and the cylindrical wall open edge portions are wider than the slits 51 on both open end side cylindrical wall surfaces. And a cylindrical boat main body 50 made of graphite, which is provided with strip notches 52 connected to the ends of the slits 51, and a lid made of graphite screwed to both open ends of the cylindrical boat main body 50. 60, which is interposed between the cylindrical boat main body 50 and the lid member 60, has a diameter slightly larger than the inner diameter of the cylindrical boat main body 50, and is fitted to the strip notch 52 at a part of the outer peripheral edge thereof. Projected piece 71
The main part of the heat-resistant film 70 having a circular shape is
The group raw material 3 is filled.

【0020】そして、上記III族原料3が充填されたボ
ート4は石英内管5内に収納され、図2に示すように石
英内管5毎、石英封管(外管)1内の一端側に配置され
ると共に、石英封管1の他端側にはV族原料6が配置さ
れ、かつ、石英封管1の略中央部には不透明石英製の熱
遮蔽板7が配置される。尚、熱遮蔽板7には導入管10
が取付けられており、この導入管10を介してV族原料
6が配置された空間と石英内管5とが連通するようにな
っている。
The boat 4 filled with the group III raw material 3 is housed in a quartz inner tube 5 and, as shown in FIG. 2, each quartz inner tube 5 and one end of the quartz sealed tube (outer tube) 1 In addition, the group V raw material 6 is arranged on the other end side of the quartz sealed tube 1, and the heat shielding plate 7 made of opaque quartz is arranged substantially in the center of the quartz sealed tube 1. The heat shield plate 7 has an introduction pipe 10
The quartz tube 5 is communicated with the space in which the group V raw material 6 is arranged through the introduction tube 10.

【0021】次に、石英内管5、熱遮蔽板7およびV族
原料6等が収納された石英封管(外管)1の口を塞ぎ、
真空引きを行なった後、封止切る。
Next, the opening of the quartz sealed tube (outer tube) 1 containing the quartz inner tube 5, the heat shield plate 7, the group V raw material 6 and the like is closed,
After vacuuming, the seal is cut off.

【0022】次に、中央に高周波コイル8を有しこの高
周波コイル8を中央に挟んでその両側に抵抗ヒータ9を
有する高圧容器にて構成された横型高圧炉2内に、封じ
切られた上記石英封管(外管)1を搬入し、横型高圧炉
2の高圧容器内に窒素等不活性ガスを充填して高圧炉内
を高圧状態に設定した後、抵抗ヒータ9を作用させて石
英封管(外管)1全体を加熱し、かつ、高周波コイル8
を作用させてボート4内におけるIII族原料3を局所的
に更に高温に加熱する。
Next, the horizontal high-pressure furnace 2 constituted by a high-pressure vessel having a high-frequency coil 8 in the center and having resistance heaters 9 on both sides of the high-frequency coil 8 sandwiched in the center is sealed and sealed. After the quartz sealing tube (outer tube) 1 is carried in and the high-pressure vessel of the horizontal high-pressure furnace 2 is filled with an inert gas such as nitrogen to set the inside of the high-pressure furnace to a high pressure state, the resistance heater 9 is operated to seal the quartz. The entire tube (outer tube) 1 is heated and the high frequency coil 8
To locally heat the group III raw material 3 in the boat 4 to a higher temperature.

【0023】そして、熱遮蔽板7に取付けられた導入管
10を介し上記石英内管5内に導入されたV族原料6か
らの原料ガスとボート4内におけるIII族原料3とを反
応させ、かつ、上記石英封管(外管)1若しくは横型高
圧炉2を移動(すなわち、高温部を相対移動)させ、ボ
ート4内で上記反応を順次進行させてIII−V族化合物
半導体多結晶を合成する。
Then, the raw material gas from the group V raw material 6 introduced into the quartz inner tube 5 through the introduction tube 10 attached to the heat shield plate 7 is reacted with the group III raw material 3 in the boat 4, Further, the quartz sealed tube (outer tube) 1 or the horizontal high-pressure furnace 2 is moved (that is, the high temperature portion is relatively moved), and the above reactions are sequentially advanced in the boat 4 to synthesize a III-V group compound semiconductor polycrystal. To do.

【0024】この実施の形態に係る合成方法によれば、
ボート本体50の両開放端側筒壁面にスリット51より
広幅で筒壁開放縁部から延びてスリット51端に接続さ
れる帯状切欠部52がそれぞれ設けられていると共に、
ボート本体50の内径よりわずかに大きい直径を有しか
つその外周縁の一部に上記帯状切欠部52に嵌合される
突起片71を設けた円形状の耐熱性フィルム体70を間
に介在させた状態でボート本体50の両開放端に蓋材6
0がそれぞれ螺着されているため、蓋材60の螺子部や
ボート本体50の螺子部に欠けが存在したり緩みが生じ
てこれ等螺着部位に隙間ができていても、蓋材60とボ
ート本体50の開放端間に介在された上記耐熱性フィル
ム体70の作用によりボート4内に充填されたIII族原
料3が上記螺着部位へ漏出することがなく、更に、上記
蓋材60近傍にIII族原料3が未反応状態で残留した場
合でも、上記耐熱性フィルム体70の作用により合成さ
れたIII−V族化合物半導体多結晶と蓋材60とが接着
してしまうこともない。
According to the synthesis method of this embodiment,
Strip-shaped notches 52 that are wider than the slits 51 and extend from the cylinder wall open edge portion and are connected to the ends of the slits 51 are provided on both open-end-side cylinder wall surfaces of the boat body 50, respectively.
A circular heat-resistant film body 70 having a diameter slightly larger than the inner diameter of the boat main body 50 and provided with a protruding piece 71 fitted to the band-shaped notch 52 on a part of its outer peripheral edge is interposed. Lid 6 on both open ends of the boat body 50
Since 0 is screwed to each of them, even if the screw portion of the lid member 60 or the screw portion of the boat main body 50 is chipped or loosened to form a gap in these screwed portions, The heat-resistant film body 70 interposed between the open ends of the boat body 50 prevents the group III raw material 3 filled in the boat 4 from leaking to the screwing portion, and further, in the vicinity of the lid member 60. Even when the group III raw material 3 remains in the unreacted state, the III-V group compound semiconductor polycrystal synthesized by the action of the heat resistant film body 70 and the lid member 60 do not adhere to each other.

【0025】従って、化合物半導体多結晶の合成を終了
した時点で蓋材60をボート本体50から外す際に、従
来のように蓋材60が外れ難くなるようなことがなく、
ボート4の再使用が阻害されるようなこともない利点を
有している。
Therefore, when the lid member 60 is removed from the boat body 50 at the time when the synthesis of the compound semiconductor polycrystal is completed, the lid member 60 does not easily come off unlike the conventional case.
It has the advantage that reuse of the boat 4 is not hindered.

【0026】尚、ボート本体50の両開放端側筒壁面に
設けられる上記帯状切欠部52の幅寸法についてはスリ
ット51と同一幅若しくは狭幅であってもよく、また、
帯状切欠部52がスリット51端に必ずしも接続される
必要はない。
The width dimensions of the band-shaped notches 52 provided on the cylinder wall surfaces on both open end sides of the boat body 50 may be the same as or narrower than the slit 51.
The strip notch 52 does not necessarily have to be connected to the end of the slit 51.

【0027】また、上記耐熱性フィルム体70の材質と
しては、例えば、カーボンフィルムや熱分解窒化ホウ素
(p−BN)製フィルム等が挙げられる。また、耐熱性
フィルム体70の直径はボート本体50の内径よりもわ
ずかに大きければよく、この耐熱性フィルム体70を蓋
材60とボート本体50の開放端間に介在させることに
よりボート4内に充填されたIII族原料3が螺着部位へ
漏出しなくなるような寸法なら任意である。尚、ボート
4内に充填されたIII族原料3の上記螺着部位への漏出
が防止されるなら耐熱性フィルム体70の形状は円形状
に限定されるものではなく、例えば、ボート本体の開放
面よりわずかに大きい正八角形状など多角形状であって
もよい。更に、上記耐熱性フィルム体70の外周縁に設
けられる突起片71の幅寸法についても、この突起片7
1がボート本体50の上記帯状切欠部52に嵌合されて
ボート4内で保持されればよくこれ等寸法も任意であ
る。
Examples of the material of the heat resistant film body 70 include carbon film and pyrolytic boron nitride (p-BN) film. Further, the diameter of the heat-resistant film body 70 may be slightly larger than the inner diameter of the boat body 50. By interposing the heat-resistant film body 70 between the lid member 60 and the open end of the boat body 50, the heat-resistant film body 70 is provided inside the boat 4. The size is arbitrary as long as the filled group III raw material 3 does not leak to the screwing part. Note that the shape of the heat-resistant film body 70 is not limited to a circular shape as long as the leakage of the group III raw material 3 filled in the boat 4 to the screwed portion is prevented. It may be a polygonal shape such as a regular octagon slightly larger than the surface. Further, regarding the width dimension of the projection piece 71 provided on the outer peripheral edge of the heat resistant film body 70, the projection piece 7 is
It suffices that 1 is fitted in the band-shaped notch 52 of the boat body 50 and held in the boat 4, and these dimensions are also arbitrary.

【0028】[0028]

【実施例】以下、本発明の実施例について具体的に説明
する。
EXAMPLES Examples of the present invention will be specifically described below.

【0029】まず、図1に示す黒鉛製ボート本体50の
内径よりわずかに大きい、直径42mm、厚さ0.4m
mのカーボンフィルム製耐熱性フィルム体70を間に介
在させた状態で上記黒鉛製ボート本体50の両開放端に
蓋材60をそれぞれ螺着させて合成用ボート4を組み立
てた。
First, the diameter is 42 mm and the thickness is 0.4 m, which is slightly larger than the inner diameter of the graphite boat main body 50 shown in FIG.
The synthetic boat 4 was assembled by screwing the lid members 60 to both open ends of the graphite boat main body 50 with the carbon film heat-resistant film body 70 of m interposed therebetween.

【0030】尚、図2に示すようにこのボート4は外径
48mm、内径40mm、長さ745mmの寸法を有し
ており、この内部にIII族原料3であるガリウム(G
a)2000gが2等分して充填されている。
As shown in FIG. 2, the boat 4 has an outer diameter of 48 mm, an inner diameter of 40 mm, and a length of 745 mm, and gallium (G
a) 2000 g is divided into two equal parts and filled.

【0031】次に、III族原料3が充填され黒鉛製ボー
ト4を石英内管5内に収納し、図1に示すように石英内
管5毎、石英封管1内の一端側に配置すると共に、石英
封管1の他端側にはV族原料6である赤燐(P)920
gを配置した。尚、石英封管1内には、V族原料6の原
料ガスを石英内管5内に導入するための導入管10が取
付けられた不透明石英製の熱遮蔽板7が配置されてい
る。
Next, the graphite boat 4 filled with the group III raw material 3 is housed in the inner quartz tube 5, and as shown in FIG. 1, each inner quartz tube 5 is arranged at one end of the inner quartz tube 1. Along with the other end of the quartz sealed tube 1, red phosphorus (P) 920 which is a group V raw material 6 is also provided.
g was placed. An opaque heat shield plate 7 made of opaque quartz is arranged in the quartz sealed tube 1 to which an introduction tube 10 for introducing the raw material gas of the group V raw material 6 into the inner quartz tube 5 is attached.

【0032】次に、石英内管5、熱遮蔽板7およびV族
原料6等が収納された石英封管1の口を塞ぎ、中を10
-6Torrオーダまで真空引きを行なった後、封止切
る。
Next, the mouth of the quartz sealed tube 1 containing the quartz inner tube 5, the heat shield plate 7, the group V raw material 6 and the like is closed, and the inside is filled with 10
After vacuuming to -6 Torr order, seal off.

【0033】次に、中央に高周波コイル8を有しこの高
周波コイル8を中央に挟んでその両側に抵抗ヒータ9を
有する高圧容器にて構成された横型高圧炉2内に、封じ
切られた上記石英封管1を搬入し、横型高圧炉2の高圧
容器内に窒素ガスを充填して高圧炉内を高圧状態(40
kg/cm2)に設定した後、抵抗ヒータ9を作用させ
石英封管1全体を加熱してV族原料6である赤燐(P)
を300℃〜700℃に昇温し、かつ、ボート4内のII
I族原料3であるガリウム(Ga)を500℃〜600
℃の範囲で保持すると共に、高周波コイル8を作用させ
て上記ボート4内をGaPの融点である1470℃付近
の温度で保持する。
Next, the horizontal high-pressure furnace 2 constituted by a high-pressure vessel having a high-frequency coil 8 in the center and sandwiching the high-frequency coil 8 in the center and having resistance heaters 9 on both sides of the high-frequency coil 8 is sealed off. The quartz sealed tube 1 is carried in, and the high-pressure container of the horizontal high-pressure furnace 2 is filled with nitrogen gas so that the high-pressure furnace is in a high-pressure state (40
(Kg / cm 2 ), and then the resistance heater 9 is actuated to heat the entire quartz sealed tube 1 to produce red phosphorus (P) which is the group V raw material 6.
To 300 ° C to 700 ° C, and II in the boat 4
Gallium (Ga), which is Group I raw material 3, is added at 500 ° C to 600 ° C.
The temperature is maintained in the range of 0 ° C., and the high frequency coil 8 is operated to maintain the inside of the boat 4 at a temperature around 1470 ° C. which is the melting point of GaP.

【0034】そして、熱遮蔽板7に取付けられた導入管
10を介し上記石英内管5内に導入されたV族原料6か
らの原料ガスとボート4の内におけるIII族原料3とを
反応させ、かつ、上記石英封管1を矢印α方向へ横型高
圧炉2内を移動させ(すなわち、高温部を相対移動さ
せ)、ボート4内で上記反応を順次進行させて一体化さ
れたIII−V族化合物半導体(GaP)多結晶を合成し
た。
Then, the raw material gas from the V group raw material 6 introduced into the quartz inner tube 5 through the introduction tube 10 attached to the heat shield plate 7 is reacted with the III group raw material 3 in the boat 4. In addition, the quartz sealed tube 1 is moved in the horizontal high-pressure furnace 2 in the direction of the arrow α (that is, the high temperature portion is relatively moved), and the reaction is sequentially advanced in the boat 4 to be integrated III-V. A group compound semiconductor (GaP) polycrystal was synthesized.

【0035】一方、比較例としてカーボンフィルム製耐
熱性フィルム体70を間に介在させない従来のボートも
組み立て、かつ、合成条件は実施例と同一にしてIII−
V族化合物半導体(GaP)多結晶を合成した。
On the other hand, as a comparative example, a conventional boat having no carbon film heat-resistant film 70 interposed was also assembled, and the synthesis conditions were the same as in the example III-
A Group V compound semiconductor (GaP) polycrystal was synthesized.

【0036】そして、実施例と比較例に係るIII−V族
化合物半導体(GaP)多結晶の合成を繰り返し行い、
III族原料であるガリウム(Ga)の漏れ状態、合成さ
れた多結晶と蓋材60との接着状態、および、黒鉛製ボ
ート4の再使用寿命(耐久性)を比較した。この結果を
以下の表1に示す。
Then, the III-V group compound semiconductor (GaP) polycrystals according to the example and the comparative example were repeatedly synthesized,
The leakage state of gallium (Ga), which is a group III raw material, the adhesion state of the synthesized polycrystal and the lid member 60, and the reuse life (durability) of the graphite boat 4 were compared. The results are shown in Table 1 below.

【0037】尚、表1において「原料漏れ発生率
(%)」は繰り返し行った合成数に対して原料漏れが発
生した数の割合、「蓋との接着発生率(%)」は上記合
成数に対して合成されたIII−V族化合物半導体(Ga
P)多結晶と蓋材60とが接着した数の割合である。ま
た、「黒鉛ボートの破損率(%)」は合成数に対して合
成されたIII−V族化合物半導体(GaP)多結晶を取
り出すときに破損したボート数の割合、「平均使用回数
(回)」は黒鉛ボート1個について合成に繰り返し使用
した回数の平均回数である。
In Table 1, "Raw material leak rate (%)" is the ratio of the number of leaked raw materials to the number of repeated synthesis, and "Adhesion rate with lid (%)" is the above synthetic number. III-V compound semiconductors (Ga
P) It is the ratio of the number of polycrystals and the lid member 60 bonded. In addition, the “damage rate of graphite boat (%)” is the ratio of the number of damaged boats when taking out the synthesized III-V compound semiconductor (GaP) polycrystal with respect to the number of synthesis, “average number of uses (times)” "Is the average number of times that one graphite boat was repeatedly used for synthesis.

【0038】[0038]

【表1】 表1に示された数値から明らかなように、実施例におい
てはIII族原料であるガリウム(Ga)の漏れ、合成さ
れたIII−V族化合物半導体(GaP)多結晶と蓋材6
0との接着はほとんどない状態となり、接着の発生率は
大幅に低下していることが確認される。
[Table 1] As is clear from the numerical values shown in Table 1, leakage of gallium (Ga), which is a group III raw material, synthesized III-V group compound semiconductor (GaP) polycrystal and lid 6 in the examples.
It is confirmed that there is almost no adhesion with 0, and the incidence of adhesion is significantly reduced.

【0039】また、実施例における黒鉛ボートの破損率
は0.7%となり、比較例の18.2%から大きく低下
し、かつ、実施例における黒鉛ボートの平均使用回数に
ついても6.5回となり比較例の2.4回に較べて著し
く向上していることが確認される。
The breakage rate of the graphite boat in the example was 0.7%, which was greatly reduced from 18.2% in the comparative example, and the average number of uses of the graphite boat in the example was 6.5 times. It is confirmed that it is remarkably improved as compared with 2.4 times of the comparative example.

【0040】[0040]

【発明の効果】請求項1〜2記載の発明に係る化合物半
導体多結晶の合成方法によれば、ボート本体の両開放端
側筒壁面にその開放縁部から上記スリット端方向へ延び
る帯状切欠部をそれぞれ設けると共に、ボート本体の開
放面よりわずかに大きくかつその外周縁の一部に上記帯
状切欠部に嵌合される突起片が設けられた円形若しくは
多角形状の耐熱性フィルム体を間に介在させた状態でボ
ート本体の両開放端に蓋材をそれぞれ螺着して上記ボー
トが構成されているため、蓋材の螺子部やボート本体の
螺子部に欠けが存在したり緩みが生じてこれ等螺着部位
に隙間ができても、蓋材とボート本体の開放端間に介在
された上記耐熱性フィルム体の作用によりボート内に充
填されたIII族原料が上記螺着部位へ漏出することがな
く、更に、上記蓋材近傍にIII族原料が未反応状態で残
留した場合でも、上記耐熱性フィルム体の作用により合
成されたIII−V族化合物半導体多結晶と蓋材とが接着
してしまうこともない。
According to the method for synthesizing a compound semiconductor polycrystal according to the first and second aspects of the present invention, a strip-shaped notch extending from the open edge toward the slit end is formed on both open end side cylinder wall surfaces of the boat body. And a circular or polygonal heat-resistant film body that is slightly larger than the open surface of the boat body and has a projection piece fitted to the above-mentioned band-shaped cutout portion at a part of the outer peripheral edge thereof. In this state, the boat is constructed by screwing the lids to the open ends of the boat, respectively.Therefore, the screw of the lid and the screw of the boat may be chipped or loosened. Even if there is a gap in the screwed part, the group III raw material filled in the boat leaks to the screwed part due to the action of the heat-resistant film body interposed between the lid material and the open end of the boat body. And the above lid material Even if the group III material near has remained at an unreacted state, the heat-resistant group III-V were synthesized by the action of the film body compound semiconductor polycrystalline and the lid member and is not also result in the adhesive.

【0041】従って、化合物半導体多結晶の合成を終了
した時点で蓋材をボート本体から容易に外すことができ
るためボートの欠けや破損を防止することが可能とな
り、これによりボートの再使用寿命の大幅な改善が図れ
る効果を有する。
Therefore, since the lid material can be easily removed from the boat body when the synthesis of the compound semiconductor polycrystal is completed, it is possible to prevent the boat from being chipped or damaged, which leads to the reuse life of the boat. It has the effect of making a great improvement.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態に係る化合物半導体多結晶
の合成方法に適用されるボートの一部分解斜視図。
FIG. 1 is a partial exploded perspective view of a boat applied to a method for synthesizing a compound semiconductor polycrystal according to an embodiment of the present invention.

【図2】III−V族化合物半導体多結晶の合成方法を示
す説明図。
FIG. 2 is an explanatory view showing a method for synthesizing a III-V compound semiconductor polycrystal.

【図3】従来例に係るIII−V族化合物半導体多結晶の
合成方法に適用されるボートの概略斜視図。
FIG. 3 is a schematic perspective view of a boat applied to a method for synthesizing a III-V compound semiconductor polycrystal according to a conventional example.

【図4】従来例に係るIII−V族化合物半導体多結晶の
合成方法に適用されるボートの一部分解斜視図。
FIG. 4 is a partial exploded perspective view of a boat applied to a method for synthesizing a III-V compound semiconductor polycrystal according to a conventional example.

【符号の説明】[Explanation of symbols]

4 ボート 50 ボート本体 51 スリット 52 帯状切欠部 60 蓋材 70 耐熱性フィルム体 71 突起片 4 boats 50 boat body 51 slits 52 band notch 60 lid material 70 Heat-resistant film body 71 projection piece

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】上部長手方向に直線状のスリットが開設さ
れた円筒状ボート本体とこのボート本体の両開放端に螺
着される蓋材とでその主要部が構成されるボート内にII
I族原料を充填し、このボートを封管内の一端側に配置
する一方、封管内の他端側にはV族原料を配置し、上記
封管全体を加熱すると共にボート内のIII族原料を局所
的に更に高温に加熱してV族原料から発生した原料ガス
と上記III族原料を反応させ、かつ、上記高温部を徐々
に相対移動させながらIII−V族化合物半導体多結晶を
合成する化合物半導体多結晶の合成方法において、 ボート本体の両開放端側筒壁面にその開放縁部から上記
スリット端方向へ延びる帯状切欠部をそれぞれ設けると
共に、ボート本体の開放面よりわずかに大きくかつその
外周縁の一部に上記帯状切欠部に嵌合される突起片が設
けられた円形若しくは多角形状の耐熱性フィルム体を間
に介在させた状態でボート本体の両開放端に蓋材をそれ
ぞれ螺着して上記ボートが構成されていることを特徴と
する化合物半導体多結晶の合成方法。
Claim: What is claimed is: 1. In a boat, the main part of which is composed of a cylindrical boat main body having a linear slit formed in the upper longitudinal direction and a lid member screwed to both open ends of the boat main body.
The group I raw material is filled, and the boat is placed on one end side in the sealed tube, while the group V raw material is placed on the other end side in the sealed tube to heat the entire sealed tube and remove the group III raw material in the boat. A compound for synthesizing a group III-V compound semiconductor polycrystal while locally heating the gas to a higher temperature to react the source gas generated from the group V source material with the group III source material and gradually moving the high temperature part relatively In the method for synthesizing semiconductor polycrystals, strip-shaped notches extending from the open edge toward the slit end are provided on both open end side cylinder wall surfaces of the boat main body, and the outer peripheral edge is slightly larger than the open surface of the boat main body. With a circular or polygonal heat-resistant film body provided with a protruding piece fitted to the above-mentioned band-shaped notch in a part thereof, a lid member is screwed to both open ends of the boat body, respectively. The above boat is constructed Compounds method of synthesizing a semiconductor polycrystal, characterized in that it is.
【請求項2】上記ボート本体並びに蓋体が黒鉛で構成さ
れ、かつ、耐熱性フィルム体がカーボンフィルムで構成
されていることを特徴とする請求項1記載の化合物半導
体多結晶の合成方法。
2. The method for synthesizing a compound semiconductor polycrystal according to claim 1, wherein the boat main body and the lid are made of graphite, and the heat resistant film is made of a carbon film.
JP2001355587A 2001-11-21 2001-11-21 Method for synthesizing compound semiconductor polycrystal Expired - Fee Related JP3888142B2 (en)

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JP2003160315A true JP2003160315A (en) 2003-06-03
JP3888142B2 JP3888142B2 (en) 2007-02-28

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007084366A (en) * 2005-09-21 2007-04-05 Showa Denko Kk Method for producing polycrystal of group iii-v compound semiconductor
JPWO2018180456A1 (en) * 2017-03-28 2019-11-07 富士フイルム株式会社 III-V group semiconductor nanoparticle manufacturing method, III-V group semiconductor quantum dot manufacturing method, and flow reaction system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007084366A (en) * 2005-09-21 2007-04-05 Showa Denko Kk Method for producing polycrystal of group iii-v compound semiconductor
JPWO2018180456A1 (en) * 2017-03-28 2019-11-07 富士フイルム株式会社 III-V group semiconductor nanoparticle manufacturing method, III-V group semiconductor quantum dot manufacturing method, and flow reaction system
US11492252B2 (en) 2017-03-28 2022-11-08 Fujifilm Corporation Method for producing group III-V semiconductor nanoparticle, method for producing group III-V semiconductor quantum dot, and flow reaction system

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