JP2003156835A5 - - Google Patents
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- Publication number
- JP2003156835A5 JP2003156835A5 JP2001353206A JP2001353206A JP2003156835A5 JP 2003156835 A5 JP2003156835 A5 JP 2003156835A5 JP 2001353206 A JP2001353206 A JP 2001353206A JP 2001353206 A JP2001353206 A JP 2001353206A JP 2003156835 A5 JP2003156835 A5 JP 2003156835A5
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- fluorine
- group
- etheric oxygen
- oxygen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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- 229910052731 fluorine Inorganic materials 0.000 claims 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 5
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 239000011737 fluorine Substances 0.000 claims 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims 5
- 229910052799 carbon Inorganic materials 0.000 claims 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 3
- 239000000853 adhesive Substances 0.000 claims 2
- 230000001070 adhesive effect Effects 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 229920002313 fluoropolymer Polymers 0.000 claims 2
- 150000001993 dienes Chemical class 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
Claims (6)
- R f の側鎖がエーテル性酸素原子を有していてもよい炭素数3以下の含フッ素アルキル基であり、かつ、該側鎖がエーテル性酸素原子に隣接する炭素原子に結合している請求項1に記載のペリクル。
- R f の側鎖がトリフルオロメチル基であり、該トリフルオロメチル基がエーテル性酸素原子に隣接する炭素原子に結合している請求項1に記載のペリクル。
- R f が、1または2個の側鎖を有する請求項1、2、または3に記載のペリクル。
- 含フッ素重合体が、下式(4)で表される含フッ素ジエンが環化重合して生じた環構造を含む含フッ素重合体である請求項1〜4のいずれかに記載のペリクル。
CF2=CF(CF2)nC(CF3)(R)OCF=CF2・・・(4)
ただし、Rはフッ素原子またはトリフルオロメチル基、nは1〜3の整数を表す。 - フォトリソグラフィーにおける波長300nm以下の光を用いた露光処理方法において、請求項1〜5のいずれかに記載のペリクルを用いることを特徴とする露光処理方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001353206A JP2003156835A (ja) | 2001-11-19 | 2001-11-19 | ペリクルおよび露光処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001353206A JP2003156835A (ja) | 2001-11-19 | 2001-11-19 | ペリクルおよび露光処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003156835A JP2003156835A (ja) | 2003-05-30 |
JP2003156835A5 true JP2003156835A5 (ja) | 2005-07-14 |
Family
ID=19165266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001353206A Ceased JP2003156835A (ja) | 2001-11-19 | 2001-11-19 | ペリクルおよび露光処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003156835A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4436212B2 (ja) * | 2004-08-20 | 2010-03-24 | 信越化学工業株式会社 | ダイコータの塗工方法およびこの方法によって作製されたフォトリソグラフィ用ペリクル |
-
2001
- 2001-11-19 JP JP2001353206A patent/JP2003156835A/ja not_active Ceased
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