JP2003142259A - Organic thin film light emitting display and manufacturing method of the same - Google Patents

Organic thin film light emitting display and manufacturing method of the same

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Publication number
JP2003142259A
JP2003142259A JP2001335273A JP2001335273A JP2003142259A JP 2003142259 A JP2003142259 A JP 2003142259A JP 2001335273 A JP2001335273 A JP 2001335273A JP 2001335273 A JP2001335273 A JP 2001335273A JP 2003142259 A JP2003142259 A JP 2003142259A
Authority
JP
Japan
Prior art keywords
electrode
terminal pad
light emitting
insulating film
electric insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001335273A
Other languages
Japanese (ja)
Other versions
JP3674848B2 (en
JP2003142259A5 (en
Inventor
Makoto Uchiumi
誠 内海
Goji Kawaguchi
剛司 川口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP2001335273A priority Critical patent/JP3674848B2/en
Publication of JP2003142259A publication Critical patent/JP2003142259A/en
Publication of JP2003142259A5 publication Critical patent/JP2003142259A5/ja
Application granted granted Critical
Publication of JP3674848B2 publication Critical patent/JP3674848B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/38Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays
    • H10K59/173Passive-matrix OLED displays comprising banks or shadow masks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays

Abstract

PROBLEM TO BE SOLVED: To provide an organic thin film light emitting display which can surely separate an organic light emitting layer from a second electrode, with high resolution and reliability and improved yield of work, and to provide a manufacturing method of the same. SOLUTION: For the organic thin film light emitting display, terminal pads for a first electrode and a second electrode extended from the first electrode are formed around an image display arranging area, and an electric insulation film is formed on a part of the first electrode, a transparent base board, and part of the terminal pad for the second electrode. The second electrode is connected to the terminal pad for the second electrode at the opening of the electric insulation film formed on the terminal pad for the second electrode. Barrier ribs, composed of a plurality of electric insulation bodies arranged in parallel with the second electrode protruding on the electric insulation film, are formed, and adjacent barrier ribs are jointed to each other at the upper part of the electric insulation film formed on the terminal pad for the second electrode.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、ディスプレイとし
て用いられる有機発光素子に関し、特に高精細で信頼性
が高く、製造費用がかからず、効率のよいパッシブマト
リクス型有機発光素子およびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an organic light emitting device used as a display, and more particularly to a passive matrix type organic light emitting device having high definition, high reliability, low manufacturing cost and high efficiency, and a manufacturing method thereof. .

【0002】[0002]

【従来の技術】有機化合物材料のエレクトロルミネセン
スを利用した有機薄膜発光ディスプレイパネルの1つ
に、パッシブマトリクス型(単純マトリクス型)ディス
プレイがある。
2. Description of the Related Art A passive matrix type (simple matrix type) display is one of the organic thin film light emitting display panels utilizing the electroluminescence of organic compound materials.

【0003】パッシブマトリクス型ディスプレイは、透
明基板上の複数の第一電極と、該第一電極に直交する複
数の第二電極、これら電極に挟持された有機発光層から
構成される。第一電極と第二電極の交差領域の発光部を
1単位として1画素を形成している。この画素が複数個
配列することにより画像表示部分が形成される。第一電
極および第二電極(すなわち陽極および陰極)を画像表
示部より基板周囲へ延長して形成した接続部を介して、
外部駆動回路と画面表示部を接続することにより画像表
示装置が構成される。
A passive matrix type display comprises a plurality of first electrodes on a transparent substrate, a plurality of second electrodes orthogonal to the first electrodes, and an organic light emitting layer sandwiched between these electrodes. One pixel is formed with the light emitting portion in the intersecting region of the first electrode and the second electrode as one unit. An image display portion is formed by arranging a plurality of these pixels. Via the connection part formed by extending the first electrode and the second electrode (that is, the anode and the cathode) from the image display part to the periphery of the substrate,
An image display device is configured by connecting the external drive circuit and the screen display unit.

【0004】近年では、有機発光素子の発光応答速度の
速さを活かした高精細なパッシブマトリクス型カラーデ
ィスプレイの研究がなされ、フルカラー表示や動画表示
といった情報機器用途での低コストでの高品位ディスプ
レイ実現への期待が高まってきている。
In recent years, research has been conducted on a high-definition passive matrix type color display utilizing the light emitting response speed of an organic light emitting element, and a high-quality display at a low cost for information device applications such as full-color display and moving image display. Expectations for realization are increasing.

【0005】高精細なディスプレイ作製のためには、第
一電極および第二電極のストライプ幅を数百μm以下、
隣り合うストライプ間のギャップを数十μm以下にする
必要がある。
In order to manufacture a high-definition display, the stripe width of the first electrode and the second electrode is several hundreds μm or less,
It is necessary to set the gap between adjacent stripes to several tens of μm or less.

【0006】[0006]

【発明が解決しようとする課題】一般に、有機発光層
は、第二電極の微細パターニング方法として、特開平5
−275172号公報、特開平5−258859号公
報、特開平5−258860号公報、および特開平8−
315981号公報などに開示の技術が知られている。
これらの公報には、基板上に平行にストライプ状の隔壁
を形成し、該隔壁を利用して有機発光層および第二電極
を形成する方法が記載されている。
Generally, an organic light emitting layer is disclosed in Japanese Patent Application Laid-Open No. Hei 5 (1999) -53138 as a fine patterning method for the second electrode.
-275172, JP-A-5-258859, JP-A-5-258860, and JP-A-8-
The technology disclosed in Japanese Patent No. 315981 is known.
These publications describe a method in which stripe-shaped partition walls are formed in parallel on a substrate and the partition walls are used to form an organic light emitting layer and a second electrode.

【0007】近年、有機発光素子のフルカラー化開発が
行われ、前述の公報に開示された技術を用い、3原色の
有機発光層や第二電極の材料を精密に塗り分ける方法が
とられている。この方法は、成膜装置内で基板と成膜マ
スクを精密に位置合わせする必要があり、装置費用が大
きくなり、作製歩留りが小さくなる可能性がある。
In recent years, full-color development of organic light-emitting devices has been carried out, and a method of precisely coating the materials of the organic light-emitting layer of the three primary colors and the second electrode has been adopted by using the technique disclosed in the above-mentioned publication. . In this method, it is necessary to precisely align the substrate and the film forming mask in the film forming apparatus, which may increase the cost of the apparatus and reduce the manufacturing yield.

【0008】一方で、フルカラー表示を行う方法とし
て、基板にカラーフィルターや色変換層を形成した後
に、白色あるいは青色の発光層を一括して形成する技術
も知られている。この技術は、有機発光層を塗り分ける
必要がなく、装置費用、作製歩留りにおいて有利性をも
っている。
On the other hand, as a method for performing full-color display, there is also known a technique in which a color filter or a color conversion layer is formed on a substrate and then a white or blue light emitting layer is collectively formed. This technique does not require separate coating of the organic light emitting layer, and is advantageous in terms of device cost and production yield.

【0009】この方法は、基板に有機発光層用の蒸着マ
スクおよび、第二電極用の蒸着マスクを位置合わせして
形成しており、有機発光層の塗り分けの必要がなく、高
精度の位置合わせは必要としない。しかし今日、狭額縁
化、マザーガラスからの製造枚数の向上が求められてお
り、蒸着マスクをより容易に位置合わせでき、かつ、作
製歩留りを向上させる方法が求められている。
According to this method, the vapor deposition mask for the organic light emitting layer and the vapor deposition mask for the second electrode are aligned with each other on the substrate, and it is not necessary to separately paint the organic light emitting layer. No alignment required. However, today, there is a demand for a narrower frame and an increase in the number of manufactured glass sheets from the mother glass, and there is a demand for a method that can more easily align the vapor deposition mask and improve the production yield.

【0010】また、上述の特開平8−315981号公
報に記載の方法では、基板面に平行な方向に突出するオ
ーバーハング部を上部に有する電気絶縁性の隔壁を、第
一電極の一部分を露出するように形成した電気絶縁性の
膜上に形成している。しかし、この構造は、異種材料が
積層される場合には機械的強度が低く、さらにヒートサ
イクル試験など、熱膨張、熱収縮が激しく繰り返される
試験では、隔壁の剥離が観察され、機械的強度を向上さ
せる方法が求められている。
Further, in the method described in the above-mentioned JP-A-8-315981, an electrically insulating partition having an overhang portion projecting in a direction parallel to the surface of the substrate at the top is exposed at a part of the first electrode. It is formed on the electrically insulating film formed as described above. However, this structure has low mechanical strength when dissimilar materials are laminated, and peeling of partition walls is observed in tests such as heat cycle tests where thermal expansion and thermal contraction are severely repeated. There is a need for ways to improve.

【0011】[0011]

【課題を解決するための手段】上記の課題を達成するた
めの本発明の有機薄膜発光ディスプレイは、透明基板上
に形成された複数の第一電極の列と、複数の第二電極の
列との交点より構成される画素からなる画像表示配列領
域を有し、該電極間には少なくとも有機発光層が形成さ
れており、所望の画素を構成する両電極間に電圧を印加
し電流を注入することで得るエレクトロルミネセンスを
取り出すことで情報を表示しており、前述の画像表示配
列領域の周辺に、第一電極から延長された第一電極用の
端子パッドおよび第二電極用の端子パッドが形成されて
おり、該第一電極の一部、透明基板、および第二電極用
の端子パッドの一部上に電気絶縁膜が形成されており、
第二電極は、第二電極用の端子パッド上の電気絶縁膜の
開口部において、第二電極用の端子パッドと接続されて
おり、前述の電気絶縁膜上に突出した第二電極に平行な
複数の電気絶縁体からなる隔壁が形成されており、該隔
壁は第二電極用の端子パッド上の電気絶縁膜上におい
て、隣接する隔壁が互いに連結されている。
The organic thin film light emitting display of the present invention for achieving the above object comprises a plurality of first electrode rows and a plurality of second electrode rows formed on a transparent substrate. Has an image display array region composed of pixels composed of intersections of the above, at least an organic light emitting layer is formed between the electrodes, and a voltage is applied between both electrodes forming a desired pixel to inject a current. Information is displayed by taking out the electroluminescence obtained by the above, and the terminal pad for the first electrode and the terminal pad for the second electrode extended from the first electrode are provided around the image display array area described above. Is formed, a part of the first electrode, a transparent substrate, and an electric insulating film is formed on a part of the terminal pad for the second electrode,
The second electrode is connected to the terminal pad for the second electrode at the opening of the electric insulating film on the terminal pad for the second electrode, and is parallel to the second electrode protruding on the electric insulating film. A partition wall made of a plurality of electrical insulators is formed, and the partition wall is formed by connecting adjacent partition walls to each other on the electrical insulating film on the terminal pad for the second electrode.

【0012】また、本発明における有機薄膜発光ディス
プレイの製造方法は、基板の上に、複数の第一電極をパ
ターニングして形成する工程と、該第一電極の周辺に第
二電極用の端子パッドを形成する工程と、該第一電極の
一部、基板、および第二電極用の端子パッドの一部上に
電気絶縁膜を形成する工程と、該電気絶縁膜上に電気絶
縁体からなる隔壁を形成する工程と、該電気絶縁膜上お
よび第一電極上の電気絶縁膜の開口部に有機発光層を形
成する工程と、該有機発光層、電気絶縁膜、および第二
電極用の端子パッド上の電気絶縁膜の開口部に第二電極
となる薄膜を形成する工程と、を備え、該第二電極を、
第二電極用の端子パッド上の電気絶縁膜の開口部を通し
て第二電極用の端子パッドと導通させ、電気絶縁体から
なる隔壁により第二電極の形成領域を規定している。
The method of manufacturing an organic thin film light emitting display according to the present invention comprises a step of patterning a plurality of first electrodes on a substrate and a terminal pad for a second electrode around the first electrodes. And a step of forming an electric insulating film on a part of the first electrode, the substrate, and a part of the terminal pad for the second electrode, and a partition made of an electric insulator on the electric insulating film. And a step of forming an organic light emitting layer on the opening of the electric insulating film on the electric insulating film and on the first electrode, the organic light emitting layer, the electric insulating film, and a terminal pad for the second electrode. And a step of forming a thin film to be a second electrode in the opening of the electrical insulating film on the second electrode,
The terminal pad for the second electrode is electrically connected through the opening of the electric insulating film on the terminal pad for the second electrode, and the partition wall made of the electric insulator defines the formation region of the second electrode.

【0013】[0013]

【発明の実施の形態】図1に、本発明における有機薄膜
発光ディスプレイの構成の一例を示す平面図を、図2に
図1に示した有機薄膜ディスプレイの一例のII−II
線における断面図を示す。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a plan view showing an example of the constitution of an organic thin film light emitting display according to the present invention, and FIG. 2 is an example of the organic thin film display shown in FIG.
A sectional view taken along the line is shown.

【0014】本発明の有機薄膜発光ディスプレイは、図
1および図2に示すように、基板1上に形成された複数
の第一電極の列2と、複数の第二電極の列3との交点に
より構成される画素からなる画像表示配列領域を有し、
電極間には少なくとも有機発光層4が形成されており、
所望の画素を構成する両電極間に電圧を印加し電流を注
入することで情報を表示するものである。この画像表示
配列領域の周辺には、第一電極から延長された第一電極
用端子パッド2aおよび第二電極用の端子パッド5が形
成されており、第一電極2の一部、透明基板1、および
第二電極用の端子パッド5の一部上に電気絶縁膜6が形
成されている。第二電極3は、第二電極用の端子パッド
5上の電気絶縁膜の開口部7において、第二電極用の端
子パッド5と接続されており、電気絶縁膜上に突出した
第二電極に平行な複数の電気絶縁体からなる隔壁8が形
成されており、該隔壁は第二電極用の端子パッド上の電
気絶縁膜上において隣接する隔壁が互いに連結されてい
る。
In the organic thin film light emitting display of the present invention, as shown in FIGS. 1 and 2, an intersection of a plurality of first electrode rows 2 and a plurality of second electrode rows 3 formed on a substrate 1. Has an image display array region composed of pixels configured by
At least the organic light emitting layer 4 is formed between the electrodes,
Information is displayed by applying a voltage between both electrodes forming a desired pixel and injecting a current. Around the image display array region, a first electrode terminal pad 2a extending from the first electrode and a second electrode terminal pad 5 are formed. A part of the first electrode 2 and the transparent substrate 1 are formed. , And an electric insulating film 6 is formed on a part of the terminal pad 5 for the second electrode. The second electrode 3 is connected to the terminal pad 5 for the second electrode in the opening 7 of the electric insulating film on the terminal pad 5 for the second electrode, and is connected to the second electrode protruding on the electric insulating film. Partition walls 8 made of a plurality of parallel electrical insulators are formed, and the partition walls are connected to each other on the electrical insulating film on the terminal pad for the second electrode.

【0015】このような構造をとる有機薄膜発光ディス
プレイの製造方法を、図2〜図4を参照しながら説明す
る。図3は、図1に示す本発明における有機薄膜発光デ
ィスプレイの構成の一例を示す平面図の有機発光層およ
び第二電極の形成前の図である。図4は、本発明におけ
る隔壁のパターンの一例を示す。
A method of manufacturing an organic thin film light emitting display having such a structure will be described with reference to FIGS. FIG. 3 is a plan view showing an example of the configuration of the organic thin film light emitting display according to the present invention shown in FIG. 1 before forming the organic light emitting layer and the second electrode. FIG. 4 shows an example of the partition pattern in the present invention.

【0016】本発明の有機薄膜発光ディスプレイの例と
して、パネルが蛍光色変換フィルターと、有機発光体と
を備えたカラーディスプレイパネルを説明する。すなわ
ち、有機発光体から発せられる近紫外から可視領域の
光、好ましくは青色から青緑色領域の光を、上記蛍光色
変換フィルターに入射し、該蛍光色変換フィルターから
なる異なる波長の可視光として出力させるようにしたも
のである。
As an example of the organic thin film light emitting display of the present invention, a color display panel in which the panel includes a fluorescent color conversion filter and an organic light emitting body will be described. That is, light in the near-ultraviolet to visible region emitted from the organic light-emitting body, preferably light in the blue to blue-green region is incident on the fluorescent color conversion filter, and output as visible light of different wavelengths formed by the fluorescent color conversion filter. It was made to let.

【0017】まず、基板上に蛍光色変換フィルターを形
成し、その上に保護層およびガスバリア層を形成する
(図示なし)。このとき、保護層として平坦化機能と色
変換層の保護機能を兼備するアクリル樹脂などからなる
保護層を形成し、SiOまたはSiOなどから
なるガスバリア層を形成する。また、保護層の機能を細
分化し、機能ごとに層数を増やすこともできる。
First, a fluorescent color conversion filter is formed on a substrate, and a protective layer and a gas barrier layer are formed thereon (not shown). At this time, a protective layer made of acrylic resin or the like having both a flattening function and a protective function for the color conversion layer is formed as a protective layer, and a gas barrier layer made of SiO x or SiO x N y is formed. Further, the function of the protective layer can be subdivided, and the number of layers can be increased for each function.

【0018】本発明で用いる基板としては、ガラス基
板、ポリマーフィルムなどのフィルム状基板、ポリイミ
ド基板、アクリル基板などを用いることができる。
As the substrate used in the present invention, a glass substrate, a film substrate such as a polymer film, a polyimide substrate, an acrylic substrate or the like can be used.

【0019】この発光色変換フィルター上のガスバリア
層上に、有機発光体を形成する。有機発光体は、一対の
電極の間に挟持され、必要に応じ、正孔注入層、正孔輸
送層、または電子注入層を電極間に介在させた構造を有
している。具体的には、下記のような層構造からなるも
のが採用される。 (1)陽極/有機発光層/陰極 (2)陽極/正孔注入層/有機発光層/陰極 (3)陽極/有機発光層/電子注入層/陰極 (4)陽極/正孔注入層/有機発光層/電子注入層/陰
極 (5)陽極/正孔注入層/正孔輸送層/有機発光層/電
子注入層/陰極
An organic luminescent material is formed on the gas barrier layer on the luminescent color conversion filter. The organic light-emitting body is sandwiched between a pair of electrodes, and has a structure in which a hole injection layer, a hole transport layer, or an electron injection layer is interposed between the electrodes as necessary. Specifically, one having the following layer structure is adopted. (1) Anode / organic light emitting layer / cathode (2) Anode / hole injection layer / organic light emitting layer / cathode (3) Anode / organic light emitting layer / electron injection layer / cathode (4) Anode / hole injection layer / organic Light emitting layer / electron injection layer / cathode (5) Anode / hole injection layer / hole transport layer / organic light emitting layer / electron injection layer / cathode

【0020】上記の層構成において、陽極(第一電極)
および陰極(第二電極)の少なくとも一方は、該有機発
光体の発する光の波長域において透明であることが望ま
しく、および透明である電極を通して光を発して、前述
の蛍光色変換膜に光を入射させる。当該技術において、
陽極を透明にすることが容易であることが知られてお
り、本発明においても陽極を透明とすることが望まし
い。
In the above layer structure, an anode (first electrode)
At least one of the cathode and the second electrode is preferably transparent in the wavelength range of light emitted by the organic light-emitting body, and emits light through the transparent electrode to emit light to the fluorescent color conversion film. Make it incident. In this technology,
It is known that it is easy to make the anode transparent, and it is desirable to make the anode transparent also in the present invention.

【0021】有機発光体を形成するために、まず、ガス
バリア層上に、図3に示すように第一電極(陽極)2お
よび第一電極から延長した第一電極用の端子パッド2a
をパターン形成する。第一電極としては、透明導電性膜
材料のインジウム錫酸化物(ITO)、インジウム亜鉛
酸化物、酸化錫、酸化亜鉛、またはアルミニウム錫酸化
物などを用いることができる。
In order to form an organic light emitting body, first, a first electrode (anode) 2 and a terminal pad 2a for a first electrode extending from the first electrode 2a are formed on the gas barrier layer as shown in FIG.
To form a pattern. As the first electrode, indium tin oxide (ITO), indium zinc oxide, tin oxide, zinc oxide, aluminum tin oxide or the like which is a transparent conductive film material can be used.

【0022】この第一電極の周辺に図3に示すように第
二電極用の端子パッド5を形成し、図3に示すような範
囲に電気絶縁膜を形成する。第二電極用の端子パッドの
材料としては、例えば第一電極と同一の材料(ITOな
ど)、Al、Cr、Mo、Cu、およびWなどの金属材
料、ならびにこれらの合金などが挙げられる。電気絶縁
膜材料としては、例えばノボラック樹脂を用いたポジ型
フォトレジスト、アクリレート等のネガ型フォトレジス
ト、ポリイミド材料、またはSiO、SiO
SiN、およびTiOなどの無機酸化膜を用いるこ
とができる。この電気絶縁膜は第二電極用の端子パッド
5上および第一電極2の一部に開口部7を有することを
特徴としている。また、電気絶縁膜は第一電極の端部を
被覆するように形成してもよい。電気絶縁膜の形成領域
は、図3に示す限りではないが、陰極の形成領域に、基
板と蒸着マスクの位置ズレ量を加味した領域に形成する
ことにより、第一電極(陽極)2材料と第二電極(陰
極)3材料との短絡、端子パッド間の短絡を防ぐことが
できる。また、絶縁膜の膜厚は、パネル駆動時に印加さ
れる電圧から算出される絶縁耐圧を持つ必要がある。
Around the first electrode, as shown in FIG.
A terminal pad 5 for two electrodes is formed, and the area as shown in FIG. 3 is formed.
An electrically insulating film is formed in the surrounding area. Of the terminal pad for the second electrode
The material is, for example, the same material as the first electrode (such as ITO).
Etc.), metal materials such as Al, Cr, Mo, Cu, and W
Materials as well as alloys thereof. Electrical insulation
As the film material, for example, a positive type using novolac resin
Negative photoresist such as photoresist and acrylate
, Polyimide material, or SiOx, SiO xNy,
SiNx, And TiOxUse an inorganic oxide film such as
You can This electrical insulation film is the terminal pad for the second electrode
5 and an opening 7 on a part of the first electrode 2
It has a feature. In addition, the electrically insulating film is formed on the edge of the first electrode.
You may form so that it may coat. Area where electrical insulation film is formed
Is not limited to that shown in FIG.
Form in a region that considers the amount of positional deviation between the plate and vapor deposition mask
This allows the first electrode (anode) 2 material and the second electrode (cathode)
Pole) to prevent short circuit between 3 materials and between terminal pads
it can. Also, the thickness of the insulating film is not applied when the panel is driven.
It is necessary to have the withstand voltage calculated from the applied voltage.

【0023】次に、該電気絶縁膜の上に、隔壁8を形成
する。隔壁8は第二電極の伸張方向に複数本形成され、
第一電極の周辺に形成された第二電極用の端子パッド部
5まで延在する。隣接する隔壁は、第二電極用の端子パ
ッド上において図3に示すように垂直に連結されてもよ
く、図4に示すように曲線により連結されていてもよ
い。隔壁を連結することにより隔壁の強度が向上する。
この隔壁を形成する電気絶縁体材料としては、例えば、
ノボラック樹脂を用いたネガ型フォトレジストおよびポ
ジ型フォトレジスト、ならびにアクリレート等のネガ型
フォトレジストなどが挙げられる。
Next, the partition wall 8 is formed on the electric insulating film. A plurality of partition walls 8 are formed in the extending direction of the second electrode,
It extends to the terminal pad portion 5 for the second electrode formed around the first electrode. The adjacent partition walls may be vertically connected on the terminal pad for the second electrode as shown in FIG. 3 or may be connected by a curved line as shown in FIG. By connecting the partition walls, the strength of the partition walls is improved.
Examples of the electric insulator material forming the partition wall include:
Examples thereof include a negative photoresist and a positive photoresist using a novolac resin, and a negative photoresist such as acrylate.

【0024】この隔壁8間の、電気絶縁膜6上、および
第一電極上の電気絶縁膜の開口部7上に、図2に示した
ように、少なくとも有機発光層4を形成する。このと
き、必要に応じて、上述した層構造を有するように正孔
注入層、電子注入層、および/または正孔輸送層を形成
してもよい。
At least the organic light emitting layer 4 is formed on the electric insulating film 6 between the partition walls 8 and on the opening 7 of the electric insulating film on the first electrode, as shown in FIG. At this time, if necessary, the hole injection layer, the electron injection layer, and / or the hole transport layer may be formed so as to have the above-mentioned layer structure.

【0025】上記各層の材料としては、公知のものが使
用される。例えば、有機発光層として青色から青緑色の
発光を得るためには、例えばベンゾチアゾール系、ベン
ゾイミダゾール系、ベンゾオキサゾール系などの蛍光増
白剤、金属キレート化オキソニウム化合物、スチリルベ
ンゼン系化合物、芳香族ジメチリディン系化合物などが
好ましく使用される。
Known materials are used as the materials for the respective layers. For example, in order to obtain blue to blue-green light emission as the organic light emitting layer, for example, a fluorescent whitening agent such as benzothiazole-based, benzimidazole-based, benzoxazole-based, metal chelated oxonium compound, styrylbenzene-based compound, aromatic Dimethylidene compounds are preferably used.

【0026】正孔注入層としては、Cuフタロシアニ
ン、トリフェニルアミン誘導体などが用いられ、正孔輸
送層としては、TPDおよびα−NPDなどのトリフェ
ニルアミン誘導体などが用いられ、電子注入層として
は、アルミキレート錯体などの金属錯体などが用いるこ
とができるが、これらに限定するわけではない。
Cu phthalocyanine, triphenylamine derivative, etc. are used as the hole injection layer, triphenylamine derivatives such as TPD and α-NPD are used as the hole transport layer, and electron injection layer is used. Metal complexes such as aluminum chelate complexes can be used, but the invention is not limited thereto.

【0027】次いで、有機発光層(必要に応じて電子注
入層)4上、電気絶縁膜5上、および第二電極用の端子
パッド上の電気絶縁膜の開口部7上に、第二電極(陽
極)3を形成する。第二電極の材料としては、アルミニ
ウム、マグネシウム、インジウム、銀またはこれらの合
金などの仕事関数の小さな金属などを用いることができ
る。
Next, on the organic light emitting layer (electron injection layer if necessary) 4, on the electric insulating film 5, and on the opening 7 of the electric insulating film on the terminal pad for the second electrode, the second electrode ( Anode) 3 is formed. As a material for the second electrode, a metal having a low work function such as aluminum, magnesium, indium, silver, or an alloy thereof can be used.

【0028】上述した実施態様によると、第一電極(陽
極)および第二電極(陰極)のパターンはそれぞれ平行
なストライプ状をなし、互いに交差するように形成され
ている。この場合には、本発明は有機発光素子はマトリ
クス駆動を行うことができ、すなわち、第一電極(陽
極)の特定のストライプと、第二電極(陰極)の特定の
ストライプに電圧が印加された時に、有機発光層におい
て、それらのストライプが交差する部分が発光する。し
たがって、第一電極(陽極)および第二電極(陰極)の
選択されたストライプに電圧を印加することによって、
特定の蛍光色変換膜および/またはフィルター層が位置
する部分のみを発光させることができる。
According to the above-described embodiment, the patterns of the first electrode (anode) and the second electrode (cathode) are parallel stripes and are formed so as to intersect each other. In this case, the present invention allows the organic light emitting device to perform matrix driving, that is, a voltage is applied to a specific stripe of the first electrode (anode) and a specific stripe of the second electrode (cathode). Occasionally, in the organic light emitting layer, the portions where those stripes intersect emit light. Therefore, by applying a voltage to selected stripes of the first electrode (anode) and the second electrode (cathode),
Only the portion where the specific fluorescent color conversion film and / or the filter layer is located can emit light.

【0029】また、第一電極(陽極)をストライプパタ
ーンを持たない一様な平面電極とし、および第二電極
(陰極)を各画素に対応するようにパターニングしても
よい。その場合には、各画素に対応するスイッチング素
子を設けて、いわゆるアクティブマトリクス駆動を行う
ことが可能になる。
Further, the first electrode (anode) may be a uniform flat electrode having no stripe pattern, and the second electrode (cathode) may be patterned so as to correspond to each pixel. In that case, a so-called active matrix drive can be performed by providing a switching element corresponding to each pixel.

【0030】[0030]

【実施例】ここでは、画素数(320×RGB)×24
0ドット、画素ピッチ110×330μmのサブドット
数230,400の有機薄膜発光ディスプレイパネルに
本発明を適用した実施例を示す。パネルは、第一の電極
の形成するデータラインをパネル上下方向に2分割した
構造とした。
[Embodiment] Here, the number of pixels (320 × RGB) × 24
An example in which the present invention is applied to an organic thin-film light emitting display panel having 0 dots and a pixel pitch of 110 × 330 μm and the number of sub-dots 230 and 400 will be described. The panel has a structure in which the data line formed by the first electrode is divided into two in the vertical direction of the panel.

【0031】まず、基板上に蛍光色変換フィルターを形
成する。
First, a fluorescent color conversion filter is formed on the substrate.

【0032】[青色フィルターの作製]青色フィルター
材料(富士ハントエレクトロニクステクノロジー製:カ
ラーモザイクCB−7001)をスピンコート法にて、
透明基板のコーニングガラス(50×50×1.1m
m)上に塗布後、フォトリソグラフ法によりパターニン
グを実施し、青色フィルターの線幅0.1mm、ピッチ
0.33mm、膜厚10μmのラインパターンを得た。
[Preparation of blue filter] A blue filter material (manufactured by Fuji Hunt Electronics Technology: Color Mosaic CB-7001) was applied by spin coating.
Corning glass on a transparent substrate (50 x 50 x 1.1 m
m) and then patterned by photolithography to obtain a line pattern of a blue filter having a line width of 0.1 mm, a pitch of 0.33 mm and a film thickness of 10 μm.

【0033】[緑色変換フィルターの作製]蛍光色素と
してクマリン6(0.7重量部)を溶剤のプロピレング
リコールモノエチルアセテート(PGMEA)120重
量部へ溶解させた。光重合性樹脂の「V259PA/P
5」(商品名、新日鐵化成工業株式会社)100重量部
を加えて溶解させ、塗布溶液を得た。この塗布溶液を、
透明基板としてのコーニングガラス(50×50×1.
1mm)上に、スピンコート法を用いて塗布し、フォト
リソグラフ法により、パターニングを実施し、緑色変換
フィルターの線幅0.1mm、ピッチ0.33mm、膜
厚10μmのラインパターンを得た。
[Preparation of Green Conversion Filter] Coumarin 6 (0.7 parts by weight) as a fluorescent dye was dissolved in 120 parts by weight of propylene glycol monoethyl acetate (PGMEA) as a solvent. Photopolymerizable resin "V259PA / P
5 "(trade name, Nippon Steel Chemical Co., Ltd.) was added and dissolved to obtain a coating solution. This coating solution
Corning glass (50 x 50 x 1.
1 mm) was applied by a spin coating method and patterned by a photolithography method to obtain a line pattern of a green conversion filter having a line width of 0.1 mm, a pitch of 0.33 mm and a film thickness of 10 μm.

【0034】[赤色変換フィルター層の作製]蛍光色素
としてクマリン6(0.6重量部)、ローダミン6G
(0.3重量部)、ベーシックバイオレット11(0.
3重量部)を溶剤のプロピレングリコールモノエチルア
セテート(PGMEA)120重量部へ溶解させた。光
重合性樹脂の「V259PA/P5」(商品名、新日鐵
化成工業株式会社)100重量部を加えて溶解させ、塗
布溶液を得た。この塗布溶液を、透明基板としてのコー
ニングガラス(50×50×1.1mm)上に、スピン
コート法を用いて塗布し、フォトリソグラフ法により、
パターニングを実施し、赤色変換フィルターの線幅0.
1mm、ピッチ0.33mm、膜厚10μmのラインパ
ターンを得た。
[Preparation of Red Conversion Filter Layer] Coumarin 6 (0.6 parts by weight) as fluorescent dye, Rhodamine 6G
(0.3 parts by weight), basic violet 11 (0.
3 parts by weight) was dissolved in 120 parts by weight of a solvent propylene glycol monoethyl acetate (PGMEA). 100 parts by weight of a photopolymerizable resin "V259PA / P5" (trade name, Nippon Steel Chemical Co., Ltd.) was added and dissolved to obtain a coating solution. This coating solution was applied onto Corning glass (50 × 50 × 1.1 mm) as a transparent substrate by spin coating, and then by photolithography.
Patterning is performed, and the line width of the red conversion filter is 0.
A line pattern having a thickness of 1 mm, a pitch of 0.33 mm and a film thickness of 10 μm was obtained.

【0035】[保護層およびガスバリア層の製造]この
蛍光変換フィルターの上に、保護層としてUV硬化型樹
脂(エポキシ変性アクリレート)をスピンコート法にて
塗布し、高圧水銀灯にて照射し、膜厚5μm形成した。
この時、蛍光変換フィルターのパターンは変形がなく、
且つ、保護層上面は平坦化され保護されていた。
[Production of Protective Layer and Gas Barrier Layer] A UV curable resin (epoxy modified acrylate) was applied as a protective layer on this fluorescence conversion filter by a spin coating method and irradiated with a high pressure mercury lamp to give a film thickness. 5 μm was formed.
At this time, the pattern of the fluorescence conversion filter has no deformation,
Moreover, the upper surface of the protective layer was flattened and protected.

【0036】保護層上に、ガスバリア層として、スパッ
タ法にてSiO膜を300nm堆積させた。この
とき、JIS5400記載の基盤目試験にて保護層とガ
スバリア層の密着性を評価したところ、8点以上の良好
な密着性を示した。
On the protective layer, a SiO x N y film having a thickness of 300 nm was deposited as a gas barrier layer by a sputtering method. At this time, when the adhesion between the protective layer and the gas barrier layer was evaluated by the basic test according to JIS5400, a good adhesion of 8 points or more was shown.

【0037】このようにして、透明基板上に3原色から
なる蛍光変換フィルターを形成した。
In this way, the fluorescence conversion filter composed of the three primary colors was formed on the transparent substrate.

【0038】[有機発光素子の作製]得られた基板上の
蛍光変換フィルター上に有機発光素子を形成する。
[Production of Organic Light-Emitting Element] An organic light-emitting element is formed on the obtained fluorescence conversion filter on the substrate.

【0039】まず、フィルター部の最外層をなすガスバ
リア層の上面に、第二電極(陰極)用の端子パッド部5
および陽極の補助電極部として抵抗率1.5×10−5
[Ω・cm]のMoを膜厚300nm、幅20μm形成
した。Moの成膜にはDCマグネトロンスパッタ法を用
い、Mo上にレジスト剤「OFRP−800」(商品
名、東京応化製)を塗布した後、フォトリソグラフィー
法にてパターニングを行い、第二電極用の端子パッド5
および陽極の補助電極部を形成した。この後にスパッタ
法にて透明電極材料(ITO)を全面成膜した。ITO
上にレジスト剤「OFRP−800」(商品名、東京応
化製)を塗布した後、フォトリソグラフィー法にてパタ
ーニングを行い、それぞれの色の発光部(赤色、緑色、
および青色)に位置する、幅0.094mm、間隔0.
016mm、膜厚100nmのストライプパターンから
なる陽極1を得た。
First, the terminal pad portion 5 for the second electrode (cathode) is formed on the upper surface of the gas barrier layer which is the outermost layer of the filter portion.
And a resistivity of 1.5 × 10 −5 as an auxiliary electrode portion of the anode
Mo of [Ω · cm] was formed with a film thickness of 300 nm and a width of 20 μm. A DC magnetron sputtering method is used for forming a film of Mo, a resist agent “OFRP-800” (trade name, manufactured by Tokyo Ohka Co., Ltd.) is applied on Mo, and then patterning is performed by a photolithography method to form a second electrode. Terminal pad 5
And the auxiliary electrode portion of the anode was formed. After that, a transparent electrode material (ITO) was formed on the entire surface by a sputtering method. ITO
After applying the resist agent "OFRP-800" (trade name, manufactured by Tokyo Ohka) on the top, patterning is performed by photolithography, and the light emitting portions (red, green,
And 94.), width 0.094 mm, spacing 0.
An anode 1 having a stripe pattern of 016 mm and a film thickness of 100 nm was obtained.

【0040】次に電気絶縁膜としてポジ型フォトレジス
ト[WIX−2A](商品名、日本ゼオン製)をスピン
コート法にて塗布し、フォトリソグラフによりパターニ
ングを実施した。電気絶縁膜は膜厚1μmであり、各第
一電極上2に幅80μm、長さ290μm(第一電極の
伸張方向)の開口部を複数有し、かつ各第二電極用の端
子パッド5上に幅(端子パッドの伸張方向)1mm、長
さ290μmの開口部を有している。電気絶縁膜の端部
の基板に対する角度は鋭角となっている。このようにし
て、図3に示すように、絶縁膜は表示領域の外側におい
て陰極形成領域よりも広く形成し、陽極上と陰極の端子
パッド上に開口部7を設けた。
Next, a positive photoresist [WIX-2A] (trade name, manufactured by Zeon Corporation) was applied as an electric insulating film by a spin coating method, and patterning was performed by photolithography. The electric insulating film has a film thickness of 1 μm, has a plurality of openings of width 80 μm and length 290 μm (in the extending direction of the first electrode) on each first electrode 2, and on the terminal pad 5 for each second electrode. Has an opening with a width of 1 mm (the extending direction of the terminal pad) and a length of 290 μm. The angle of the end of the electric insulating film with respect to the substrate is an acute angle. In this way, as shown in FIG. 3, the insulating film was formed wider outside the display region than in the cathode formation region, and the openings 7 were provided on the anode and the cathode terminal pads.

【0041】本実施例に用いたポジ型フォトレジストで
はおよそ800nm以上の膜厚で形成することにより十
分な絶縁耐圧を持つことができた。
The positive type photoresist used in this example was able to have a sufficient withstand voltage by being formed with a film thickness of approximately 800 nm or more.

【0042】次にネガ型フォトレジスト[ZPN110
0](商品名、日本ゼオン製)をスピンコート法にて塗
布し、フォトリソグラフにより厚さ4μmの隔壁8を図
3に示すように形成した。陰極伸張方向の隔壁幅は30
μmであり、ピッチは330μmである。また、隔壁の
端部は陰極伸張方向に垂直に形成された隔壁により連結
されている。
Next, a negative photoresist [ZPN110
0] (trade name, manufactured by Zeon Corporation) was applied by a spin coating method, and partition walls 8 having a thickness of 4 μm were formed by photolithography as shown in FIG. The partition wall width in the cathode extension direction is 30
μm and the pitch is 330 μm. In addition, the ends of the barrier ribs are connected by the barrier ribs formed perpendicularly to the cathode extension direction.

【0043】隔壁を連結することにより隔壁の強度が向
上し、−40℃から95℃のヒートショック試験におい
て400サイクル以上の形状および密着の安定性を確認
した。
By connecting the partition walls, the strength of the partition walls was improved, and the shape and adhesion stability of 400 cycles or more were confirmed in a heat shock test of -40 ° C to 95 ° C.

【0044】次いで、前述の基板を抵抗加熱蒸着装置内
に装着し、正孔注入層、正孔輸送層、有機発光層、電子
注入層を、真空を破らずに順次成膜した。成膜に際して
真空槽内圧は1×10−4Paまで減圧した。正孔注入
層は銅フタロシアニン(CuPc)
Next, the above-mentioned substrate was mounted in a resistance heating vapor deposition apparatus, and a hole injection layer, a hole transport layer, an organic light emitting layer, and an electron injection layer were sequentially formed without breaking the vacuum. During film formation, the internal pressure of the vacuum chamber was reduced to 1 × 10 −4 Pa. The hole injection layer is copper phthalocyanine (CuPc)

【0045】[0045]

【化1】 [Chemical 1]

【0046】を100nm積層した。正孔輸送層は、
4,4′−ビス[N−(1−ナフチル)−N−フェニル
アミノ]ビフェニル(α−NPD)
100 nm was laminated. The hole transport layer is
4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (α-NPD)

【0047】[0047]

【化2】 [Chemical 2]

【0048】を20nm積層した。有機発光層は4,
4′−ビス(2,2′−ジフェニルビニル)ビフェニル
(DPVBi)
20 nm was laminated. The organic light emitting layer is 4,
4'-bis (2,2'-diphenylvinyl) biphenyl (DPVBi)

【0049】[0049]

【化3】 [Chemical 3]

【0050】を30nm積層した。電子注入層はトリス
(8−ヒドロキシキノリン)アルミニウム錯体(Al
q)
30 nm was laminated. The electron injection layer is a tris (8-hydroxyquinoline) aluminum complex (Al
q)

【0051】[0051]

【化4】 [Chemical 4]

【0052】を20nm積層した。正孔注入層、正孔輸
送層、有機発光層、および電子注入層の成膜には開口部
107.6×81.2mmの蒸着マスクを用いて形成し
た。
20 nm was laminated. The hole injecting layer, the hole transporting layer, the organic light emitting layer, and the electron injecting layer were formed using a vapor deposition mask having an opening of 107.6 × 81.2 mm.

【0053】この後、厚さ200nmのMg/Ag(1
0:1の重量比率)層からなる陰極(第二電極)3を、
真空を破らずに形成した。陰極の成膜には開口部11
1.6×81.2mmの蒸着マスクを用いた。蒸着マス
クと、基板との位置合わせ精度は±1mmであり、陰極
は陰極用の端子パッド5と1mmの接触領域を持つ構造
とした。
After this, 200 nm thick Mg / Ag (1
A cathode (second electrode) 3 composed of a layer (0: 1 weight ratio),
Formed without breaking vacuum. Opening 11 for forming the cathode
A 1.6 × 81.2 mm vapor deposition mask was used. The accuracy of alignment between the vapor deposition mask and the substrate was ± 1 mm, and the cathode had a structure having a contact area of 1 mm with the cathode terminal pad 5.

【0054】隔壁の端部が連結されていることにより、
それぞれの陰極の形成領域を完全に規定することがで
き、また絶縁膜を陰極領域より広く形成することによ
り、陽極間および陰極間の短絡を防ぐことができた。
By connecting the ends of the partition walls,
It was possible to completely define the formation region of each cathode and prevent the short circuit between the anodes and between the cathodes by forming the insulating film wider than the cathode region.

【0055】このようにして得られた有機発光素子をグ
ローブボックス内乾燥窒素雰囲気(酸素および水分濃度
ともに10ppm以下)下において、封止ガラス(図示
せず)とUV硬化接着剤を用いて封止した。
The organic light-emitting device thus obtained was sealed in a glove box under a dry nitrogen atmosphere (both oxygen and water concentrations were 10 ppm or less) using a sealing glass (not shown) and a UV curing adhesive. did.

【0056】封止を完了した基板は、大気中に取り出さ
れ、異方導電性接着剤(ACF)を用いて端子パッドを
介して駆動回路端子と接続した。
The sealed substrate was taken out into the atmosphere and connected to the drive circuit terminals via the terminal pads using an anisotropic conductive adhesive (ACF).

【0057】以上の方法により、画素数(320×RG
B)×240ドット、画素ピッチ110×330μmの
サブドット数230,400の有機薄膜発光ディスプレ
イパネルを作製した。
By the above method, the number of pixels (320 × RG
B) An organic thin film light emitting display panel having 240 dots and a pixel pitch of 110 × 330 μm and having 230,400 sub-dots was produced.

【0058】[0058]

【発明の効果】以上説明したように、本発明を用いる
と、高精細で信頼性の高い有機薄膜発光ディスプレイパ
ネルの製造において、第二電極の分離を確実に行うこと
ができ、蒸着マスクを容易に位置合わせでき、また、費
用をかけずに作製歩留まりを向上させることができる。
As described above, according to the present invention, the second electrode can be reliably separated in the production of a high-definition and highly reliable organic thin film light emitting display panel, and a vapor deposition mask can be easily formed. The manufacturing yield can be improved without cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明における有機薄膜発光ディスプレイの基
板構成の一例を示す平面図である。
FIG. 1 is a plan view showing an example of a substrate structure of an organic thin film light emitting display according to the present invention.

【図2】図1のII−II線における断面図である。FIG. 2 is a sectional view taken along line II-II in FIG.

【図3】本発明における有機薄膜発光ディスプレイの基
板構成の一例を示す平面図である。
FIG. 3 is a plan view showing an example of a substrate configuration of an organic thin film light emitting display according to the present invention.

【図4】本発明における有機薄膜発光ディスプレイの隔
壁の配置例を示す図である。
FIG. 4 is a view showing an arrangement example of partition walls of the organic thin film light emitting display according to the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 第一電極(陽極) 2a 第一電極用の端子パッド 3 第二電極(陰極) 4 有機発光層 5 第二電極用の端子パッド 6 電気絶縁膜 7 電気絶縁膜の開口部 8 隔壁 1 substrate 2 First electrode (anode) 2a Terminal pad for first electrode 3 Second electrode (cathode) 4 Organic light emitting layer 5 Terminal pad for the second electrode 6 Electric insulation film 7 Opening of electrical insulation film 8 partitions

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05B 33/14 H05B 33/14 A 33/22 33/22 Z Fターム(参考) 3K007 AB04 AB18 BA06 BB06 CB01 CC05 DB03 EA00 FA01 FA02 5C094 AA08 AA42 AA43 AA44 AA48 BA27 CA19 CA24 DA13 DA15 DB02 DB04 EA05 EB02 ED02 FA01 FB01 FB15 FB20 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05B 33/14 H05B 33/14 A 33/22 33/22 Z F term (reference) 3K007 AB04 AB18 BA06 BB06 CB01 CC05 DB03 EA00 FA01 FA02 5C094 AA08 AA42 AA43 AA44 AA48 BA27 CA19 CA24 DA13 DA15 DB02 DB04 EA05 EB02 ED02 FA01 FB01 FB15 FB20

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 透明基板上に形成された複数の第一電極
の列と、複数の第二電極の列との交点より構成される画
素からなる画像表示配列領域を有し、前記電極間には少
なくとも有機発光層が形成されており、所望の画素を構
成する両電極間に電圧を印加し電流を注入することで得
るエレクトロルミネセンスを取り出すことで情報を表示
する有機薄膜発光ディスプレイであって、 前記画像表示配列領域の周辺に、第一電極から延長され
た第一電極用の端子パッドおよび第二電極用の端子パッ
ドが形成されており、前記第一電極の一部、透明基板、
および第二電極用の端子パッドの一部上に電気絶縁膜が
形成されており、第二電極は、第二電極用の端子パッド
上の電気絶縁膜の開口部において、第二電極用の端子パ
ッドと接続されており、前記電気絶縁膜上に突出した第
二電極に平行な複数の電気絶縁体からなる隔壁が形成さ
れており、該隔壁は第二電極用の端子パッド上の電気絶
縁膜上において、隣接する隔壁が互いに連結されている
ことを特徴とする有機薄膜発光ディスプレイ。
1. An image display array region having pixels formed by intersections of a plurality of first electrode rows and a plurality of second electrode rows formed on a transparent substrate, and between the electrodes. Is an organic thin-film light-emitting display that displays information by extracting electroluminescence obtained by applying a voltage and injecting a current between both electrodes that form a desired pixel. In the vicinity of the image display array region, a terminal pad for a first electrode and a terminal pad for a second electrode extended from a first electrode are formed, and a part of the first electrode, a transparent substrate,
And an electric insulating film is formed on a part of the terminal pad for the second electrode, and the second electrode is a terminal for the second electrode in the opening of the electric insulating film on the terminal pad for the second electrode. A partition wall formed of a plurality of electrical insulators connected to the pad and parallel to the second electrode protruding on the electrical insulation film is formed, and the partition wall is the electrical insulation film on the terminal pad for the second electrode. In the above, the organic thin film light emitting display is characterized in that adjacent barrier ribs are connected to each other.
【請求項2】 有機薄膜発光ディスプレイの製造方法で
あって、 基板の上に、複数の第一電極をパターニングして形成す
る工程と、 前記第一電極の周辺に第二電極用の端子パッドを形成す
る工程と、 前記第一電極の一部、基板、および第二電極用の端子パ
ッドの一部上に電気絶縁膜を形成する工程と、 前記電気絶縁膜上に電気絶縁体からなる隔壁を形成する
工程と、 前記電気絶縁膜上および第一電極上の電気絶縁膜の開口
部に有機発光層を形成する工程と、 前記有機発光層、電気絶縁膜、および第二電極用の端子
パッド上の電気絶縁膜の開口部に第二電極となる薄膜を
形成する工程と、 を備え、前記第二電極を、第二電極用の端子パッド上の
電気絶縁膜の開口部を通して第二電極用の端子パッドと
導通させ、電気絶縁体からなる隔壁により第二電極の形
成領域を規定していること、 を特徴とする有機薄膜発光ディスプレイの製造方法。
2. A method of manufacturing an organic thin film light emitting display, the method comprising: patterning and forming a plurality of first electrodes on a substrate; and forming terminal pads for the second electrodes around the first electrodes. A step of forming, a step of forming an electric insulating film on a part of the first electrode, the substrate, and a part of the terminal pad for the second electrode, and a partition wall made of an electric insulator on the electric insulating film. A step of forming, an step of forming an organic light emitting layer in the opening of the electric insulating film on the electric insulating film and on the first electrode, on the organic light emitting layer, the electric insulating film, and the terminal pad for the second electrode And a step of forming a thin film to be a second electrode in the opening of the electric insulating film, the second electrode for the second electrode through the opening of the electric insulating film on the terminal pad for the second electrode. It is electrically connected to the terminal pad and is separated by an electrically insulating partition wall. The method for manufacturing an organic thin film light-emitting display, characterized in that, defining the formation area of the second electrode.
JP2001335273A 2001-10-31 2001-10-31 Organic thin film light emitting display and method for manufacturing the same Expired - Fee Related JP3674848B2 (en)

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