JP2003133535A - Package for housing imaging element - Google Patents

Package for housing imaging element

Info

Publication number
JP2003133535A
JP2003133535A JP2001323988A JP2001323988A JP2003133535A JP 2003133535 A JP2003133535 A JP 2003133535A JP 2001323988 A JP2001323988 A JP 2001323988A JP 2001323988 A JP2001323988 A JP 2001323988A JP 2003133535 A JP2003133535 A JP 2003133535A
Authority
JP
Japan
Prior art keywords
package
image pickup
lithium niobate
plate
pickup device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001323988A
Other languages
Japanese (ja)
Other versions
JP3814512B2 (en
Inventor
Yoji Kobayashi
洋二 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001323988A priority Critical patent/JP3814512B2/en
Publication of JP2003133535A publication Critical patent/JP2003133535A/en
Application granted granted Critical
Publication of JP3814512B2 publication Critical patent/JP3814512B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PROBLEM TO BE SOLVED: To solve the problem that damage to a cover and a decrease in the reliability of hermetical sealing cannot be prevented effectively. SOLUTION: The package for housing an imaging element comprises an insulating base 1 having a recess 1a for mounting the imaging element 4 on an upper surface, and a transparent cover 2 connected to the upper surface of the base 1 so as to cover the recess 1a via a sealer 3. The cover 2 is formed of a plate material 2a made of glass, and an optical plate material 2b made of at least a single lithium niobate plate X which is adhered to the upper surface of the material 2a via a resin adhesive 7.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、外部からの機械的
衝撃や熱的衝撃、あるいは水分の浸入から半導体素子を
保護するための撮像素子収納用パッケージに関し、特に
200万画素を超える、CCD・CMOSイメージセンサ
等のカラー撮像素子を搭載する撮像素子収納用パッケー
ジに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package for housing an image pickup device for protecting a semiconductor device from mechanical shock or thermal shock from the outside or intrusion of moisture, and more particularly,
The present invention relates to a package for storing an image pickup device, which has a color image pickup device such as a CCD / CMOS image sensor exceeding 2 million pixels.

【0002】[0002]

【従来の技術】近年、CCD・CMOS等の撮像装置を
含むカメラの軽薄短小化および低価格化が急激に進展
し、これに伴って搭載される撮像素子収納用パッケージ
をはじめとする光学機能部品も軽薄短小化あるいは部品
削減が進んでいる。
2. Description of the Related Art In recent years, a camera including an image pickup device such as a CCD or CMOS has been rapidly reduced in size, thickness, and price, and along with this, optical functional parts such as a package for storing an image pickup element. The lightness, thinness, shortness and miniaturization or the reduction of parts are progressing.

【0003】このような光学機能部品は、一般に画像を
集光するとともに撮像素子に導くためのガラス材やプラ
スチック材から成るレンズと、画像のモアレを防ぐため
の複屈折効果や位相効果を有する水晶から成る光学ロー
パスフィルタと、赤みがかる色調を補正するための金属
錯体を含有する赤外線カットフィルタと、ホウ珪酸ガラ
ス板材から成る蓋体および酸化アルミニウム質焼結体や
窒化アルミニウム質焼結体・ムライト質焼結体・窒化珪
素質焼結体等の電気絶縁材料から成り、半導体素子を搭
載する凹部を有する絶縁基体から成る撮像素子収納用パ
ッケージとから構成されている。
Such an optical functional component generally has a lens made of a glass material or a plastic material for focusing an image and guiding it to an image pickup device, and a crystal having a birefringence effect or a phase effect for preventing an image moire. Optical low-pass filter consisting of, infrared cut filter containing metal complex to correct reddish color tone, lid made of borosilicate glass plate and aluminum oxide sintered body or aluminum nitride sintered body / mullite The image pickup device housing package is made of an electrically insulating material such as a sintered body or a silicon nitride sintered body, and is made of an insulating base having a recess for mounting a semiconductor element.

【0004】しかしながら、このような光学機能部品構
成では、個々の特性を得るための部材厚みの制約から薄
型化が困難であり、結果としてカメラ本体を小型化でき
ないという問題点を有していた。
However, in such an optical functional component structure, it is difficult to reduce the thickness due to the restriction of the member thickness for obtaining individual characteristics, and as a result, the camera body cannot be downsized.

【0005】このような問題点を解決するために、特開
2000−114502号公報には、光学ローパスフィルタの機能
を有する水晶を撮像素子収納用パッケージの蓋体として
使用し、さらにこの蓋体に誘電体多層膜を施すことによ
り赤外線遮蔽機能を付加して、光学機能部品を薄型化す
ることが提案されている。
In order to solve such a problem, Japanese Patent Laid-Open Publication No.
In 2000-114502, a crystal having a function of an optical low-pass filter is used as a lid of a package for housing an image sensor, and an infrared shielding function is added by applying a dielectric multilayer film to the lid, It has been proposed to make the optical functional component thinner.

【0006】また、水晶以上に複屈折率の大きいニオブ
酸リチウムを蓋体として用いて、さらに光学部品を薄型
化することが提案されている。
Further, it has been proposed to use lithium niobate, which has a larger birefringence than that of quartz, as a lid to further reduce the thickness of optical components.

【0007】この提案によれば、蓋体を、複屈折効果あ
るいは位相効果を有するニオブ酸リチウム板の片面全面
あるいは画像認識の有効領域に、Ta25・TiO2
Nb25・LaF3・La23・Ta25・ZrO2・Y
23等の屈折率が1.7以上の誘電体からなる高屈折率薄
膜層とSiO2・Al23・MgF2・Na3AlF6等の
屈折率が1.6以下の誘電体からなる低屈折率薄膜層とを
交互に数十層積層して成る誘電体多層膜を、例えばCV
D法・スパッタ法・真空蒸着法等により被着形成して赤
外線遮蔽機能を有するものとすることにより、これまで
光学ローパスフィルタおよび赤外線カットフィルタを設
置するのに必要であった空間が削減でき、カメラの薄型
化が可能になるというものである。
[0007] According to this proposal, the lid body is provided with Ta 2 0 5 · TiO 2 · on the entire surface of one side of the lithium niobate plate having a birefringence effect or a phase effect or in an effective area for image recognition.
Nb 2 0 5 · LaF 3 · La 2 O 3 · Ta 2 O 5 · ZrO 2 · Y
2 O 3 high refractive index thin film layer in which the refractive index is 1.7 or more dielectric such as SiO 2 · Al 2 O 3 · MgF 2 · Na 3 AlF 6 , etc. the refractive index of the is 1.6 or less dielectric low-refractive A dielectric multi-layered film formed by alternately laminating several tens of thin film layers
By using the D method, the sputtering method, the vacuum deposition method, or the like to form an adhesive film having an infrared shielding function, the space required to install the optical low-pass filter and the infrared cut filter can be reduced, This means that the camera can be made thinner.

【0008】なお、ニオブ酸リチウム板に多層膜を施す
ことにより赤外線カット機能が付与される理由は次の通
りである。一般的には、光学的膜厚(λ/4:λは設計
波長)が薄膜層を構成する材料の屈折率(n)と形状膜
厚(d)との積(n×d)で表わされることから、薄膜
層の材料および形状膜厚を適宜選択するとともに薄膜層
を複数積層して特定範囲の波長光の透過・反射をコント
ロールすることによりニオブ酸リチウム板に赤外線カッ
ト機能を付与するものである。また、ニオブ酸リチウム
板から成る蓋体は、通常はニオブ酸リチウム板が1枚、
あるいは複屈折効果や位相効果を有するニオブ酸リチウ
ム板を複数枚貼り合わせることにより形成されている。
The reason why the infrared ray cutting function is imparted by applying a multilayer film to the lithium niobate plate is as follows. Generally, the optical film thickness (λ / 4: λ is the design wavelength) is represented by the product (n × d) of the refractive index (n) of the material forming the thin film layer and the shape film thickness (d). Therefore, by appropriately selecting the material and shape film thickness of the thin film layer and stacking a plurality of thin film layers to control the transmission / reflection of light having a wavelength in a specific range, it is possible to impart an infrared cut function to the lithium niobate plate. is there. The lid made of a lithium niobate plate usually has one lithium niobate plate,
Alternatively, it is formed by laminating a plurality of lithium niobate plates having a birefringence effect or a phase effect.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、光学ロ
ーパスフィルタとして用いられるニオブ酸リチウムは、
従来蓋体として用いられているホウ珪酸ガラスと比較し
て、熱膨張係数が非常に小さくかつ熱膨張の方向に異方
性をもっており、また材料強度が非常に弱く脆く、さら
に複屈折率が大きいことから厚みが従来用いられていた
水晶と比較して約1/6と非常に薄くなり、200万画素
を超えるような高画素デバイスを覆う15mm角を超える
大きさの蓋体では、外部からの機械的衝撃や熱的衝撃を
受けた際に絶縁基体と蓋体との接合部に集中する応力に
より蓋体が容易に破壊されてしまい、パッケージの気密
封止が破れてしまうという問題点を有していた。
However, lithium niobate used as an optical low pass filter is
Compared with borosilicate glass that has been used as a conventional lid, it has a very small coefficient of thermal expansion and anisotropy in the direction of thermal expansion, and its material strength is very weak and brittle, and its birefringence is large. As a result, the thickness is very thin, about 1/6 of that of the conventionally used crystal, and with a lid larger than 15 mm square that covers a high pixel device that exceeds 2 million pixels, There is a problem that the lid is easily broken by the stress concentrated on the joint between the insulating base and the lid when it receives a mechanical shock or a thermal shock, and the hermetic sealing of the package is broken. Was.

【0010】また、誘電体多層膜を、例えば蓋体の外側
に形成した場合、誘電体多層膜が空気中の水分を吸収し
てその赤外線遮蔽機能が劣化してしまうという問題点
を、さらに、誘電体多層膜を蓋体の内側に形成した場合
には、温度サイクル等の熱衝撃により誘電体多層膜が蓋
体から剥離して撮像素子の画像認識領域に落下してしま
い、撮像に支障をきたしてしまうという問題点を有して
いた。
Further, when the dielectric multilayer film is formed, for example, on the outer side of the lid, the dielectric multilayer film absorbs moisture in the air to deteriorate the infrared shielding function. When the dielectric multilayer film is formed on the inside of the lid, the dielectric multilayer film is separated from the lid due to thermal shock such as a temperature cycle and falls into the image recognition area of the image sensor, which hinders imaging. It had a problem that it caused it.

【0011】さらに、ニオブ酸リチウム板を用いた透光
性蓋体を絶縁基体に従来の高弾性率の熱硬化性樹脂を用
いて接合した場合、熱硬化性樹脂が硬化する際の応力に
よってニオブ酸リチウム板が破壊されてしまい、パッケ
ージの気密封止が破れてしまうという問題点も有してい
た。
Further, when a translucent lid body made of a lithium niobate plate is bonded to an insulating substrate by using a conventional thermosetting resin having a high elastic modulus, the niobium is caused by stress when the thermosetting resin is cured. There is also a problem that the lithium oxide plate is broken and the hermetic sealing of the package is broken.

【0012】本発明は、かかる従来技術の問題点に鑑み
案出されたものであり、その目的は外部からの機械的衝
撃や熱的衝撃に対して気密封止の信頼性が高く、かつ外
界の環境に影響を受けずに安定した光学特性を得られ
る、光学ローパスフィルタおよび赤外線カットフィルタ
の機能を有する撮像素子収納用パッケージを提供するこ
とにある。
The present invention has been devised in view of the above problems of the prior art, and its purpose is to provide a highly reliable airtight seal against mechanical shock or thermal shock from the outside, and to provide an external environment. An object of the present invention is to provide a package for housing an image pickup device having functions of an optical low-pass filter and an infrared cut filter, which can obtain stable optical characteristics without being affected by the environment.

【0013】[0013]

【課題を解決するための手段】本発明の撮像素子収納用
パッケージは、上面に撮像素子が搭載される凹部を有す
る絶縁基体と、この絶縁基体の上面に凹部を覆うように
封止剤を介して接合される透光性蓋体とから成り、この
透光性蓋体は、ガラスから成る板材と、この板材の上面
に樹脂系接着剤を介して接着した、少なくとも1枚のニ
オブ酸リチウム板から成る光学板材とで形成されている
ことを特徴とするものである。
The package for housing an image pickup device of the present invention includes an insulating base having a recess on the upper surface of which an image pickup device is mounted, and a sealant interposed so as to cover the recess on the upper surface of the insulating base. And a light-transmitting lid body bonded together, the light-transmitting lid body being made of a glass plate material and at least one lithium niobate plate bonded to the upper surface of the plate material with a resin adhesive. And an optical plate material composed of.

【0014】また、本発明の撮像素子収納用パッケージ
は、上記構成において、ニオブ酸リチウム板のいずれか
1枚の板材側の面に赤外線遮蔽機能を有する誘電体多層
膜が形成されていることを特徴とするものである。
Further, the package for housing the image pickup device of the present invention has any one of the lithium niobate plates in the above structure.
It is characterized in that a dielectric multilayer film having an infrared shielding function is formed on the surface of one plate material side.

【0015】さらに、本発明の撮像素子収納用パッケー
ジは、上記構成において、樹脂系接着剤の厚みが1〜30
μmであることを特徴とするものである。
Further, in the package for housing the image pickup device of the present invention, in the above-mentioned constitution, the thickness of the resin adhesive is 1 to 30.
It is characterized by being μm.

【0016】また、本発明の撮像素子収納用パッケージ
は、上記構成において、封止剤がエポキシ樹脂を主成分
とする熱硬化性樹脂に有機材料粉末を含有させて成ると
ともに、封止剤の弾性率が0.1〜3GPaであることを
特徴とするものである。
Further, in the package for housing an image pickup device of the present invention, in the above structure, the sealant is made of thermosetting resin containing epoxy resin as a main component and organic material powder, and the elasticity of the sealant is high. The rate is 0.1 to 3 GPa.

【0017】本発明の撮像素子収納用パッケージによれ
ば、透光性蓋体をガラスから成る板材と少なくとも1枚
のニオブ酸リチウム板から成る光学板材とで形成したこ
とから、15mm角を超える大きさの透光性蓋体を絶縁基
体に接合したとしても、外部からの機械的衝撃や熱的衝
撃を受けた際の絶縁基体と蓋体との接合部に集中する応
力をガラスから成る板材がニオブ酸リチウム板全体に良
好に分散し、その結果、ニオブ酸リチウム板に大きな応
力が集中してニオブ酸リチウム板が容易に破壊されるこ
とはなく、気密封止の良好なパッケージとすることがで
きる。
According to the package for housing the image pickup device of the present invention, the translucent lid is formed of the plate material made of glass and the optical plate material made of at least one lithium niobate plate. Even if the translucent lid is bonded to the insulating base, the plate material made of glass applies the stress concentrated on the joint between the insulating base and the cover when it receives a mechanical shock or a thermal shock from the outside. It is well dispersed throughout the lithium niobate plate, and as a result, large stress is not concentrated on the lithium niobate plate and the lithium niobate plate is not easily broken, and a package with good hermetic sealing can be obtained. it can.

【0018】また、本発明の撮像素子収納用パッケージ
によれば、上記構成において、ニオブ酸リチウム板のい
ずれか1枚の板材側の面に赤外線遮蔽機能を有する誘電
体多層膜を形成したことから、水分の吸収により光学特
性が変化し易い誘電体多層膜を空気中の水分から保護す
ることが可能となり、安定した赤外線カット機能を有す
る撮像素子収納用パッケージとすることができる。さら
に、温度サイクル等の熱衝撃により誘電体多層膜が蓋体
から剥離して撮像素子の画像認識領域に落下してしま
い、撮像に支障をきたしてしまうということもない。
Further, according to the image pickup device housing package of the present invention, in the above structure, the dielectric multilayer film having the infrared shielding function is formed on the surface of any one of the lithium niobate plates on the plate material side. As a result, it becomes possible to protect the dielectric multilayer film whose optical characteristics are likely to change due to the absorption of water from the water in the air, and it is possible to provide a package for housing an image sensor having a stable infrared ray cutting function. Further, there is no possibility that the dielectric multilayer film is peeled off from the lid and dropped into the image recognition area of the image pickup element due to thermal shock such as a temperature cycle, which causes trouble in image pickup.

【0019】さらに、本発明の撮像素子収納用パッケー
ジによれば、上記構成において、ガラスから成る板材と
ニオブ酸リチウム板を貼り合わせて成る光学板材とを接
合する樹脂系接着剤の厚みを1〜30μmとしたことか
ら、ガラスから成る板材とニオブ酸リチウム板の熱膨脹
係数の相違に起因して発生する応力を良好に緩和するこ
とができ、その結果、パッケージが温度サイクル試験等
で熱衝撃を受けたとしても光学板材が破壊されることは
なく、かつ撮像素子への光の入射が阻害されることのな
い良好な赤外線カット機能を有する撮像素子収納用パッ
ケージとすることができる。
Further, according to the package for housing an image pickup device of the present invention, in the above structure, the thickness of the resin-based adhesive for joining the plate member made of glass and the optical plate member made by bonding the lithium niobate plates to the range of 1 to Since the thickness is 30 μm, the stress generated due to the difference in thermal expansion coefficient between the glass plate material and the lithium niobate plate can be satisfactorily relaxed, and as a result, the package is not subject to thermal shock during temperature cycle tests. Even if it does, the optical plate material is not destroyed, and the image pickup device housing package having a good infrared ray cut function that does not hinder the incidence of light on the image pickup device can be provided.

【0020】また、本発明の撮像素子収納用パッケージ
によれば、上記構成において、封止剤をエポキシ樹脂を
主成分とする熱硬化性樹脂に有機材料粉末を含有させて
その弾性率を0.1〜3GPaとしたことから、熱硬化性
樹脂が硬化する際の応力によって透光性蓋体が破壊され
ることはなく、気密信頼性の優れた撮像素子収納用パッ
ケージとすることができる。
Further, according to the package for housing the image pickup device of the present invention, in the above-mentioned structure, a thermosetting resin having epoxy resin as a main component is mixed with organic material powder as a sealing agent, and the elastic modulus thereof is 0.1 to. Since the pressure is set to 3 GPa, the translucent lid is not destroyed by the stress when the thermosetting resin is cured, and the image pickup element housing package having excellent airtight reliability can be obtained.

【0021】[0021]

【発明の実施の形態】以下、本発明の撮像素子収納用パ
ッケージを添付の図面に基づき詳細に説明する。図1
は、本発明の撮像素子収納用パッケージの実施の形態の
一例を示す断面図であり、図2は、その要部拡大断面図
である。これらの図において、1は絶縁基体、2は透光
性蓋体、3は封止剤、4は撮像素子であり、主に絶縁基
体1と透光性蓋体2と封止剤3とで本発明の撮像素子収
納用パッケージが構成される。なお、透光性蓋体2はガ
ラスから成る板材2aに、1枚のニオブ酸リチウム板X
または複数枚のニオブ酸リチウム板Xを貼り合せて成る
光学板材2bを接合することによって形成されている。
また、この図の例では、ニオブ酸リチウム板Xを3枚貼
り合わせた場合の例を示している。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a package for accommodating an image pickup device of the present invention will be described in detail with reference to the accompanying drawings. Figure 1
[Fig. 2] is a sectional view showing an example of an embodiment of a package for accommodating an image sensor of the present invention, and Fig. 2 is an enlarged sectional view of a main part thereof. In these figures, 1 is an insulating substrate, 2 is a translucent lid, 3 is a sealant, 4 is an image sensor, and mainly the insulating substrate 1, the translucent lid 2 and the sealant 3 are used. An image pickup device housing package of the present invention is configured. In addition, the translucent lid 2 includes a plate material 2a made of glass, and one lithium niobate plate X.
Alternatively, it is formed by joining optical plate materials 2b formed by bonding a plurality of lithium niobate plates X together.
Further, in the example of this figure, an example in which three lithium niobate plates X are bonded together is shown.

【0022】絶縁基体1は、その上面に撮像素子4を搭
載するための凹部1aが設けてあり、この凹部1aの底
面には撮像素子4がガラス・樹脂・ろう材等から成る接
着剤を介して接着固定される。
The insulating base 1 is provided with a recess 1a for mounting the image pickup device 4 on the upper surface thereof, and the image pickup device 4 is provided on the bottom surface of the recess 1a with an adhesive made of glass, resin, brazing material or the like. And glued and fixed.

【0023】このような絶縁基体1は、酸化アルミニウ
ム質焼結体やムライト質焼結体・窒化アルミニウム質焼
結体・窒化珪素質焼結体・炭化珪素質焼結体等の無機絶
縁材料あるいは、エポキシ樹脂・フェノール樹脂・液晶
ポリマー・ポリフェニレンサルファイド等の有機絶縁材
料から成り、例えば、酸化アルミニウム質焼結体から成
る場合であれば、酸化アルミニウム・酸化珪素・酸化マ
グネシウム・酸化カルシウム等の原料粉末に適当な有機
バインダ・溶剤・可塑剤・分散剤を添加混合して泥漿物
を作り、この泥漿物を従来周知のドクターブレード法や
カレンダーロール法等のシート成形法を採用しシート状
にしてセラミックグリーンシート(セラミック生シー
ト)を得、しかる後、それらセラミックグリーンシート
に適当な打抜き加工を施すとともにこれを複数枚積層
し、約1600℃の高温で焼成することによって製作され
る。あるいは、エポキシ樹脂からなる場合であれば、一
般的にシリカ粉末を充填した樹脂コンパウンドを射出成
形機により約180℃の熱で任意の金型形状に成形し硬化
させることによって製作される。なお、絶縁基体1の大
きさは、撮像素子4としては対角線の長が2インチ(in
ch)以下のものが使用されるため、縦・横の長さが50m
m以下である。
The insulating substrate 1 is made of an inorganic insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, a silicon nitride sintered body, or a silicon carbide sintered body. , Organic resin such as epoxy resin, phenol resin, liquid crystal polymer, polyphenylene sulfide, for example, aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc. A suitable organic binder, solvent, plasticizer, dispersant is added and mixed to make a sludge, and the sludge is made into a sheet by using the sheet forming method such as the well-known doctor blade method or calendar roll method. Obtain a green sheet (ceramic green sheet), and then punch appropriately into those ceramic green sheets. This laminating a plurality, it is manufactured by firing at a high temperature of about 1600 ° C. with applied. Alternatively, when it is made of an epoxy resin, it is generally manufactured by molding a resin compound filled with silica powder with an injection molding machine by heat of about 180 ° C. into an arbitrary mold shape and curing it. The size of the insulating substrate 1 is such that the diagonal length of the image pickup element 4 is 2 inches (in).
ch) The following items are used, so the length and width are 50m.
m or less.

【0024】また、絶縁基体1には、凹部1aの底面か
ら下面にかけて複数の配線導体5が被着形成されてお
り、この配線導体5の凹部1aの底面に位置する部位に
は撮像素子4の各電極がボンディングワイヤ6を介して
電気的に接続され、また、下面に導出する部位を外部電
気回路の配線導体(図示せず)に半田等の接続部材を介
して電気的に接続することにより、撮像素子4の各電極
が外部電気回路の配線導体と電気的に接続されることと
なる。
A plurality of wiring conductors 5 are formed on the insulating substrate 1 from the bottom surface to the bottom surface of the concave portion 1a. The wiring element 5 is provided with a portion of the image sensor 4 at the bottom surface of the concave portion 1a. By electrically connecting each electrode through the bonding wire 6, and electrically connecting the portion leading to the lower surface to the wiring conductor (not shown) of the external electric circuit through a connecting member such as solder. The electrodes of the image pickup device 4 are electrically connected to the wiring conductors of the external electric circuit.

【0025】配線導体5は、撮像素子4の各電極を外部
電気回路に電気的に接続する際の導電路として作用し、
例えば絶縁基体1が酸化アルミニウム質焼結体から成る
場合であれば、タングステン・モリブデン・マンガン等
の高融点金属粉末に適当な有機溶剤・溶媒・可塑剤等を
添加混合して得た金属ペーストを従来周知のスクリーン
印刷法等の厚膜手法を採用して絶縁基体1となるセラミ
ックグリーンシートにあらかじめ印刷塗布しておき、こ
れをセラミックグリーンシートと同時に焼成することに
よって絶縁基体1の凹部1aの底面から下面にかけて所
定パターンに被着形成される。
The wiring conductor 5 acts as a conductive path when electrically connecting each electrode of the image pickup device 4 to an external electric circuit,
For example, when the insulating substrate 1 is made of an aluminum oxide sintered body, a metal paste obtained by adding and mixing an appropriate organic solvent, solvent, plasticizer, etc. to high melting point metal powder such as tungsten, molybdenum, manganese, etc. The bottom surface of the concave portion 1a of the insulating substrate 1 is formed by applying a thick film technique such as a well-known screen printing method to a ceramic green sheet to be the insulating substrate 1 in advance by printing, and firing the ceramic green sheet simultaneously with the ceramic green sheet. To the lower surface, a predetermined pattern is deposited.

【0026】また、絶縁基体1の上面には、透光性蓋体
2が封止剤3を介して接合されている。透光性蓋体2
は、ガラスから成る板材2aに1枚のニオブ酸リチウム
板Xまたは複数枚のニオブ酸リチウム板Xを貼り合せて
成る光学板材2bを接合することによって形成されてお
り、撮像素子4をパッケージ内部に気密に封止する機能
を有するとともに、光学ローパスフィルタの機能を有す
る。
A transparent lid 2 is joined to the upper surface of the insulating substrate 1 with a sealant 3 interposed therebetween. Translucent lid 2
Is formed by bonding one plate of lithium niobate X or a plurality of plates of lithium niobate X to a plate member 2a made of glass, and bonding the optical plate member 2b to the inside of the package. It has a function of hermetically sealing and also has a function of an optical low-pass filter.

【0027】本発明の、撮像素子収納用パッケージによ
れば、透光性蓋体2をガラスから成る板材2aに1枚の
ニオブ酸リチウム板Xまたは複数枚のニオブ酸リチウム
板Xを貼り合せて成る光学板材2bを接合して成るもの
としたことから、15mm角を超える大きさの透光性蓋体
2を絶縁基体1に接合したとしても、外部からの機械的
衝撃や熱的衝撃を受けた際の絶縁基体1と透光性蓋体2
との接合部に集中する応力をガラスがニオブ酸リチウム
板X全体に良好に分散し、その結果、ニオブ酸リチウム
板Xに大きな応力が集中して容易に破壊されることはな
く、気密封止の良好なパッケージとすることができる。
According to the package for accommodating the image pickup device of the present invention, the transparent lid 2 is formed by bonding one lithium niobate plate X or a plurality of lithium niobate plates X to the plate member 2a made of glass. Since the optical plate member 2b is made to be joined, even if the translucent lid 2 having a size exceeding 15 mm square is joined to the insulating substrate 1, it receives a mechanical shock or a thermal shock from the outside. Insulating substrate 1 and translucent lid 2
The glass favorably disperses the stress concentrated on the joint part with the lithium niobate plate X as a whole, and as a result, a large stress is not concentrated on the lithium niobate plate X and is not easily broken. Can be a good package.

【0028】なお、板材2aを形成するガラスとして
は、一般的にホウ珪酸ガラスが用いられ、その厚みは0.
1〜1.5mmである。板材2aの厚みが0.1mm未満であ
ると透光性蓋体2の強度が弱いものとなり、外部からの
機械的衝撃や熱的衝撃により蓋体が容易に破壊されてし
まう危険性があり、また、1.5mmを超えると光の透過
率が低下し、画質が劣化する傾向がある。したがって、
板材2aの厚みは0.1〜1.5mmの範囲が好ましい。
Borosilicate glass is generally used as the glass forming the plate 2a, and the thickness thereof is 0.
It is 1 to 1.5 mm. When the thickness of the plate member 2a is less than 0.1 mm, the light-transmitting lid body 2 has a low strength, and there is a risk that the lid body is easily broken by a mechanical shock or a thermal shock from the outside. When the thickness exceeds 1.5 mm, the light transmittance tends to decrease, and the image quality tends to deteriorate. Therefore,
The plate material 2a preferably has a thickness of 0.1 to 1.5 mm.

【0029】また、ニオブ酸リチウム板Xは、その厚み
が0.05〜1mm程度であり、0.05mm未満であるとニオ
ブ酸リチウム板Xを研磨加工する際に割れ易くなる傾向
があり、また、1mmを超えるとその厚みが厚いものと
なり、撮像素子収納用パッケージを薄型化することが困
難となる傾向がある。したがって、ニオブ酸リチウム板
Xの厚みは0.05〜1mmの範囲が好ましい。なお、ニオ
ブ酸リチウム板Xの枚数としては何枚でも可能である
が、枚数を多くすると薄型化が困難になること、および
光学ローパスフィルタの機能の大幅な改善が期待し難い
ことにより、ニオブ酸リチウム板Xの枚数としては1〜
5枚が好ましい。
Further, the lithium niobate plate X has a thickness of about 0.05 to 1 mm, and if it is less than 0.05 mm, it tends to be broken during polishing of the lithium niobate plate X, and 1 mm is less than 1 mm. If it exceeds, the thickness becomes thick, and it tends to be difficult to reduce the thickness of the package for housing the image sensor. Therefore, the thickness of the lithium niobate plate X is preferably in the range of 0.05 to 1 mm. The number of lithium niobate plates X can be any number, but if the number of lithium niobate plates X is increased, it becomes difficult to reduce the thickness and it is difficult to expect a significant improvement in the function of the optical low-pass filter. The number of lithium plates X is 1 to
Five is preferable.

【0030】なお、ニオブ酸リチウム板Xは、その結晶
軸に対する切断方向により複屈折板や位相板として用い
られるが、透光性蓋体2の光学特性を考慮して適宜複屈
折板と位相板を組み合わせて用いればよい。
The lithium niobate plate X is used as a birefringent plate or a phase plate depending on the cutting direction with respect to its crystal axis. However, the birefringent plate and the phase plate are appropriately selected in consideration of the optical characteristics of the translucent lid 2. May be used in combination.

【0031】また、板材2aと光学板材2bとの接着
は、エポキシ樹脂やアクリル樹脂等の樹脂系接着剤7
を、好ましくは紫外線硬化樹脂を板材2aと光学板材2
bとの間の全面に塗布あるいは印刷し、しかる後両者を
貼り合わせるとともに樹脂系接着剤7を硬化することに
より行なわれる。
The plate member 2a and the optical plate member 2b are bonded to each other by a resin adhesive 7 such as an epoxy resin or an acrylic resin.
Is preferably a UV curable resin and the plate member 2a and the optical plate member 2
It is carried out by applying or printing on the entire surface between b and b, and then bonding both together and curing the resin adhesive 7.

【0032】そして本発明の撮像素子収納用パッケージ
においては、樹脂系接着剤7の厚みを1〜30μmとする
ことが好ましい。樹脂系接着剤7の厚みが1μm未満の
場合、パッケージに外部から機械的衝撃や熱的衝撃が印
加された場合、樹脂系接着剤7がホウ珪酸ガラス(熱膨
脹係数α≒6.0〜7.0×10-6/℃)とニオブ酸リチウム
(結晶方向熱膨脹係数α≒15.4×10-6/℃)の熱膨張係
数差を緩和することが困難となり、光学板材2bが破壊
されてしまう危険性があり、また、30μmを超えると樹
脂系接着剤7により撮像素子4への光の入射が阻害さ
れ、画質が低下してしまう傾向がある。したがって、樹
脂系接着剤7の厚みは、1〜30μmの範囲とすることが
好ましい。
In the package for housing the image pickup device of the present invention, it is preferable that the thickness of the resin adhesive 7 is 1 to 30 μm. When the thickness of the resin adhesive 7 is less than 1 μm, or when a mechanical shock or a thermal shock is applied to the package from the outside, the resin adhesive 7 is made of borosilicate glass (coefficient of thermal expansion α≈6.0 to 7.0 × 10 − 6 / ° C.) and lithium niobate (coefficient of thermal expansion in crystal direction α≈15.4 × 10 −6 / ° C.) becomes difficult to relax, and there is a risk that the optical plate material 2b will be destroyed. , 30 μm, the resin adhesive 7 impedes the incidence of light on the image pickup element 4, and the image quality tends to deteriorate. Therefore, the thickness of the resin adhesive 7 is preferably in the range of 1 to 30 μm.

【0033】なお、ニオブ酸リチウム板X同士の貼り合
わせは、板材2aと光学板材2bとの接着と同様に、エ
ポキシ樹脂やアクリル樹脂等の樹脂系接着剤7を用い
て、その厚みを1〜30μmの範囲として接着すればよ
い。
The lithium niobate plates X are attached to each other with a resin adhesive 7 such as an epoxy resin or an acrylic resin, and the thickness thereof is 1 to 1, as in the case of the adhesion between the plate 2a and the optical plate 2b. Adhesion may be performed within a range of 30 μm.

【0034】また、本発明の撮像素子収納用パッケージ
においては、ニオブ酸リチウム板Xのいずれか1枚の板
材2a側の面に赤外線遮蔽機能を有する誘電体多層膜8
を形成することが好ましい。
Further, in the package for accommodating the image pickup device of the present invention, the dielectric multilayer film 8 having the infrared shielding function on the surface of any one of the lithium niobate plates X on the side of the plate material 2a.
Is preferably formed.

【0035】このような誘電体多層膜8は、図2に要部
拡大断面図に示すように、屈折率が1.6以下の絶縁材料
から成る低屈折率薄膜層8aおよび屈折率が1.7以上の
絶縁材料から成る高屈折率薄膜層8bを順次交互に複数
層積層することにより形成され、撮像レンズ(図示せ
ず)を通過した光から赤外線の波長領域の成分を反射
し、撮像素子4によって得られる画像の画質を高める機
能を有し、また、透光性蓋体2に赤外線カット機能を付
与することにより光学機能部品を薄型化することができ
る。
As shown in the enlarged cross-sectional view of the main part of FIG. 2, such a dielectric multilayer film 8 has a low refractive index thin film layer 8a made of an insulating material having a refractive index of 1.6 or less and an insulating film having a refractive index of 1.7 or more. It is formed by alternately stacking a plurality of high refractive index thin film layers 8b made of a material, and reflects a component in a wavelength region of infrared rays from light passing through an image pickup lens (not shown), and is obtained by the image pickup device 4. The optical functional component can be made thin by having a function of enhancing the image quality of the image and by providing the translucent lid body 2 with an infrared ray cutting function.

【0036】また、本発明の撮像素子収納用パッケージ
によれば、誘電体多層膜8をニオブ酸リチウム板X間、
あるいはガラスから成る板材2aとニオブ酸リチウム板
Xとの間に挟みこんだことから、水分の吸収により光学
特性が変化し易い誘電体多層膜8を空気中の水分から保
護することが可能となり、安定した赤外線カット機能を
有する撮像素子収納用パッケージとすることができる。
さらに、誘電体多層膜8を透光性蓋体2の最も外側に位
置するニオブ酸リチウム板Xの板材2a側の面に形成し
て撮像素子4から遠ざけることにより、誘電体多層膜8
の成形時に膜欠陥が発生した場合においても、膜欠陥の
影響を撮像素子4のイメージ認識に与え難い赤外線カッ
ト機能を有する撮像素子収納用パッケージとすることが
できる。
Further, according to the package for accommodating the image pickup device of the present invention, the dielectric multilayer film 8 is provided between the lithium niobate plates X,
Alternatively, since it is sandwiched between the plate material 2a made of glass and the lithium niobate plate X, it becomes possible to protect the dielectric multilayer film 8 whose optical characteristics are likely to change due to absorption of water from water in the air, It is possible to provide a package for accommodating an image sensor having a stable infrared ray cutting function.
Further, the dielectric multilayer film 8 is formed on the surface of the lithium niobate plate X located on the outermost side of the translucent lid 2 on the plate material 2a side and kept away from the image pickup element 4, whereby the dielectric multilayer film 8 is formed.
Even when a film defect occurs during molding, the image sensor housing package having an infrared ray cutting function that is hard to exert the influence of the film defect on the image recognition of the image sensor 4 can be provided.

【0037】なお、高屈折率薄膜層8bの屈折率と低屈
折率薄膜層8aの屈折率との差を0.1以上とすることに
より、高屈折率薄膜層8bと低屈折率薄膜層8aとの界
面での赤外線の反射量が少なくなる、すなわち赤外線カ
ット効果が小さくなることはなく、その結果、良好な赤
外線カット機能を有する撮像素子収納用パッケージとす
ることができる。高屈折率薄膜層8bの屈折率と低屈折
率薄膜層8aの屈折率との差が0.1未満であると、高屈
折率薄膜層8bと低屈折率薄膜層8aとの界面での赤外
線の反射量が極端に少なくなり、良好な赤外線カット機
能を得ることが困難となる傾向がある。したがって、高
屈折率薄膜層8bの屈折率と低屈折率薄膜層8aの屈折
率との差を0.1以上とすることが、さらに好適には0.5以
上とすることが好ましい。
By setting the difference between the refractive index of the high refractive index thin film layer 8b and the refractive index of the low refractive index thin film layer 8a to be 0.1 or more, the high refractive index thin film layer 8b and the low refractive index thin film layer 8a are separated from each other. The amount of infrared rays reflected at the interface does not decrease, that is, the infrared ray cutting effect does not decrease, and as a result, it is possible to provide an image pickup device housing package having a good infrared ray cutting function. When the difference between the refractive index of the high refractive index thin film layer 8b and the refractive index of the low refractive index thin film layer 8a is less than 0.1, infrared rays are reflected at the interface between the high refractive index thin film layer 8b and the low refractive index thin film layer 8a. The amount tends to be extremely small, and it tends to be difficult to obtain a good infrared cut function. Therefore, the difference between the refractive index of the high refractive index thin film layer 8b and the low refractive index thin film layer 8a is preferably 0.1 or more, more preferably 0.5 or more.

【0038】このような高屈折率薄膜層8bおよび低屈
折率薄膜層8aは、両者の屈折率の差を0.1以上として
良好な赤外線カット機能を得るとともに誘電体多層膜8
の厚みを薄くするという観点からは、それぞれの屈折率
を1.7以上および1.6以下とすることが好ましい。これ
は、光学的膜厚(λ/4:λは設計波長)が薄膜層を構
成する材料の屈折率(n)と形状膜厚(d)との積(n
×d)で表わされることから、高い周波数領域の赤外線
を遮断する場合には屈折率(n)の大きな材料を用いる
ことにより高屈折率薄膜層8bを薄くすることができ、
また、低屈折率薄膜層8aの屈折率を1.6以下とするこ
とにより、高屈折率薄膜層8bと低屈折率薄膜層8aの
屈折率の差を十分なものとし良好な赤外線カット機能を
得ることができるからである。
The high-refractive-index thin film layer 8b and the low-refractive-index thin film layer 8a have a difference in refractive index of 0.1 or more from each other to obtain a good infrared ray cutting function, and the dielectric multilayer film 8
From the viewpoint of reducing the thickness of the above, it is preferable that the respective refractive indexes are 1.7 or more and 1.6 or less. This is because the optical film thickness (λ / 4: λ is the design wavelength) is the product (n) of the refractive index (n) of the material forming the thin film layer and the shape film thickness (d).
Since it is represented by xd), the high refractive index thin film layer 8b can be thinned by using a material having a large refractive index (n) when blocking infrared rays in a high frequency region,
Further, by setting the refractive index of the low refractive index thin film layer 8a to 1.6 or less, a sufficient difference in refractive index between the high refractive index thin film layer 8b and the low refractive index thin film layer 8a can be obtained to obtain a good infrared cut function. Because you can

【0039】このような屈折率が1.7以上の絶縁材料と
しては、Ta25やTiO2・Nb25・La23・Z
rO2・Y23等が用いられ、屈折率が1.6以下の絶縁材
料としては、SiO2やAl23・LaF3・MgF2
Na3AlF6等が用いられる。また、高屈折率薄膜層8
bはその屈折率の範囲が通常は1.7〜3.0、低屈折率薄膜
層8aはその屈折率の範囲が通常は1.2〜1.6であり、こ
れらを形成する絶縁材料は薄膜層の硬さ等の特性や形成
し易さ・価格等を考慮して選択される。
[0039] As such a refractive index of 1.7 or more insulating materials, Ta 2 0 5 or TiO 2 · Nb 2 0 5 · La 2 O 3 · Z
rO 2 · Y 2 O 3 or the like is used, and as the insulating material having a refractive index of 1.6 or less, SiO 2 or Al 2 O 3 · LaF 3 · MgF 2 ·
Na 3 AlF 6 or the like is used. In addition, the high refractive index thin film layer 8
The range of the refractive index of b is usually 1.7 to 3.0, the range of the low refractive index thin film layer 8a is usually 1.2 to 1.6, and the insulating material for forming these has characteristics such as hardness of the thin film layer. It is selected in consideration of ease of formation, price, etc.

【0040】なお、図1では、誘電体多層膜8をニオブ
酸リチウム板Xの板材2b側の全面に被着形成した例を
示しているが、誘電体多層膜8をニオブ酸リチウム板X
の板材2b側の撮像素子4の受光領域(凹部1aの開口
に対応する領域)のみに被着形成してもよい。
Although FIG. 1 shows an example in which the dielectric multilayer film 8 is formed on the entire surface of the lithium niobate plate X on the plate material 2b side, the dielectric multilayer film 8 is formed on the lithium niobate plate X.
It may be formed only on the light receiving region (the region corresponding to the opening of the recessed portion 1a) of the image sensor 4 on the plate material 2b side.

【0041】このような低屈折率薄膜層8aおよび高屈
折率薄膜層8bから成る誘電体多層膜8は、CVD法や
スパッタ法・真空蒸着法等により成形され、例えば真空
蒸着法により成形する場合、SiO2・Al23・Mg
2等の屈折率が1.6以下の絶縁材料と、Ta25やTi
2・Nb25等の屈折率が1.7以上の絶縁材料とをそれ
ぞれ真空蒸着装置内に設置した坩堝に入れ、そして真空
蒸着装置内を1×10-6Pa程度の真空度で250〜300℃の
温度に設定した後、ニオブ酸リチウム板Xの一方の主面
の全面あるいはマスキングをして撮像素子4の受光領域
となる領域に、まず低屈折率薄膜層8aを被着し、その
後、高屈折率薄膜層8bと低屈折率薄膜層8aとを順次
交互に合計10〜100層被着することにより形成される。
The dielectric multilayer film 8 including the low-refractive index thin film layer 8a and the high-refractive index thin film layer 8b is formed by a CVD method, a sputtering method, a vacuum deposition method, or the like. , SiO 2 · Al 2 O 3 · Mg
An insulating material having a refractive index of 1.6 or less in F 2, etc., Ta 2 0 5 and Ti
O 2 · Nb 2 0 refractive index, such as 5 placed in installation crucible 1.7 or more insulating materials and to each the vacuum evaporation apparatus, and 250 in the vacuum evaporation apparatus in 1 × 10 -6 Pa vacuum degree of about After the temperature is set to 300 ° C., the low refractive index thin film layer 8a is first applied to the entire surface of one main surface of the lithium niobate plate X or to the area to be the light receiving area of the image pickup device 4 by masking, and thereafter. , A high-refractive-index thin film layer 8b and a low-refractive-index thin film layer 8a are sequentially and alternately deposited for a total of 10 to 100 layers.

【0042】また、低屈折率薄膜層8aや高屈折率薄膜
層8bのそれぞれの厚みは、遮断しようとする赤外線波
長λ(nm)の0.1λ〜0.5λの厚みとすることが好まし
い。低屈折率薄膜層8aや高屈折率薄膜層8bの厚みが
0.1λ未満、あるいは、0.5λと超えると、屈折率(n)
と形状膜厚(d)との積(n×d)がλ/4で算出され
る光学的膜厚と大きく異なって反射・屈折の光学的特性
の関係が崩れてしまい、特定波長を遮断・透過するコン
トロールができなくなってしまう傾向がある。したがっ
て、低屈折率薄膜層8aや高屈折率薄膜層8bの層の厚
みは、遮断しようとする赤外線波長λ(nm)の0.1λ
〜0.5λの範囲の厚みとすることが好ましい。
The thickness of each of the low refractive index thin film layer 8a and the high refractive index thin film layer 8b is preferably 0.1λ to 0.5λ of the infrared wavelength λ (nm) to be blocked. The thickness of the low refractive index thin film layer 8a and the high refractive index thin film layer 8b is
If it is less than 0.1λ or exceeds 0.5λ, the refractive index (n)
The product (n × d) of the film thickness and the shape film thickness (d) is significantly different from the optical film thickness calculated by λ / 4, and the relationship between the optical characteristics of reflection and refraction is broken, and the specific wavelength is blocked. There is a tendency to lose control of transparency. Therefore, the thickness of the low-refractive-index thin film layer 8a and the high-refractive-index thin film layer 8b is 0.1λ of the infrared wavelength λ (nm) to be blocked.
It is preferable that the thickness is in the range of 0.5λ.

【0043】また、低屈折率薄膜層8aおよび高屈折率
薄膜層8bの積層数が10層未満であると、赤外線領域の
波長を良好に遮断することが困難となる傾向があり、10
0層を超えると誘電体多層膜8を真空蒸着後に透光性蓋
体2を室温に冷却する際の誘電体多層膜8の熱収縮が大
きなものとなり、ニオブ酸リチウム板Xが割れ易くなる
傾向がある。したがって、低屈折率薄膜層8aおよび高
屈折率薄膜層8bの積層数は10〜100層の範囲が好まし
く、赤外線領域の波長をより良好に遮断する、および、
室温に冷却する際の誘電体多層膜8の熱収縮を小さくし
てニオブ酸リチウム板Xが割れ難くするという観点から
は、30〜45層の範囲が好ましい。
If the number of the low-refractive index thin film layers 8a and the high-refractive index thin film layers 8b is less than 10, it tends to be difficult to satisfactorily block the wavelength in the infrared region.
If the number of layers exceeds 0, the thermal shrinkage of the dielectric multilayer film 8 when cooling the transparent lid 2 to room temperature after vacuum-depositing the dielectric multilayer film 8 becomes large, and the lithium niobate plate X tends to be easily cracked. There is. Therefore, the number of layers of the low-refractive-index thin film layer 8a and the high-refractive-index thin film layer 8b is preferably in the range of 10 to 100, and blocks wavelengths in the infrared region better, and
From the viewpoint of reducing the thermal shrinkage of the dielectric multilayer film 8 when cooled to room temperature and making the lithium niobate plate X less likely to crack, the range of 30 to 45 layers is preferable.

【0044】さらに、本発明の撮像素子収納用パッケー
ジにおいては、低屈折率薄膜層8aを二酸化珪素で、高
屈折率薄膜層8bを二酸化チタンで形成することが好ま
しい。二酸化チタンおよび二酸化珪素の蒸着粒子は、こ
れらの粒径が薄膜層8a・8bの形成に用いられる他の
絶縁材料の蒸着粒子に比較して微細であるとともに硬い
ことから、低屈折率薄膜層8aおよび高屈折率薄膜層8
bの膜厚を精度良くコントロールすることができるとと
もにニオブ酸リチウム板Xの取り扱いの際に傷つき難
く、その結果、特定波長光の透過・反射を良好にコント
ロールできる赤外線カットフィルタの機能を有する撮像
素子収納用パッケージとすることができる。
Further, in the package for housing an image pickup device of the present invention, it is preferable that the low refractive index thin film layer 8a is formed of silicon dioxide and the high refractive index thin film layer 8b is formed of titanium dioxide. Since the vapor-deposited particles of titanium dioxide and silicon dioxide are fine and hard in particle size as compared with vapor-deposited particles of other insulating materials used for forming the thin film layers 8a and 8b, they are low in refractive index thin film layer 8a. And high refractive index thin film layer 8
An image sensor having the function of an infrared cut filter, which can control the film thickness of b with high accuracy and is less likely to be damaged when handling the lithium niobate plate X, and as a result, can favorably control the transmission / reflection of light of a specific wavelength. It can be a storage package.

【0045】次に、絶縁基体1と透光性蓋体2とを接合
する封止剤3は、エポキシ樹脂を主成分とする熱硬化性
樹脂に有機材料粉末を含有させてその弾性率を0.1〜3
GPaの値とすることが重要である。
Next, the sealant 3 for joining the insulating base 1 and the translucent lid body 2 has a modulus of elasticity of 0.1 by adding organic material powder to a thermosetting resin containing epoxy resin as a main component. ~ 3
It is important to use the value of GPa.

【0046】本発明の撮像素子収納用パッケージによれ
ば、透光性蓋体2と絶縁基体1とを接合する封止剤3
を、エポキシ樹脂を主成分とする熱硬化性樹脂に有機材
料粉末を含有させて0.1〜3GPaの弾性率としたこと
から、封止剤3が硬化する際の応力によってニオブ酸リ
チウム板Xが破壊されることはなく、気密信頼性の優れ
た撮像素子収納用パッケージとすることができる。ま
た、封止剤3がエポキシ樹脂を主成分とすることから、
熱硬化性エポキシ樹脂接着剤が緻密な3次元網目構造を
有し絶縁基体1と透光性蓋体2との接合を強固なものと
することができ、その結果、気密信頼性のより高い撮像
素子収納用パッケージとすることができる。
According to the package for housing the image pickup device of the present invention, the sealant 3 for joining the translucent lid body 2 and the insulating substrate 1 together.
Since the thermosetting resin containing an epoxy resin as a main component contains an organic material powder to have an elastic modulus of 0.1 to 3 GPa, the lithium niobate plate X is destroyed by the stress when the sealant 3 is cured. Therefore, it is possible to obtain a package for housing an image pickup element that is highly airtight and highly reliable. In addition, since the sealant 3 has an epoxy resin as a main component,
The thermosetting epoxy resin adhesive has a dense three-dimensional mesh structure and can firmly bond the insulating substrate 1 and the translucent lid body 2, and as a result, image pickup with higher airtightness and reliability It can be used as an element storage package.

【0047】このような絶縁基体1と透光性蓋体2との
接合は、接合部に封止剤3を塗布した透光性蓋体2を絶
縁基体1に重ねあわせた後、約110℃の温度で60〜90分
間加圧加熱することにより行われる。なお、接合の際の
残留応力を低減するという観点からは、110℃程度の低
温度での加熱が好ましいが、90〜250℃の温度で加熱し
てもよい。なお、封止剤3は、絶縁基体1と透光性蓋体
2との接合時はもちろんのこと、その後の基板への2次
実装時に加えられる熱、さらには撮像素子4の作動時に
発生する熱によって生ずる部材間の応力を緩和して、透
光性蓋体2が破壊されるのを有効に防止する機能を有す
る。
The insulating base 1 and the translucent lid body 2 are bonded together at about 110.degree. C. after the translucent lid body 2 having the sealant 3 applied to the joint portion is superposed on the insulating base body 1. It is carried out by heating under pressure at the temperature of 60 to 90 minutes. From the viewpoint of reducing the residual stress at the time of joining, heating at a low temperature of about 110 ° C is preferable, but heating at a temperature of 90 to 250 ° C may be performed. The sealant 3 is generated not only when the insulating substrate 1 and the translucent lid 2 are bonded, but also when heat is applied during secondary mounting on the substrate thereafter, and further when the image sensor 4 is activated. It has a function of relieving stress between members generated by heat and effectively preventing the translucent lid body 2 from being broken.

【0048】このような封止剤3としては、例えば、ビ
スフェノールA型エポキシ樹脂やビスフェノールA変性
エポキシ樹脂・ビスフェノールF型エポキシ樹脂・フェ
ノールノボラック型エポキシ樹脂・クレゾールノボラッ
ク型エポキシ樹脂・特殊ノボラック型エポキシ樹脂・フ
ェノール誘導体エポキシ樹脂・ビフェノール骨格型エポ
キシ樹脂等のエポキシ樹脂にイミダゾール系・アミン系
・リン系・ヒドラジン系・イミダゾールアダクト系・ア
ミンアダクト系・カチオン重合系・ジシアンジアミド系
等の硬化剤を添加したもので形成されている。なお、2
種類以上のエポキシ樹脂を混合して用いてもよい。
Examples of the sealing agent 3 include bisphenol A type epoxy resin, bisphenol A modified epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, and special novolac type epoxy resin.・ Epoxy resin such as phenol derivative epoxy resin, biphenol skeleton epoxy resin, etc., with addition of curing agents such as imidazole, amine, phosphorus, hydrazine, imidazole adduct, amine adduct, cationic polymerization, dicyandiamide Is formed by. 2
You may mix and use the epoxy resin of a kind or more.

【0049】また、封止剤3に含有される有機材料粉末
としては、エポキシ樹脂を主成分とする熱硬化性樹脂よ
りも弾性率が低いシリコンゴムやシリコンレジン・LD
PE・HDPE・PMMA・架橋PMMA・ポリスチレ
ン・架橋ポリスチレン・エチレン−アクリル共重合・ポ
リメタクリル酸エチル・ブチルアクリレート・ウレタン
等の軟質微粒子が好ましい。
As the organic material powder contained in the sealant 3, silicon rubber or silicon resin / LD whose elastic modulus is lower than that of a thermosetting resin containing epoxy resin as a main component.
Soft particles such as PE, HDPE, PMMA, cross-linked PMMA, polystyrene, cross-linked polystyrene, ethylene-acrylic copolymer, polyethyl methacrylate, butyl acrylate and urethane are preferable.

【0050】なお、封止剤3は、その弾性率が0.1GP
a未満であると、機械的応力が透光性蓋体2に加わった
際に封止剤3が歪み、所定の位置に透光性蓋体2を保持
することが困難となる傾向があり、また、弾性率が3G
Paを超えると、撮像素子収納用パッケージに落下等の
大きな衝撃が加わった際に生じる応力あるいは撮像素子
4の発熱による熱応力を吸収することができず、透光性
蓋体2が絶縁基体1から外れてしまう、あるいは透光性
蓋体2が破壊しやすくなる傾向がある。したがって、封
止剤3は、その弾性率を0.1〜3GPaの範囲とするこ
とが好ましい。
The sealing agent 3 has an elastic modulus of 0.1 GP.
When it is less than a, the encapsulant 3 is distorted when mechanical stress is applied to the translucent lid body 2, and it tends to be difficult to hold the translucent lid body 2 at a predetermined position. Also, the elastic modulus is 3G
If it exceeds Pa, the stress generated when a large impact such as a drop is applied to the package for housing the image sensor or the thermal stress due to the heat generation of the image sensor 4 cannot be absorbed, and the translucent lid body 2 is insulated by the insulating base body 1. There is a tendency that the light-transmitting lid 2 is easily broken. Therefore, the sealant 3 preferably has an elastic modulus in the range of 0.1 to 3 GPa.

【0051】また、封止剤3は、その硬化後の厚みが1
〜50μmの範囲であることが好ましく、1μm未満であ
ると応力緩和が有効に働かなくなる傾向があり、50μm
を超えると封止剤3の透湿量が増加し、撮像素子4が水
分により劣化しやすくなる傾向がある。したがって、封
止剤3は、硬化後の厚みが1〜50μmの範囲であること
が好ましい。
The sealing agent 3 has a thickness of 1 after curing.
It is preferable to be in the range of up to 50 μm, and if it is less than 1 μm, stress relaxation tends to be ineffective.
When it exceeds, the moisture permeability of the sealant 3 increases, and the image pickup element 4 tends to be deteriorated by moisture. Therefore, the sealant 3 preferably has a thickness after curing in the range of 1 to 50 μm.

【0052】かくして本発明の撮像素子収納用パッケー
ジによれば、絶縁基体1の凹部1aの底面に撮像素子4
をガラス・樹脂・ろう材等から成る接着剤を介して接着
固定するとともに撮像素子4の各電極をボンディングワ
イヤ6を介して配線導体5に接続させ、しかる後、絶縁
基体1と透光性蓋体2とを封止剤3を介して接続して、
絶縁基体1と透光性蓋体2とから成る容器の内部に撮像
素子4を気密に収容することによって最終製品としての
撮像装置が完成する。
Thus, according to the image pickup device housing package of the present invention, the image pickup device 4 is provided on the bottom surface of the recess 1a of the insulating base 1.
Is bonded and fixed through an adhesive made of glass, resin, a brazing material, etc., and each electrode of the image pickup device 4 is connected to the wiring conductor 5 through a bonding wire 6, and thereafter, the insulating substrate 1 and the translucent lid are connected. Connect to the body 2 via the sealant 3,
The image pickup device 4 as a final product is completed by hermetically housing the image pickup device 4 inside a container formed of the insulating base 1 and the translucent lid 2.

【0053】なお、本発明は上述の実施の形態に限定さ
れるものではなく、本発明の要旨を逸脱しない範囲であ
れば種々の変更は可能であり、例えば、誘電体多層膜7
は赤外線遮光膜に限定されず、弗化マグネシウム等の材
料を成膜した反射防止膜であってもよい。
The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the present invention. For example, the dielectric multilayer film 7
Is not limited to the infrared ray shielding film, and may be an antireflection film formed of a material such as magnesium fluoride.

【0054】[0054]

【発明の効果】本発明の撮像素子収納用パッケージによ
れば、透光性蓋体をガラスから成る板材と少なくとも1
枚のニオブ酸リチウム板から成る光学板材とで形成した
ことから、15mm角を超える大きさの透光性蓋体を絶縁
基体に接合したとしても、外部からの機械的衝撃や熱的
衝撃を受けた際の絶縁基体と蓋体との接合部に集中する
応力をガラスから成る板材がニオブ酸リチウム板全体に
良好に分散し、その結果、ニオブ酸リチウム板に大きな
応力が集中してニオブ酸リチウム板が容易に破壊される
ことはなく、気密封止の良好なパッケージとすることが
できる。
According to the package for housing the image pickup device of the present invention, the translucent lid and at least one plate member made of glass are used.
Since it is formed with an optical plate material consisting of one lithium niobate plate, even if a translucent lid with a size of more than 15 mm square is joined to the insulating base, it will not be affected by external mechanical or thermal shock. The plate material made of glass satisfactorily disperses the stress concentrated on the joint between the insulating substrate and the lid when the lithium niobate plate is concentrated. As a result, a large stress is concentrated on the lithium niobate plate. The plate is not easily broken, and the package can be hermetically sealed.

【0055】また、本発明の撮像素子収納用パッケージ
によれば、上記構成において、ニオブ酸リチウム板のい
ずれか1枚の板材側の面に赤外線遮蔽機能を有する誘電
体多層膜を形成したことから、水分の吸収により光学特
性が変化し易い誘電体多層膜を空気中の水分から保護す
ることが可能となり、安定した赤外線カット機能を有す
る撮像素子収納用パッケージとすることができる。さら
に、温度サイクル等の熱衝撃により誘電体多層膜が蓋体
から剥離して撮像素子の画像認識領域に落下してしま
い、撮像に支障をきたしてしまうということもない。
Further, according to the package for accommodating an image pickup device of the present invention, in the above structure, the dielectric multilayer film having the infrared shielding function is formed on the surface of any one of the lithium niobate plates on the plate material side. As a result, it becomes possible to protect the dielectric multilayer film whose optical characteristics are likely to change due to the absorption of water from the water in the air, and it is possible to provide a package for housing an image sensor having a stable infrared ray cutting function. Further, there is no possibility that the dielectric multilayer film is peeled off from the lid and dropped into the image recognition area of the image pickup element due to thermal shock such as a temperature cycle, which causes trouble in image pickup.

【0056】さらに、本発明の撮像素子収納用パッケー
ジによれば、上記構成において、ガラスから成る板材と
ニオブ酸リチウム板を貼り合わせて成る光学板材とを接
合する樹脂系接着剤の厚みを1〜30μmとしたことか
ら、ガラスから成る板材とニオブ酸リチウム板の熱膨脹
係数の相違に起因して発生する応力を良好に緩和するこ
とができ、その結果、パッケージが温度サイクル試験等
で熱衝撃を受けたとしても光学板材が破壊されることは
なく、かつ撮像素子への光の入射が阻害されることのな
い良好な赤外線カット機能を有する撮像素子収納用パッ
ケージとすることができる。
Further, according to the package for accommodating the image pickup device of the present invention, in the above structure, the thickness of the resin adhesive for joining the plate member made of glass and the optical plate member made by bonding the lithium niobate plates to each other is 1 to Since the thickness is 30 μm, the stress generated due to the difference in thermal expansion coefficient between the glass plate material and the lithium niobate plate can be satisfactorily relaxed, and as a result, the package is not subject to thermal shock during temperature cycle tests. Even if it does, the optical plate material is not destroyed, and the image pickup device housing package having a good infrared ray cut function that does not hinder the incidence of light on the image pickup device can be provided.

【0057】また、本発明の撮像素子収納用パッケージ
によれば、上記構成において、封止剤をエポキシ樹脂を
主成分とする熱硬化性樹脂に有機材料粉末を含有させて
その弾性率を0.1〜3GPaとしたことから、熱硬化性
樹脂が硬化する際の応力によって透光性蓋体が破壊され
ることはなく、気密信頼性の優れた撮像素子収納用パッ
ケージとすることができる。
Further, according to the package for housing the image pickup device of the present invention, in the above structure, the thermosetting resin having epoxy resin as a main component is mixed with the organic material powder as the sealant, and the elastic modulus thereof is 0.1 to. Since the pressure is set to 3 GPa, the translucent lid is not destroyed by the stress when the thermosetting resin is cured, and the image pickup element housing package having excellent airtight reliability can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の撮像素子収納用パッケージの実施の形
態の一例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a package for housing an image sensor according to the present invention.

【図2】図1の要部拡大断面図である。FIG. 2 is an enlarged cross-sectional view of a main part of FIG.

【符号の説明】[Explanation of symbols]

1・・・・・・・・・絶縁基体 1a・・・・・・・・凹部 2・・・・・・・・・透光性蓋体 2a・・・・・・・・ガラスから成る板材 2b・・・・・・・・光学板材 3・・・・・・・・・封止剤 4・・・・・・・・・撮像素子 7・・・・・・・・・樹脂系接着剤 8・・・・・・・・・誘電体多層膜 8a・・・・・・・・低屈折率薄膜層 8b・・・・・・・・高屈折率薄膜層 X・・・・・・・・・ニオブ酸リチウム板 1 ... Insulating substrate 1a ... Recess 2 ・ ・ ・ ・ ・ ・ Translucent lid 2a ... Plate material made of glass 2b ・ ・ ・ ・ ・ ・ Optical plate material 3 ・ ・ ・ ・ ・ ・ Sealant 4 ... Image sensor 7 ... Resin adhesive 8 ・ ・ ・ ・ ・ ・ Dielectric multilayer film 8a ... Low-refractive index thin film layer 8b ... High-refractive index thin film layer X ... Lithium niobate plate

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 上面に撮像素子が搭載される凹部を有す
る絶縁基体と、該絶縁基体の上面に前記凹部を覆うよう
に封止剤を介して接合される透光性蓋体とから成り、該
透光性蓋体は、ガラスから成る板材と、該板材の上面に
樹脂系接着剤を介して接着した、少なくとも1枚のニオ
ブ酸リチウム板から成る光学板材とで形成されているこ
とを特徴とする撮像素子収納用パッケージ。
1. An insulating base having a recess on the upper surface of which an image pickup device is mounted, and a translucent lid joined to the upper surface of the insulating base via a sealant so as to cover the recess. The translucent lid is formed of a plate material made of glass and an optical plate material made of at least one lithium niobate plate adhered to the upper surface of the plate material with a resin adhesive. The package for storing the image sensor.
【請求項2】 前記光学板材は、前記ニオブ酸リチウム
板のいずれか1枚の前記板材側の面に赤外線遮蔽機能を
有する誘電体多層膜が形成されていることを特徴とする
請求項1記載の撮像素子収納用パッケージ。
2. The optical plate member, wherein a dielectric multilayer film having an infrared shielding function is formed on a surface of any one of the lithium niobate plates facing the plate member. Image sensor package.
【請求項3】 前記樹脂系接着剤の厚みが1〜30μm
であることを特徴とする請求項1または請求項2記載の
撮像素子収納用パッケージ。
3. The thickness of the resin adhesive is 1 to 30 μm
The package for housing an image pickup device according to claim 1 or 2, wherein:
【請求項4】 前記封止剤は、エポキシ樹脂を主成分と
する熱硬化性樹脂に有機材料粉末を含有させて成るとと
もに弾性率が0.1〜3GPaであることを特徴とする
請求項1乃至請求項3のいずれかに記載の撮像素子収納
用パッケージ。
4. The encapsulant comprises a thermosetting resin containing an epoxy resin as a main component and an organic material powder contained therein, and has an elastic modulus of 0.1 to 3 GPa. The package for accommodating the image pickup device according to claim 3.
JP2001323988A 2001-10-22 2001-10-22 Image pickup device storage package and image pickup apparatus Expired - Fee Related JP3814512B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001323988A JP3814512B2 (en) 2001-10-22 2001-10-22 Image pickup device storage package and image pickup apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001323988A JP3814512B2 (en) 2001-10-22 2001-10-22 Image pickup device storage package and image pickup apparatus

Publications (2)

Publication Number Publication Date
JP2003133535A true JP2003133535A (en) 2003-05-09
JP3814512B2 JP3814512B2 (en) 2006-08-30

Family

ID=19140797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001323988A Expired - Fee Related JP3814512B2 (en) 2001-10-22 2001-10-22 Image pickup device storage package and image pickup apparatus

Country Status (1)

Country Link
JP (1) JP3814512B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023058103A1 (en) * 2021-10-05 2023-04-13 三菱電機株式会社 Hermetic package element, and element module

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023058103A1 (en) * 2021-10-05 2023-04-13 三菱電機株式会社 Hermetic package element, and element module

Also Published As

Publication number Publication date
JP3814512B2 (en) 2006-08-30

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