JP2003084687A5 - - Google Patents

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Publication number
JP2003084687A5
JP2003084687A5 JP2002148441A JP2002148441A JP2003084687A5 JP 2003084687 A5 JP2003084687 A5 JP 2003084687A5 JP 2002148441 A JP2002148441 A JP 2002148441A JP 2002148441 A JP2002148441 A JP 2002148441A JP 2003084687 A5 JP2003084687 A5 JP 2003084687A5
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JP
Japan
Prior art keywords
insulating film
interlayer insulating
tft
forming
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002148441A
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English (en)
Japanese (ja)
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JP4118602B2 (ja
JP2003084687A (ja
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Publication date
Application filed filed Critical
Priority to JP2002148441A priority Critical patent/JP4118602B2/ja
Priority claimed from JP2002148441A external-priority patent/JP4118602B2/ja
Publication of JP2003084687A publication Critical patent/JP2003084687A/ja
Publication of JP2003084687A5 publication Critical patent/JP2003084687A5/ja
Application granted granted Critical
Publication of JP4118602B2 publication Critical patent/JP4118602B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002148441A 2001-05-23 2002-05-22 半導体装置およびその作製方法 Expired - Fee Related JP4118602B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002148441A JP4118602B2 (ja) 2001-05-23 2002-05-22 半導体装置およびその作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-154673 2001-05-23
JP2001154673 2001-05-23
JP2002148441A JP4118602B2 (ja) 2001-05-23 2002-05-22 半導体装置およびその作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005116162A Division JP4105173B2 (ja) 2001-05-23 2005-04-13 発光装置

Publications (3)

Publication Number Publication Date
JP2003084687A JP2003084687A (ja) 2003-03-19
JP2003084687A5 true JP2003084687A5 (https=) 2005-09-22
JP4118602B2 JP4118602B2 (ja) 2008-07-16

Family

ID=26615603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002148441A Expired - Fee Related JP4118602B2 (ja) 2001-05-23 2002-05-22 半導体装置およびその作製方法

Country Status (1)

Country Link
JP (1) JP4118602B2 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004296303A (ja) 2003-03-27 2004-10-21 Seiko Epson Corp 電気光学装置、その製造方法および電子機器
KR100542997B1 (ko) 2003-08-07 2006-01-20 삼성에스디아이 주식회사 평판표시장치 및 그의 제조방법
JP4736013B2 (ja) * 2003-12-16 2011-07-27 日本電気株式会社 発光表示装置の製造方法
JP2005242339A (ja) * 2004-01-26 2005-09-08 Semiconductor Energy Lab Co Ltd 発光装置
US7274044B2 (en) * 2004-01-26 2007-09-25 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
JP2005209583A (ja) * 2004-01-26 2005-08-04 Semiconductor Energy Lab Co Ltd 発光装置
US7315047B2 (en) 2004-01-26 2008-01-01 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
US7692378B2 (en) * 2004-04-28 2010-04-06 Semiconductor Energy Laboratory Co., Ltd. Display device including an insulating layer with an opening
JP4785415B2 (ja) * 2004-05-14 2011-10-05 株式会社半導体エネルギー研究所 エレクトロルミネッセンス表示装置の作製方法
EP1793266B1 (en) 2005-12-05 2017-03-08 Semiconductor Energy Laboratory Co., Ltd. Transflective Liquid Crystal Display with a Horizontal Electric Field Configuration
KR101230307B1 (ko) 2006-02-17 2013-02-06 삼성디스플레이 주식회사 액정 표시 장치
JP4930501B2 (ja) 2008-12-22 2012-05-16 ソニー株式会社 表示装置および電子機器
CN102576173B (zh) 2009-10-08 2013-05-01 夏普株式会社 液晶显示装置及其制造方法
TWI665778B (zh) * 2014-02-05 2019-07-11 日商半導體能源研究所股份有限公司 半導體裝置、模組及電子裝置
KR102573853B1 (ko) * 2016-09-20 2023-09-01 삼성디스플레이 주식회사 발광 표시 장치
CN107170762B (zh) * 2017-06-16 2019-04-30 武汉华星光电半导体显示技术有限公司 Oled显示面板及其制作方法
JP6597768B2 (ja) * 2017-12-27 2019-10-30 セイコーエプソン株式会社 電気光学装置および電子機器
JP7551375B2 (ja) * 2020-07-20 2024-09-17 株式会社ジャパンディスプレイ 表示装置

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