JP2003031357A - Electroluminescent element - Google Patents
Electroluminescent elementInfo
- Publication number
- JP2003031357A JP2003031357A JP2001211861A JP2001211861A JP2003031357A JP 2003031357 A JP2003031357 A JP 2003031357A JP 2001211861 A JP2001211861 A JP 2001211861A JP 2001211861 A JP2001211861 A JP 2001211861A JP 2003031357 A JP2003031357 A JP 2003031357A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- sealing layer
- face sealing
- sealing
- protective layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 238000005401 electroluminescence Methods 0.000 claims description 4
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- 229920001296 polysiloxane Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- RQGPLDBZHMVWCH-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole Chemical class C1=NC2=CC=NC2=C1 RQGPLDBZHMVWCH-UHFFFAOYSA-N 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Electroluminescent Light Sources (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、情報表示端末など
のディスプレイや面発光光源として幅広い用途が期待さ
れるエレクトロルミネッセンス素子(以下、EL素子と
表記する)に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroluminescence element (hereinafter referred to as an EL element), which is expected to have a wide range of uses as a display such as an information display terminal and a surface emitting light source.
【0002】[0002]
【従来の技術】EL素子は、広視野角、応答速度が速
い、低消費電力などの利点から、ブラウン管や液晶ディ
スプレイに変わる、次世代のフラットパネルディスプレ
イとして期待されている。特に、透明電極基材や封止材
にプラスチックフィルムを使用することにより、ロール
巻き取り方式でEL素子を作製することが可能となるた
め、薄型、軽量、フレキシブルなEL素子を安価に提供
できると期待されている。2. Description of the Related Art EL elements are expected as next-generation flat panel displays which can be replaced with cathode ray tubes and liquid crystal displays due to advantages such as wide viewing angle, fast response speed, and low power consumption. In particular, by using a plastic film for the transparent electrode base material and the sealing material, it becomes possible to manufacture an EL element by a roll winding method, and thus it is possible to provide a thin, lightweight, flexible EL element at low cost. Is expected.
【0003】EL素子は、少なくとも一方が透明な2枚
の電極の間に発光媒体層を挟持した構造であり、両電極
間に電流を流すことにより発光媒体層で発光が生じるも
のである。An EL element has a structure in which a light emitting medium layer is sandwiched between two electrodes, at least one of which is transparent, and light is generated in the light emitting medium layer by passing a current between both electrodes.
【0004】ただし、EL素子は、大気中の水分や酸素
などの影響により劣化する。EL素子劣化の具体例とし
て、ダークスポットと呼ばれる非発光領域が発生し、時
間の経過と共に拡大するといった現象がある。特に、ガ
スバリア性が低いプラスチックフィルムを基材として使
用した場合には、EL素子の劣化はさらに早く進行す
る。However, the EL element is deteriorated by the influence of moisture and oxygen in the atmosphere. As a specific example of EL element deterioration, there is a phenomenon in which a non-light emitting area called a dark spot occurs and expands over time. In particular, when a plastic film having a low gas barrier property is used as a base material, the deterioration of the EL element progresses more quickly.
【0005】この問題を解決する手段として、特開平5
−89961号公報、特開平7−65957号公報など
に記載されているように、ガスバリアフィルムによりE
L素子を被覆封止する方法がある。As a means for solving this problem, Japanese Patent Laid-Open No.
As described in JP-A-89961 and JP-A-7-65957, a gas barrier film is used for E
There is a method of covering and sealing the L element.
【0006】背面側(光取り出し面と反対側)に配置す
るガスバリアフィルムとしては、透光性である必要が無
く、特にガスバリア性が高いアルミニウム箔などの金属
箔を積層したフィルムで封止することが効果的である。The gas barrier film arranged on the back side (the side opposite to the light extraction surface) does not need to be translucent, and should be sealed with a film laminated with a metal foil such as an aluminum foil having a particularly high gas barrier property. Is effective.
【0007】それに対して、前面側(光取り出し面側)
のフィルム基材は、透光性である必要が有るために、フ
ッ素系樹脂フィルムや無機薄膜蒸着フィルムなどの透光
性ガスバリアフィルムを積層したフィルムが用いられて
きた。しかし、前記フィルムを含み十分なガスバリア性
を有する透光性フィルムが未だ開発されていないのが現
状である。On the other hand, the front side (light extraction surface side)
Since the film substrate of (1) needs to be translucent, a film obtained by laminating a translucent gas barrier film such as a fluororesin film or an inorganic thin film vapor deposition film has been used. However, the present situation is that a translucent film having a sufficient gas barrier property including the above film has not yet been developed.
【0008】従って、現状のフィルムEL素子の実用化
に際し、薄型・軽量・小型・低価格を要求される用途に
使用することが好ましい。たとえば、電報、グリーティ
ングカード、はがき等、文字や絵などの情報を相手に伝
達する各種印刷物は、少なくとも相手の手元に届くまで
の間、EL素子の劣化を抑制できれば目的を達成するこ
とができる。Therefore, when the current film EL device is put to practical use, it is preferable to use it for applications requiring thinness, light weight, small size and low price. For example, various printed matters such as telegrams, greeting cards, postcards, etc. that transmit information such as characters and pictures to the other party can achieve the purpose if deterioration of the EL element can be suppressed at least until reaching the other party's hand.
【0009】このような用途に対しては、使用時まで発
光を視認できなくても良く、金属箔のようにガスバリア
性の高い層を有する封止袋に封入し、劣化を抑制する手
段が有効である。しかし、封止袋による封止では、EL
素子の外観が封止袋のシール端部の分大きくなるため、
好ましくないといった問題がある。また、EL素子の背
面側の封止能は十分であるにもかかわらず、封止袋では
EL素子の両面に封止材が配置されるため、封止材が余
分に使用されているといった問題がある。また、一度開
封するとEL素子が劣化し、たとえ再度封入したとして
も、水分を含んだ空気を一緒に封入してしまうため、E
L素子の劣化を抑制できないといった問題がある。For such applications, it is not necessary to visually recognize the light emission until the time of use, and a means for suppressing deterioration by enclosing it in a sealing bag having a layer having a high gas barrier property such as a metal foil is effective. Is. However, in the case of sealing with a sealing bag, EL
Since the external appearance of the element is increased by the size of the sealing end of the sealing bag,
There is a problem that it is not preferable. Further, although the sealing ability on the back side of the EL element is sufficient, the sealing bag is provided with the sealing material on both sides of the EL element, so that the sealing material is excessively used. There is. Also, once the EL element is opened, the EL element deteriorates, and even if it is re-enclosed, air containing water is enclosed together.
There is a problem that the deterioration of the L element cannot be suppressed.
【0010】[0010]
【発明が解決しようとする課題】本発明では、上記の問
題点を解決するためになされたものであり、その課題と
するところは、光取り出し面側のフィルム基材のガスバ
リア性能不足を使用直前まで補うことにより、外部から
の水分を遮断し、しかも繰り返し封止することができる
エレクトロルミネッセンス素子を提供することにある。DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems. The problem is that the gas barrier performance of the film base material on the light extraction surface side is insufficient immediately before use. The present invention is to provide an electroluminescent element which can block moisture from the outside and can be repeatedly sealed.
【0011】[0011]
【課題を解決するための手段】上記課題を解決するため
に、まず請求項1においては、少なくとも、透明陽極
層、発光媒体層、陰極層を有するエレクトロルミネッセ
ンス素子において、透明陽極層側に、少なくともガスバ
リア層と粘着層とを有する保護層が剥離可能な状態で積
層されていることを特徴とするエレクトロルミネッセン
ス素子である。請求項2においては、少なくとも、保護
層、前面封止層、透光性基材層、透明陽極層、発光媒体
層、陰極層、及び少なくともガスバリア層とシーラント
層を有する背面封止層がこの順に積層されており、かつ
背面封止層の端部が保護層と接していることを特徴とす
るエレクトロルミネッセンス素子である。請求項3にお
いては、前記保護層が再封止可能な状態にもうけられた
ことを特徴とする、請求項1又は2記載のエレクトロル
ミネッセンス素子である。請求項4においては、前面封
止層、背面封止層または保護層の少なくとも1面に、1
層以上の印刷層が積層されていることを特徴とする請求
項1,2ないし3のいずれかに記載のエレクトロルミネ
ッセンス素子である。In order to solve the above problems, first, in claim 1, in an electroluminescent element having at least a transparent anode layer, a light emitting medium layer and a cathode layer, at least on the transparent anode layer side. The electroluminescent element is characterized in that a protective layer having a gas barrier layer and an adhesive layer is laminated in a peelable state. In claim 2, at least the protective layer, the front sealing layer, the translucent base material layer, the transparent anode layer, the luminescent medium layer, the cathode layer, and the back sealing layer having at least the gas barrier layer and the sealant layer in this order. The electroluminescent element is characterized in that it is laminated and the end portion of the backside sealing layer is in contact with the protective layer. A third aspect of the present invention is the electroluminescent element according to the first or second aspect, wherein the protective layer is provided in a resealable state. In claim 4, at least one surface of the front sealing layer, the back sealing layer or the protective layer is
The electroluminescent element according to any one of claims 1 to 3, wherein a printed layer of at least one layer is laminated.
【0012】[0012]
【発明の実施の形態】以下、本発明のEL素子及びその
製造方法の一例を、図1に基づいて説明する。BEST MODE FOR CARRYING OUT THE INVENTION An example of an EL device of the present invention and a manufacturing method thereof will be described below with reference to FIG.
【0013】エレクトロルミネッセンス素子が発光する
ためには、少なくとも図に示すように透明陽極層2、発
光媒体層3および陰極層4があれば良いが、具体的な形
態としては、透明陽極層2を透光性基材層1上に形成
し、前面封止層6、透光性基材層1,透明陽極層2,発
光媒体層3,陰極層4、背面封止層5をこの順に積層す
ることが望ましい。In order for the electroluminescence element to emit light, at least the transparent anode layer 2, the light emitting medium layer 3 and the cathode layer 4 are sufficient as shown in the figure. As a concrete form, the transparent anode layer 2 is used. It is formed on the translucent base material layer 1, and a front sealing layer 6, a translucent base material layer 1, a transparent anode layer 2, a light emitting medium layer 3, a cathode layer 4, and a back sealing layer 5 are laminated in this order. Is desirable.
【0014】本実施の形態において、透光性基材層1と
しては、透光性と絶縁性を有する基板であれば如何なる
基材も使用することができる。例えば、ポリプロピレ
ン、ポリエーテルサルフォン、ポリカーボネート、シク
ロオレフィンポリマー、ポリアリレート、ポリアミド、
ポリメチルメタクリレート等のプラスチックフィルムや
シートを用いても良く、又はこれらのプラスチックフィ
ルムやシートに、酸化珪素や酸化アルミニウムなどのガ
スバリア膜を成膜したものや、これらのガスバリア膜が
成膜されたフィルムをラミネートしたものを用いること
ができる。In the present embodiment, as the translucent base material layer 1, any base material can be used as long as it is a substrate having translucency and insulation. For example, polypropylene, polyether sulfone, polycarbonate, cycloolefin polymer, polyarylate, polyamide,
A plastic film or sheet such as polymethyl methacrylate may be used, or a film obtained by forming a gas barrier film such as silicon oxide or aluminum oxide on the plastic film or sheet, or a film formed by forming the gas barrier film. A laminated product can be used.
【0015】まず、透光性基材層1上に、スパッタリン
グ法や真空蒸着法などの既知の成膜方法により、透明陽
極層2を形成する。その後、ウェットエッチング法やド
ライエッチング法など既知のパターニング技術により透
明陽極層2をパターニングし、引き出し電極2aを兼ね
た透明陽極層2と陰極用引き出し電極2bとを形成す
る。First, the transparent anode layer 2 is formed on the transparent base material layer 1 by a known film forming method such as a sputtering method or a vacuum deposition method. Then, the transparent anode layer 2 is patterned by a known patterning technique such as a wet etching method or a dry etching method to form the transparent anode layer 2 which also serves as the extraction electrode 2a and the cathode extraction electrode 2b.
【0016】透明陽極層2の材料としては、インジウム
スズ酸化物やインジウム亜鉛酸化物、亜鉛アルミニウム
酸化物、カドミウムスズ酸化物などの金属酸化物材料
や、金、白金などの金属薄膜材料を使用することができ
る。As the material of the transparent anode layer 2, a metal oxide material such as indium tin oxide, indium zinc oxide, zinc aluminum oxide, cadmium tin oxide, or a metal thin film material such as gold or platinum is used. be able to.
【0017】また、透光性基材層1と透明陽極層2の密
着性を向上させるために、あらかじめ透光性基材1表面
に、コロナ放電処理、プラズマ処理、UVオゾン処理な
どの表面処理を施してもよく、さらには酸化珪素、窒化
珪素、酸窒化珪素などの無機絶縁薄膜や、クロム、チタ
ンなどの金属薄膜などを単層もしくは積層して挿入して
もよい。Further, in order to improve the adhesion between the transparent base material layer 1 and the transparent anode layer 2, the surface of the transparent base material 1 is previously subjected to surface treatment such as corona discharge treatment, plasma treatment, UV ozone treatment. In addition, an inorganic insulating thin film such as silicon oxide, silicon nitride, or silicon oxynitride, a metal thin film such as chromium or titanium, or the like may be inserted as a single layer or a laminate.
【0018】次に、発光媒体層3を形成する。ここで、
発光媒体層3を形成する前に、透明陽極層2の表面洗浄
や表面改質を目的として、コロナ放電処理、プラズマ処
理、UVオゾン処理などの表面処理を施すことが好まし
い。Next, the light emitting medium layer 3 is formed. here,
Before forming the light emitting medium layer 3, it is preferable to perform surface treatment such as corona discharge treatment, plasma treatment, and UV ozone treatment for the purpose of cleaning the surface and modifying the surface of the transparent anode layer 2.
【0019】本発明における発光媒体層3としては、蛍
光物質を含む単層膜、あるいは多層膜で形成することが
できる。多層膜で形成する場合の発光媒体層の構成例は
正孔注入輸送層、電子輸送性発光層または正孔輸送性発
光層、電子輸送層からなる2層構成や正孔注入輸送層、
発光層、電子輸送層からなる3層構成等がある。さらに
より多層で形成することも可能であり、各層を基板上に
順に成膜する。The light emitting medium layer 3 in the present invention can be formed of a single layer film containing a fluorescent substance or a multilayer film. When the light emitting medium layer is formed of a multilayer film, examples of the structure of the light emitting medium layer include a hole injecting and transporting layer, an electron transporting light emitting layer or a hole transporting light emitting layer, a two-layered structure including an electron transporting layer and a hole injecting and transporting layer
There is a three-layer structure including a light emitting layer and an electron transporting layer. It is also possible to form more layers, and each layer is sequentially formed on the substrate.
【0020】正孔注入輸送層の材料としては、銅フタロ
シアニン、テトラ(t−ブチル)銅フタロシアニン等の
金属フタロシアニン類及び無金属フタロシアニン類、キ
ナクリドン化合物、1,1−ビス(4−ジ−p−トリル
アミノフェニル)シクロヘキサン、N,N’−ジフェニ
ル−N,N’−ビス(3−メチルフェニル)−1,1’
−ビフェニル−4,4’−ジアミン、N,N’−ジ(1
−ナフチル)−N,N’−ジフェニル−1,1’−ビフ
ェニル−4,4’−ジアミン等の芳香族アミンなどの低
分子材料や、ポリチオフェン、ポリアニリン等の高分子
材料、ポリチオフェンオリゴマー材料、その他既存の正
孔輸送材料の中から選ぶことができる。Materials for the hole injecting and transporting layer include metal phthalocyanines such as copper phthalocyanine and tetra (t-butyl) copper phthalocyanine and non-metal phthalocyanines, quinacridone compounds, 1,1-bis (4-di-p- Tolylaminophenyl) cyclohexane, N, N′-diphenyl-N, N′-bis (3-methylphenyl) -1,1 ′
-Biphenyl-4,4'-diamine, N, N'-di (1
-Naphtyl) -N, N'-diphenyl-1,1'-biphenyl-4,4'-diamine and other low molecular weight materials such as aromatic amines, polythiophene, polyaniline and other high molecular weight materials, polythiophene oligomer materials, etc. It can be selected from existing hole transport materials.
【0021】発光層材料としては、9,10−ジアリー
ルアントラセン誘導体、ピレン、コロネン、ペリレン、
ルブレン、1,1,4,4−テトラフェニルブタジエ
ン、トリス(8−キノリノラート)アルミニウム錯体、
トリス(4−メチル−8−キノリノラート)アルミニウ
ム錯体、ビス(8−キノリノラート)亜鉛錯体、トリス
(4−メチル−5−トリフルオロメチル−8−キノリノ
ラート)アルミニウム錯体、トリス(4−メチル−5−
シアノ−8−キノリノラート)アルミニウム錯体、ビス
(2−メチル−5−トリフルオロメチル−8−キノリノ
ラート)[4−(4−シアノフェニル)フェノラート]
アルミニウム錯体、ビス(2−メチル−5−シアノ−8
−キノリノラート)[4−(4−シアノフェニル)フェ
ノラート]アルミニウム錯体、トリス(8−キノリノラ
ート)スカンジウム錯体、ビス〔8−(パラ−トシル)
アミノキノリン〕亜鉛錯体及びカドミウム錯体、1,
2,3,4−テトラフェニルシクロペンタジエン、ペン
タフェニルシクロペンタジエン、ポリ−2,5−ジヘプ
チルオキシ−パラ−フェニレンビニレン、クマリン系蛍
光体、ペリレン系蛍光体、ピラン系蛍光体、アンスロン
系蛍光体、ポルフィリン系蛍光体、キナクリドン系蛍光
体、N,N’−ジアルキル置換キナクリドン系蛍光体、
ナフタルイミド系蛍光体、N,N’−ジアリール置換ピ
ロロピロール系蛍光体等の低分子材料や、ポリフルオレ
ン、ポリパラフェニレンビニレン、ポリチオフェンなど
の高分子材料、その他既存の発光材料を用いることがで
きる。Materials for the light emitting layer include 9,10-diarylanthracene derivatives, pyrene, coronene, perylene,
Rubrene, 1,1,4,4-tetraphenylbutadiene, tris (8-quinolinolato) aluminum complex,
Tris (4-methyl-8-quinolinolato) aluminum complex, bis (8-quinolinolato) zinc complex, tris (4-methyl-5-trifluoromethyl-8-quinolinolato) aluminum complex, tris (4-methyl-5--5)
Cyano-8-quinolinolato) aluminum complex, bis (2-methyl-5-trifluoromethyl-8-quinolinolato) [4- (4-cyanophenyl) phenolate]
Aluminum complex, bis (2-methyl-5-cyano-8)
-Quinolinolato) [4- (4-cyanophenyl) phenolate] aluminum complex, tris (8-quinolinolato) scandium complex, bis [8- (para-tosyl)
Aminoquinoline] zinc complex and cadmium complex, 1,
2,3,4-Tetraphenylcyclopentadiene, pentaphenylcyclopentadiene, poly-2,5-diheptyloxy-para-phenylene vinylene, coumarin-based phosphor, perylene-based phosphor, pyran-based phosphor, anthron-based phosphor , Porphyrin-based phosphor, quinacridone-based phosphor, N, N'-dialkyl-substituted quinacridone-based phosphor,
It is possible to use low molecular weight materials such as naphthalimide-based phosphors and N, N′-diaryl-substituted pyrrolopyrrole-based phosphors, polymer materials such as polyfluorene, polyparaphenylene vinylene, and polythiophene, and other existing light emitting materials. .
【0022】電子注入輸送層の材料としては、2−(4
−ビフィニルイル)−5−(4−t−ブチルフェニル)
−1,3,4−オキサジアゾール、2,5−ビス(1−
ナフチル)−1,3,4−オキサジアゾール、およびオ
キサジアゾール誘導体やビス(10−ヒドロキシベンゾ
[h]キノリノラート)ベリリウム錯体、トリアゾール
化合物等が挙げられる。The material for the electron injecting and transporting layer is 2- (4
-Bifinylyl) -5- (4-t-butylphenyl)
-1,3,4-oxadiazole, 2,5-bis (1-
Examples thereof include naphthyl) -1,3,4-oxadiazole, oxadiazole derivatives, bis (10-hydroxybenzo [h] quinolinolate) beryllium complex, and triazole compounds.
【0023】発光媒体層3の形成方法は、材料に応じ
て、真空蒸着法や、スピンコート、スプレーコート、フ
レキソ、グラビア、ロールコート、凹版オフセットなど
のコーティング法、印刷法を用いることができる。発光
媒体層3の膜厚は、単層または積層により形成する場合
においても1000nm以下であり、好ましくは50〜
150nmである。As a method for forming the light emitting medium layer 3, a vacuum deposition method, a coating method such as spin coating, spray coating, flexo, gravure, roll coating, intaglio offset, or a printing method can be used depending on the material. The thickness of the light emitting medium layer 3 is 1000 nm or less, preferably 50 to 50, even when formed as a single layer or a laminated layer.
It is 150 nm.
【0024】次に、陰極層4を形成する。陰極層4の材
料としては電子注入効率の高い物質を用いることが好ま
しい。具体的にはMg,Al, Yb等の金属単体を用い
たり、発光媒体と接する界面にLiや酸化Li,LiF
等の化合物を1nm程度挟んで、安定性・導電性の高い
AlやCuやAgを積層して用いることができる。Next, the cathode layer 4 is formed. As the material of the cathode layer 4, it is preferable to use a substance having a high electron injection efficiency. Specifically, a simple metal such as Mg, Al, or Yb is used, or Li, Li oxide, LiF is added to the interface in contact with the light emitting medium.
It is possible to stack Al, Cu, and Ag having high stability and conductivity with a compound such as 1 nm sandwiched therebetween.
【0025】または電子注入効率と安定性を両立させる
ため、仕事関数が低いLi,Mg,Ca,Sr,La,
Ce,Er,Eu,Sc,Y,Yb等の金属1種以上
と、安定なAg,Al,Cu等の金属元素との合金系を
用いてもよい。具体的にはMgAg,AlLi,CuL
i等の合金が使用できる。Alternatively, in order to achieve both electron injection efficiency and stability, Li, Mg, Ca, Sr, La, having a low work function,
An alloy system of one or more metals such as Ce, Er, Eu, Sc, Y and Yb and a stable metal element such as Ag, Al and Cu may be used. Specifically, MgAg, AlLi, CuL
Alloys such as i can be used.
【0026】陰極層4の形成方法としては、材料に応じ
て、抵抗加熱蒸着法、電子ビーム蒸着法、反応性蒸着
法、イオンプレーティング法、スパッタリング法、ラミ
ネート法などを用いることができる。陰極の厚さは、1
0nm〜1000nm程度が望ましい。As the method for forming the cathode layer 4, a resistance heating vapor deposition method, an electron beam vapor deposition method, a reactive vapor deposition method, an ion plating method, a sputtering method, a laminating method or the like can be used depending on the material. The thickness of the cathode is 1
About 0 nm to 1000 nm is desirable.
【0027】次に、背面封止層5および前面封止層6を
積層する。前記封止層5、6は少なくともガスバリア層
を有し、かつ少なくともどちらか一方にシーラント層を
有することが好ましい。ここで、封止層5、6を積層す
る前に、陰極層4上に酸化珪素、酸化アルミニウム、窒
化珪素などのガスバリア性に優れた無機薄膜を、単独膜
もしくは硬化性樹脂などの有機膜との積層膜で成膜する
ことによりEL素子を保護することがより好ましい。Next, the back side sealing layer 5 and the front side sealing layer 6 are laminated. The sealing layers 5 and 6 preferably have at least a gas barrier layer and have a sealant layer on at least one of them. Here, before laminating the sealing layers 5 and 6, an inorganic thin film having excellent gas barrier properties such as silicon oxide, aluminum oxide, and silicon nitride is formed on the cathode layer 4 as a single film or an organic film such as a curable resin. It is more preferable to protect the EL element by forming a laminated film of.
【0028】前記ガスバリア層としては、基材に酸化珪
素、酸化アルミニウム、酸化クロム、酸化マグネシウム
等の金属酸化物や、弗化アルミニウム、弗化マグネシウ
ム等の金属弗化物や、窒化珪素、窒化アルミニウム、窒
化クロム等の金属窒化物やその他透光性無機薄膜を単層
または積層したフィルムや、アルミニウム、銅、ニッケ
ル、ステンレス、アルミニウム合金などを蒸着したフィ
ルムや、またはこれらの金属箔を用いることができる。
本発明において、ガスバリア層の性能は10-2g/m2
/day以下であることが好ましく、とくに10-5g/
m2/day以下であることがより望ましい。背面封止
層5は、EL発光取り出し面と反対側に配置されるため
に、透光性である必要はなく、ガスバリア性の高い金属
箔を用いることが好ましい。また、前面封止層6は、光
取り出し面側であるため、金属酸化物や金属窒化物など
の透光性無機薄膜を用いることが好ましい。As the gas barrier layer, metal oxides such as silicon oxide, aluminum oxide, chromium oxide and magnesium oxide, metal fluorides such as aluminum fluoride and magnesium fluoride, silicon nitride and aluminum nitride are used as the gas barrier layer. A film in which a metal nitride such as chromium nitride or another translucent inorganic thin film is formed into a single layer or a laminated film, a film in which aluminum, copper, nickel, stainless steel, an aluminum alloy, or the like is deposited, or a metal foil of these can be used. .
In the present invention, the performance of the gas barrier layer is 10 -2 g / m2.
/ Day or less, preferably 10 -5 g /
It is more preferable that it is m2 / day or less. Since the backside sealing layer 5 is arranged on the side opposite to the EL emission extraction surface, it does not need to be translucent, and it is preferable to use a metal foil having a high gas barrier property. Further, since the front surface sealing layer 6 is on the light extraction surface side, it is preferable to use a translucent inorganic thin film such as a metal oxide or a metal nitride.
【0029】シーラント層としては、ポリエチレン、ポ
リプロピレン、エチレン・プロピレン共重合体などのポ
リオレフィンの酸変性物、エチレン・酢酸ビニル共重合
体の酸変性物、エチレン・アクリル酸共重合体、エチレ
ン・メタクリル酸共重合体、アイオノマーなどの熱可塑
性接着性樹脂を用いることができる。As the sealant layer, an acid modified product of polyolefin such as polyethylene, polypropylene, ethylene / propylene copolymer, an acid modified product of ethylene / vinyl acetate copolymer, ethylene / acrylic acid copolymer, ethylene / methacrylic acid. A thermoplastic adhesive resin such as a copolymer or an ionomer can be used.
【0030】次に、封止層5,6を熱圧着することによ
りEL素子を封止する。ここで、熱圧着は、真空中もし
くは、窒素やアルゴンなどの不活性乾燥ガス雰囲気中で
行うことがより好ましい。封止方法としては、EL素子
を被覆するように封止層5,6を重ね合せ、両者を熱圧
着することが好ましい。Next, the EL elements are sealed by thermocompression bonding the sealing layers 5 and 6. Here, the thermocompression bonding is more preferably performed in a vacuum or in an atmosphere of an inert dry gas such as nitrogen or argon. As a sealing method, it is preferable to stack the sealing layers 5 and 6 so as to cover the EL element and thermocompression-bond them.
【0031】次に、透光性基材層1と前面封止層6のガ
スバリア性能不足を補うために、保護層7を前面封止層
6および、背面封止層5の端部突出部に積層する。保護
層7は少なくともガスバリア層と粘着層とを有し、かつ
剥離可能な状態で積層されていることが好ましい。更に
は、剥離後に、再貼着ができることがより好ましい。剥
離可能な状態で積層されれば、保護層7は透光性である
必要はなく、アルミニウム、銅、ニッケル、ステンレ
ス、アルミニウム合金などの金属材料の蒸着フィルムで
も良く、これら金属材料の金属箔でも良く、酸化珪素、
酸化アルミニウム、弗化アルミニウム、窒化珪素、酸窒
化珪素などの無機薄膜蒸着フィルムでも良く、着色や印
字が施されたプラスチックフィルムや紙でもよく、上記
プラスチックフィルム、金属箔、紙などを組み合わせて
積層しても良く、別のエレクトロルミネッセンス素子で
も良い。特に、耐湿性に優れた金属箔が少なくとも積層
されていることが好ましい。また、保護層7は、全面で
剥離できなくてもよく、例えば背面封止層5との粘着部
分のうち1辺を剥離できなくして、見開き状に剥離して
もよい。Next, in order to make up for the insufficient gas barrier performance of the translucent base material layer 1 and the front surface sealing layer 6, a protective layer 7 is formed on the front surface sealing layer 6 and the end projections of the back surface sealing layer 5. Stack. The protective layer 7 preferably has at least a gas barrier layer and an adhesive layer, and is laminated in a peelable state. Furthermore, it is more preferable that it can be reattached after peeling. If laminated in a peelable state, the protective layer 7 does not need to be translucent, and may be a vapor deposition film of a metal material such as aluminum, copper, nickel, stainless steel, or an aluminum alloy, or a metal foil of these metal materials. Well, silicon oxide,
It may be an inorganic thin film vapor-deposited film of aluminum oxide, aluminum fluoride, silicon nitride, silicon oxynitride, etc., may be a colored or printed plastic film or paper, and may be laminated by combining the above plastic film, metal foil, paper, etc. Alternatively, another electroluminescence element may be used. Particularly, it is preferable that at least a metal foil having excellent moisture resistance is laminated. Further, the protective layer 7 may not be peelable on the entire surface, and for example, one side of the adhesive portion with the backside sealing layer 5 may not be peeled and may be peeled in a spread manner.
【0032】粘着層の主材料としては、天然ゴム、エス
テル化天然ゴム、スチレンブタジエンゴム、ブチルゴ
ム、ポリイソブチレンポリマー、スチレン−イソプレン
−スチレンなどのゴム系粘着剤や、アクリル酸エステル
を主体にアクリル酸、メタクリル酸、アクリルアミド、
酢酸ビニル、スチレンなどのモノマーの共重合体を主成
分としたアクリル系粘着剤や、シリコーンゴムとオルガ
ノクロルシランの加水分解物の縮合反応により得られる
シリコーン樹脂からなるシリコーン系粘着剤や、これら
の混合物を用いることができる。The main materials of the adhesive layer are natural rubber, esterified natural rubber, styrene-butadiene rubber, butyl rubber, polyisobutylene polymer, rubber adhesive such as styrene-isoprene-styrene, and acrylic acid ester-based acrylic acid. , Methacrylic acid, acrylamide,
Acrylic adhesive mainly composed of copolymers of monomers such as vinyl acetate and styrene, silicone adhesive composed of silicone resin obtained by condensation reaction of hydrolyzate of silicone rubber and organochlorosilane, and these Mixtures can be used.
【0033】これらの粘着剤には、粘着力の調整や耐候
性の向上など必要に応じて、ロジン系樹脂、テルペン系
樹脂、脂肪族系石油樹脂、芳香族系石油樹脂などの粘着
付与剤や、フタル酸エステル、りん酸エステル、動植物
・鉱物油などの可塑剤や、炭酸カルシウム、珪酸塩など
の充填剤や、アミン系、フェノール系、イムダール系な
どの老化防止剤や、その他既存の添加剤を適量混合する
ことが好ましい。These adhesives include tackifiers such as rosin-based resins, terpene-based resins, aliphatic petroleum resins, aromatic petroleum resins, and the like, if necessary, such as adjustment of adhesive strength and improvement of weather resistance. , Phthalates, phosphates, plasticizers such as animal and vegetable oils and mineral oils, fillers such as calcium carbonate and silicates, amine-based, phenol-based, imdal-based antioxidants, and other existing additives Is preferably mixed in an appropriate amount.
【0034】粘着層は、保護層7を剥離する際に、前面
封止層6及び背面封止層5側に残存せずに、保護層7と
共に剥離されることが好ましいため、保護層7側に予め
下塗り剤を塗布したり、コロナ処理などの表面処理を施
すことにより、粘着層と保護層7との粘着力を向上させ
ても良く、さらに必要に応じて、前面封止層6及び背面
封止層5に剥離剤を塗布し、粘着層を剥離されやすくし
てもよい。When the protective layer 7 is peeled off, it is preferable that the adhesive layer is peeled off together with the protective layer 7 without remaining on the front side sealing layer 6 and the back side sealing layer 5 side. The adhesive force between the adhesive layer and the protective layer 7 may be improved by applying an undercoating agent to the undercoat or surface treatment such as corona treatment. A release agent may be applied to the sealing layer 5 to facilitate the release of the adhesive layer.
【0035】下塗り剤としては、粘着層と親和性の有る
ポリマー材料と、保護層7と親和性の有るポリマー材
料、との混合体もしくは共重合体を用いることが好まし
い。特に、有機チタン系、イソシアネート系、ポリエチ
レンイミン系、ポリブタジエン系などを主成分として用
いることができる。例えば、アルミ箔とアクリル系ゴム
との組み合わせの場合には、イソシアネート、活性水素
含有物、塩化ゴムの混合体などを用いることができる。As the undercoating agent, it is preferable to use a mixture or copolymer of a polymer material having an affinity with the adhesive layer and a polymer material having an affinity with the protective layer 7. In particular, organic titanium-based, isocyanate-based, polyethyleneimine-based, polybutadiene-based and the like can be used as the main component. For example, in the case of a combination of aluminum foil and acrylic rubber, a mixture of isocyanate, active hydrogen-containing material, chlorinated rubber, etc. can be used.
【0036】剥離剤としては、ポリエステルアクリレー
ト、ポリエステルアリルアクリルアミドなどの長鎖アル
キル基含有ポリマーや、フェニルメチルシロキサンとジ
メチルシロキサンのコポリマーなどのシリコーン系ポリ
マーや、ポリ(1,1−シヒドロパ−フロロヘキシルメ
タクリレート)、ポリ(N−エチル、N−パーフロロオ
クタンスルホアミドエチルメタクリレート)などのパー
フロロ系ポリマーなどを使用することができる。Examples of the release agent include long-chain alkyl group-containing polymers such as polyester acrylate and polyester allyl acrylamide, silicone-based polymers such as copolymers of phenylmethyl siloxane and dimethyl siloxane, and poly (1,1-cyhydroperfluorohexyl methacrylate). ), Poly (N-ethyl, N-perfluorooctanesulfoamidoethylmethacrylate), and other perfluoro-based polymers can be used.
【0037】意匠性を寄与するために、前面封止層6、
背面封止層5または保護層7には、ガスバリア層とシー
ラント層の他に、印刷層が積層されていることがより好
ましい。印刷層としては、プラスチックフィルムなどの
透光性基材上に、フレキソ、グラビア、ロールコート、
凹版オフセット、インクジェット法などの既知の印刷法
により、印字や着色を施しても良く、その他偏光やレン
ズや反射防止やカラーフィルターなどの機能を付与して
も良い。In order to contribute to the design, the front sealing layer 6,
The back sealing layer 5 or the protective layer 7 is more preferably laminated with a printing layer in addition to the gas barrier layer and the sealant layer. As a printing layer, flexo, gravure, roll coat, on a translucent substrate such as a plastic film,
Printing or coloring may be performed by a known printing method such as intaglio offset or ink jet method, and other functions such as polarization, lens, antireflection and color filter may be added.
【0038】[0038]
【実施例】以下、本発明に係わるEL素子を説明する。
図1は、本発明のEL素子およびそれを用いた発光積層
体の製造工程の一例を説明した概略図である。また、図
2(a)〜(d)は、それぞれ順に比較例1〜4記載の
EL素子を説明した概略図である。EXAMPLE An EL element according to the present invention will be described below.
FIG. 1 is a schematic view illustrating an example of a manufacturing process of an EL device of the present invention and a light emitting laminate using the EL device. In addition, FIGS. 2A to 2D are schematic views illustrating the EL elements described in Comparative Examples 1 to 4, respectively.
【0039】(実施例1)まず、透光性基材層1とし
て、ポリエチレンテレフタレートフィルム(50μm)
の一方の面に、接着層として酸化珪素薄膜を50nm成
膜した後に、透明陽極層2として、スパッタリング法に
よりインジウム錫酸化物(ITO)を150nm形成し
た。さらに、フォトリソグラフィー法及びウェットエッ
チング法によって、ITO膜2をパターンニングし、引
き出し電極2aを兼ねたITO膜2と陰極引き出し電極
2bとを形成した(図1(a))。Example 1 First, a polyethylene terephthalate film (50 μm) was used as the translucent base material layer 1.
A silicon oxide thin film having a thickness of 50 nm was formed as an adhesive layer on one surface, and then indium tin oxide (ITO) having a thickness of 150 nm was formed as a transparent anode layer 2 by a sputtering method. Further, the ITO film 2 was patterned by the photolithography method and the wet etching method to form the ITO film 2 also serving as the extraction electrode 2a and the cathode extraction electrode 2b (FIG. 1A).
【0040】次に、ITO膜表面をUVオゾン処理した
後に、発光媒体層3として、ポリ[2−メトキシ−5−
(2’−エチル−ヘキシロキシ)−1,4−フェニレン
ビニレン](MEHPPV)をダイレクトグラビア法
により100nm形成した。Next, after the surface of the ITO film was subjected to UV ozone treatment, poly [2-methoxy-5-) was used as the light emitting medium layer 3.
(2'-Ethyl-hexyloxy) -1,4-phenylene vinylene] (MEHPPV) was formed to 100 nm by the direct gravure method.
【0041】次に、陰極層4として、真空蒸着法により
Ca(20nm)とAg(200nm)をこの順に積層
形成した(図1(b))。Next, as the cathode layer 4, Ca (20 nm) and Ag (200 nm) were laminated in this order by a vacuum evaporation method (FIG. 1 (b)).
【0042】次に、背面封止層5として、ポリエチレン
テレフタレート(12μm)、アルミニウム箔(20μ
m)、ポリエチレンの酸変性物(30μm)をこの順にド
ライラミネート及び押し出しラミネートした。Next, as the back surface sealing layer 5, polyethylene terephthalate (12 μm) and aluminum foil (20 μm) were used.
m) and an acid-modified polyethylene (30 μm) were dry laminated and extrusion laminated in this order.
【0043】次に、前面封止層6として、ポリエチレン
テレフタレート(12μm)上に、酸化珪素薄膜(50n
m)を真空蒸着した後に、ポリエチレンの酸変性物(3
0μm)をドライラミネートした。Next, as a front surface sealing layer 6, a silicon oxide thin film (50 n) was formed on polyethylene terephthalate (12 μm).
m) is vacuum-deposited, and then an acid-modified polyethylene (3
0 μm) was dry laminated.
【0044】次に、乾燥窒素雰囲気中で、前面封止層6
と背面封止層5とを端部で熱圧着し、EL素子を被覆封
止した。Next, in the dry nitrogen atmosphere, the front surface sealing layer 6
The back sealing layer 5 and the back sealing layer 5 were thermocompression-bonded at the ends to cover and seal the EL element.
【0045】最後に、保護層7として、アルミ箔テープ
(3M社登録商標スコッチ)を、乾燥窒素雰囲気中で、
前面封止層6および背面封止層5の端部突出部に粘着し
た(図1(c))。Finally, an aluminum foil tape (Scotch, a trademark of 3M Co.) was used as the protective layer 7 in a dry nitrogen atmosphere.
It adhered to the end projections of the front sealing layer 6 and the back sealing layer 5 (Fig. 1 (c)).
【0046】得られたEL素子を、40℃90%RHの
恒温槽で1000時間保存した後に、保護層7を剥離し
て、EL素子を発光させたところ、発光面積は初期面積
の80%であった。また、得られたEL素子を、40℃
90%RHの恒温槽で500時間保存した後に、保護層
7を剥離して、EL素子を発光させたところ、発光面積
は初期面積の90%であり、さらに再度保護層7を粘着
し、40℃90%RHの恒温槽で500時間保存し、保
護層7を剥離して、EL素子を発光させたところ、発光
面積は初期面積の60%であった。The obtained EL device was stored in a constant temperature bath at 40 ° C. and 90% RH for 1000 hours, and then the protective layer 7 was peeled off to allow the EL device to emit light. The light emitting area was 80% of the initial area. there were. In addition, the obtained EL device was
After storage in a constant temperature bath of 90% RH for 500 hours, the protective layer 7 was peeled off and the EL element was allowed to emit light. The light emitting area was 90% of the initial area, and the protective layer 7 was adhered again. When the EL element was allowed to emit light after being stored for 500 hours in a thermostat at 90 ° C. and RH for 500 hours, the light emitting area was 60% of the initial area.
【0047】(実施例2)実施例1で用いた前面封止層
6および保護層7に、予め印刷層を積層し、発光積層体
を作製した。印刷層としては、ポリエチレンテレフタレ
ート(12μm)基材上に印字し、前面封止層及び保護層
7にラミネートすることにより印字部8を設けた(図1
(d))。Example 2 A printed layer was previously laminated on the front sealing layer 6 and the protective layer 7 used in Example 1 to prepare a light emitting laminate. As the printing layer, printing was carried out on a polyethylene terephthalate (12 μm) substrate and laminated on the front sealing layer and the protective layer 7 to provide the printing portion 8 (FIG. 1).
(D)).
【0048】得られたEL素子を、40℃90%RHの
恒温槽で1000時間保存した後に、保護層6を剥離
し、EL素子を発光させたところ、発光面積は初期面積
の80%であった。また、得られたEL素子を、40℃
90%RHの恒温槽で500時間保存した後に、保護層
7を剥離して、EL素子を発光させたところ、発光面積
は初期面積の90%であり、さらに再度保護層7を粘着
し、40℃90%RHの恒温槽で500時間保存し、保
護層7を剥離して、EL素子を発光させたところ、発光
面積は初期面積の60%であった。The EL device thus obtained was stored in a constant temperature bath at 40 ° C. and 90% RH for 1000 hours, and then the protective layer 6 was peeled off to allow the EL device to emit light. The light emitting area was 80% of the initial area. It was In addition, the obtained EL device was
After storage in a constant temperature bath of 90% RH for 500 hours, the protective layer 7 was peeled off and the EL element was allowed to emit light. The light emitting area was 90% of the initial area, and the protective layer 7 was adhered again. When the EL element was allowed to emit light after being stored for 500 hours in a thermostat at 90 ° C. and RH for 500 hours, the light emitting area was 60% of the initial area.
【0049】(比較例1)実施例1で作製したEL素子
に、保護層6を積層せず(図2(a))、40℃90%
RHの恒温槽で1000時間保存し、EL素子を発光さ
せたところ、発光しなかった。(Comparative Example 1) The protective layer 6 was not laminated on the EL element prepared in Example 1 (FIG. 2 (a)), and 40 ° C. 90%.
When the EL element was allowed to emit light after being stored in a thermostatic bath of RH for 1000 hours, it did not emit light.
【0050】(比較例2)比較例1で作製したEL素子
を、アルミニウム箔と粘着層からなる封止袋8の内部に
封入した(図2(b))。得られたEL素子を、40℃
90%RHの恒温槽で1000時間保存した後に、封止
袋8から取り出し、EL素子を発光させたところ、発光
面積は初期面積の80%であった。また、得られたEL
素子を、40℃90%RHの恒温槽で500時間保存し
た後に、封止袋から取り出し、EL素子を発光させたと
ころ、発光面積は初期面積の90%であり、さらに再度
封止袋8の内部にEL素子を封入し、40℃90%RH
の恒温槽で500時間保存した後に、封止袋8から取り
出し、EL素子を発光させたところ、発光しなかった。(Comparative Example 2) The EL device produced in Comparative Example 1 was enclosed in a sealing bag 8 composed of an aluminum foil and an adhesive layer (Fig. 2 (b)). The obtained EL element was placed at 40 ° C.
After storing in a thermostat of 90% RH for 1000 hours and then taking out from the sealing bag 8 and letting the EL element emit light, the light emitting area was 80% of the initial area. Also, the EL obtained
The device was stored in a constant temperature bath at 40 ° C. and 90% RH for 500 hours, then taken out from the sealing bag and the EL device was made to emit light. The light emitting area was 90% of the initial area, and the sealing bag 8 EL element is enclosed inside, 40 ℃ 90% RH
After storing for 500 hours in the constant temperature bath, the EL device was taken out from the sealing bag 8 and the EL device was made to emit light, but no light was emitted.
【0051】(比較例3)実施例1のEL素子におい
て、背面封止層5および前面封止層6を熱圧着する箇所
を透光性基材層1の端部に行い、保護層7を前面封止層
6のみに粘着した(図2(c))。得られたEL素子を、
40℃90%RHの恒温槽で1000時間保存し、EL
素子を発光させたところ、発光面積は初期面積の60%
であった。また、得られたEL素子を、40℃90%R
Hの恒温槽で500時間保存した後に、保護層7を剥離
して、EL素子を発光させたところ、発光面積は初期面
積の80%であり、さらに再度保護層7を粘着し、40
℃90%RHの恒温槽で500時間保存し、保護層7を
剥離して、EL素子を発光させたところ、発光面積は初
期面積の20%であった。(Comparative Example 3) In the EL element of Example 1, the back sealing layer 5 and the front sealing layer 6 were thermocompression-bonded to the end portions of the translucent base material layer 1 and the protective layer 7 was formed. It adhered only to the front sealing layer 6 (Fig. 2 (c)). The obtained EL element,
Store in a constant temperature bath at 40 ° C and 90% RH for 1000 hours, then EL
When the device was made to emit light, the light emitting area was 60% of the initial area.
Met. In addition, the obtained EL device was tested at 40 ° C. and 90% R
After the protective layer 7 was peeled off and the EL element was made to emit light after being stored in a thermostatic bath of H for 500 hours, the light emitting area was 80% of the initial area.
When the EL element was allowed to emit light after being stored for 500 hours in a thermostat at 90 ° C. and RH for 500 hours, the light emitting area was 20% of the initial area.
【0052】(比較例4)実施例1のEL素子におい
て、背面封止層5と前面封止層6とを熱圧着の際に、背
面封止層5が前面封止層6よりも突出しないようにし、
保護層7を前面封止層6のみに粘着した(図2
(d))。得られたEL素子を、40℃90%RHの恒
温槽で1000時間保存し、EL素子を発光させたとこ
ろ、発光面積は初期面積の65%であった。また、得ら
れたEL素子を、40℃90%RHの恒温槽で500時
間保存した後に、保護層7を剥離して、EL素子を発光
させたところ、発光面積は初期面積の85%であり、さ
らに再度保護層7を粘着し、40℃90%RHの恒温槽
で500時間保存し、保護層7を剥離して、EL素子を
発光させたところ、発光面積は初期面積の30%であっ
た。(Comparative Example 4) In the EL device of Example 1, the back sealing layer 5 does not project beyond the front sealing layer 6 when the back sealing layer 5 and the front sealing layer 6 are thermocompression bonded. And then
The protective layer 7 was adhered only to the front sealing layer 6 (see FIG. 2).
(D)). The obtained EL device was stored in a constant temperature bath at 40 ° C. and 90% RH for 1000 hours, and the EL device was caused to emit light. The light emitting area was 65% of the initial area. The EL device thus obtained was stored in a constant temperature bath at 40 ° C. and 90% RH for 500 hours, and then the protective layer 7 was peeled off to allow the EL device to emit light. The light emitting area was 85% of the initial area. Then, the protective layer 7 was adhered again and stored in a constant temperature bath at 40 ° C. and 90% RH for 500 hours, and the protective layer 7 was peeled off to allow the EL element to emit light. It was
【0053】[0053]
【発明の効果】請求項1記載の発明によれば、少なくと
もガスバリア層と粘着層を有する保護層を、前面封止層
に積層することにより、光取り出し面側のガスバリア性
能不足を補うことができ、外部からの水分を遮断し、使
用直前までEL素子の劣化を抑制することができる。請
求項2記載の発明によれば、少なくともガスバリア層と
シーラント層を有する背面封止層と保護層とが接してい
ることによりフィルム端部からの水分の侵入を抑制する
ことができるため、長期にわたりEL素子の劣化を抑制
することができ、請求項1に記載の発明の実施態様とし
て好ましい。請求項3記載の発明によれば、EL素子の
使用後も保護層を再粘着することで、該EL素子の劣化
を抑制することができる。請求項4記載の発明によれ
ば、前面封止層もしくは背面封止層及び/又は保護層
に、印刷層を積層することにより、実際の使用に際する
まで長期にわたりEL素子の劣化が抑制され、かつ剥離
後も、再粘着することによりEL素子の劣化が抑制でき
る、意匠性に優れた発光積層体を作製できる。According to the invention of claim 1, by laminating a protective layer having at least a gas barrier layer and an adhesive layer on the front sealing layer, it is possible to compensate for the insufficient gas barrier performance on the light extraction surface side. It is possible to block moisture from the outside and suppress deterioration of the EL element until just before use. According to the second aspect of the invention, since at least the back sealing layer having the gas barrier layer and the sealant layer and the protective layer are in contact with each other, it is possible to suppress the intrusion of water from the end portion of the film, so that it is possible for a long time. Degradation of the EL element can be suppressed, which is preferable as an embodiment of the invention described in claim 1. According to the invention described in claim 3, the deterioration of the EL element can be suppressed by re-adhering the protective layer after using the EL element. According to the invention of claim 4, by laminating the printing layer on the front sealing layer or the back sealing layer and / or the protective layer, deterioration of the EL element can be suppressed for a long time until it is actually used. Further, it is possible to manufacture a light emitting laminate which is excellent in designability, in which deterioration of the EL element can be suppressed by re-adhering even after peeling.
【0054】[0054]
【図1】本発明のEL素子の製造工程の一例を示した説
明図である。FIG. 1 is an explanatory view showing an example of a manufacturing process of an EL element of the present invention.
【図2】本発明の比較例1〜4のEL素子を示す説明図
である。FIG. 2 is an explanatory diagram showing EL devices of Comparative Examples 1 to 4 of the present invention.
1 透光性基材層 2 透明陽極層 3 発光媒体層 4 陰極層 5 背面封止層 6 前面封止層 7 保護層 8 印字部 9 1〜4及び6からなる積層体 10 発光部 11 封止袋 1 Translucent base material layer 2 Transparent anode layer 3 Luminous medium layer 4 cathode layer 5 Back sealing layer 6 Front sealing layer 7 protective layer 8 printing section 9 1 to 4 and 6 laminated body 10 Light emitting part 11 sealed bags
Claims (4)
極層を有するエレクトロルミネッセンス素子において、
透明陽極層側に、少なくともガスバリア層と粘着層とを
有する保護層が剥離可能な状態で積層されていることを
特徴とするエレクトロルミネッセンス素子。1. An electroluminescent device having at least a transparent anode layer, a light emitting medium layer and a cathode layer,
An electroluminescent element, wherein a protective layer having at least a gas barrier layer and an adhesive layer is laminated in a peelable state on the transparent anode layer side.
基材層、透明陽極層、発光媒体層、陰極層、及び少なく
ともガスバリア層とシーラント層を有する背面封止層が
この順に積層されており、かつ背面封止層の全ての端部
が保護層と接していることを特徴とするエレクトロルミ
ネッセンス素子。2. A protective layer, a front surface sealing layer, a translucent base material layer, a transparent anode layer, a light emitting medium layer, a cathode layer, and at least a back surface sealing layer having a gas barrier layer and a sealant layer are laminated in this order. The electroluminescence element is characterized in that all the end portions of the backside sealing layer are in contact with the protective layer.
れたことを特徴とする、請求項1又は2記載のエレクト
ロルミネッセンス素子。3. The electroluminescent device according to claim 1, wherein the protective layer is provided in a resealable state.
なくとも1面に、1層以上の印刷層が積層されているこ
とを特徴とする請求項1,2ないし3のいずれかに記載
のエレクトロルミネッセンス素子。4. The one or more printing layers are laminated on at least one surface of the front sealing layer, the back sealing layer or the protective layer, according to any one of claims 1, 2 or 3. The electroluminescent element described.
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004071134A1 (en) * | 2003-02-04 | 2004-08-19 | Sanyo Electric Co., Ltd. | Organic electroluminescent device and method for manufacturing same |
WO2005034583A1 (en) * | 2003-10-03 | 2005-04-14 | Jsr Corporation | Transparent sealing material for organic el device |
JP2008103254A (en) * | 2006-10-20 | 2008-05-01 | Tokai Rubber Ind Ltd | Organic el device |
JP2010080293A (en) * | 2008-09-26 | 2010-04-08 | Dainippon Printing Co Ltd | Pressure-sensitive adhesive film for sealing organic electroluminescent element |
KR100989137B1 (en) | 2008-08-29 | 2010-10-20 | 삼성모바일디스플레이주식회사 | Donor Substrate For Laser Induced Thermal Imaging, The Fabricating Method Of The Same and The Method Of Fabricating Orgnic Light Emitting Display Device Using the Same |
JP2013062094A (en) * | 2011-09-13 | 2013-04-04 | Konica Minolta Holdings Inc | Organic electroluminescent panel and method for manufacturing the same |
JPWO2011105141A1 (en) * | 2010-02-23 | 2013-06-20 | コニカミノルタ株式会社 | Organic electroluminescence device and method for manufacturing the same |
KR20150061468A (en) * | 2013-11-27 | 2015-06-04 | 주식회사 엘지화학 | Pressure Sensitive Adhesive Sheet and Encapsulation Method of Organic Electronic Device Using the Same |
WO2017043057A1 (en) * | 2015-09-08 | 2017-03-16 | シャープ株式会社 | Organic el display device |
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JP2000164348A (en) * | 1998-11-20 | 2000-06-16 | Toshiba Corp | El panel |
JP2000323273A (en) * | 1999-05-07 | 2000-11-24 | Dainippon Printing Co Ltd | Electroluminescent element |
-
2001
- 2001-07-12 JP JP2001211861A patent/JP4830222B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000164348A (en) * | 1998-11-20 | 2000-06-16 | Toshiba Corp | El panel |
JP2000323273A (en) * | 1999-05-07 | 2000-11-24 | Dainippon Printing Co Ltd | Electroluminescent element |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004071134A1 (en) * | 2003-02-04 | 2004-08-19 | Sanyo Electric Co., Ltd. | Organic electroluminescent device and method for manufacturing same |
JP2004265615A (en) * | 2003-02-04 | 2004-09-24 | Sanyo Electric Co Ltd | Organic electroluminescent device, and manufacturing method of the same |
WO2005034583A1 (en) * | 2003-10-03 | 2005-04-14 | Jsr Corporation | Transparent sealing material for organic el device |
JP2008103254A (en) * | 2006-10-20 | 2008-05-01 | Tokai Rubber Ind Ltd | Organic el device |
KR100989137B1 (en) | 2008-08-29 | 2010-10-20 | 삼성모바일디스플레이주식회사 | Donor Substrate For Laser Induced Thermal Imaging, The Fabricating Method Of The Same and The Method Of Fabricating Orgnic Light Emitting Display Device Using the Same |
JP2010080293A (en) * | 2008-09-26 | 2010-04-08 | Dainippon Printing Co Ltd | Pressure-sensitive adhesive film for sealing organic electroluminescent element |
JPWO2011105141A1 (en) * | 2010-02-23 | 2013-06-20 | コニカミノルタ株式会社 | Organic electroluminescence device and method for manufacturing the same |
JP2013062094A (en) * | 2011-09-13 | 2013-04-04 | Konica Minolta Holdings Inc | Organic electroluminescent panel and method for manufacturing the same |
KR20150061468A (en) * | 2013-11-27 | 2015-06-04 | 주식회사 엘지화학 | Pressure Sensitive Adhesive Sheet and Encapsulation Method of Organic Electronic Device Using the Same |
KR101717418B1 (en) * | 2013-11-27 | 2017-03-17 | 주식회사 엘지화학 | Pressure Sensitive Adhesive Sheet and Encapsulation Method of Organic Electronic Device Using the Same |
WO2017043057A1 (en) * | 2015-09-08 | 2017-03-16 | シャープ株式会社 | Organic el display device |
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