JP2003015296A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003015296A5 JP2003015296A5 JP2001196794A JP2001196794A JP2003015296A5 JP 2003015296 A5 JP2003015296 A5 JP 2003015296A5 JP 2001196794 A JP2001196794 A JP 2001196794A JP 2001196794 A JP2001196794 A JP 2001196794A JP 2003015296 A5 JP2003015296 A5 JP 2003015296A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001196794A JP4262422B2 (ja) | 2001-06-28 | 2001-06-28 | ポジ型フォトレジスト組成物及びそれを用いたパターン形成方法 |
| TW091113909A TW594414B (en) | 2001-06-28 | 2002-06-25 | Positive photoresist composition |
| KR1020020036843A KR100913732B1 (ko) | 2001-06-28 | 2002-06-28 | 포지티브 포토레지스트 조성물 및 이 조성물을 이용한 패턴형성방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001196794A JP4262422B2 (ja) | 2001-06-28 | 2001-06-28 | ポジ型フォトレジスト組成物及びそれを用いたパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003015296A JP2003015296A (ja) | 2003-01-15 |
| JP2003015296A5 true JP2003015296A5 (ja) | 2006-01-19 |
| JP4262422B2 JP4262422B2 (ja) | 2009-05-13 |
Family
ID=19034527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001196794A Expired - Fee Related JP4262422B2 (ja) | 2001-06-28 | 2001-06-28 | ポジ型フォトレジスト組成物及びそれを用いたパターン形成方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4262422B2 (ja) |
| KR (1) | KR100913732B1 (ja) |
| TW (1) | TW594414B (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI366067B (en) | 2003-09-10 | 2012-06-11 | Fujifilm Corp | Photosensitive composition and pattern forming method using the same |
| JP4491309B2 (ja) * | 2004-09-29 | 2010-06-30 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4695996B2 (ja) * | 2006-02-27 | 2011-06-08 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP4288518B2 (ja) * | 2006-07-28 | 2009-07-01 | 信越化学工業株式会社 | ラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法 |
| JP5746818B2 (ja) | 2008-07-09 | 2015-07-08 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法 |
| KR101229312B1 (ko) | 2011-01-03 | 2013-02-04 | 금호석유화학 주식회사 | 술포늄 화합물, 광산발생제 및 이의 제조방법 |
| KR101458946B1 (ko) * | 2012-10-17 | 2014-11-07 | 금호석유화학 주식회사 | 신규 아크릴계 단량체, 중합체 및 이를 포함하는 레지스트 조성물 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69803117T2 (de) * | 1997-05-12 | 2002-10-02 | Fuji Photo Film Co Ltd | Positiv arbeitende Resistzusammensetzung |
| JP3865919B2 (ja) * | 1998-02-03 | 2007-01-10 | 富士フイルムホールディングス株式会社 | ネガ型フォトレジスト組成物 |
| US6280911B1 (en) * | 1998-09-10 | 2001-08-28 | Shipley Company, L.L.C. | Photoresist compositions comprising blends of ionic and non-ionic photoacid generators |
| JP4131062B2 (ja) * | 1998-09-25 | 2008-08-13 | 信越化学工業株式会社 | 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法 |
| JP3961139B2 (ja) * | 1998-12-24 | 2007-08-22 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| US6479211B1 (en) * | 1999-05-26 | 2002-11-12 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| JP3444821B2 (ja) * | 1999-10-06 | 2003-09-08 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| TWI257528B (en) * | 1999-12-16 | 2006-07-01 | Fuji Photo Film Co Ltd | Positive resist composition |
-
2001
- 2001-06-28 JP JP2001196794A patent/JP4262422B2/ja not_active Expired - Fee Related
-
2002
- 2002-06-25 TW TW091113909A patent/TW594414B/zh not_active IP Right Cessation
- 2002-06-28 KR KR1020020036843A patent/KR100913732B1/ko active IP Right Grant