JP2003007999A5 - - Google Patents

Download PDF

Info

Publication number
JP2003007999A5
JP2003007999A5 JP2001193386A JP2001193386A JP2003007999A5 JP 2003007999 A5 JP2003007999 A5 JP 2003007999A5 JP 2001193386 A JP2001193386 A JP 2001193386A JP 2001193386 A JP2001193386 A JP 2001193386A JP 2003007999 A5 JP2003007999 A5 JP 2003007999A5
Authority
JP
Japan
Prior art keywords
compound semiconductor
nitride
iii
semiconductor layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001193386A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003007999A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001193386A priority Critical patent/JP2003007999A/ja
Priority claimed from JP2001193386A external-priority patent/JP2003007999A/ja
Publication of JP2003007999A publication Critical patent/JP2003007999A/ja
Publication of JP2003007999A5 publication Critical patent/JP2003007999A5/ja
Pending legal-status Critical Current

Links

JP2001193386A 2001-06-26 2001-06-26 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法 Pending JP2003007999A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001193386A JP2003007999A (ja) 2001-06-26 2001-06-26 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001193386A JP2003007999A (ja) 2001-06-26 2001-06-26 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2003007999A JP2003007999A (ja) 2003-01-10
JP2003007999A5 true JP2003007999A5 (https=) 2008-04-03

Family

ID=19031686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001193386A Pending JP2003007999A (ja) 2001-06-26 2001-06-26 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JP2003007999A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101161875B1 (ko) 2005-03-21 2012-07-03 엘지전자 주식회사 반도체 레이저 다이오드의 제조 방법
KR101203692B1 (ko) * 2006-02-16 2012-11-21 삼성전자주식회사 펜데오 에피탁시 성장용 기판 및 그 형성 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4255168B2 (ja) * 1998-06-30 2009-04-15 シャープ株式会社 窒化物半導体の製造方法及び発光素子
JP3587081B2 (ja) * 1999-05-10 2004-11-10 豊田合成株式会社 Iii族窒化物半導体の製造方法及びiii族窒化物半導体発光素子
JP3678061B2 (ja) * 1999-05-21 2005-08-03 日亜化学工業株式会社 窒化物半導体の成長方法及び窒化物半導体素子

Similar Documents

Publication Publication Date Title
US6727523B2 (en) Method of manufacturing crystal of iii-v compounds of the nitride system, crystal substrate of iii-v compounds of the nitride system, crystal film of iii-v compounds of the nitride system, and method of manufacturing device
TWI381602B (zh) Semiconductor laser element and manufacturing method thereof
CN102479900B (zh) 第iii族氮化物半导体发光器件
CN103354956B (zh) 具有光子晶体结构的发光二极管及其制造方法
JP3620269B2 (ja) GaN系半導体素子の製造方法
US20120112239A1 (en) Nitride semiconductor light-emitting device and method for fabricating thereof
JP2008536294A5 (https=)
EP0955708A3 (en) Blue vertical cavity surface emitting laser
JP4471726B2 (ja) 単結晶サファイア基板の製造方法
KR20000035610A (ko) 반도체 박막, 반도체 소자와 반도체 장치, 및 이들의 제조방법
JP2003124572A5 (https=)
JP2003124573A5 (https=)
TWI582825B (zh) 像素化及圖案化模板之高品質元件生長技術
KR20120092326A (ko) 광 결정 구조를 갖는 비극성 발광 다이오드 및 그것을 제조하는 방법
US20110175126A1 (en) Light-emitting diode structure
KR101643757B1 (ko) 발광소자 및 그 제조방법
CN105917444A (zh) 半导体器件及制造方法
EP1091422A2 (en) Semiconductor device, semiconductor substrate, and manufacture method
TW201937753A (zh) 氮化物半導體發光元件
JP2006191071A (ja) 半導体発光素子及びその製造方法
JP3756831B2 (ja) GaN系半導体発光素子
JP4979674B2 (ja) 窒化物単結晶の成長方法及び窒化物半導体発光素子の製造方法
EP0997996A2 (en) Semiconductor device and method for fabricating the same
KR101638975B1 (ko) 중공 부재 패턴을 구비한 질화물 반도체 기판 및 제조방법
JP2003081697A5 (https=)