JP2002524874A5 - - Google Patents

Download PDF

Info

Publication number
JP2002524874A5
JP2002524874A5 JP2000569433A JP2000569433A JP2002524874A5 JP 2002524874 A5 JP2002524874 A5 JP 2002524874A5 JP 2000569433 A JP2000569433 A JP 2000569433A JP 2000569433 A JP2000569433 A JP 2000569433A JP 2002524874 A5 JP2002524874 A5 JP 2002524874A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000569433A
Other languages
Japanese (ja)
Other versions
JP2002524874A (ja
Filing date
Publication date
Priority claimed from GBGB9819338.6A external-priority patent/GB9819338D0/en
Application filed filed Critical
Publication of JP2002524874A publication Critical patent/JP2002524874A/ja
Publication of JP2002524874A5 publication Critical patent/JP2002524874A5/ja
Pending legal-status Critical Current

Links

JP2000569433A 1998-09-04 1999-08-23 薄い半導体膜の二重パルスレーザー結晶化 Pending JP2002524874A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9819338.6 1998-09-04
GBGB9819338.6A GB9819338D0 (en) 1998-09-04 1998-09-04 Laser crystallisation of thin films
PCT/EP1999/006161 WO2000014784A1 (en) 1998-09-04 1999-08-23 Double-pulse laser crystallisation of thin semiconductor films

Publications (2)

Publication Number Publication Date
JP2002524874A JP2002524874A (ja) 2002-08-06
JP2002524874A5 true JP2002524874A5 (enExample) 2006-10-12

Family

ID=10838370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000569433A Pending JP2002524874A (ja) 1998-09-04 1999-08-23 薄い半導体膜の二重パルスレーザー結晶化

Country Status (5)

Country Link
US (1) US6169014B1 (enExample)
EP (1) EP1048061A1 (enExample)
JP (1) JP2002524874A (enExample)
GB (1) GB9819338D0 (enExample)
WO (1) WO2000014784A1 (enExample)

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6555449B1 (en) * 1996-05-28 2003-04-29 Trustees Of Columbia University In The City Of New York Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication
US6281471B1 (en) 1999-12-28 2001-08-28 Gsi Lumonics, Inc. Energy-efficient, laser-based method and system for processing target material
US7838794B2 (en) * 1999-12-28 2010-11-23 Gsi Group Corporation Laser-based method and system for removing one or more target link structures
US7723642B2 (en) * 1999-12-28 2010-05-25 Gsi Group Corporation Laser-based system for memory link processing with picosecond lasers
US8217304B2 (en) 2001-03-29 2012-07-10 Gsi Group Corporation Methods and systems for thermal-based laser processing a multi-material device
US20040134894A1 (en) * 1999-12-28 2004-07-15 Bo Gu Laser-based system for memory link processing with picosecond lasers
KR100671212B1 (ko) * 1999-12-31 2007-01-18 엘지.필립스 엘시디 주식회사 폴리실리콘 형성방법
US7671295B2 (en) * 2000-01-10 2010-03-02 Electro Scientific Industries, Inc. Processing a memory link with a set of at least two laser pulses
US20060141681A1 (en) * 2000-01-10 2006-06-29 Yunlong Sun Processing a memory link with a set of at least two laser pulses
US20030222324A1 (en) * 2000-01-10 2003-12-04 Yunlong Sun Laser systems for passivation or link processing with a set of laser pulses
US6368945B1 (en) * 2000-03-16 2002-04-09 The Trustees Of Columbia University In The City Of New York Method and system for providing a continuous motion sequential lateral solidification
US6830993B1 (en) * 2000-03-21 2004-12-14 The Trustees Of Columbia University In The City Of New York Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method
AU2000240180A1 (en) * 2000-03-21 2001-10-03 The Trustees Of Columbia University In The City Of New York Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method
MXPA02005590A (es) * 2000-10-10 2002-09-30 Univ Columbia Metodo y aparato para procesar capas de metal delgadas.
TW546684B (en) * 2000-11-27 2003-08-11 Univ Columbia Process and mask projection system for laser crystallization processing of semiconductor film regions on a substrate
CN1443364A (zh) * 2001-04-19 2003-09-17 纽约市哥伦比亚大学托管会 用于提供单扫描、连续移动连续横向凝固的方法和系统
JP2005525689A (ja) 2001-08-27 2005-08-25 ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク ミクロ構造の非整列による多結晶薄膜トランジスタの均一性の改善
JP3977038B2 (ja) 2001-08-27 2007-09-19 株式会社半導体エネルギー研究所 レーザ照射装置およびレーザ照射方法
JP4006994B2 (ja) * 2001-12-18 2007-11-14 株式会社リコー 立体構造体の加工方法、立体形状品の製造方法及び立体構造体
US6951995B2 (en) 2002-03-27 2005-10-04 Gsi Lumonics Corp. Method and system for high-speed, precise micromachining an array of devices
AU2003220611A1 (en) 2002-04-01 2003-10-20 The Trustees Of Columbia University In The City Of New York Method and system for providing a thin film
TWI378307B (en) * 2002-08-19 2012-12-01 Univ Columbia Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions
JP5030382B2 (ja) 2002-08-19 2012-09-19 ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク 基板上のフィルム領域を処理して、こうした領域内及びその端部領域をほぼ均一にするレーザ結晶化プロセス及びシステム
AU2003258288A1 (en) 2002-08-19 2004-03-03 The Trustees Of Columbia University In The City Of New York Process and system for processing a thin film sample and thin film structure
AU2003258289A1 (en) 2002-08-19 2004-03-03 The Trustees Of Columbia University In The City Of New York A single-shot semiconductor processing system and method having various irradiation patterns
JP5164378B2 (ja) * 2003-02-19 2013-03-21 ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク 逐次的横方向結晶化技術を用いて結晶化させた複数の半導体薄膜フィルムを処理するシステム及びプロセス
CN100593292C (zh) * 2003-08-19 2010-03-03 电子科学工业公司 产生定制的激光脉冲组
US7318866B2 (en) 2003-09-16 2008-01-15 The Trustees Of Columbia University In The City Of New York Systems and methods for inducing crystallization of thin films using multiple optical paths
US7364952B2 (en) 2003-09-16 2008-04-29 The Trustees Of Columbia University In The City Of New York Systems and methods for processing thin films
WO2005029551A2 (en) 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions
WO2005029549A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for facilitating bi-directional growth
WO2005029548A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York System and process for providing multiple beam sequential lateral solidification
US7164152B2 (en) 2003-09-16 2007-01-16 The Trustees Of Columbia University In The City Of New York Laser-irradiated thin films having variable thickness
WO2005029546A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts, and a mask for facilitating such artifact reduction/elimination
WO2005029547A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Enhancing the width of polycrystalline grains with mask
WO2005029550A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for producing crystalline thin films with a uniform crystalline orientation
WO2005034193A2 (en) 2003-09-19 2005-04-14 The Trustees Of Columbia University In The City Ofnew York Single scan irradiation for crystallization of thin films
US7139294B2 (en) * 2004-05-14 2006-11-21 Electro Scientific Industries, Inc. Multi-output harmonic laser and methods employing same
US7645337B2 (en) * 2004-11-18 2010-01-12 The Trustees Of Columbia University In The City Of New York Systems and methods for creating crystallographic-orientation controlled poly-silicon films
US20060128073A1 (en) * 2004-12-09 2006-06-15 Yunlong Sun Multiple-wavelength laser micromachining of semiconductor devices
US7289549B2 (en) * 2004-12-09 2007-10-30 Electro Scientific Industries, Inc. Lasers for synchronized pulse shape tailoring
US20060191884A1 (en) * 2005-01-21 2006-08-31 Johnson Shepard D High-speed, precise, laser-based material processing method and system
US8221544B2 (en) 2005-04-06 2012-07-17 The Trustees Of Columbia University In The City Of New York Line scan sequential lateral solidification of thin films
EP1716964B1 (en) * 2005-04-28 2009-01-21 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device and laser irradiation apparatus
JP2009505432A (ja) * 2005-08-16 2009-02-05 ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク 薄膜のハイ・スループット結晶化
WO2007067541A2 (en) * 2005-12-05 2007-06-14 The Trustees Of Columbia University In The City Of New York Systems and methods for processing a film, and thin films
US8846551B2 (en) 2005-12-21 2014-09-30 University Of Virginia Patent Foundation Systems and methods of laser texturing of material surfaces and their applications
WO2008127807A1 (en) * 2007-03-09 2008-10-23 University Of Virginia Patent Foundation Systems and methods of laser texturing of material surfaces and their applications
US8753990B2 (en) * 2005-12-21 2014-06-17 University Of Virginia Patent Foundation Systems and methods of laser texturing and crystallization of material surfaces
KR101191404B1 (ko) 2006-01-12 2012-10-16 삼성디스플레이 주식회사 실리콘 결정화용 마스크와 이를 이용한 실리콘 결정화 방법및 표시 장치
US7605343B2 (en) * 2006-05-24 2009-10-20 Electro Scientific Industries, Inc. Micromachining with short-pulsed, solid-state UV laser
US8084706B2 (en) * 2006-07-20 2011-12-27 Gsi Group Corporation System and method for laser processing at non-constant velocities
DE102007025942A1 (de) * 2007-06-04 2008-12-11 Coherent Gmbh Verfahren zur selektiven thermischen Oberflächenbehandlung eines Flächensubstrates
TW200942935A (en) 2007-09-21 2009-10-16 Univ Columbia Collections of laterally crystallized semiconductor islands for use in thin film transistors and systems and methods for making same
WO2009042784A1 (en) 2007-09-25 2009-04-02 The Trustees Of Columbia University In The City Of New York Methods of producing high uniformity in thin film transistor devices fabricated on laterally crystallized thin films
WO2009067688A1 (en) 2007-11-21 2009-05-28 The Trustees Of Columbia University In The City Of New York Systems and methods for preparing epitaxially textured polycrystalline films
EP2212913A4 (en) * 2007-11-21 2013-10-30 Univ Columbia SYSTEMS AND METHOD FOR PRODUCING EPITACTIC STRUCTURED THICK FILMS
US8012861B2 (en) 2007-11-21 2011-09-06 The Trustees Of Columbia University In The City Of New York Systems and methods for preparing epitaxially textured polycrystalline films
KR101413370B1 (ko) * 2008-02-29 2014-06-30 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 결정질 막 제조 방법, 태양전지 형성 방법 및 이 방법에 의해 제조된 결정질 막 및 태양 전지
TWI452632B (zh) * 2008-02-29 2014-09-11 Univ Columbia 製造均勻一致結晶矽膜的微影方法
WO2009111340A2 (en) * 2008-02-29 2009-09-11 The Trustees Of Columbia University In The City Of New York Flash lamp annealing crystallization for large area thin films
KR20110094022A (ko) 2008-11-14 2011-08-19 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 박막 결정화를 위한 시스템 및 방법
US9087696B2 (en) 2009-11-03 2015-07-21 The Trustees Of Columbia University In The City Of New York Systems and methods for non-periodic pulse partial melt film processing
US8440581B2 (en) 2009-11-24 2013-05-14 The Trustees Of Columbia University In The City Of New York Systems and methods for non-periodic pulse sequential lateral solidification
US9646831B2 (en) 2009-11-03 2017-05-09 The Trustees Of Columbia University In The City Of New York Advanced excimer laser annealing for thin films
EP2504059A4 (en) * 2009-11-24 2014-01-22 Univ Columbia SYSTEMS AND METHOD FOR SEQUENTIAL SIDE FIXING WITH NONPERIODIC IMPULSES
TWI459444B (zh) 2009-11-30 2014-11-01 Applied Materials Inc 在半導體應用上的結晶處理
WO2011082065A2 (en) * 2009-12-30 2011-07-07 Gsi Group Corporation Link processing with high speed beam deflection
US10131086B2 (en) 2011-06-30 2018-11-20 University Of Virginia Patent Foundation Micro-structure and nano-structure replication methods and article of manufacture
TWI590309B (zh) 2011-09-01 2017-07-01 應用材料股份有限公司 結晶化的方法
TWI577488B (zh) * 2014-11-17 2017-04-11 財團法人工業技術研究院 表面加工方法
KR102440115B1 (ko) 2015-11-13 2022-09-05 삼성디스플레이 주식회사 엑시머 레이저 어닐링 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3585088A (en) * 1968-10-18 1971-06-15 Ibm Methods of producing single crystals on supporting substrates
US3600237A (en) * 1969-12-17 1971-08-17 Us Navy Controlled nucleation in zone recrystallized insb films
US4309225A (en) * 1979-09-13 1982-01-05 Massachusetts Institute Of Technology Method of crystallizing amorphous material with a moving energy beam
US4330363A (en) * 1980-08-28 1982-05-18 Xerox Corporation Thermal gradient control for enhanced laser induced crystallization of predefined semiconductor areas
US4400715A (en) * 1980-11-19 1983-08-23 International Business Machines Corporation Thin film semiconductor device and method for manufacture
JPS5821319A (ja) * 1981-07-30 1983-02-08 Fujitsu Ltd レ−ザアニ−ル方法
US4604791A (en) * 1982-09-24 1986-08-12 Todorof William J Method for producing multi-layer, thin-film, flexible silicon alloy photovoltaic cells
WO1995026517A1 (en) * 1992-11-10 1995-10-05 United States Department Of Energy Laser beam pulse formatting method
JP3204986B2 (ja) * 1996-05-28 2001-09-04 ザ トラスティース オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク 基板上の半導体膜領域の結晶化処理及びこの方法により製造されたデバイス
US6014944A (en) * 1997-09-19 2000-01-18 The United States Of America As Represented By The Secretary Of The Navy Apparatus for improving crystalline thin films with a contoured beam pulsed laser

Similar Documents

Publication Publication Date Title
BE2018C020I2 (enExample)
JP2002518882A5 (enExample)
BRPI0017527B8 (enExample)
JP2002528874A5 (enExample)
BRPI0001672A2 (enExample)
JP2002524874A5 (enExample)
BRPI0001542A2 (enExample)
JP2002529807A5 (enExample)
JP2002532197A5 (enExample)
JP2002507837A5 (enExample)
JP2002523318A5 (enExample)
BRPI0012675B8 (enExample)
BRPI0017522A2 (enExample)
JP2002506946A5 (enExample)
JP2002520906A5 (enExample)
BRMU7902607U2 (enExample)
BRPI0303609A (enExample)
BRPI9917761A2 (enExample)
IN187098B (enExample)
ECSDI990584S (enExample)
IN191498B (enExample)
IN188749B (enExample)
BY5807C1 (enExample)
CN3099012S (enExample)
CN3098431S (enExample)