JP2002520659A5 - - Google Patents
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- Publication number
- JP2002520659A5 JP2002520659A5 JP2000559485A JP2000559485A JP2002520659A5 JP 2002520659 A5 JP2002520659 A5 JP 2002520659A5 JP 2000559485 A JP2000559485 A JP 2000559485A JP 2000559485 A JP2000559485 A JP 2000559485A JP 2002520659 A5 JP2002520659 A5 JP 2002520659A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/113,892 US6368421B1 (en) | 1998-07-10 | 1998-07-10 | Composition for stripping photoresist and organic materials from substrate surfaces |
| US09/113,892 | 1998-07-10 | ||
| PCT/EP1999/004498 WO2000003306A1 (en) | 1998-07-10 | 1999-06-30 | Composition for stripping photoresist and organic materials from substrate surfaces |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002520659A JP2002520659A (ja) | 2002-07-09 |
| JP2002520659A5 true JP2002520659A5 (US20050276830A1-20051215-C00018.png) | 2006-06-29 |
Family
ID=22352158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000559485A Pending JP2002520659A (ja) | 1998-07-10 | 1999-06-30 | フォトレジストおよび有機物質を基体表面から取り除くための組成物 |
Country Status (9)
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090127253A1 (en) * | 1997-06-06 | 2009-05-21 | Philip Stark | Temperature-controlled induction heating of polymeric materials |
| US6939477B2 (en) | 1997-06-06 | 2005-09-06 | Ashland, Inc. | Temperature-controlled induction heating of polymeric materials |
| US7521405B2 (en) | 2002-08-12 | 2009-04-21 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| US7129199B2 (en) | 2002-08-12 | 2006-10-31 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| US7348300B2 (en) | 1999-05-04 | 2008-03-25 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture |
| US6319835B1 (en) * | 2000-02-25 | 2001-11-20 | Shipley Company, L.L.C. | Stripping method |
| KR100360985B1 (ko) * | 2000-04-26 | 2002-11-18 | 주식회사 동진쎄미켐 | 레지스트 스트리퍼 조성물 |
| CA2446140C (en) * | 2000-05-02 | 2008-11-18 | Tribond, Inc. | Temperature-controlled induction heating of polymeric materials |
| KR20020072595A (ko) * | 2001-03-12 | 2002-09-18 | (주)에스티디 | 동판의 산화막 형성방법 및 이에 의해 제조된 동판 |
| KR100429455B1 (ko) * | 2001-06-11 | 2004-05-04 | 동우 화인켐 주식회사 | 포토레지스트의 에지 비드를 제거하는 세정용액 및 이를이용한 세정방법 |
| KR100772810B1 (ko) * | 2001-12-18 | 2007-11-01 | 주식회사 하이닉스반도체 | 포토레지스트 세정액 조성물 |
| US7563753B2 (en) | 2001-12-12 | 2009-07-21 | Hynix Semiconductor Inc. | Cleaning solution for removing photoresist |
| KR100772809B1 (ko) * | 2001-12-18 | 2007-11-01 | 주식회사 하이닉스반도체 | 포토레지스트 세정액 조성물 |
| US20030196685A1 (en) * | 2001-12-18 | 2003-10-23 | Shipley Company, L.L.C. | Cleaning composition and method |
| JP2005514661A (ja) * | 2002-01-11 | 2005-05-19 | クラリアント インターナショナル リミテッド | ポジ型またはネガ型フォトレジスト用の洗浄剤組成物 |
| JP4045180B2 (ja) * | 2002-12-03 | 2008-02-13 | Ａｚエレクトロニックマテリアルズ株式会社 | リソグラフィー用リンス液およびそれを用いたレジストパターン形成方法 |
| US20040259746A1 (en) * | 2003-06-20 | 2004-12-23 | Warren Jonathan N. | Concentrate composition and process for removing coatings from surfaces such as paint application equipment |
| US7018939B2 (en) * | 2003-07-11 | 2006-03-28 | Motorola, Inc. | Micellar technology for post-etch residues |
| JP5162131B2 (ja) | 2003-10-28 | 2013-03-13 | サッチェム， インコーポレイテッド | 洗浄溶液およびエッチング液、ならびにそれらを用いる方法 |
| US7867696B2 (en) * | 2004-04-15 | 2011-01-11 | The Boeing Company | Method and apparatus for monitoring saturation levels of solvents used during rapid prototyping processes |
| KR20050101458A (ko) * | 2004-04-19 | 2005-10-24 | 주식회사 하이닉스반도체 | 포토레지스트 세정액 조성물 및 이를 이용한 패턴 형성방법 |
| TWI253888B (en) * | 2004-12-09 | 2006-04-21 | Advanced Semiconductor Eng | Method of packaging flip chip and method of forming pre-solders on substrate thereof |
| KR100690347B1 (ko) * | 2005-04-09 | 2007-03-09 | 주식회사 엘지화학 | 박리액 조성물, 이를 이용한 박리 방법 및 그 박리 장치 |
| US20070099810A1 (en) * | 2005-10-27 | 2007-05-03 | Hiroshi Matsunaga | Cleaning liquid and cleaning method |
| JP5000260B2 (ja) * | 2006-10-19 | 2012-08-15 | ＡｚエレクトロニックマテリアルズＩｐ株式会社 | 微細化されたパターンの形成方法およびそれに用いるレジスト基板処理液 |
| JP2009014938A (ja) * | 2007-07-03 | 2009-01-22 | Toagosei Co Ltd | レジスト剥離剤組成物 |
| JP5306755B2 (ja) * | 2008-09-16 | 2013-10-02 | ＡｚエレクトロニックマテリアルズＩｐ株式会社 | 基板処理液およびそれを用いたレジスト基板処理方法 |
| KR101579846B1 (ko) * | 2008-12-24 | 2015-12-24 | 주식회사 이엔에프테크놀로지 | 포토레지스트 패턴 제거용 조성물 및 이를 이용한 금속 패턴의 형성 방법 |
| WO2010098899A1 (en) | 2009-02-25 | 2010-09-02 | Mallinckrodt Baker, Inc. | Multipurpose acidic, organic solvent based microelectronic cleaning composition |
| US8444768B2 (en) * | 2009-03-27 | 2013-05-21 | Eastman Chemical Company | Compositions and methods for removing organic substances |
| US8614053B2 (en) * | 2009-03-27 | 2013-12-24 | Eastman Chemical Company | Processess and compositions for removing substances from substrates |
| MY185453A (en) * | 2009-07-30 | 2021-05-19 | Basf Se | Post ion implant stripper for advanced semiconductor application |
| WO2012161790A1 (en) * | 2011-02-24 | 2012-11-29 | John Moore | Concentrated chemical composition and method for removing photoresist during microelectric fabrication |
| CN102436153B (zh) * | 2011-10-28 | 2013-06-19 | 绍兴文理学院 | 印花网版感光胶剥离剂 |
| CN102427039A (zh) * | 2011-11-02 | 2012-04-25 | 上海宏力半导体制造有限公司 | 光阻去除方法 |
| ES2564426B2 (es) | 2014-09-19 | 2016-09-12 | Universidad De Oviedo | Marcador de patologías oculares |
| US10073351B2 (en) * | 2014-12-23 | 2018-09-11 | Versum Materials Us, Llc | Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation |
| TWI692679B (zh) * | 2017-12-22 | 2020-05-01 | 美商慧盛材料美國責任有限公司 | 光阻剝除劑 |
| KR102391389B1 (ko) * | 2021-09-15 | 2022-04-28 | (주)네프코 | 세정 용이성 및 내마모성이 우수한 친환경 포토마스크 및 이의 제조방법 |
| CN113832471B (zh) * | 2021-09-26 | 2024-03-08 | 苏州至绒新能源科技有限公司 | 一种用于快速剥离聚酰亚胺薄膜的清洗剂及其应用 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1487737A (en) * | 1973-11-05 | 1977-10-05 | Nat Res Dev | Paint removers |
| US4395479A (en) | 1981-09-23 | 1983-07-26 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4395348A (en) * | 1981-11-23 | 1983-07-26 | Ekc Technology, Inc. | Photoresist stripping composition and method |
| US4403029A (en) | 1982-09-02 | 1983-09-06 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4491530A (en) | 1983-05-20 | 1985-01-01 | Allied Corporation | Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper |
| DE3580827D1 (de) | 1984-10-09 | 1991-01-17 | Hoechst Japan K K | Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen. |
| US4770713A (en) | 1986-12-10 | 1988-09-13 | Advanced Chemical Technologies, Inc. | Stripping compositions containing an alkylamide and an alkanolamine and use thereof |
| JPS63163457A (ja) * | 1986-12-26 | 1988-07-06 | Asahi Chem Ind Co Ltd | フオトレジスト用剥離剤組成物 |
| USH366H (en) * | 1987-03-18 | 1987-11-03 | The United States Of America As Represented By The Secretary Of The Army | Microemulsions containing sulfolanes |
| CH670832A5 (en) | 1987-03-19 | 1989-07-14 | Rico S A Lausanne | Paint and varnish stripping compsn. - comprising chloro-hydrocarbon free resin solubiliser, swelling agent, solvent for surfactant, surfactant, thickener and dissolving assistant |
| US5102573A (en) * | 1987-04-10 | 1992-04-07 | Colgate Palmolive Co. | Detergent composition |
| JP2553872B2 (ja) | 1987-07-21 | 1996-11-13 | 東京応化工業株式会社 | ホトレジスト用剥離液 |
| US4824763A (en) | 1987-07-30 | 1989-04-25 | Ekc Technology, Inc. | Triamine positive photoresist stripping composition and prebaking process |
| US5185235A (en) | 1987-09-09 | 1993-02-09 | Tokyo Ohka Kogyo Co., Ltd. | Remover solution for photoresist |
| JP2591626B2 (ja) | 1987-09-16 | 1997-03-19 | 東京応化工業株式会社 | レジスト用剥離液 |
| US4853315A (en) | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
| US4781804A (en) * | 1988-03-02 | 1988-11-01 | Delco Electronics Corporation | Electrolytic organic mold flash removal |
| US5098594A (en) * | 1988-05-20 | 1992-03-24 | The Boeing Company | Carbonate/diester based solvent |
| JP2571136B2 (ja) | 1989-11-17 | 1997-01-16 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
| US5279771A (en) | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
| CA2062027C (en) | 1991-03-04 | 1998-05-19 | William Aldrich | Liquid control system for diagnostic cartridges used in analytical instruments |
| GB9118042D0 (en) | 1991-08-21 | 1991-10-09 | Kodak Ltd | Silver image bleaching solution and process |
| US5308745A (en) | 1992-11-06 | 1994-05-03 | J. T. Baker Inc. | Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins |
| US5612303B1 (en) * | 1993-06-15 | 2000-07-18 | Nitto Chemical Industry Co Ltd | Solvent composition |
| JP3233379B2 (ja) | 1993-08-26 | 2001-11-26 | 東京応化工業株式会社 | レジスト用剥離液組成物 |
| US5419779A (en) | 1993-12-02 | 1995-05-30 | Ashland Inc. | Stripping with aqueous composition containing hydroxylamine and an alkanolamine |
| JPH07199455A (ja) | 1993-12-28 | 1995-08-04 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物 |
| US5545353A (en) | 1995-05-08 | 1996-08-13 | Ocg Microelectronic Materials, Inc. | Non-corrosive photoresist stripper composition |
| US5597678A (en) | 1994-04-18 | 1997-01-28 | Ocg Microelectronic Materials, Inc. | Non-corrosive photoresist stripper composition |
| US5554312A (en) | 1995-01-13 | 1996-09-10 | Ashland | Photoresist stripping composition |
| US5563119A (en) | 1995-01-26 | 1996-10-08 | Ashland Inc. | Stripping compositions containing alkanolamine compounds |
| US5541033A (en) | 1995-02-01 | 1996-07-30 | Ocg Microelectronic Materials, Inc. | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
| US5733948A (en) * | 1995-09-06 | 1998-03-31 | Mac Dermid, Imaging Technology, Inc. | Tack-free photopolymer printing plate |
| JP2802990B2 (ja) * | 1995-12-19 | 1998-09-24 | 株式会社ハクリバー | 清浄剤 |
-
1998
- 1998-07-10 US US09/113,892 patent/US6368421B1/en not_active Expired - Lifetime
-
1999
- 1999-06-21 TW TW088110333A patent/TW544551B/zh not_active IP Right Cessation
- 1999-06-30 CN CNB998084689A patent/CN1316317C/zh not_active Expired - Lifetime
- 1999-06-30 DE DE69934229T patent/DE69934229T2/de not_active Expired - Lifetime
- 1999-06-30 KR KR1020017000338A patent/KR100602463B1/ko not_active IP Right Cessation
- 1999-06-30 JP JP2000559485A patent/JP2002520659A/ja active Pending
- 1999-06-30 EP EP99931215A patent/EP1097405B1/en not_active Expired - Lifetime
- 1999-06-30 WO PCT/EP1999/004498 patent/WO2000003306A1/en active IP Right Grant
- 1999-07-09 MY MYPI99002913A patent/MY117049A/en unknown
