JP2002516590A - 流体キャリヤー塗布プロセスの塗膜パターンの調整 - Google Patents
流体キャリヤー塗布プロセスの塗膜パターンの調整Info
- Publication number
- JP2002516590A JP2002516590A JP54274598A JP54274598A JP2002516590A JP 2002516590 A JP2002516590 A JP 2002516590A JP 54274598 A JP54274598 A JP 54274598A JP 54274598 A JP54274598 A JP 54274598A JP 2002516590 A JP2002516590 A JP 2002516590A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- pattern
- layer
- functional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/061—Special surface effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.(a)キャリヤー流体層と機能流体層とを含む複合材料を分配する工程と 、 (b)該複合材料と基材とを接触させる工程と、 (c)該複合材料を該基材に移動させる工程と、を含むパターン形成塗膜 を作製する方法において、該キャリヤー流体層、該機能流体層、及び該基材の間 の界面の相互作用が、該基材上の該機能層のパターン形成塗膜を生じさせる方法 。 2.(d)前記キャリヤー流体を前記基材から除去する工程を更に含む、請求項 1に記載の方法。 3.前記分配工程(a)が、浸漬塗布、浴塗布、キャリヤー流体塗布、多層カー テン塗布、多層押出ダイ塗布、ロール塗布、吹付け塗布、滴下塗布からなる群か ら選択される請求項1に記載の方法。 4.前記除去工程(d)が、機械的掻き取り、重力、求心性除去、吹き込み、吸 込み、キャリヤーの固化と掻き取り、吸収材料中への吸収、キャリヤーのゲル化 と掻き取り、塗料のゲル化と掻き取り、キャリヤー流体の吸収、及び蒸発からな る群から選択される請求項2に記載の方法。 5.前記キャリヤー流体層が空気ではない請求項1に記載の方法。 6.前記機能流体層が、剥離材料、接着剤、プライマー、及び低粘着裏糊材料 からなる群から選択される請求項1に記載の方法。 7.(e)前記基材上の前記機能流体層を後処理する工程を更に含む請求項2に 記載の方法。 8.前記後処理が、工程(c)ですでに形成されたパターンを保持するための乾 燥、架橋、前記パターン形成塗膜の前記基材からの分離、及びそれらの組合せか らなる群から選択される請求項7に記載 の方法。 9.前記基材が、不透明、半透明、及び透明な基材、低表面エネルギー及び高 表面エネルギー基材、テクスチャーされ、パターン形成され、粗い及び平滑な基 材、並びにそれらの組合せからなる群から選択される請求項1〜8の何れか1項 に記載の方法。 10.前記パターンが、前記移動工程(c)の間の、基材の基部まで全体にわた る厚さ、空間分解能及び材料の組成物の不均質、並びにそれらの組合せからなる 群から選択される請求項1〜9の何れか1項に記載の方法。 11.前記パターンの変化が、ランダム、対称、周期性、漸変、不規則、円形 、角のある形、角のない形、及びそれらの組合せからなる群から選択される請求 項10に記載の方法。 12.前記移動工程(c)が、艷消仕上、光学透過率、粗さ、多孔率、画像品質 、制御剥離、部分的塗布、及びそれらの組合せからなる群から選択される特徴を 有するパターンを生じる請求項1〜11の何れか1項に記載の方法。 13.仮エレクトログラフ受像体、剥離ライナー、低粘着裏糊材料、分化剥離 層、微孔性膜、粘着テープ、高拡散勾配機能層、フィルター、または多孔性基材 の表面改質剤を含む請求項1〜12の何れか1項に記載の方法に従って作製され た、基材上のパターン形成塗膜を含む物品。 14.前記エレクトログラフ受像体が、電子写真受像体を含む請求項13に記 載の物品。 15.前記エレクトログラフ受像体が、静電受像体を含む請求項14に記載の 物品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/826,571 US5928726A (en) | 1997-04-03 | 1997-04-03 | Modulation of coating patterns in fluid carrier coating processes |
US08/826,571 | 1997-04-04 | ||
PCT/US1997/023813 WO1998045052A1 (en) | 1997-04-03 | 1997-12-23 | Modulation of coating patterns in fluid carrier coating processes |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002516590A true JP2002516590A (ja) | 2002-06-04 |
JP2002516590A5 JP2002516590A5 (ja) | 2005-07-14 |
Family
ID=25246927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54274598A Ceased JP2002516590A (ja) | 1997-04-03 | 1997-12-23 | 流体キャリヤー塗布プロセスの塗膜パターンの調整 |
Country Status (10)
Country | Link |
---|---|
US (1) | US5928726A (ja) |
EP (1) | EP0971796A1 (ja) |
JP (1) | JP2002516590A (ja) |
KR (1) | KR20010005918A (ja) |
CN (1) | CN1082841C (ja) |
AU (1) | AU5717598A (ja) |
BR (1) | BR9714565A (ja) |
TW (1) | TW443966B (ja) |
WO (1) | WO1998045052A1 (ja) |
ZA (1) | ZA982769B (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005037017A (ja) * | 2003-07-17 | 2005-02-10 | Dainippon Printing Co Ltd | 乾燥方法 |
JP2015511877A (ja) * | 2012-02-10 | 2015-04-23 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 液体輸送装置上での粒子フィルム構造形成を含む基材への粒子堆積方法 |
JP2015512769A (ja) * | 2012-02-10 | 2015-04-30 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 液体輸送装置を用いて基材上に粒子フィルムを配置し構造形成する方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6824828B2 (en) * | 1995-06-07 | 2004-11-30 | Avery Dennison Corporation | Method for forming multilayer release liners |
JP2002544293A (ja) * | 1998-11-03 | 2002-12-24 | スリーエム イノベイティブ プロパティズ カンパニー | 充填剤入りのlabパターン被覆フィルム |
US6342324B1 (en) | 2000-02-16 | 2002-01-29 | Imation Corp. | Release layers and compositions for forming the same |
CN100336607C (zh) * | 2000-03-22 | 2007-09-12 | 艾弗里丹尼逊公司 | 形成多层脱模衬垫的方法及用此方法形成的衬垫 |
US6790393B1 (en) | 2000-03-23 | 2004-09-14 | Patrick O. Kraker | Solid surface material with a simulated burled wood effect and method |
US6491970B2 (en) * | 2000-07-27 | 2002-12-10 | Imation Corp. | Method of forming a magnetic recording media |
WO2003067231A1 (en) * | 2002-02-07 | 2003-08-14 | The Regents Of The University Of California | Optically encoded particles |
US20030215581A1 (en) * | 2002-05-20 | 2003-11-20 | Eastman Kodak Company | Polycarbonate films prepared by coating methods |
US7163549B2 (en) * | 2003-02-11 | 2007-01-16 | Boston Scientific Scimed Inc. | Filter membrane manufacturing method |
US20040241395A1 (en) * | 2003-05-29 | 2004-12-02 | 3M Innovative Properties Company | Method of modifying a surface of a substrate and articles therefrom |
US20040241323A1 (en) * | 2003-05-29 | 2004-12-02 | 3M Innovative Properties Company | Method for applying adhesive to a substrate |
US20040241396A1 (en) * | 2003-05-29 | 2004-12-02 | 3M Innovative Properties Company | Method of modifying a surface of a substrate and articles therefrom |
US6969166B2 (en) | 2003-05-29 | 2005-11-29 | 3M Innovative Properties Company | Method for modifying the surface of a substrate |
EP1713595A2 (en) * | 2003-12-22 | 2006-10-25 | The Regents of The University of California | Optically encoded particles, system and high-throughput screening |
EP1702414A4 (en) * | 2003-12-22 | 2008-04-23 | Univ California Office Of The | OPTICALLY CODED PARTICLES WITH SPECTRA OF GRAY LEVELS |
DE102004010586A1 (de) * | 2004-03-02 | 2005-09-29 | Ab Skf | Dichtungsanordnung und Verfahren zum Herstellen der Dichtungsanordnung |
US20070108465A1 (en) * | 2005-03-10 | 2007-05-17 | The Regents Of The University Of California | Porous microstructure multi layer spectroscopy and biosensing |
US20070237925A1 (en) * | 2006-04-07 | 2007-10-11 | Castle Scott R | Radiation cured coatings |
DE102007024365A1 (de) * | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Pyrogen hergestellte silanisierte und vermahlene Kieselsäure |
US8017192B2 (en) * | 2007-07-17 | 2011-09-13 | Lexmark International, Inc. | Radiation cured coatings for image forming device components |
US8623140B2 (en) * | 2007-07-25 | 2014-01-07 | 3M Innovative Properties Company | System and method for making a film having a matte finish |
US9228785B2 (en) | 2010-05-04 | 2016-01-05 | Alexander Poltorak | Fractal heat transfer device |
KR20120082165A (ko) * | 2011-01-13 | 2012-07-23 | 삼성전기주식회사 | 그린 시트 및 이의 제조방법 |
US9907704B2 (en) | 2012-06-07 | 2018-03-06 | The Brigham And Women's Hospital, Inc. | Quick-release adhesive tapes |
EP3485215B1 (en) | 2016-07-12 | 2023-06-07 | Alexander Poltorak | System and method for maintaining efficiency of a heat sink |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB362947A (en) * | 1930-09-11 | 1931-12-11 | India Rubber Gutta Percha Tele | A method of applying variegated or "jazz" colourings to the surfaces of articles |
US1931667A (en) * | 1931-02-26 | 1933-10-24 | Emil C Loetscher | Process for reproducing marbleized surfaces on composite building materials |
US2148741A (en) * | 1937-07-22 | 1939-02-28 | Battelle Memorial Institute | Age-hardening lead base alloys |
US3679784A (en) * | 1969-07-23 | 1972-07-25 | Flo Tech Corp | Method of making decorative articles from plastisol |
US4120608A (en) * | 1975-08-22 | 1978-10-17 | E. I. Du Pont De Nemours And Company | Heat-stable polymer coating composition with antioxidant |
US4091126A (en) * | 1976-03-05 | 1978-05-23 | Kabushiki Kaisha Hidan Seisakusho | Method of dyeing a pattern like the grain of wood on the surface of an aluminum |
US4132824A (en) * | 1977-07-21 | 1979-01-02 | General Electric Company | Method for casting ultrathin methylpentene polymer membranes |
US4406673A (en) * | 1979-12-27 | 1983-09-27 | Teijin Limited | Ultrathin solid membrane, process for production thereof, and use thereof for concentrating a specified gas in a gaseous mixture |
GB2148741A (en) * | 1983-11-04 | 1985-06-05 | Huang Hong Bing | A process and apparatus for forming a pattern on a substrate |
US4600484A (en) * | 1983-12-06 | 1986-07-15 | Minnesota Mining And Manufacturing Company | Hydrosilation process using a (η5 -cyclopentadienyl)tri(σ-aliphatic) platinum complex as the catalyst |
US4510094A (en) * | 1983-12-06 | 1985-04-09 | Minnesota Mining And Manufacturing Company | Platinum complex |
US5067797A (en) * | 1988-03-25 | 1991-11-26 | Hitachi, Ltd. | Liquid crystal display cell and process for producing the same |
US5045391A (en) * | 1990-02-23 | 1991-09-03 | Minnesota Mining And Manufacturing Company | Release coatings for dielectric substrates |
BR9107320A (pt) * | 1991-09-27 | 1994-08-02 | Du Pont | Revestimento compósito de espessura variável com gradiente de coloração na direção transversa-tela |
US5324359A (en) * | 1992-02-25 | 1994-06-28 | Nouvas Manufacturing Technology Co. | Material deposition device |
CA2088865A1 (en) * | 1992-03-06 | 1993-09-07 | Larry D. Boardman | Organosilicone compositions |
US5356706A (en) * | 1992-12-14 | 1994-10-18 | Shores A Andrew | Release coating for adhesive tapes and labels |
US5348766A (en) * | 1993-01-05 | 1994-09-20 | Elaine Latham | Method for marbleizing an object by dipping the object into paint floating on borax-conditioned water |
US5468815A (en) * | 1994-01-12 | 1995-11-21 | Minnesota Mining And Manufacturing | Low coefficient of friction silicone release formulations incorporating higher alkenyl-functional silicone gums |
AU4283396A (en) * | 1995-02-02 | 1996-08-21 | Minnesota Mining And Manufacturing Company | Method and apparatus for applying thin fluid coatings |
ES2122721T3 (es) * | 1995-02-02 | 1998-12-16 | Minnesota Mining & Mfg | Metodo y aparato para aplicar tiras delgadas de recubrimiento liquido. |
WO1996034318A1 (en) * | 1995-04-28 | 1996-10-31 | Minnesota Mining And Manufacturing Company | Release layer for photoconductors |
US5700536A (en) * | 1996-02-07 | 1997-12-23 | Tamarack Products, Inc. | Integrated label, method and apparatus |
-
1997
- 1997-04-03 US US08/826,571 patent/US5928726A/en not_active Expired - Fee Related
- 1997-12-23 WO PCT/US1997/023813 patent/WO1998045052A1/en not_active Application Discontinuation
- 1997-12-23 AU AU57175/98A patent/AU5717598A/en not_active Abandoned
- 1997-12-23 KR KR1019997008995A patent/KR20010005918A/ko not_active Application Discontinuation
- 1997-12-23 BR BR9714565-3A patent/BR9714565A/pt not_active Application Discontinuation
- 1997-12-23 EP EP97953423A patent/EP0971796A1/en not_active Ceased
- 1997-12-23 CN CN97182094A patent/CN1082841C/zh not_active Expired - Fee Related
- 1997-12-23 JP JP54274598A patent/JP2002516590A/ja not_active Ceased
-
1998
- 1998-03-12 TW TW087103668A patent/TW443966B/zh not_active IP Right Cessation
- 1998-04-01 ZA ZA9802769A patent/ZA982769B/xx unknown
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005037017A (ja) * | 2003-07-17 | 2005-02-10 | Dainippon Printing Co Ltd | 乾燥方法 |
JP2015511877A (ja) * | 2012-02-10 | 2015-04-23 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 液体輸送装置上での粒子フィルム構造形成を含む基材への粒子堆積方法 |
JP2015512769A (ja) * | 2012-02-10 | 2015-04-30 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 液体輸送装置を用いて基材上に粒子フィルムを配置し構造形成する方法 |
Also Published As
Publication number | Publication date |
---|---|
AU5717598A (en) | 1998-10-30 |
CN1251540A (zh) | 2000-04-26 |
KR20010005918A (ko) | 2001-01-15 |
CN1082841C (zh) | 2002-04-17 |
TW443966B (en) | 2001-07-01 |
US5928726A (en) | 1999-07-27 |
EP0971796A1 (en) | 2000-01-19 |
WO1998045052A1 (en) | 1998-10-15 |
ZA982769B (en) | 1999-10-01 |
BR9714565A (pt) | 2000-02-15 |
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