JP2002516346A5 - - Google Patents
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- JP2002516346A5 JP2002516346A5 JP2000550049A JP2000550049A JP2002516346A5 JP 2002516346 A5 JP2002516346 A5 JP 2002516346A5 JP 2000550049 A JP2000550049 A JP 2000550049A JP 2000550049 A JP2000550049 A JP 2000550049A JP 2002516346 A5 JP2002516346 A5 JP 2002516346A5
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- JP
- Japan
- Prior art keywords
- oxazoline
- ethyl
- poly
- polymer
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 description 14
- 229920000068 poly(2-ethyl-2-oxazoline) Polymers 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000004014 plasticizer Substances 0.000 description 4
- 239000002861 polymer material Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
Description
【特許請求の範囲】
【請求項1】 少なくとも1種のポリマー材料から三次元モデルを構築するための自由形成方法であって、以下の工程:
ポリマー材料の供給物を液化させる工程;
該ポリマー材料を材料の液化リボンとして施与する工程;および
該ポリマー材料の液化リボンを、所定の三次元パターンのプラットフォーム上に堆積させる工程、
を包含し、ここで、該ポリマー材料の供給物がポリ(2−エチル−2−オキサゾリン)を含むことによって、該方法が特徴付けられる、
方法。
【請求項2】 ポリ(2−エチル−2−オキサゾリン)が、他の材料の自由形成層のための支持体として使用される、請求項1に記載の方法。
【請求項3】 前記ポリ(2−エチル−2−オキサゾリン)の供給物が、円柱状ロッドの形態である、請求項1に記載の方法。
【請求項4】 前記ポリ(2−エチル−2−オキサゾリン)の供給物が、フィラメントの形態である、請求項1に記載の方法。
【請求項5】 前記ポリマー材料が、さらに可塑剤を含む、請求項1に記載の方法。
【請求項6】 前記ポリマー材料が、さらに0.25重量%〜5重量%の極性ワックスを含む、請求項5に記載の方法。
【請求項7】 前記ポリマー材料が、さらに少なくとも1種の極性ポリマーを含む、請求項5に記載の方法。
【請求項8】 前記極性ポリマーが、0.5重量%〜35重量%のポリマー材料を含む、請求項7に記載の方法。
【請求項9】 前記極性ポリマーが、スチレン−アクリロニトリルコポリマーである、請求項7に記載の方法。
【請求項10】 前記可塑剤が、水溶性アルコール可塑剤である、請求項7に記載の方法。
【請求項11】 三次元モデルおよびそのための支持構造を構築するための添加剤処理方法であって、該モデルが、固化可能モデリング材料の層化堆積物によって形成され、そして該支持構造が、該モデリング材料の堆積物と協調して施与される液体支持材料のリボンの層化堆積物によって形成され、ここで、該支持材料が、ポリ(2−エチル−2−オキサゾリン)を含む熱可塑性組成物である、方法。
【請求項12】 前記支持材料が、さらに少なくとも1種の極性ポリマーを含む、請求項11に記載の方法。
【請求項13】 前記極性ポリマーが、スチレン−アクリロニトリルコポリマーである、請求項12に記載の方法。
【請求項14】 前記支持材料が、さらに、アルコール可塑剤を含む、請求項12に記載の方法。
【請求項1】 少なくとも1種のポリマー材料から三次元モデルを構築するための自由形成方法であって、以下の工程:
ポリマー材料の供給物を液化させる工程;
該ポリマー材料を材料の液化リボンとして施与する工程;および
該ポリマー材料の液化リボンを、所定の三次元パターンのプラットフォーム上に堆積させる工程、
を包含し、ここで、該ポリマー材料の供給物がポリ(2−エチル−2−オキサゾリン)を含むことによって、該方法が特徴付けられる、
方法。
【請求項2】 ポリ(2−エチル−2−オキサゾリン)が、他の材料の自由形成層のための支持体として使用される、請求項1に記載の方法。
【請求項3】 前記ポリ(2−エチル−2−オキサゾリン)の供給物が、円柱状ロッドの形態である、請求項1に記載の方法。
【請求項4】 前記ポリ(2−エチル−2−オキサゾリン)の供給物が、フィラメントの形態である、請求項1に記載の方法。
【請求項5】 前記ポリマー材料が、さらに可塑剤を含む、請求項1に記載の方法。
【請求項6】 前記ポリマー材料が、さらに0.25重量%〜5重量%の極性ワックスを含む、請求項5に記載の方法。
【請求項7】 前記ポリマー材料が、さらに少なくとも1種の極性ポリマーを含む、請求項5に記載の方法。
【請求項8】 前記極性ポリマーが、0.5重量%〜35重量%のポリマー材料を含む、請求項7に記載の方法。
【請求項9】 前記極性ポリマーが、スチレン−アクリロニトリルコポリマーである、請求項7に記載の方法。
【請求項10】 前記可塑剤が、水溶性アルコール可塑剤である、請求項7に記載の方法。
【請求項11】 三次元モデルおよびそのための支持構造を構築するための添加剤処理方法であって、該モデルが、固化可能モデリング材料の層化堆積物によって形成され、そして該支持構造が、該モデリング材料の堆積物と協調して施与される液体支持材料のリボンの層化堆積物によって形成され、ここで、該支持材料が、ポリ(2−エチル−2−オキサゾリン)を含む熱可塑性組成物である、方法。
【請求項12】 前記支持材料が、さらに少なくとも1種の極性ポリマーを含む、請求項11に記載の方法。
【請求項13】 前記極性ポリマーが、スチレン−アクリロニトリルコポリマーである、請求項12に記載の方法。
【請求項14】 前記支持材料が、さらに、アルコール可塑剤を含む、請求項12に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/082,064 | 1998-05-20 | ||
US09/082,064 US6070107A (en) | 1997-04-02 | 1998-05-20 | Water soluble rapid prototyping support and mold material |
US09/096,100 | 1998-06-11 | ||
US09/096,100 US6228923B1 (en) | 1997-04-02 | 1998-06-11 | Water soluble rapid prototyping support and mold material |
PCT/US1999/011163 WO1999060507A1 (en) | 1998-05-20 | 1999-05-20 | Water soluble rapid prototyping support and mold material |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002516346A JP2002516346A (ja) | 2002-06-04 |
JP2002516346A5 true JP2002516346A5 (ja) | 2006-01-05 |
JP4301733B2 JP4301733B2 (ja) | 2009-07-22 |
Family
ID=26767003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000550049A Expired - Lifetime JP4301733B2 (ja) | 1998-05-20 | 1999-05-20 | 支持構造を構築するための自由形成方法、及び、三次元モデルおよびそのための支持構造を構築するための添加剤処理方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US6228923B1 (ja) |
EP (1) | EP1078327A4 (ja) |
JP (1) | JP4301733B2 (ja) |
WO (1) | WO1999060507A1 (ja) |
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