JP2002510404A5 - - Google Patents

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Publication number
JP2002510404A5
JP2002510404A5 JP1999506671A JP50667199A JP2002510404A5 JP 2002510404 A5 JP2002510404 A5 JP 2002510404A5 JP 1999506671 A JP1999506671 A JP 1999506671A JP 50667199 A JP50667199 A JP 50667199A JP 2002510404 A5 JP2002510404 A5 JP 2002510404A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999506671A
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English (en)
Japanese (ja)
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JP2002510404A (ja
Filing date
Publication date
Priority claimed from GBGB9714172.5A external-priority patent/GB9714172D0/en
Priority claimed from GBGB9714169.1A external-priority patent/GB9714169D0/en
Priority claimed from GBGB9809346.1A external-priority patent/GB9809346D0/en
Application filed filed Critical
Priority claimed from PCT/GB1998/001953 external-priority patent/WO1999001795A2/en
Publication of JP2002510404A publication Critical patent/JP2002510404A/ja
Publication of JP2002510404A5 publication Critical patent/JP2002510404A5/ja
Pending legal-status Critical Current

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JP50667199A 1997-07-05 1998-07-02 パターン形成方法および放射線感受性材料 Pending JP2002510404A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
GBGB9714172.5A GB9714172D0 (en) 1997-07-05 1997-07-05 Improvements in relation to pattern-forming methods
GBGB9714169.1A GB9714169D0 (en) 1997-07-05 1997-07-05 Improvements in relation to pattern-forming methods and radiation sensitive ma erials
GB9714172.5 1998-05-01
GB9714169.1 1998-05-01
GBGB9809346.1A GB9809346D0 (en) 1998-05-01 1998-05-01 Improvements in relation to pattern-forming methods and radiation sensitive materials
GB9809346.1 1998-05-01
PCT/GB1998/001953 WO1999001795A2 (en) 1997-07-05 1998-07-02 Pattern-forming methods and radiation sensitive materials

Publications (2)

Publication Number Publication Date
JP2002510404A JP2002510404A (ja) 2002-04-02
JP2002510404A5 true JP2002510404A5 (enExample) 2006-01-05

Family

ID=27268918

Family Applications (2)

Application Number Title Priority Date Filing Date
JP50667599A Ceased JP2002511955A (ja) 1997-07-05 1998-07-02 パターン形成方法
JP50667199A Pending JP2002510404A (ja) 1997-07-05 1998-07-02 パターン形成方法および放射線感受性材料

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP50667599A Ceased JP2002511955A (ja) 1997-07-05 1998-07-02 パターン形成方法

Country Status (8)

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US (2) US6218083B1 (enExample)
EP (3) EP0953166B1 (enExample)
JP (2) JP2002511955A (enExample)
AT (1) ATE204388T1 (enExample)
AU (1) AU8229498A (enExample)
BR (2) BR9810545A (enExample)
DE (1) DE69801363T2 (enExample)
WO (2) WO1999001796A2 (enExample)

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999001796A2 (en) * 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
GB9806478D0 (en) 1998-03-27 1998-05-27 Horsell Graphic Ind Ltd Pattern formation
IT1299220B1 (it) 1998-05-12 2000-02-29 Lastra Spa Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6643001B1 (en) * 1998-11-20 2003-11-04 Revco, Inc. Patterned platelets
JP4417528B2 (ja) * 1999-05-24 2010-02-17 コダックグラフィックコミュニケーションズ株式会社 ポジ型感光性組成物及びポジ型感光性平版印刷版
US6255033B1 (en) 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
US6251559B1 (en) 1999-08-03 2001-06-26 Kodak Polychrome Graphics Llc Heat treatment method for obtaining imagable coatings and imagable coatings
US6706466B1 (en) 1999-08-03 2004-03-16 Kodak Polychrome Graphics Llc Articles having imagable coatings
US6461794B1 (en) 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms
US6232031B1 (en) 1999-11-08 2001-05-15 Ano-Coil Corporation Positive-working, infrared-sensitive lithographic printing plate and method of imaging
US6300038B1 (en) 1999-11-19 2001-10-09 Kodak Polychrome Graphics Llc Articles having imagable coatings
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
US6391524B2 (en) 1999-11-19 2002-05-21 Kodak Polychrome Graphics Llc Article having imagable coatings
US6355398B1 (en) * 2000-01-12 2002-03-12 Howard A. Fromson Method of actinically imaging
US20020081517A1 (en) * 2000-12-22 2002-06-27 Howard A. Fromson Actinically imageable and infrared heated printing plate
US6534241B2 (en) 2000-01-12 2003-03-18 Howard A. Fromson Method of actinically imaging a semiconductor
JP4753454B2 (ja) * 2000-05-11 2011-08-24 独立行政法人理化学研究所 光熱硬化性樹脂組成物
US6506533B1 (en) 2000-06-07 2003-01-14 Kodak Polychrome Graphics Llc Polymers and their use in imagable products and image-forming methods
EP1307341B1 (en) 2000-08-04 2007-04-04 Kodak Polychrome Graphics Company Ltd. Lithographic printing form and method of preparation and use thereof
US6511790B2 (en) * 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
US6558872B1 (en) 2000-09-09 2003-05-06 Kodak Polychrome Graphics Llc Relation to the manufacture of masks and electronic parts
WO2002034517A1 (en) 2000-10-26 2002-05-02 Kodak Polychrome Graphics Company, Ltd. Compositions comprising a pigment
JP4177106B2 (ja) * 2000-12-29 2008-11-05 イーストマン コダック カンパニー 熱可逆性ポリマーを含む2層式の画像形成可能なエレメント
US6506536B2 (en) 2000-12-29 2003-01-14 Kodak Polychrome Graphics, Llc Imageable element and composition comprising thermally reversible polymers
US6777164B2 (en) 2001-04-06 2004-08-17 Kodak Polychrome Graphics Llc Lithographic printing forms
US6410208B1 (en) * 2001-04-18 2002-06-25 Gary Ganghui Teng Lithographic printing plates having a thermo-deactivatable photosensitive layer
US6599676B2 (en) * 2002-01-03 2003-07-29 Kodak Polychrome Graphics Llc Process for making thermal negative printing plate
US6677106B2 (en) * 2002-01-03 2004-01-13 Kodak Polychrome Graphics Llc Method and equipment for using photo- or thermally imagable, negatively working patterning compositions
US6723489B2 (en) 2002-01-30 2004-04-20 Kodak Polychrome Graphics Llp Printing form precursors
US20050003296A1 (en) * 2002-03-15 2005-01-06 Memetea Livia T. Development enhancement of radiation-sensitive elements
US7052117B2 (en) * 2002-07-03 2006-05-30 Dimatix, Inc. Printhead having a thin pre-fired piezoelectric layer
US6858359B2 (en) 2002-10-04 2005-02-22 Kodak Polychrome Graphics, Llp Thermally sensitive, multilayer imageable element
DE10302111A1 (de) * 2003-01-21 2004-08-19 Kodak Polychrome Graphics Gmbh Bebilderbare Elemente und Zusammensetzungen für Bebilderung mittels UV-Bestrahlung
US6790590B2 (en) * 2003-01-27 2004-09-14 Kodak Polychrome Graphics, Llp Infrared absorbing compounds and their use in imageable elements
DE10307521A1 (de) 2003-02-21 2004-09-09 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenläufer mit hoher Chemikalienbeständigkeit
DE10329262B3 (de) * 2003-06-23 2004-12-16 Infineon Technologies Ag Verfahren zur Behandlung eines Substrates und ein Halbleiterbauelement
EP1637520A4 (en) * 2003-06-25 2010-06-30 Yamamoto Chemicals Inc POLYMETHINETHER
US7425402B2 (en) 2003-08-13 2008-09-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
EP1506858A3 (en) 2003-08-13 2005-10-12 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
US20070077513A1 (en) 2003-12-18 2007-04-05 Agfa-Gevaert Positive-working lithographic printing plate precursor
US7205084B2 (en) 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
US7005227B2 (en) * 2004-01-21 2006-02-28 Intel Corporation One component EUV photoresist
DE102004003890A1 (de) * 2004-01-27 2005-08-11 Mitsubishi Polyester Film Gmbh Mittels elektromagnetischer Strahlung ein- oder mehrschichtige, orientierte strukturierbare Folie aus thermoplastischem Polymer, Verfahren zu ihrer Herstellung und ihre Verwendung
DE102004003891A1 (de) * 2004-01-27 2005-08-11 Mitsubishi Polyester Film Gmbh Orientierte, mittels elektromagnetischer Strahlung strukturierbare Folie aus thermoplastischem Polyester, Verfahren zu ihrer Herstellung und ihre Verwendung
US7281778B2 (en) 2004-03-15 2007-10-16 Fujifilm Dimatix, Inc. High frequency droplet ejection device and method
US8491076B2 (en) 2004-03-15 2013-07-23 Fujifilm Dimatix, Inc. Fluid droplet ejection devices and methods
US7467587B2 (en) 2004-04-21 2008-12-23 Agfa Graphics, N.V. Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material
US7279263B2 (en) * 2004-06-24 2007-10-09 Kodak Graphic Communications Canada Company Dual-wavelength positive-working radiation-sensitive elements
US8708441B2 (en) 2004-12-30 2014-04-29 Fujifilm Dimatix, Inc. Ink jet printing
US7678533B2 (en) 2005-06-30 2010-03-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
ES2365930T3 (es) 2006-02-28 2011-10-13 Agfa Graphics N.V. Un precursor de plancha de impresión litográfica que funciona como positivo sensible al calor.
EP1854627A1 (en) 2006-05-12 2007-11-14 Agfa Graphics N.V. Method for making a lithographic printing plate
GB2439734A (en) * 2006-06-30 2008-01-09 Peter Andrew Reath Bennett Coating for a lithographic precursor and use thereof
US7988247B2 (en) 2007-01-11 2011-08-02 Fujifilm Dimatix, Inc. Ejection of drops having variable drop size from an ink jet printer
EP1985445B1 (en) 2007-04-27 2011-07-20 Agfa Graphics N.V. A lithographic printing plate precursor
EP2025512B1 (en) 2007-08-14 2011-05-18 Agfa Graphics N.V. Method for making a lithographic printing plate
EP2065211B1 (en) 2007-11-30 2010-05-26 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP2098376B1 (en) 2008-03-04 2013-09-18 Agfa Graphics N.V. A method for making a lithographic printing plate support
ATE514561T1 (de) 2008-03-31 2011-07-15 Agfa Graphics Nv Verfahren zur behandlung einer lithografischen druckplatte
ATE552111T1 (de) 2008-09-02 2012-04-15 Agfa Graphics Nv Wärmeempfindlicher, positiv arbeitender lithographiedruckformvorläufer
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2213690B1 (en) 2009-01-30 2015-11-11 Agfa Graphics N.V. A new alkali soluble resin
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
ATE553920T1 (de) 2009-06-18 2012-05-15 Agfa Graphics Nv Lithographiedruckplattenvorläufer
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
US20110097666A1 (en) 2009-10-27 2011-04-28 Celin Savariar-Hauck Lithographic printing plate precursors
US20110111134A1 (en) * 2009-11-09 2011-05-12 YewSavin, Inc. Systems and Methods of Preparation of Photovoltaic Films and Devices
US20110108773A1 (en) * 2009-11-09 2011-05-12 YewSavin, Inc. Compositions for Depositions and Processing of Films for Electronic Applications
EP2329951B1 (en) 2009-12-04 2012-06-20 AGFA Graphics NV A lithographic printing plate precursor
EP2366545B1 (en) 2010-03-19 2012-12-05 Agfa Graphics N.V. A lithographic printing plate precursor
US20110236832A1 (en) 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US20130298792A1 (en) 2011-01-25 2013-11-14 Agfa Graphics Nv Lithographic printing plate precursor
EP2489512B1 (en) 2011-02-18 2013-08-28 Agfa Graphics N.V. A lithographic printing plate precursor
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
ES2556055T3 (es) 2011-09-08 2016-01-12 Agfa Graphics Nv Método de fabricación de una plancha de impresión litográfica
US9562129B2 (en) 2013-01-01 2017-02-07 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
ES2655798T3 (es) 2014-12-08 2018-02-21 Agfa Nv Sistema para reducir los residuos de ablación
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
WO2017157579A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3778253A1 (en) 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate
EP4382306A1 (en) 2022-12-08 2024-06-12 Eco3 Bv Lithographic printing press make-ready method

Family Cites Families (118)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL76414C (enExample) 1949-07-23
US3046121A (en) 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
US3046119A (en) 1950-08-01 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
BE506677A (enExample) 1950-10-31
NL166823B (nl) 1951-02-02 Petroles Cie Francaise Electrisch koppelingsorgaan voor koppeling onder water.
US2767092A (en) 1951-12-06 1956-10-16 Azoplate Corp Light sensitive material for lithographic printing
GB742557A (en) 1952-10-01 1955-12-30 Kalle & Co Ag Light-sensitive material for photomechanical reproduction and process for the production of images
GB772517A (en) 1954-02-06 1957-04-17 Kalle & Co Ag Improvements in or relating to photo-mechanical reproduction
NL95407C (enExample) 1954-08-20
US2907665A (en) 1956-12-17 1959-10-06 Cons Electrodynamics Corp Vitreous enamel
NL129161C (enExample) 1959-01-14
NL254616A (enExample) 1959-08-05
US3105465A (en) 1960-05-31 1963-10-01 Oliver O Peters Hot water heater
US3206601A (en) 1963-05-21 1965-09-14 Keuffel & Esser Co Plastic film thermography
US3635709A (en) 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
GB1170495A (en) 1967-03-31 1969-11-12 Agfa Gevaert Nv Radiation-Sensitive Recording Material
GB1231789A (enExample) 1967-09-05 1971-05-12
GB1245924A (en) 1967-09-27 1971-09-15 Agfa Gevaert Improvements relating to thermo-recording
US3837860A (en) 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3647443A (en) 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS5024641B2 (enExample) 1972-10-17 1975-08-18
US3891439A (en) 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3859099A (en) 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
CA1085212A (en) 1975-05-27 1980-09-09 Ronald H. Engebrecht Use of volatile carboxylic acids in improved photoresists containing quinone diazides
DE2543820C2 (de) 1975-10-01 1984-10-31 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Flachdruckformen mittels Laserstrahlen
DE2607207C2 (de) 1976-02-23 1983-07-14 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen
GB1603920A (en) 1978-05-31 1981-12-02 Vickers Ltd Lithographic printing plates
JPS5560944A (en) 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
DE3009873A1 (de) 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
JPS561044A (en) 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561045A (en) 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS569740A (en) 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
GB2082339B (en) 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing
US4529682A (en) 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
JPS58203433A (ja) 1982-05-21 1983-11-26 Fuji Photo Film Co Ltd 感光性組成物
JPS58224351A (ja) 1982-06-23 1983-12-26 Fuji Photo Film Co Ltd 感光性印刷版
US4469774A (en) * 1983-03-28 1984-09-04 E. I. Du Pont De Nemours And Company Positive-working photosensitive benzoin esters
US4609615A (en) 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
DE3325023A1 (de) 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
US4708925A (en) 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
US4693958A (en) 1985-01-28 1987-09-15 Lehigh University Lithographic plates and production process therefor
DE3541534A1 (de) 1985-11-25 1987-05-27 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
ZA872295B (enExample) 1986-03-13 1987-09-22
US4684599A (en) 1986-07-14 1987-08-04 Eastman Kodak Company Photoresist compositions containing quinone sensitizer
DE3716848A1 (de) 1987-05-20 1988-12-01 Hoechst Ag Verfahren zur bebilderung lichtempfindlichen materials
EP0304313A3 (en) 1987-08-21 1990-08-22 Oki Electric Industry Company, Limited Pattern forming material
JPH01201654A (ja) 1988-02-06 1989-08-14 Nippon Oil Co Ltd ポジ型フォトレジスト材料
US4962147A (en) 1988-05-26 1990-10-09 Hoechst Celanese Corporation Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers
DE3820001A1 (de) 1988-06-11 1989-12-14 Basf Ag Optisches aufzeichnungsmedium
US4877718A (en) 1988-09-26 1989-10-31 Rennsselaer Polytechnic Institute Positive-working photosensitive polyimide operated by photo induced molecular weight changes
JP2547626B2 (ja) 1988-10-07 1996-10-23 富士写真フイルム株式会社 モノマーの製造方法
EP0366590B2 (en) * 1988-10-28 2001-03-21 International Business Machines Corporation Highly sensitive positive photoresist compositions
EP0368327B1 (en) 1988-11-11 1995-02-15 Fuji Photo Film Co., Ltd. Light-sensitive composition
JP2571115B2 (ja) 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
JP2871710B2 (ja) 1989-03-17 1999-03-17 株式会社きもと 画像形成方法
JP2661671B2 (ja) * 1989-03-20 1997-10-08 株式会社日立製作所 パタン形成材料とそれを用いたパタン形成方法
JPH02251962A (ja) 1989-03-27 1990-10-09 Matsushita Electric Ind Co Ltd 微細パターン形成材料およびパターン形成方法
US5200298A (en) 1989-05-10 1993-04-06 Fuji Photo Film Co., Ltd. Method of forming images
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
EP0424182B1 (en) 1989-10-19 1998-07-08 Fujitsu Limited Process for formation of resist patterns
GB9004337D0 (en) 1990-02-27 1990-04-25 Minnesota Mining & Mfg Preparation and use of dyes
DE4013575C2 (de) 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien
EP0455228B1 (en) 1990-05-02 1998-08-12 Mitsubishi Chemical Corporation Photoresist composition
JP2729850B2 (ja) 1990-05-15 1998-03-18 富士写真フイルム株式会社 画像形成層
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
JP2645384B2 (ja) 1990-05-21 1997-08-25 日本ペイント株式会社 ポジ型感光性樹脂組成物
GB9012021D0 (en) * 1990-05-30 1990-07-18 Cookson Group Plc Light sensitive materials for lithographic plates
US5145763A (en) 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
US5085972A (en) 1990-11-26 1992-02-04 Minnesota Mining And Manufacturing Company Alkoxyalkyl ester solubility inhibitors for phenolic resins
JPH04359906A (ja) 1991-06-07 1992-12-14 Shin Etsu Chem Co Ltd ポリ(パラ−t−ブトキシカルボニルオキシスチレン)及びその製造方法
CA2066895A1 (en) * 1991-06-17 1992-12-18 Thomas P. Klun Aqueous developable imaging systems
US5258257A (en) 1991-09-23 1993-11-02 Shipley Company Inc. Radiation sensitive compositions comprising polymer having acid labile groups
US5437952A (en) 1992-03-06 1995-08-01 Konica Corporation Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin
US5368977A (en) 1992-03-23 1994-11-29 Nippon Oil Co. Ltd. Positive type photosensitive quinone diazide phenolic resin composition
DE4321607A1 (de) 1992-06-30 1994-01-05 Kanzaki Paper Mfg Co Ltd Aufzeichnungsmaterial
CA2091286A1 (en) 1992-07-20 1994-01-21 John Grunwald Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed boards
JPH07120928A (ja) * 1992-12-11 1995-05-12 Hitachi Ltd ポジ型感放射線組成物及びそれを用いたパタン形成方法
EP0608983B1 (en) 1993-01-25 1997-11-12 AT&T Corp. A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers
US5512418A (en) * 1993-03-10 1996-04-30 E. I. Du Pont De Nemours And Company Infra-red sensitive aqueous wash-off photoimaging element
US5340699A (en) 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
DE4426820A1 (de) * 1993-07-29 1995-02-02 Fuji Photo Film Co Ltd Bilderzeugungsmaterial und Bilderzeugungsverfahren
GB9322705D0 (en) 1993-11-04 1993-12-22 Minnesota Mining & Mfg Lithographic printing plates
EP0672954B1 (en) 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
JP3317574B2 (ja) 1994-03-15 2002-08-26 富士写真フイルム株式会社 ネガ型画像記録材料
JP3461377B2 (ja) * 1994-04-18 2003-10-27 富士写真フイルム株式会社 画像記録材料
US5441850A (en) 1994-04-25 1995-08-15 Polaroid Corporation Imaging medium and process for producing an image
DE69525883T2 (de) * 1994-07-04 2002-10-31 Fuji Photo Film Co., Ltd. Positiv-photoresistzusammensetzung
US5858604A (en) 1994-07-11 1999-01-12 Konica Corporation Presensitized lithographic printing plate and method for preparing lithographic printing plate
US5466557A (en) 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
EP0706899A1 (en) 1994-10-13 1996-04-17 Agfa-Gevaert N.V. Thermal imaging element
GB9426206D0 (en) * 1994-12-23 1995-02-22 Horsell Plc Lithographic plate
US5491046A (en) 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
US5658708A (en) 1995-02-17 1997-08-19 Fuji Photo Film Co., Ltd. Image recording material
JPH0962005A (ja) 1995-06-14 1997-03-07 Fuji Photo Film Co Ltd ネガ型感光性組成物
US5641608A (en) 1995-10-23 1997-06-24 Macdermid, Incorporated Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates
JPH09120157A (ja) 1995-10-25 1997-05-06 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
US6132935A (en) 1995-12-19 2000-10-17 Fuji Photo Film Co., Ltd. Negative-working image recording material
JP3589365B2 (ja) 1996-02-02 2004-11-17 富士写真フイルム株式会社 ポジ画像形成組成物
BR9702181A (pt) * 1996-04-23 1999-12-28 Horsell Graphic Ind Ltd Composição termossensìvel e método para fabricar um modelo de impressão litográfica com a mesma.
EP0803771A1 (en) 1996-04-23 1997-10-29 Agfa-Gevaert N.V. A method for making a lithopgrapic printing plate wherein an imaging element is used that comprises a thermosensitive mask
US5763134A (en) * 1996-05-13 1998-06-09 Imation Corp Composition comprising photochemical acid progenitor and specific squarylium dye
EP0819980B1 (en) 1996-07-19 2000-05-31 Agfa-Gevaert N.V. An IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
JP3814961B2 (ja) * 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版
US5705309A (en) 1996-09-24 1998-01-06 Eastman Kodak Company Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder
US5759742A (en) 1996-09-25 1998-06-02 Eastman Kodak Company Photosensitive element having integral thermally bleachable mask and method of use
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
EP0833204A1 (en) * 1996-09-30 1998-04-01 Eastman Kodak Company Infrared-sensitive diazonaphthoquinone imaging composition and element
EP0839647B2 (en) 1996-10-29 2014-01-22 Agfa Graphics N.V. Method for making a lithographic printing plate with improved ink-uptake
DE69806986T2 (de) 1997-03-11 2003-05-08 Agfa-Gevaert, Mortsel Verfahren zur Herstellung von positiv arbeitenden lithographischen Druckplatten
DE19712323A1 (de) 1997-03-24 1998-10-01 Agfa Gevaert Ag Strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial für Offsetdruckplatten
US5948591A (en) * 1997-05-27 1999-09-07 Agfa-Gevaert, N.V. Heat sensitive imaging element and a method for producing lithographic plates therewith
WO1999001796A2 (en) * 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
JP3779444B2 (ja) 1997-07-28 2006-05-31 富士写真フイルム株式会社 赤外線レーザ用ポジ型感光性組成物
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US5919600A (en) * 1997-09-03 1999-07-06 Kodak Polychrome Graphics, Llc Thermal waterless lithographic printing plate
US6165691A (en) * 1997-12-19 2000-12-26 Agfa-Gevaert, N.V. Method for lithographic printing by use of a lithographic printing plate provided by a heat sensitive non-ablatable wasteless imaging element and a fountain containing water-insoluble compounds
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use

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