JP2002505774A5 - - Google Patents

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Publication number
JP2002505774A5
JP2002505774A5 JP1999501507A JP50150799A JP2002505774A5 JP 2002505774 A5 JP2002505774 A5 JP 2002505774A5 JP 1999501507 A JP1999501507 A JP 1999501507A JP 50150799 A JP50150799 A JP 50150799A JP 2002505774 A5 JP2002505774 A5 JP 2002505774A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999501507A
Other languages
English (en)
Japanese (ja)
Other versions
JP4010373B2 (ja
JP2002505774A (ja
Filing date
Publication date
Priority claimed from CH01368/97A external-priority patent/CH693517A5/de
Application filed filed Critical
Publication of JP2002505774A publication Critical patent/JP2002505774A/ja
Publication of JP2002505774A5 publication Critical patent/JP2002505774A5/ja
Application granted granted Critical
Publication of JP4010373B2 publication Critical patent/JP4010373B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP50150799A 1997-06-06 1998-06-04 回折面パターン Expired - Fee Related JP4010373B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH01368/97A CH693517A5 (de) 1997-06-06 1997-06-06 Flächenmuster.
CH1368/97 1997-06-06
PCT/EP1998/003324 WO1998055964A1 (de) 1997-06-06 1998-06-04 Diffraktives flächenmuster

Publications (3)

Publication Number Publication Date
JP2002505774A JP2002505774A (ja) 2002-02-19
JP2002505774A5 true JP2002505774A5 (enExample) 2005-12-02
JP4010373B2 JP4010373B2 (ja) 2007-11-21

Family

ID=4208786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50150799A Expired - Fee Related JP4010373B2 (ja) 1997-06-06 1998-06-04 回折面パターン

Country Status (14)

Country Link
US (1) US6359734B1 (enExample)
EP (2) EP0883085A1 (enExample)
JP (1) JP4010373B2 (enExample)
KR (1) KR100403419B1 (enExample)
CN (1) CN1179301C (enExample)
AT (1) ATE223600T1 (enExample)
AU (1) AU740397B2 (enExample)
CA (1) CA2292594C (enExample)
CH (1) CH693517A5 (enExample)
DE (1) DE59805423D1 (enExample)
ES (1) ES2183391T3 (enExample)
PT (1) PT986796E (enExample)
RU (1) RU2193232C2 (enExample)
WO (1) WO1998055964A1 (enExample)

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US7433123B2 (en) * 2004-02-19 2008-10-07 Illumina, Inc. Optical identification element having non-waveguide photosensitive substrate with diffraction grating therein
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CA2559283C (en) 2004-03-12 2014-08-26 Russell Paul Cowburn Authenticity verification methods, products and apparatuses
GB2438424B (en) * 2004-08-13 2008-02-13 Ingenia Technology Ltd Article manufacturing screen
US7604173B2 (en) * 2004-11-16 2009-10-20 Illumina, Inc. Holographically encoded elements for microarray and other tagging labeling applications, and method and apparatus for making and reading the same
WO2006055736A1 (en) 2004-11-16 2006-05-26 Illumina, Inc. And methods and apparatus for reading coded microbeads
WO2006055735A2 (en) 2004-11-16 2006-05-26 Illumina, Inc Scanner having spatial light modulator
KR20070092739A (ko) * 2004-12-17 2007-09-13 코닌클리케 필립스 일렉트로닉스 엔.브이. 무작위 배향 부분면을 갖는 광학 식별자
US7623624B2 (en) * 2005-11-22 2009-11-24 Illumina, Inc. Method and apparatus for labeling using optical identification elements characterized by X-ray diffraction
DE102005061749A1 (de) 2005-12-21 2007-07-05 Giesecke & Devrient Gmbh Optisch variables Sicherheitselement und Verfahren zu seiner Herstellung
US7812935B2 (en) 2005-12-23 2010-10-12 Ingenia Holdings Limited Optical authentication
DE102006006323B4 (de) 2006-02-11 2017-07-13 Ovd Kinegram Ag Mehrschichtkörper mit einer optisch maschinell lesbaren Kennung
US7830575B2 (en) * 2006-04-10 2010-11-09 Illumina, Inc. Optical scanner with improved scan time
US7943273B2 (en) * 2007-04-20 2011-05-17 Photronics, Inc. Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
US7790340B2 (en) * 2007-04-20 2010-09-07 Photronics, Inc. Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
US7851110B2 (en) * 2007-04-20 2010-12-14 Photronics, Inc. Secure photomask with blocking aperture
GB0711434D0 (en) 2007-06-13 2007-07-25 Rue De Int Ltd Holographic security device
GB0821872D0 (en) * 2008-12-01 2009-01-07 Optaglio Sro Optical device offering multiple pattern switch and/or colour effect and method of manufacture
GB2466465B (en) 2008-12-19 2011-02-16 Ingenia Holdings Authentication
GB2466311B (en) 2008-12-19 2010-11-03 Ingenia Holdings Self-calibration of a matching algorithm for determining authenticity
GB2476226B (en) 2009-11-10 2012-03-28 Ingenia Holdings Ltd Optimisation
FR2987783B1 (fr) * 2012-03-06 2014-04-11 Oberthur Fiduciaire Sas Document de securite pourvu d'un repere tactile et d'une zone texturee et procede de fabrication
EP3880487B1 (en) * 2018-11-16 2023-05-31 Orell Füssli AG Waveguide-based anti-forgery security device
CN113466981A (zh) * 2021-07-01 2021-10-01 江西欧迈斯微电子有限公司 衍射光学元件、投射模组及电子设备
WO2023068631A1 (ko) 2021-10-18 2023-04-27 라이트비전 주식회사 높은 분별력을 가지는 tem sadp 영상 생성 시스템 및 방법
KR102582498B1 (ko) 2021-10-18 2023-09-26 라이트비전 주식회사 높은 분별력을 가지는 tem sadp 영상 생성 시스템 및 방법
WO2023068632A1 (ko) 2021-10-18 2023-04-27 라이트비전 주식회사 딥러닝을 이용하여 가상 tem sadp 영상과 실제 tem sadp 영상을 상호 변환시키는 회절 패턴 영상 변환 시스템 및 방법

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