JP2002505774A5 - - Google Patents

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Publication number
JP2002505774A5
JP2002505774A5 JP1999501507A JP50150799A JP2002505774A5 JP 2002505774 A5 JP2002505774 A5 JP 2002505774A5 JP 1999501507 A JP1999501507 A JP 1999501507A JP 50150799 A JP50150799 A JP 50150799A JP 2002505774 A5 JP2002505774 A5 JP 2002505774A5
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JP
Japan
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JP1999501507A
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English (en)
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JP2002505774A (ja
JP4010373B2 (ja
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Priority claimed from CH01368/97A external-priority patent/CH693517A5/de
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Publication of JP2002505774A publication Critical patent/JP2002505774A/ja
Publication of JP2002505774A5 publication Critical patent/JP2002505774A5/ja
Application granted granted Critical
Publication of JP4010373B2 publication Critical patent/JP4010373B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

Figure 2002505774
Figure 2002505774
Figure 2002505774
Figure 2002505774
Figure 2002505774
JP50150799A 1997-06-06 1998-06-04 回折面パターン Expired - Fee Related JP4010373B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH1368/97 1997-06-06
CH01368/97A CH693517A5 (de) 1997-06-06 1997-06-06 Flächenmuster.
PCT/EP1998/003324 WO1998055964A1 (de) 1997-06-06 1998-06-04 Diffraktives flächenmuster

Publications (3)

Publication Number Publication Date
JP2002505774A JP2002505774A (ja) 2002-02-19
JP2002505774A5 true JP2002505774A5 (ja) 2005-12-02
JP4010373B2 JP4010373B2 (ja) 2007-11-21

Family

ID=4208786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50150799A Expired - Fee Related JP4010373B2 (ja) 1997-06-06 1998-06-04 回折面パターン

Country Status (15)

Country Link
US (1) US6359734B1 (ja)
EP (2) EP0883085A1 (ja)
JP (1) JP4010373B2 (ja)
KR (1) KR100403419B1 (ja)
CN (1) CN1179301C (ja)
AT (1) ATE223600T1 (ja)
AU (1) AU740397B2 (ja)
CA (1) CA2292594C (ja)
CH (1) CH693517A5 (ja)
DE (1) DE59805423D1 (ja)
ES (1) ES2183391T3 (ja)
HK (1) HK1026759A1 (ja)
PT (1) PT986796E (ja)
RU (1) RU2193232C2 (ja)
WO (1) WO1998055964A1 (ja)

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US7830575B2 (en) * 2006-04-10 2010-11-09 Illumina, Inc. Optical scanner with improved scan time
US7851110B2 (en) * 2007-04-20 2010-12-14 Photronics, Inc. Secure photomask with blocking aperture
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