JP2002362737A - Apparatus, system, and method for conveying mask - Google Patents

Abstract

PROBLEM TO BE SOLVED: To convey a plurality of mask accommodating containers onto a mask storage device and/or a plurality of substrate processing devices and place them by aligning with the direction of a placement base where the mask accommodating containers are placed. SOLUTION: In the mask conveyance method where a carriage 1 holding the plurality of mask accommodating containers 14 for accommodating a pattern copying mask is connected with a track rail 13 laid between the mask storage device 16 and/or the plurality of substrate processing devices for conveyance, the layout of the plurality of mask accommodating containers 14 is made to match with the laying direction of the track rail 13 while the carriage 1 is traveling. The carriage 1 stops when it reaches a prescribed position, and the carriage 1 is rotated so that the layout of the plurality of mask accommodating containers 14 may match with the layout of the placement base of the mask accommodating containers 14 to place the mask accommodating containers 14 on the placement base.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask transfer device, a mask transfer system, and a mask transfer method for a pattern transfer mask. As a more specific application,
The present invention relates to a structure and use of a mask transfer device and a mask transfer system that can transfer a pattern transfer mask to a mask storage device and a substrate processing device in a semiconductor manufacturing plant.

[0002]

2. Description of the Related Art FIG. 5 is a conceptual diagram showing a transfer system for automatically transferring semiconductor substrates in a semiconductor manufacturing plant. OHT (Overhead Hoist Transfer) 51
By grasping the wafer carrier 54 containing the semiconductor substrate and following the track rail 53 laid in the semiconductor manufacturing plant,
The wafer carrier 54 is moved to a predetermined stocker 56 or a substrate processing device 57.

[0003] Hoist mechanism 52 provided in OHT 51
The wafer carrier 54 gripped by the OHT 51 and moved to a predetermined position is mounted on a stocker 56 or a mounting table 55 provided in a substrate processing apparatus 57. In the substrate processing apparatus 57, the mounting table 55 is a part of a load port apparatus, and the semiconductor substrate housed in the wafer carrier 54 is taken out by the load port apparatus and taken into the substrate processing apparatus 57. It is.

[0004] As a typical example of the above-mentioned wafer carrier, there is a wafer carrier called FOUP in the SEMI standard. FOUP is an abbreviation for Front Opening unified pod. For detailed dimensions and other information, see SEMI Standard E52,
These are described in E1.9, E47.1 and the like. The above-described OHT (Overhead Hoist Transfer) 51 is a typical automatic transfer device that transfers a wafer carrier containing semiconductor substrates in a bay of a semiconductor factory.

In the field of microfabrication on the order of microns in the manufacture of semiconductor devices, shrinkage and expansion of substances due to temperature and humidity, and intrusion of foreign substances such as dust are serious problems. Therefore, most processes for manufacturing a semiconductor device are performed in a clean room in which air conditioning is performed and dust and the like in the air are removed. Such intrusion of a person into the clean room is a source of intrusion of foreign matters, and thus it is desirable to suppress the intrusion. Therefore, the automatic transport system as described above plays an important role in semiconductor manufacturing.

Further, this is an important system for suppressing mistakes and shortening the transport time when transported to each substrate processing apparatus by hand, thereby improving the processing efficiency. From the above viewpoints, research and development of an automatic semiconductor substrate transfer system are being advanced.

On the other hand, a pattern transfer mask used in a substrate processing apparatus for processing a semiconductor substrate, specifically, a reticle used in a reduction projection exposure apparatus, for example, is currently stored in a mask storage container. The entire mask storage container is manually placed on a mounting table for the mask storage container provided in the reduction projection exposure apparatus. However, in the same way that an automatic transfer system is important for a semiconductor substrate, it is preferable that the pattern transfer mask can be automatically transferred in consideration of prevention of foreign matter intrusion, processing efficiency, and the like.

[0008]

As described above,
In a semiconductor manufacturing plant, it is desired to automate a transfer operation of a pattern transfer mask. In order to realize the automation of the transfer operation, it is conceivable to apply the above-described automatic transfer system for semiconductor substrates as it is.
However, the height of the mounting table of the mask storage container installed in each substrate processing apparatus varies, and in order to place the mask storage apparatus at an accurate position with respect to this mounting table, the automatic transfer of the semiconductor substrate is required. In addition to the system, it is necessary to provide a means capable of largely adjusting the mounting position.

Further, a plurality of mask storage containers can be mounted on a mounting table provided in the substrate processing apparatus. Therefore, in order to effectively utilize this and to smoothly and quickly transport the mask storage containers, it is desirable that a plurality of mask storage containers can be transported at once. However, in general, a plurality of mounting tables provided in the substrate processing apparatus are generally arranged in a direction that connects the plurality of substrate processing apparatuses, that is, in a direction substantially perpendicular to the laying direction of the track rail. On the other hand, a plurality of track rails are laid and transported according to the mounting table of each substrate processing apparatus, or a plurality of mask storage containers are arranged and transported at a time in a state perpendicular to the plurality of track rails. In such a case, a large amount of space is required for transportation, which is a problem in current factories and facilities. Further, a large change to the substrate processing apparatus, such as changing the entire arrangement of the mounting tables of the substrate processing apparatus along the laying direction of the track rails, is not preferable in terms of cost.

[0010] Furthermore, in today's pattern miniaturization and integration, there are various types of pattern transfer masks to be used. The work is preferably performed in an automated state as much as possible.

Accordingly, an object of the present invention is to make it possible to automatically transfer a pattern transfer mask while taking the cost into consideration and utilizing conventional equipment.
Specifically, the present invention provides a method of automatically setting a plurality of mask storage containers storing pattern transfer masks at once, without making a major change, while maintaining the arrangement of the mounting tables provided in the substrate processing apparatus. The present invention proposes a mask transporting means that enables the wafer to be transported selectively.

[0012]

According to the present invention, there is provided a mask transfer apparatus movably connected to a track rail laid for transferring a pattern transfer mask to a mask storage device and / or a substrate processing device. A carriage that can move along a rail and can be rotated substantially horizontally around a portion connected to the track rail, and a plurality of mask storage containers that can store a pattern transfer mask. Therefore, a gripping tool provided on the cart is included.

Further, in the mask transport apparatus according to the present invention, the carriage follows the rail in a first state in which the arrangement direction of the plurality of gripping tools is along the laying direction of the track rail. is there.

Further, in the mask transport apparatus according to the present invention, the gripper may include a transfer unit for transferring the mask storage container between the mask storage device and / or the substrate processing device and the carriage. Including.

Further, the mask transport apparatus according to the present invention includes control means for stopping the carriage at a predetermined position with respect to the mask storage apparatus and / or the substrate processing apparatus and rotating the carriage at a predetermined angle. is there.

Next, the mask transport system according to the present invention comprises:
A mask storage container capable of storing a plurality of pattern transfer masks, a track rail for transferring between a mask storage device and / or a plurality of substrate processing devices, and movably connected to the track rail, A truck capable of moving along the track rail and rotating substantially horizontally around a portion connected to the track rail; and a plurality of trucks provided on the truck for gripping a plurality of mask storage containers. Gripper, provided in the mask storage device and / or substrate processing apparatus, a mounting table for mounting the mask storage container, between the mounting table and the carriage, the mask storage container, A transfer means for transmitting and receiving by a gripper,
Is included.

Further, the mask transport system of the present invention comprises:
When the arrangement direction of the plurality of grippers follows the track rail, the first state is along the laying direction of the track rail, and when placed on the mounting table, along the mounting table. And control means for controlling the rotation of the bogie so as to be in the second state.

Further, the mask transport system of the present invention comprises:
The control means stops the carriage at a predetermined position with respect to the mounting table.

Further, the mask transport system of the present invention comprises:
The control means automatically detects that the cart has reached a predetermined position with respect to the mounting table, stops the cart, and, with this detection, causes the cart to enter the second state. It rotates automatically.

Next, according to the mask transfer method of the present invention, a pattern transfer mask is stored by one carriage via a track storage device and / or a track rail laid between a plurality of substrate processing devices. A plurality of mask storage containers for gripping and transporting, the mask storage device and / or, for the plurality of substrate processing apparatus, in the mask transport method of exchanging the mask storage container, when the carriage is moved, Arrangement of a plurality of mask storage containers, in the first state along the laying direction of the track rail, stop when the carriage comes to a predetermined position with respect to the mask storage device and / or the plurality of substrate processing apparatus, Arrangement of the plurality of mask storage containers, the carriage in a second state along the arrangement of the mounting table provided in the mask storage device and / or the plurality of substrate processing apparatus. It is rolling, in which so as to transfer the mask container.

10. The method according to claim 9, wherein the carriage is stopped and rotated automatically.

[0022]

Embodiments of the present invention will be described below with reference to the drawings. In each of the drawings, the same or corresponding portions have the same reference characters allotted, and description thereof will be omitted or simplified.

Embodiment FIG. 1 is a view for explaining a mask transport system according to an embodiment of the present invention. FIG. 1 (a) is a perspective view, and FIG. 1 (b) is a top view. .

In FIG. 1, reference numeral 200 denotes a mask transport system, 100 denotes a mask transport device, and 14 denotes a mask storage container. A reticle, which is a mask for pattern transfer, is stored in the mask storage container 14.
Is transported by the mask transport device 100. A typical example of the mask storage container 14 for storing a reticle is a reticle SMIF pod. Here, SMIF is an abbreviation of Standard Mechanical Interface, and information such as detailed dimensions is described in SEMI standard E19.

A reticle stocker 16 is a mask storage device. Reference numeral 17 denotes a substrate processing apparatus, here, a reduction projection exposure apparatus that processes a substrate using a reticle that has been carried. Reference numeral 15A denotes a mounting table provided in the mask storage device 16, and 15B denotes a mounting table provided in the reduction projection exposure device 17. Reference numeral 13 denotes a track rail laid for transporting the reticle stored in the mask storage container 14 between the reticle stocker 16 and the reduction projection exposure apparatus 17.

Reference numeral 51 denotes an OHT which is an automatic semiconductor substrate transfer device, and reference numeral 53 denotes a track rail laid for transferring the semiconductor substrate. Further, reference numeral 54 denotes a wafer carrier accommodating a semiconductor substrate, 57 denotes a coating device for coating a semiconductor substrate with a resist, and 55 denotes a mounting table provided in the coating device 57. The coating device 57 is connected to the reduction projection exposure device 17, and the semiconductor substrate coated with the resist in the coating device 57 is sent to the reduction projection exposure device 17.

FIG. 2 shows an embodiment of the present invention.
FIGS. 2A and 2B are views for explaining a state of the mask transport device 100 when it is moved, FIG. 2A is a front view, FIG. 2B is a side view, and FIG. 2C is a top view.

In FIG. 2, 1 is a truck, and 2 is
The gripping tools 4 provided on the cart 1 indicate connecting portions, which are parts included in the cart 1. Two gripping tools 2 are provided on one truck 1, and two mask storage containers 14 are gripped by the two gripping tools 2 and hung on the cart 1. The truck 1 is connected to the track rail 1 by the connecting portion 4.
3 so that the carriage 1 can move following the track rail 13. Further, the carriage 1 can be rotated substantially horizontally around the connection portion 4 as an axis.

The state shown in FIG.
00 is in a moving state, and the cart 1 is
The arrangement of the mask storage containers 14 held by this is in a direction along the laying direction of the track rail 13. This state of the cart 1 is referred to as a first state in this specification. In this case, the cart 1 provided with two gripping tools 2 is used, but the present invention is not limited to this.
A cart provided with one gripper that can grip two mask storage containers 14 may be used.

FIG. 3 shows an embodiment of the present invention.
3A and 3B are diagrams illustrating a state when the mask storage container 14 is transferred in the mask transport device 100, wherein FIG. 3A is a front view and FIG. 3B is a side view. In FIG. 3, 3 is
The lifting rope as a transfer means used when transferring the mask storage container 14 between the carriage 1 and the mounting table 15A or 15B is shown. The lifting rope 3 is included in the gripper 2, and in the first state when the mask transport device 100 is moved, as shown in FIG. 3 is used in an extended state only as shown in FIG.

Here, the stop of the mask transport device 100 and the start and stop of the descent of the lifting rope 3 are controlled by control means (not shown) provided in the mask transport device 100.
Controlled. The control means reads the bar code provided on the track rail corresponding to the reticle stocker 16 or the reduction projection exposure device 17 to stop the position of the reticle stocker 16 or the reduction projection exposure device 17 and the position of the mounting table 15A or 15B. Necessary information such as height can be obtained. With this information, the control means:
The mask transport device 100 is stopped at an appropriate position of the reticle stocker 16 or a predetermined reduction projection exposure device 17, and the lifting rope 3 is lowered to stop the lifting rope 3 according to the height of the mounting table 15A or 15B. .
Thereby, the mask storage container can be automatically transferred to the mounting tables 15A and 15B having different heights provided in the reticle stocker 16 or the respective reduced projection exposure apparatuses 17.

FIGS. 4A and 4B are views showing a state in which the carriage 1 has been rotated in accordance with the arrangement direction of the mounting tables 15B. FIG. 4A is a front view showing a state before the rotation, and FIG. FIG. 4C is a side view illustrating a state after the rotation, and FIG. 4C is a top view illustrating a state after the rotation. As shown in FIG. 4A, before rotation, the mask transport device 100 is in the first state. In this embodiment, the arrangement direction of the mounting tables 15B is perpendicular to the track rail 13. Therefore, the trolley 1 that has moved to the vicinity of the mounting table 15B rotates by 90 degrees, and enters a state as shown in FIG. 4B or FIG. 4C. In this state, the arrangement of the two gripping tools 2 and the mask storage container 14 is
This is a state along the arrangement direction of the mounting tables 15. In this specification, this state is referred to as a second state.

Here, the start and stop of the rotation and the control of the rotation angle are performed by the above-mentioned control means. As described above, the control means obtains information such as the arrangement direction of the mounting table 15A or 15B from the barcode provided on the track rail 13. This information is transmitted to the control unit, and the control unit starts rotating the carriage 1 following the stop of the descent of the lifting rope 3, and based on the transmitted information, the mask transport device 100 enters the second state. The trolley 1 is rotated by an angle necessary for the rotation, and then the rotation is stopped.

In this embodiment, the connection portion 4
The mask transport device 100 is configured to include the carriage 1, the gripper 2, the lifting rope 3, and the control means. Further, the mask transport device 100, the track rail 13, and the mounting table 15
A and 15B constitute the mask transport system 200.

Next, a method of transporting a reticle in this embodiment will be described. The cart 1 is movably connected to the track rail 13 via the connection portion 4. The reticle is stored in a mask storage container 14, and the mask storage container 14 storing the reticle is stored inside the reticle stocker 16. Two mask storage containers 14 each containing a predetermined reticle are selected from the reticle stocker 16,
The reticle stocker 16 is mounted on the mounting table 15A.
Alternatively, the reticle may be stored directly in reticle stocker 16. In this case, a necessary reticle is taken out from the reticle stocker 16 and stored in the mask storage container 14 mounted on the mounting table 15A using a load port system or the like.

From the bar code (not shown) provided on the track rail 13, information such as the position of the reticle stocker 16, the height of the mounting table 15A, and the arrangement direction is read by the control means.

The control means uses the read information to
The mask transport device 100 is stopped at an appropriate position above the reticle stocker 16, the lifting rope 3 provided on the gripper 2 is lowered, and the lifting rope 3 is stopped at an appropriate position. Here, as shown in FIG. 1B, the arrangement of the mounting table 15A and the arrangement of the gripping tools 2 provided on the cart 1 are in the same direction. Therefore, the cart 1 is not rotated.
However, judging from the arrangement direction information read from the bar code, the arrangement direction of the gripper 2 is in the second state along the arrangement direction of the mounting table 15A. Then, the carriage 1 is rotated by an appropriate angle.

When the lifting rope 3 is lowered from the gripper 2 to an appropriate position, the two mask storage containers 14 are respectively gripped by the gripper 2 and then the lifting rope 3
Is raised. The lifting rope 3 is brought into the grip 2, and the arrangement of the two grips 2 and the mask container 14 is fixed in the same direction as the laying direction of the track rail 13. Thus, the mask transport device 1
00 is the state at the time of movement shown in FIG. 2, that is, the first state.

Next, the mask transfer device 100 moves along the track rail 13 while maintaining the first state. The control means provided in the mask transfer apparatus 100 reads the position of the reduced projection exposure apparatus 17 and the height and arrangement of the mounting table 15B from the bar code provided on the track rail corresponding to the predetermined reduced projection exposure apparatus 17. Read information such as direction.

Here, based on the read information on the position and height of the mounting table 15B, the control means stops the mask transfer device 100 at an appropriate position, and then starts lowering the lifting rope 3 to mount the mask. Lower to the vicinity of the table 15B, and stop at an appropriate height. Subsequent to this stop, the control means starts the rotation of the bogie 1. The control means stops the rotation after rotating the cart 1 so that the arrangement of the mask storage containers 14 is in the second state along the arrangement of the mounting tables 15B based on the arrangement direction information. Here, since the mounting table 15 is perpendicular to the laying direction of the track rail 13, the carriage 1 rotates 90 degrees. In this second state, the control means lowers the lifting rope 3 again, and
The height of the mask container 14 is accurately adjusted according to the height of B. Thereafter, the mask storage container 14 is released from the gripping tool 2 and is mounted on a suitable position of the mounting table 15B.

The mask container 1 mounted on the mounting table 15
4 is taken into the reduction projection exposure apparatus 17 as needed.

On the other hand, the semiconductor substrate housed in the wafer carrier 54 follows the track rail 53 by the OHT 51 and is mounted on the mounting table 55 provided in the coating apparatus 57. From the mounting table 55, a load port device (not shown)
Thereby, the semiconductor substrate is taken into the inside of the coating device 57. The semiconductor substrate is coated with a resist by a coating device 57, and the semiconductor substrate is housed in the reduction projection exposure device 17 from the coating device 57. In the reduction projection exposure apparatus 17, an exposure process is performed on the semiconductor substrate on which the resist is applied, using the reticle that is automatically transported.

Here, the reticle stocker 16
From the mask storage container 14,
However, the present invention is not limited to this, and in the projection exposure apparatus, the mask storage container 14 containing the reticle that has been used and is no longer needed is stored in the projection exposure apparatus 1.
7 and transported back to the reticle stocker 16 can also be used.

The delivery of the mask container and the transfer of the receipt may be performed simultaneously using the cart 1 provided with the two grippers 2. That is, the mask storage container 14 is gripped and transported by one gripping tool 2, and is mounted on the reduced projection exposure apparatus 17. At the same time, the other holding tool 2 receives the mask storage container 14 in which the unnecessary reticle is stored in the reduced projection exposure apparatus 17 and returns it to the reticle stocker 16 so that the transfer operation is performed simultaneously. Is also good.

Although the case where the reticle is conveyed to the reduction projection exposure apparatus 17 or the reticle stocker 16 has been described above, the present invention is not limited to the conveyance of the reticle to the reduction projection exposure apparatus 17 but may be applied to another apparatus. The transfer of the pattern transfer mask used in the above may be performed. Further, the present invention can also be used when the substrate is transported to a device in which the arrangement direction of the mounting tables does not match the laying direction of the track rail.

Further, here, the carriage is provided with two grippers 2.
Although the description has been given of the case where the number of mask storage containers that can be mounted on the mounting table 15 is one, one or two or more gripping tools may be provided. Even in the case where three or more mask storage containers 14 are gripped and transported, if the carriage is rotated in accordance with the arrangement of the mounting tables above the mounting table after being transported in the above-described first state, the transfer can be performed. The space required for this is not significantly different from when two mask storage containers are gripped, and thus there is no problem.

In this case, the track rail and the mounting table 15 are used.
The case where the arrangement of B is 90 degrees, that is, the case where the cart 1 is rotated by 90 degrees has been described. However, the present invention is not limited to this, and the cart 1 sets the angle of 0 to 360 Can rotate.

Further, here, the mask transport device 100
Has been described with the control means, but the present invention is not limited to the case with the control means. Further, the control means includes:
By reading the barcode provided on the track rail 13, information such as the position, height, and arrangement of the mounting table is obtained,
The cart 1 was automatically stopped and rotated again. However, the present invention is not limited to such control means, but may be one in which a stop position, a stop altitude, a rotation angle, and the like are stored in advance in the mask transfer device 100, and may be externally controlled by remote control. May be.

[0049]

As described above, according to the present invention, each substrate processing apparatus automatically transports a pattern transfer mask corresponding to a mounting table having a different height and a different arrangement. Can be. Therefore, it is not necessary to carry the pattern transfer mask manually, and the generation of foreign matter can be suppressed. Further, since it is not necessary to make a significant change on the conventional substrate processing apparatus side, it is possible to suppress the cost.

Further, according to the present invention, the mask storage container gripped by the cart is transported while maintaining the state along the track rail laying direction during transport. Therefore, a plurality of mask storage containers can be simultaneously transferred in the same space as when one mask storage container is transferred, and processing can be performed in a short time. In addition, even when a plurality of mask storage containers are mounted on the mounting table in this way, it is only necessary to rotate the cart in accordance with the arrangement of the mounting tables, so that the time for transport can be suppressed to a short time. it can.

Further, according to the present invention, the position, height, and arrangement of the mounting table are automatically read, and the carriage is automatically stopped at a necessary place, and automatically rotated to rotate the mask storage container. Is exchanged. Therefore, it is possible to prevent the pattern transfer mask from being erroneously conveyed as compared with the case of manual operation, and to perform more accurate and efficient conveyance.

[Brief description of the drawings]

FIG. 1 is a diagram for explaining a mask transport system according to an embodiment of the present invention.

FIG. 2 is a diagram for explaining a state when the mask transport device is moving according to the embodiment of the present invention.

FIG. 3 is a diagram illustrating a state when a mask storage container is transferred in the mask transport device according to the embodiment of the present invention.

FIG. 4 is a diagram showing a state in which the carriage is rotated in the direction in which the mounting tables are arranged in the mask transfer device according to the embodiment of the present invention.

FIG. 5 is a conceptual diagram showing a transfer system for automatically transferring a semiconductor substrate in a semiconductor manufacturing plant.

[Explanation of symbols]

 REFERENCE SIGNS LIST 100 mask transfer device 200 mask transfer system 1 carriage 2 gripper 3 elevating rope 4 connecting portion 13 track rail 14 mask storage container 15 mounting table 16 mask storage device (reticle stocker) 17 substrate processing device (reduction projection exposure device) 51 OHT 52 Hoist mechanism 53 Track rail 54 Wafer carrier 55 Mounting table 56 Wafer storage device (stocker) 57 Substrate processing device

Continued on the front page F term (reference) 5F031 CA02 CA07 DA08 DA12 DA17 EA14 FA03 FA07 FA09 FA15 GA12 GA19 GA36 GA58 JA49 MA06 MA26 MA27 PA02 5F046 AA21 CD02 CD04

Claims (10)

[Claims] 1. A trajectory rail laid to transfer a pattern transfer mask to a mask storage device and / or a substrate processing device, movably connected to the trajectory rail, and capable of moving along the trajectory rail, and A cart that can be rotated substantially horizontally around a portion connected to the track rail, and a gripping tool provided on the cart for gripping a plurality of mask storage containers that can store pattern transfer masks. A mask transport device characterized by including: 2. The truck according to claim 1, wherein the arrangement direction of the plurality of grippers is in a first state along a laying direction of the track rail.
2. The device according to claim 1, wherein the rail is traced.
3. The mask transport device according to item 1. 3. The apparatus according to claim 1, wherein the holding tool includes a transfer unit for transferring the mask storage container between the mask storage device and / or the substrate processing device and the carriage. 3. The mask transport device according to 1 or 2. 4. The method according to claim 1, wherein the carriage is connected to the mask storage device and
Or stopped at a predetermined position with respect to the substrate processing apparatus,
4. The mask transport apparatus according to claim 1, further comprising a control unit capable of rotating the mask by a predetermined angle. 5. A mask storage device capable of storing a plurality of pattern transfer masks, comprising: a mask storage device;
Or, a track rail for transferring between a plurality of substrate processing apparatuses, and a portion movably connected to the track rail, capable of moving along the track rail, and connecting to a portion connected to the track rail. A trolley that can be rotated substantially horizontally, a plurality of grippers provided on the trolley for gripping a plurality of mask storage containers, the mask storage device and / or the substrate processing device, the mask storage device A mask transport system, comprising: a mounting table for mounting a container; and a transfer unit configured to transfer the mask storage container between the mounting table and the carriage with the holding tool. 6. An arrangement direction of the plurality of gripping tools, when the track rail follows the track rail, a first state is along the laying direction of the track rail, and when the holder is mounted on the mounting table, The mask transport system according to claim 5, further comprising control means for controlling rotation of the carriage so as to be in a second state along the mounting table. 7. The mask transport system according to claim 5, wherein the control unit stops the carriage at a predetermined position with respect to the mounting table. 8. The control means automatically detects that the cart has come to a predetermined position with respect to the mounting table and stops the cart, and in accordance with this detection, controls the cart to the second position. The mask transport system according to claim 7, wherein the mask is automatically rotated to be in a state. 9. A carriage for gripping and transporting a plurality of mask storage containers for storing pattern transfer masks via a track storage device and / or a track rail laid between a plurality of substrate processing devices by a cart. A mask transfer method for transferring the mask storage container to and from the mask storage device and / or the plurality of substrate processing apparatuses, wherein, when the carriage is moved, the plurality of mask storage containers are arranged on the track rail. In a first state along the laying direction, and stop when the cart comes to a predetermined position with respect to the mask storage device and / or the plurality of substrate processing devices; and the arrangement of the plurality of mask storage containers is the mask. Rotating the carriage in a second state along the arrangement of a storage device and / or a mounting table provided in the plurality of substrate processing apparatuses, and exchanging the mask storage container Mask conveying method characterized by the the like. 10. The method according to claim 9, wherein the stopping and rotating of the carriage are performed automatically.