JP2002359376A5 - - Google Patents
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- Publication number
- JP2002359376A5 JP2002359376A5 JP2002089062A JP2002089062A JP2002359376A5 JP 2002359376 A5 JP2002359376 A5 JP 2002359376A5 JP 2002089062 A JP2002089062 A JP 2002089062A JP 2002089062 A JP2002089062 A JP 2002089062A JP 2002359376 A5 JP2002359376 A5 JP 2002359376A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- electrode
- wiring
- island
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 claims 63
- 239000012535 impurity Substances 0.000 claims 16
- 238000004519 manufacturing process Methods 0.000 claims 7
- 238000000034 method Methods 0.000 claims 7
- 230000015572 biosynthetic process Effects 0.000 claims 5
- 238000005498 polishing Methods 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 3
- 239000012528 membrane Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002089062A JP2002359376A (ja) | 2001-03-27 | 2002-03-27 | 半導体装置及びその作製方法 |
| US10/125,790 US6982194B2 (en) | 2001-03-27 | 2002-04-19 | Semiconductor device and method for manufacturing the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-91493 | 2001-03-27 | ||
| JP2001091493 | 2001-03-27 | ||
| JP2002089062A JP2002359376A (ja) | 2001-03-27 | 2002-03-27 | 半導体装置及びその作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002359376A JP2002359376A (ja) | 2002-12-13 |
| JP2002359376A5 true JP2002359376A5 (https=) | 2005-09-08 |
Family
ID=26612276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002089062A Withdrawn JP2002359376A (ja) | 2001-03-27 | 2002-03-27 | 半導体装置及びその作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002359376A (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7078322B2 (en) | 2001-11-29 | 2006-07-18 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a thin film transistor |
| US7541614B2 (en) | 2003-03-11 | 2009-06-02 | Semiconductor Energy Laboratory Co., Ltd. | Integrated circuit, semiconductor device comprising the same, electronic device having the same, and driving method of the same |
| JP4940797B2 (ja) * | 2005-10-03 | 2012-05-30 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
| JP5371144B2 (ja) | 2007-06-29 | 2013-12-18 | 株式会社半導体エネルギー研究所 | 半導体装置及び半導体装置の作製方法、並びに電子機器 |
| WO2011010542A1 (en) * | 2009-07-23 | 2011-01-27 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| KR102581069B1 (ko) | 2010-02-05 | 2023-09-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치, 및 반도체 장치의 제조 방법 |
| KR101465192B1 (ko) | 2010-04-09 | 2014-11-25 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| US8525178B2 (en) | 2010-05-12 | 2013-09-03 | Panasonic Corporation | Flexible semiconductor device and method for producing the same |
| TWI665778B (zh) * | 2014-02-05 | 2019-07-11 | 日商半導體能源研究所股份有限公司 | 半導體裝置、模組及電子裝置 |
| US10186618B2 (en) * | 2015-03-18 | 2019-01-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| JP6815122B2 (ja) * | 2015-08-07 | 2021-01-20 | 株式会社半導体エネルギー研究所 | 表示パネル |
-
2002
- 2002-03-27 JP JP2002089062A patent/JP2002359376A/ja not_active Withdrawn
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