JP2002355584A5 - - Google Patents
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- JP2002355584A5 JP2002355584A5 JP2002021269A JP2002021269A JP2002355584A5 JP 2002355584 A5 JP2002355584 A5 JP 2002355584A5 JP 2002021269 A JP2002021269 A JP 2002021269A JP 2002021269 A JP2002021269 A JP 2002021269A JP 2002355584 A5 JP2002355584 A5 JP 2002355584A5
- Authority
- JP
- Japan
- Prior art keywords
- aerosol
- particles
- deposition apparatus
- flow path
- differential mobility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/772,688 US6607597B2 (en) | 2001-01-30 | 2001-01-30 | Method and apparatus for deposition of particles on surfaces |
US09/772688 | 2001-01-30 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002355584A JP2002355584A (ja) | 2002-12-10 |
JP2002355584A5 true JP2002355584A5 (de) | 2005-08-11 |
JP4139112B2 JP4139112B2 (ja) | 2008-08-27 |
Family
ID=25095874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002021269A Expired - Fee Related JP4139112B2 (ja) | 2001-01-30 | 2002-01-30 | 粒子を表面上に堆積させる堆積装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6607597B2 (de) |
JP (1) | JP4139112B2 (de) |
DE (1) | DE10203580A1 (de) |
Families Citing this family (51)
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AT502207B1 (de) * | 2005-08-05 | 2007-11-15 | Univ Wien | Verfahren zum klassifizieren und trennen von teilchen sowie vorrichtung zur durchführung dieses verfahrens |
EP1757370B8 (de) * | 2005-08-24 | 2012-03-14 | Brother Kogyo Kabushiki Kaisha | Filmbildungsvorrichtung und Strahldüse |
US7932181B2 (en) | 2006-06-20 | 2011-04-26 | Lam Research Corporation | Edge gas injection for critical dimension uniformity improvement |
US8499581B2 (en) * | 2006-10-06 | 2013-08-06 | Ihi E&C International Corporation | Gas conditioning method and apparatus for the recovery of LPG/NGL(C2+) from LNG |
KR100901193B1 (ko) | 2007-07-12 | 2009-06-04 | 한양대학교 산학협력단 | 파티클 입자 증착 설비 |
US20090029064A1 (en) * | 2007-07-25 | 2009-01-29 | Carlton Maurice Truesdale | Apparatus and method for making nanoparticles using a hot wall reactor |
TWI482662B (zh) | 2007-08-30 | 2015-05-01 | Optomec Inc | 機械上一體式及緊密式耦合之列印頭以及噴霧源 |
TWI538737B (zh) | 2007-08-31 | 2016-06-21 | 阿普托麥克股份有限公司 | 材料沉積總成 |
US8887658B2 (en) * | 2007-10-09 | 2014-11-18 | Optomec, Inc. | Multiple sheath multiple capillary aerosol jet |
US8399045B2 (en) * | 2007-10-16 | 2013-03-19 | Panasonic Corporation | Film formation method and film formation apparatus |
FI122502B (fi) * | 2007-12-20 | 2012-02-29 | Beneq Oy | Menetelmä ja laite lasin pinnoittamiseksi |
US8573034B2 (en) * | 2008-01-22 | 2013-11-05 | Ct Associates, Inc. | Residue concentration measurement technology |
FI20080264L (fi) * | 2008-04-03 | 2009-10-04 | Beneq Oy | Pinnoitusmenetelmä ja -laite |
DE102009007800A1 (de) * | 2009-02-06 | 2010-08-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Aerosol-Drucker, dessen Verwendung und Verfahren zur Herstellung von Linienunterbrechungen bei kontinuierlichen Aerosol-Druckverfahren |
FI20090319A0 (fi) * | 2009-09-03 | 2009-09-03 | Beneq Oy | Prosessinsäätömenetelmä |
KR100964144B1 (ko) * | 2010-01-22 | 2010-06-17 | 한국에스티기술(주) | 정전기발생에 의한 수직형 미연탄소분 분리장치 |
US9239279B1 (en) * | 2011-06-03 | 2016-01-19 | Arkansas State University—Jonesboro | Sequential differential mobility analyzer and method of using same |
KR102444204B1 (ko) | 2015-02-10 | 2022-09-19 | 옵토멕 인코포레이티드 | 에어로졸의 비행 중 경화에 의해 3차원 구조를 제조하는 방법 |
WO2017210478A1 (en) | 2016-06-01 | 2017-12-07 | Arizona Board Of Regents On Behalf Of Arizona State University | System and methods for deposition spray of particulate coatings |
EP3421947B1 (de) | 2017-06-30 | 2019-08-07 | Sensirion AG | Betriebsverfahren für eine durchflusssensorvorrichtung |
EP3258241B1 (de) * | 2017-09-14 | 2019-12-25 | Sensirion AG | Schwebstoffteilchen sensorvorrichtung |
US10632746B2 (en) * | 2017-11-13 | 2020-04-28 | Optomec, Inc. | Shuttering of aerosol streams |
NL2022412B1 (en) * | 2019-01-17 | 2020-08-18 | Vsparticle Holding B V | Switching device, deposition device comprising the switching device, method for switching a fluid flow, and method for depositing particles onto a substrate |
US11754635B2 (en) * | 2019-07-12 | 2023-09-12 | Rai Strategic Holdings, Inc. | Power unit test system and method |
US11441974B2 (en) | 2019-08-01 | 2022-09-13 | Applied Materials, Inc. | Detection of surface particles on chamber components with carbon dioxide |
CN112033913B (zh) * | 2020-08-25 | 2024-03-22 | 中国科学院合肥物质科学研究院 | 基于表面等离激元共振成像的纳米单颗粒物含水量测量装置及方法 |
CN112519417B (zh) * | 2020-11-28 | 2022-03-29 | 厦门理工学院 | 一种双鞘气气溶胶喷印方法及喷印头 |
CN113199776B (zh) * | 2021-03-15 | 2023-04-28 | 厦门理工学院 | 一种纳米颗粒气溶胶喷印方法及装置 |
JP7517277B2 (ja) * | 2021-07-14 | 2024-07-17 | トヨタ自動車株式会社 | 電極製造装置 |
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US4610760A (en) * | 1984-08-24 | 1986-09-09 | General Foods Corporation | Three-fluid atomizing nozzle and method of utilization thereof |
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US4794086A (en) * | 1985-11-25 | 1988-12-27 | Liquid Air Corporation | Method for measurement of impurities in liquids |
JPH0663961B2 (ja) * | 1986-03-24 | 1994-08-22 | 日本科学工業株式会社 | 液中不純物測定方法とその測定装置 |
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US5316579A (en) | 1988-12-27 | 1994-05-31 | Symetrix Corporation | Apparatus for forming a thin film with a mist forming means |
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US5688565A (en) | 1988-12-27 | 1997-11-18 | Symetrix Corporation | Misted deposition method of fabricating layered superlattice materials |
US5614252A (en) | 1988-12-27 | 1997-03-25 | Symetrix Corporation | Method of fabricating barium strontium titanate |
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US4996080A (en) | 1989-04-05 | 1991-02-26 | Olin Hunt Specialty Products Inc. | Process for coating a photoresist composition onto a substrate |
FR2658913B1 (fr) | 1990-02-27 | 1992-04-30 | Commissariat Energie Atomique | Procede et dispositif d'etalonnage d'un compteur de particules. |
US5364562A (en) | 1990-04-17 | 1994-11-15 | Xingwu Wang | Aerosol-plasma deposition of insulating oxide powder |
US5171360A (en) | 1990-08-30 | 1992-12-15 | University Of Southern California | Method for droplet stream manufacturing |
US5203547A (en) * | 1990-11-29 | 1993-04-20 | Canon Kabushiki Kaisha | Vacuum attraction type substrate holding device |
US5962085A (en) * | 1991-02-25 | 1999-10-05 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
US5229171A (en) | 1991-12-23 | 1993-07-20 | Research Triangle Institute | Apparatus and method for uniformly coating a substrate in an evacuable chamber |
US5306345A (en) | 1992-08-25 | 1994-04-26 | Particle Solutions | Deposition chamber for deposition of particles on semiconductor wafers |
US5534309A (en) | 1994-06-21 | 1996-07-09 | Msp Corporation | Method and apparatus for depositing particles on surfaces |
US5916640A (en) | 1996-09-06 | 1999-06-29 | Msp Corporation | Method and apparatus for controlled particle deposition on surfaces |
US5807435A (en) | 1997-03-13 | 1998-09-15 | Thomson Consumer Electronics, Inc. | Spray module having shielding means and collecting means |
-
2001
- 2001-01-30 US US09/772,688 patent/US6607597B2/en not_active Expired - Lifetime
-
2002
- 2002-01-30 JP JP2002021269A patent/JP4139112B2/ja not_active Expired - Fee Related
- 2002-01-30 DE DE10203580A patent/DE10203580A1/de not_active Ceased
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